ATE504076T1 - Verfahren zur steuerung der ionenenergie in radiofrequenzplasmen - Google Patents

Verfahren zur steuerung der ionenenergie in radiofrequenzplasmen

Info

Publication number
ATE504076T1
ATE504076T1 AT08786101T AT08786101T ATE504076T1 AT E504076 T1 ATE504076 T1 AT E504076T1 AT 08786101 T AT08786101 T AT 08786101T AT 08786101 T AT08786101 T AT 08786101T AT E504076 T1 ATE504076 T1 AT E504076T1
Authority
AT
Austria
Prior art keywords
plasms
radio frequency
ion energy
controlling ion
components
Prior art date
Application number
AT08786101T
Other languages
English (en)
Inventor
Brian Heil
Uwe Czarnetzki
Ralf Brinkmann
Thomas Mussenbrock
Original Assignee
Univ Ruhr Bochum
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Ruhr Bochum filed Critical Univ Ruhr Bochum
Application granted granted Critical
Publication of ATE504076T1 publication Critical patent/ATE504076T1/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32091Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32137Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32146Amplitude modulation, includes pulsing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32137Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155Frequency modulation
    • H01J37/32165Plural frequencies
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32697Electrostatic control
    • H01J37/32706Polarising the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
AT08786101T 2008-03-20 2008-07-11 Verfahren zur steuerung der ionenenergie in radiofrequenzplasmen ATE504076T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US3826308P 2008-03-20 2008-03-20
PCT/EP2008/059133 WO2009115135A1 (en) 2008-03-20 2008-07-11 Method for controlling ion energy in radio frequency plasmas

Publications (1)

Publication Number Publication Date
ATE504076T1 true ATE504076T1 (de) 2011-04-15

Family

ID=39831709

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08786101T ATE504076T1 (de) 2008-03-20 2008-07-11 Verfahren zur steuerung der ionenenergie in radiofrequenzplasmen

Country Status (7)

Country Link
US (2) US8643280B2 (de)
EP (2) EP2249372B1 (de)
CN (1) CN101978461B (de)
AT (1) ATE504076T1 (de)
DE (1) DE602008005858D1 (de)
TW (1) TW200952560A (de)
WO (1) WO2009115135A1 (de)

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Also Published As

Publication number Publication date
TW200952560A (en) 2009-12-16
US8933629B2 (en) 2015-01-13
WO2009115135A1 (en) 2009-09-24
EP2122657B1 (de) 2011-03-30
CN101978461B (zh) 2013-09-11
EP2122657B8 (de) 2011-06-22
US8643280B2 (en) 2014-02-04
US20140103808A1 (en) 2014-04-17
DE602008005858D1 (de) 2011-05-12
CN101978461A (zh) 2011-02-16
EP2122657A1 (de) 2009-11-25
US20110248634A1 (en) 2011-10-13
EP2249372A1 (de) 2010-11-10
EP2249372B1 (de) 2013-01-02

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