ATE427519T1 - Uv-aushartbare harzzusammensetzung und photolít- resistfarbstoff mit der zusammensetzung - Google Patents
Uv-aushartbare harzzusammensetzung und photolít- resistfarbstoff mit der zusammensetzungInfo
- Publication number
- ATE427519T1 ATE427519T1 AT01965640T AT01965640T ATE427519T1 AT E427519 T1 ATE427519 T1 AT E427519T1 AT 01965640 T AT01965640 T AT 01965640T AT 01965640 T AT01965640 T AT 01965640T AT E427519 T1 ATE427519 T1 AT E427519T1
- Authority
- AT
- Austria
- Prior art keywords
- resin composition
- ultraviolet curable
- curable resin
- ethylenically unsaturated
- unsaturated monomer
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/10—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers containing more than one epoxy radical per molecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
- C08F290/064—Polymers containing more than one epoxy group per molecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
- C08L51/08—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
- C08L63/10—Epoxy resins modified by unsaturated compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/901—Printed circuit
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
Landscapes
- Chemical & Material Sciences (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Materials For Photolithography (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Epoxy Resins (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000321976 | 2000-09-16 | ||
JP2000282545 | 2000-09-18 | ||
JP2000375131 | 2000-12-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE427519T1 true ATE427519T1 (de) | 2009-04-15 |
Family
ID=27344652
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT01965640T ATE427519T1 (de) | 2000-09-16 | 2001-09-14 | Uv-aushartbare harzzusammensetzung und photolít- resistfarbstoff mit der zusammensetzung |
Country Status (9)
Country | Link |
---|---|
US (1) | US6896967B2 (de) |
EP (1) | EP1324135B1 (de) |
JP (1) | JP4847670B2 (de) |
CN (1) | CN1210620C (de) |
AT (1) | ATE427519T1 (de) |
AU (1) | AU2001286239A1 (de) |
DE (1) | DE60138202D1 (de) |
TW (1) | TW521547B (de) |
WO (1) | WO2002025378A1 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1359172B1 (de) * | 2000-12-14 | 2009-05-27 | Goo Chemical Co., Ltd. | Uv-härtbare harzzusammensetzung und die zusammensetzung enthaltende photolotresisttinte |
JP4198173B2 (ja) * | 2004-09-17 | 2008-12-17 | 凸版印刷株式会社 | 着色アルカリ現像性感光性樹脂組成物及び該着色アルカリ現像性感光性樹脂組成物を用いたカラーフィルタ |
CN101006393B (zh) * | 2005-05-11 | 2011-11-30 | 凸版印刷株式会社 | 碱性显影型感光性树脂组合物、带有使用它形成的液晶分割取向控制突起的基板和滤色器、以及液晶显示装置 |
JP4641861B2 (ja) * | 2005-05-11 | 2011-03-02 | 株式会社Adeka | アルカリ現像性樹脂組成物 |
JP4916224B2 (ja) * | 2005-06-20 | 2012-04-11 | 株式会社Adeka | アルカリ現像性感光性樹脂組成物 |
KR101317223B1 (ko) * | 2005-06-20 | 2013-10-15 | 가부시키가이샤 아데카 | 착색 알칼리 현상형 감광성 수지 조성물, 및 상기 착색 알칼리 현상형 감광성 수지 조성물을 이용한 컬러필터 |
JP4464907B2 (ja) * | 2005-11-16 | 2010-05-19 | 株式会社日本触媒 | 感光性樹脂組成物 |
JP4660507B2 (ja) * | 2007-01-03 | 2011-03-30 | 三星モバイルディスプレイ株式會社 | フレキシブル回路基板及びこれを有する液晶表示装置 |
KR100788556B1 (ko) * | 2007-01-03 | 2007-12-26 | 삼성에스디아이 주식회사 | 광흡수층을 갖는 액정 표시 장치용 연성 회로 기판 |
KR100788557B1 (ko) * | 2007-01-03 | 2007-12-26 | 삼성에스디아이 주식회사 | 광흡수층을 갖는 액정 표시 장치용 연성 회로 기판 |
CN101465408B (zh) * | 2008-12-31 | 2010-12-29 | 电子科技大学 | 一种柔性有机光电子器件用基板及其制备方法 |
CN102164458A (zh) * | 2010-02-24 | 2011-08-24 | 苏州群策科技有限公司 | 密集线路板的防旱涂布方法 |
US9326376B2 (en) * | 2014-01-14 | 2016-04-26 | Meiko Electronics Co., Ltd. | Printed wiring board |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0693221A (ja) * | 1992-09-09 | 1994-04-05 | Goou Kagaku Kogyo Kk | 液状レジストインク組成物及びプリント回路基板 |
JP3329877B2 (ja) | 1993-03-02 | 2002-09-30 | 互応化学工業株式会社 | プリント回路基板製造用レジストインク組成物、それを用いたレジスト膜及びプリント回路基板 |
WO1996028764A1 (fr) * | 1993-09-02 | 1996-09-19 | Goo Chemical Industries Co., Ltd. | Composition de resine photosensible et couche mince de revetement, encre resist, resist de soudure et plaquette a circuits imprimes realises avec cette composition |
JPH0772624A (ja) * | 1993-09-02 | 1995-03-17 | Goou Kagaku Kogyo Kk | 感光性樹脂組成物並びにそれを用いた被膜、レジストインク、レジスト、ソルダーレジスト及びプリント回路基板 |
JP3281473B2 (ja) | 1994-01-17 | 2002-05-13 | 日本化薬株式会社 | フレキシブルプリント配線板用レジストインキ組成物及びその硬化物 |
WO1996011239A1 (fr) * | 1994-10-05 | 1996-04-18 | Goo Chemical Co., Ltd. | Encre resist de photosoudure, carte a circuit imprime et procede de fabrication |
JP3686699B2 (ja) | 1995-03-31 | 2005-08-24 | 太陽インキ製造株式会社 | アルカリ現像型の光硬化性・熱硬化性樹脂組成物 |
JPH095997A (ja) | 1995-06-14 | 1997-01-10 | Tamura Kaken Kk | 感光性樹脂組成物、その硬化塗膜及び回路基板 |
US5858618A (en) | 1996-12-02 | 1999-01-12 | Nan Ya Plastics Corporation | Photopolymerizable resinous composition |
US6583198B2 (en) * | 1997-11-28 | 2003-06-24 | Hitachi Chemical Company, Ltd. | Photo curable resin composition and photosensitive element |
JPH11258789A (ja) * | 1998-01-08 | 1999-09-24 | Mitsui Chem Inc | 硬化性樹脂組成物 |
JP4081217B2 (ja) * | 1999-03-17 | 2008-04-23 | 互応化学工業株式会社 | 紫外線硬化性樹脂組成物、フォトソルダーレジストインク、予備乾燥被膜、基板及びプリント配線板 |
-
2001
- 2001-09-14 US US10/363,855 patent/US6896967B2/en not_active Expired - Lifetime
- 2001-09-14 EP EP20010965640 patent/EP1324135B1/de not_active Expired - Lifetime
- 2001-09-14 DE DE60138202T patent/DE60138202D1/de not_active Expired - Fee Related
- 2001-09-14 AU AU2001286239A patent/AU2001286239A1/en not_active Abandoned
- 2001-09-14 WO PCT/JP2001/007986 patent/WO2002025378A1/ja active Application Filing
- 2001-09-14 CN CNB018157513A patent/CN1210620C/zh not_active Expired - Fee Related
- 2001-09-14 AT AT01965640T patent/ATE427519T1/de not_active IP Right Cessation
- 2001-09-14 TW TW90122831A patent/TW521547B/zh not_active IP Right Cessation
- 2001-09-14 JP JP2002529317A patent/JP4847670B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP4847670B2 (ja) | 2011-12-28 |
US20040006161A1 (en) | 2004-01-08 |
US6896967B2 (en) | 2005-05-24 |
EP1324135A4 (de) | 2005-02-02 |
JPWO2002025378A1 (ja) | 2004-01-29 |
CN1459049A (zh) | 2003-11-26 |
WO2002025378A1 (fr) | 2002-03-28 |
CN1210620C (zh) | 2005-07-13 |
AU2001286239A1 (en) | 2002-04-02 |
TW521547B (en) | 2003-02-21 |
EP1324135A1 (de) | 2003-07-02 |
DE60138202D1 (de) | 2009-05-14 |
EP1324135B1 (de) | 2009-04-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |