ATE338289T1 - Optisches system zur homogenisierung von lichtstrahlen, mit variablem ausgangs-querschnitt - Google Patents
Optisches system zur homogenisierung von lichtstrahlen, mit variablem ausgangs-querschnittInfo
- Publication number
- ATE338289T1 ATE338289T1 AT00830807T AT00830807T ATE338289T1 AT E338289 T1 ATE338289 T1 AT E338289T1 AT 00830807 T AT00830807 T AT 00830807T AT 00830807 T AT00830807 T AT 00830807T AT E338289 T1 ATE338289 T1 AT E338289T1
- Authority
- AT
- Austria
- Prior art keywords
- component
- optical system
- light beams
- section
- variable output
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/067—Dividing the beam into multiple beams, e.g. multifocusing
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0955—Lenses
- G02B27/0961—Lens arrays
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0955—Lenses
- G02B27/0966—Cylindrical lenses
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Lenses (AREA)
- Laser Surgery Devices (AREA)
- Non-Portable Lighting Devices Or Systems Thereof (AREA)
- Lasers (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT2000RM000229A IT1316395B1 (it) | 2000-04-28 | 2000-04-28 | Sistema ottico per la omogeneizzazione spaziale di fasci di luce, conuscita a sezione variabile. |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE338289T1 true ATE338289T1 (de) | 2006-09-15 |
Family
ID=11454694
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT00830807T ATE338289T1 (de) | 2000-04-28 | 2000-12-06 | Optisches system zur homogenisierung von lichtstrahlen, mit variablem ausgangs-querschnitt |
Country Status (5)
Country | Link |
---|---|
US (1) | US6639728B2 (de) |
EP (1) | EP1150156B1 (de) |
AT (1) | ATE338289T1 (de) |
DE (1) | DE60030411T2 (de) |
IT (1) | IT1316395B1 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7372630B2 (en) * | 2001-08-17 | 2008-05-13 | Semiconductor Energy Laboratory Co., Ltd. | Laser, irradiation apparatus, laser irradiation method, and method for manufacturing semiconductor device |
JP3977038B2 (ja) * | 2001-08-27 | 2007-09-19 | 株式会社半導体エネルギー研究所 | レーザ照射装置およびレーザ照射方法 |
US7210820B2 (en) * | 2003-05-07 | 2007-05-01 | Resonetics, Inc. | Methods and apparatuses for homogenizing light |
KR100990251B1 (ko) * | 2003-12-23 | 2010-10-26 | 엘지디스플레이 주식회사 | 레이저 빔 프로파일 변형 필터를 포함하는 레이저 광학계 |
WO2006067495A2 (en) * | 2004-12-23 | 2006-06-29 | Micromass Uk Limited | Mass spectrometer |
GB0428185D0 (en) | 2004-12-23 | 2005-01-26 | Micromass Ltd | Mass spectrometer |
US20080013182A1 (en) * | 2006-07-17 | 2008-01-17 | Joerg Ferber | Two-stage laser-beam homogenizer |
JP2012508985A (ja) * | 2008-11-14 | 2012-04-12 | ザ トラスティーズ オブ コロンビア ユニヴァーシティ イン ザ シティ オブ ニューヨーク | 薄膜の結晶化のためのシステムおよび方法 |
WO2013009550A2 (en) * | 2011-07-13 | 2013-01-17 | Bae Systems Integration And Electronic Systems Integration Inc. | Beam shaping and control apparatus |
EP2752689A1 (de) * | 2013-01-02 | 2014-07-09 | Jena-Optronik GmbH | Kalibriereinrichtung zur Kalibration eines extraterrestrischen optischen Instruments und Kalibrierverfahren mit dieser |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4733944A (en) * | 1986-01-24 | 1988-03-29 | Xmr, Inc. | Optical beam integration system |
US6560018B1 (en) * | 1994-10-27 | 2003-05-06 | Massachusetts Institute Of Technology | Illumination system for transmissive light valve displays |
FR2737786B1 (fr) * | 1995-08-11 | 1997-09-12 | Soc D Production Et De Rech Ap | Dispositif optique pour homogeneiser un faisceau laser |
DE19632460C1 (de) * | 1996-08-12 | 1997-10-30 | Microlas Lasersystem Gmbh | Optische Vorrichtung zum Homogenisieren von Laserstrahlung und Erzeugen von mehreren Beleuchtungsfeldern |
JPH10314970A (ja) * | 1997-05-14 | 1998-12-02 | Tsunezo Sei | レーザービーム照射の均一性を向上する方法 |
US5844727A (en) * | 1997-09-02 | 1998-12-01 | Cymer, Inc. | Illumination design for scanning microlithography systems |
JP4663047B2 (ja) * | 1998-07-13 | 2011-03-30 | 株式会社半導体エネルギー研究所 | レーザー照射装置及び半導体装置の作製方法 |
JP3919419B2 (ja) * | 2000-03-30 | 2007-05-23 | キヤノン株式会社 | 照明装置及びそれを有する露光装置 |
US6577429B1 (en) * | 2002-01-15 | 2003-06-10 | Eastman Kodak Company | Laser projection display system |
-
2000
- 2000-04-28 IT IT2000RM000229A patent/IT1316395B1/it active
- 2000-11-30 US US09/727,268 patent/US6639728B2/en not_active Expired - Fee Related
- 2000-12-06 AT AT00830807T patent/ATE338289T1/de not_active IP Right Cessation
- 2000-12-06 DE DE60030411T patent/DE60030411T2/de not_active Expired - Lifetime
- 2000-12-06 EP EP00830807A patent/EP1150156B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1150156B1 (de) | 2006-08-30 |
ITRM20000229A1 (it) | 2001-10-28 |
EP1150156A3 (de) | 2004-09-15 |
ITRM20000229A0 (it) | 2000-04-28 |
US20010043399A1 (en) | 2001-11-22 |
IT1316395B1 (it) | 2003-04-10 |
EP1150156A2 (de) | 2001-10-31 |
DE60030411D1 (de) | 2006-10-12 |
DE60030411T2 (de) | 2007-04-12 |
US6639728B2 (en) | 2003-10-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |