ATE323787T1 - Plasmaunterstützte filmabscheidung - Google Patents

Plasmaunterstützte filmabscheidung

Info

Publication number
ATE323787T1
ATE323787T1 AT03816980T AT03816980T ATE323787T1 AT E323787 T1 ATE323787 T1 AT E323787T1 AT 03816980 T AT03816980 T AT 03816980T AT 03816980 T AT03816980 T AT 03816980T AT E323787 T1 ATE323787 T1 AT E323787T1
Authority
AT
Austria
Prior art keywords
electrode
certain embodiments
interior cavity
deposition chamber
plasma
Prior art date
Application number
AT03816980T
Other languages
English (en)
Inventor
Klaus Hartig
Original Assignee
Cardinal Cg Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cardinal Cg Co filed Critical Cardinal Cg Co
Application granted granted Critical
Publication of ATE323787T1 publication Critical patent/ATE323787T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32853—Hygiene
    • H01J37/32862—In situ cleaning of vessels and/or internal parts
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4404—Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Saccharide Compounds (AREA)
  • Formation Of Insulating Films (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
AT03816980T 2002-12-18 2003-12-18 Plasmaunterstützte filmabscheidung ATE323787T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US43452202P 2002-12-18 2002-12-18

Publications (1)

Publication Number Publication Date
ATE323787T1 true ATE323787T1 (de) 2006-05-15

Family

ID=33449676

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03816980T ATE323787T1 (de) 2002-12-18 2003-12-18 Plasmaunterstützte filmabscheidung

Country Status (8)

Country Link
US (2) US7157123B2 (de)
EP (1) EP1579027B1 (de)
JP (1) JP2006521462A (de)
AT (1) ATE323787T1 (de)
AU (1) AU2003304125A1 (de)
CA (1) CA2509952A1 (de)
DE (1) DE60304745T2 (de)
WO (1) WO2004101844A1 (de)

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DE102004020768A1 (de) * 2004-04-16 2005-11-17 Centrotherm Photovoltaics Gmbh + Co. Kg Plasmareaktor mit hoher Produktivität
DE602005003234T2 (de) 2004-07-12 2008-08-28 Cardinal Cg Co., Eden Prairie Wartungsarme beschichtungen
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US7923114B2 (en) 2004-12-03 2011-04-12 Cardinal Cg Company Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films
US8092660B2 (en) 2004-12-03 2012-01-10 Cardinal Cg Company Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films
US20070089982A1 (en) * 2005-10-24 2007-04-26 Hendryk Richert Sputtering target and method/apparatus for cooling the target
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EP1783815A1 (de) * 2005-11-07 2007-05-09 ARCELOR France Verfahren und Anlage zum Ätzen eines Metallbandes mittels Vakuum-Magnetron-Zerstäubung
JP5177958B2 (ja) * 2006-03-31 2013-04-10 Ｈｏｙａ株式会社 処理データ管理システム、磁気ディスク製造装置用の処理システム、および、磁気ディスク製造装置のデータ管理方法
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US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
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DE102009015737B4 (de) * 2009-03-31 2013-12-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Magnetron-Beschichtungsmodul sowie Magnetron-Beschichtungsverfahren
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CN103993274A (zh) * 2014-05-09 2014-08-20 浙江上方电子装备有限公司 一种磁控溅射***及其清洁方法
US10816703B2 (en) 2015-09-28 2020-10-27 Tru Vue, Inc. Near infrared reflective coatings
CN109311740B (zh) 2016-04-19 2022-01-11 顶峰实业股份有限公司 涂覆的玻璃表面和用于涂覆玻璃基板的方法
WO2018093985A1 (en) 2016-11-17 2018-05-24 Cardinal Cg Company Static-dissipative coating technology
KR102565397B1 (ko) 2017-05-04 2023-08-09 어포지 엔터프라이지즈, 인크. 저방사율 코팅, 그를 포함하는 유리 표면, 및 그를 제조하는 방법
CN112820619A (zh) * 2021-03-06 2021-05-18 东莞市峰谷纳米科技有限公司 一种等离子表面清洁装置
DE102022000838A1 (de) 2022-03-10 2023-09-14 Helmut Popp Anlage zum Herstellen von wenigstens einer dünnsten Schicht

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Also Published As

Publication number Publication date
JP2006521462A (ja) 2006-09-21
DE60304745D1 (de) 2006-05-24
US20040163945A1 (en) 2004-08-26
US20070102291A1 (en) 2007-05-10
CA2509952A1 (en) 2004-11-25
WO2004101844A1 (en) 2004-11-25
EP1579027B1 (de) 2006-04-19
EP1579027A1 (de) 2005-09-28
AU2003304125A1 (en) 2004-12-03
US7157123B2 (en) 2007-01-02
DE60304745T2 (de) 2007-01-25

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