ATE308414T1 - Profilierung eines strahlungsbündels für stereolithographie - Google Patents
Profilierung eines strahlungsbündels für stereolithographieInfo
- Publication number
- ATE308414T1 ATE308414T1 AT00128126T AT00128126T ATE308414T1 AT E308414 T1 ATE308414 T1 AT E308414T1 AT 00128126 T AT00128126 T AT 00128126T AT 00128126 T AT00128126 T AT 00128126T AT E308414 T1 ATE308414 T1 AT E308414T1
- Authority
- AT
- Austria
- Prior art keywords
- stereolithography
- intensity
- pinhole
- profiling
- scanning mechanism
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T17/00—Three dimensional [3D] modelling, e.g. data description of 3D objects
- G06T17/20—Finite element generation, e.g. wire-frame surface description, tesselation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
- B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
- B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/40—Structures for supporting 3D objects during manufacture and intended to be sacrificed after completion thereof
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70416—2.5D lithography
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T17/00—Three dimensional [3D] modelling, e.g. data description of 3D objects
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T17/00—Three dimensional [3D] modelling, e.g. data description of 3D objects
- G06T17/10—Constructive solid geometry [CSG] using solid primitives, e.g. cylinders, cubes
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/49—Nc machine tool, till multiple
- G05B2219/49013—Deposit layers, cured by scanning laser, stereo lithography SLA, prototyping
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Geometry (AREA)
- Optics & Photonics (AREA)
- Materials Engineering (AREA)
- Computer Graphics (AREA)
- Software Systems (AREA)
- Theoretical Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Laser Beam Processing (AREA)
- Powder Metallurgy (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/182,830 US5059359A (en) | 1988-04-18 | 1988-04-18 | Methods and apparatus for production of three-dimensional objects by stereolithography |
US26980188A | 1988-11-08 | 1988-11-08 | |
US07/268,907 US5059021A (en) | 1988-04-18 | 1988-11-08 | Apparatus and method for correcting for drift in production of objects by stereolithography |
US07/268,816 US5058988A (en) | 1988-04-18 | 1988-11-08 | Apparatus and method for profiling a beam |
US07/268,837 US5123734A (en) | 1988-04-18 | 1988-11-08 | Apparatus and method for calibrating and normalizing a stereolithographic apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE308414T1 true ATE308414T1 (de) | 2005-11-15 |
Family
ID=27539082
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT00128126T ATE308414T1 (de) | 1988-04-18 | 1989-04-17 | Profilierung eines strahlungsbündels für stereolithographie |
AT96120757T ATE208702T1 (de) | 1988-04-18 | 1989-04-17 | Profilierung eines strahlungsbündels für stereolithographie |
AT89303780T ATE160968T1 (de) | 1988-04-18 | 1989-04-17 | Profilierung eines strahlungsbündels für stereolithographie |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT96120757T ATE208702T1 (de) | 1988-04-18 | 1989-04-17 | Profilierung eines strahlungsbündels für stereolithographie |
AT89303780T ATE160968T1 (de) | 1988-04-18 | 1989-04-17 | Profilierung eines strahlungsbündels für stereolithographie |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP0375097B1 (de) |
AT (3) | ATE308414T1 (de) |
CA (2) | CA1341214C (de) |
DE (4) | DE68928485T2 (de) |
HK (1) | HK1003490A1 (de) |
IL (1) | IL89976A0 (de) |
WO (1) | WO1989011085A1 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5753171A (en) * | 1994-05-13 | 1998-05-19 | Eos Gmbh Electro Optical Systems | Method and apparatus for producing a three-dimensional object |
DE4416988A1 (de) * | 1994-05-13 | 1995-11-16 | Eos Electro Optical Syst | Vorrichtung und Verfahren zum Herstellen eines dreidimensionalen Objekts |
DE19918613A1 (de) | 1999-04-23 | 2000-11-30 | Eos Electro Optical Syst | Verfahren zur Kalibrierung einer Vorrichtung zum Herstellen eines dreidimensionalen Objektes, Kalibrierungsvorrichtung und Verfahren und Vorrichtung zur Herstellung eines dreidimensionalen Objektes |
US20120098164A1 (en) * | 2007-07-20 | 2012-04-26 | Shyi-Herng Kan | Two-photon stereolithography using photocurable compositions |
FR2966266B1 (fr) * | 2010-10-15 | 2016-01-22 | Phidias Technologies | Procede et dispositif de prototypage rapide. |
BE1024052B1 (nl) * | 2013-12-03 | 2017-11-08 | Layerwise N.V. | Werkwijze en inrichting voor het kalibreren van meerdere energiestralen voor het additief vervaardigen van een object |
JP7354590B2 (ja) | 2019-05-29 | 2023-10-03 | セイコーエプソン株式会社 | 三次元造形物の製造方法および三次元造形装置 |
JP7306065B2 (ja) | 2019-05-30 | 2023-07-11 | セイコーエプソン株式会社 | 三次元造形物の製造方法および三次元造形装置 |
CN114184131B (zh) * | 2021-12-09 | 2024-01-30 | 安徽华烨特种材料有限公司 | 浸胶增强材料接头识别设备 |
CN115415747B (zh) * | 2022-09-19 | 2024-01-26 | 四川精控阀门制造有限公司 | 强制密封球阀堆焊球体的加工方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5226242A (en) * | 1975-08-22 | 1977-02-26 | Nippon Telegr & Teleph Corp <Ntt> | Unit for analysing the distribution of a light mode |
JPS5670429A (en) * | 1979-11-14 | 1981-06-12 | Nec Corp | Measuring device for laser beam |
US4320462A (en) * | 1980-03-31 | 1982-03-16 | Hughes Aircraft Company | High speed laser pulse analyzer |
SE440415B (sv) * | 1983-11-17 | 1985-07-29 | Mydata Ab | Forfarande och anordning for kalibrering av ett positioneringssystem |
US4575330A (en) * | 1984-08-08 | 1986-03-11 | Uvp, Inc. | Apparatus for production of three-dimensional objects by stereolithography |
JPS62163933A (ja) | 1986-01-14 | 1987-07-20 | Nippon Kogaku Kk <Nikon> | レ−ザビ−ム断面光強度分布測定装置 |
-
1989
- 1989-04-17 AT AT00128126T patent/ATE308414T1/de not_active IP Right Cessation
- 1989-04-17 CA CA000617113A patent/CA1341214C/en not_active Expired - Fee Related
- 1989-04-17 DE DE68928485T patent/DE68928485T2/de not_active Expired - Lifetime
- 1989-04-17 IL IL89976A patent/IL89976A0/xx not_active IP Right Cessation
- 1989-04-17 WO PCT/US1989/001559 patent/WO1989011085A1/en unknown
- 1989-04-17 CA CA000596826A patent/CA1334052C/en not_active Expired - Lifetime
- 1989-04-17 EP EP89303780A patent/EP0375097B1/de not_active Expired - Lifetime
- 1989-04-17 DE DE0375097T patent/DE375097T1/de active Pending
- 1989-04-17 AT AT96120757T patent/ATE208702T1/de not_active IP Right Cessation
- 1989-04-17 DE DE68929541T patent/DE68929541T2/de not_active Expired - Lifetime
- 1989-04-17 AT AT89303780T patent/ATE160968T1/de not_active IP Right Cessation
- 1989-04-17 DE DE68929348T patent/DE68929348T2/de not_active Expired - Lifetime
-
1998
- 1998-03-24 HK HK98102511A patent/HK1003490A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE375097T1 (de) | 1996-02-29 |
EP0375097A3 (de) | 1991-09-25 |
DE68929541T2 (de) | 2006-08-10 |
HK1003490A1 (en) | 1998-10-30 |
DE68929348T2 (de) | 2002-09-26 |
EP0375097A2 (de) | 1990-06-27 |
EP0375097B1 (de) | 1997-12-10 |
DE68929348D1 (de) | 2001-12-20 |
DE68928485D1 (de) | 1998-01-22 |
CA1334052C (en) | 1995-01-24 |
DE68929541D1 (de) | 2005-12-08 |
WO1989011085A1 (en) | 1989-11-16 |
ATE160968T1 (de) | 1997-12-15 |
IL89976A0 (en) | 1989-12-15 |
DE68928485T2 (de) | 1998-07-02 |
ATE208702T1 (de) | 2001-11-15 |
CA1341214C (en) | 2001-04-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0860267A3 (de) | Profilierung eines Strahlungsbündels für Stereolithographie | |
DE69511099D1 (de) | Höhe und Kontur eines Objektes | |
DE69833337D1 (de) | Verfahren zum Messen der Strukturen eines Fingerabrucks mittels eines linearen Sensors | |
JPH0534606B2 (de) | ||
ATE208702T1 (de) | Profilierung eines strahlungsbündels für stereolithographie | |
ATE67042T1 (de) | Vorrichtung zur fehlerkompensation. | |
DE59911709D1 (de) | Positionierung des messvolumens in einem scanning-mikroskopischen verfahren | |
ATE49295T1 (de) | Optisch-elektronisches messverfahren, eine dafuer erforderliche einrichtung und deren verwendung. | |
EP0075190A3 (en) | Apparatus and method for measuring thickness | |
ATE81907T1 (de) | Optische messapparate. | |
DE59507664D1 (de) | Vorrichtung und Verfahren zum berührungslosen Vermessen dreidimensionaler Objekte auf der Basis optischer Triangulation | |
DE3882612D1 (de) | Inkrementale laengen- oder winkelmesseinrichtung. | |
JPS6471904A (en) | Method and device for measuring strain of structure | |
SE9301749L (sv) | Metod och anordning för att skapa en modell av en tandrestauration | |
ATE290684T1 (de) | Verfahren und vorrichtung zum messen einer aussenoberfläche | |
DE3761174D1 (de) | Lichtelektrische laengen- oder winkelmesseinrichtung. | |
DE69535479D1 (de) | Verfahren und vorrichtung zur positions- und bewegungsmessung | |
ATE371169T1 (de) | Verfahren und vorrichtung zur regelung einer lichtquelle eines positionsmessgerätes | |
ATE18946T1 (de) | Verfahren zur optischen detektion und/oder zum messen einer deformation und/oder einer versetzung eines objektes oder eines objektteiles, vorrichtung fuer die ausfuehrung dieses verfahrens und anwendung des verfahrens. | |
ATE22492T1 (de) | Messsystem mit einer einrichtung zur fehlerkorrektur. | |
RU14285U1 (ru) | Универсальный шаблон | |
SU1762449A1 (ru) | Устройство для бесконтактного измерения поверхности стопы и голени | |
JPH03269307A (ja) | すきま測定機 | |
FI913292A (fi) | Foerfarande foer saekring av maetningen vid hyggningen med en hyggningsmaskin. | |
RU92003619A (ru) | Способ и устройство измерения геометрических параметров прозрачных изделий |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |