ATE159972T1 - Beschichtstungsmittel aus silikonen und hiermit hergestellte flachdruckplatten - Google Patents

Beschichtstungsmittel aus silikonen und hiermit hergestellte flachdruckplatten

Info

Publication number
ATE159972T1
ATE159972T1 AT91916800T AT91916800T ATE159972T1 AT E159972 T1 ATE159972 T1 AT E159972T1 AT 91916800 T AT91916800 T AT 91916800T AT 91916800 T AT91916800 T AT 91916800T AT E159972 T1 ATE159972 T1 AT E159972T1
Authority
AT
Austria
Prior art keywords
molecular
weight
printing plates
component
silicones
Prior art date
Application number
AT91916800T
Other languages
English (en)
Inventor
Thomas E Lewis
Michael T Nowak
Original Assignee
Presstek Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=24469176&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE159972(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Presstek Inc filed Critical Presstek Inc
Application granted granted Critical
Publication of ATE159972T1 publication Critical patent/ATE159972T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/12—Polysiloxanes containing silicon bound to hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C08G77/16—Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/70—Siloxanes defined by use of the MDTQ nomenclature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Laminated Bodies (AREA)
  • Printing Plates And Materials Therefor (AREA)
AT91916800T 1990-11-21 1991-09-11 Beschichtstungsmittel aus silikonen und hiermit hergestellte flachdruckplatten ATE159972T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/616,377 US5212048A (en) 1990-11-21 1990-11-21 Silicone coating formulations and planographic printing plates made therewith

Publications (1)

Publication Number Publication Date
ATE159972T1 true ATE159972T1 (de) 1997-11-15

Family

ID=24469176

Family Applications (1)

Application Number Title Priority Date Filing Date
AT91916800T ATE159972T1 (de) 1990-11-21 1991-09-11 Beschichtstungsmittel aus silikonen und hiermit hergestellte flachdruckplatten

Country Status (7)

Country Link
US (2) US5212048A (de)
EP (1) EP0511328B1 (de)
JP (1) JP2721592B2 (de)
AT (1) ATE159972T1 (de)
CA (1) CA2073253C (de)
DE (1) DE69128142T2 (de)
WO (1) WO1992009659A1 (de)

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EP0816071B1 (de) * 1996-07-04 2000-10-04 Agfa-Gevaert N.V. Wärmeempfindliches Aufzeichnungselement, sowie Verfahren zur Herstellung von lithographischen Druckplatten damit
US5733698A (en) * 1996-09-30 1998-03-31 Minnesota Mining And Manufacturing Company Release layer for photoreceptors
DE69703963T2 (de) * 1996-11-14 2001-08-23 Kodak Polychrome Graphics Llc, Norwalk Entwicklungsfreie Flachdruckplatte
US6020098A (en) * 1997-04-04 2000-02-01 Minnesota Mining And Manufacturing Company Temporary image receptor and means for chemical modification of release surfaces on a temporary image receptor
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US6022668A (en) * 1998-01-19 2000-02-08 Kodak Polychrome Graphics Llc Positive-working direct write waterless lithographic printing members and methods of imaging and printing using same
US6014929A (en) * 1998-03-09 2000-01-18 Teng; Gary Ganghui Lithographic printing plates having a thin releasable interlayer overlying a rough substrate
US6201063B1 (en) * 1999-07-08 2001-03-13 Dow Corning Corporation Emulsion polymerization using a cocylic silicone
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US6447884B1 (en) 2000-03-20 2002-09-10 Kodak Polychrome Graphics Llc Low volume ablatable processless imaging member and method of use
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US7476442B2 (en) * 2002-07-17 2009-01-13 Massachusetts Institute Of Technology Nanoparticle chains and preparation thereof
US7311943B2 (en) * 2002-07-17 2007-12-25 Massachusetts Institute Of Technology Templated monolayer polymerization and replication
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US8617793B2 (en) * 2006-11-06 2013-12-31 Toray Industries, Inc. Waterless planographic printing plate precursor
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US8875629B2 (en) 2010-04-09 2014-11-04 Presstek, Inc. Ablation-type lithographic imaging with enhanced debris removal
US20110287266A1 (en) * 2010-05-20 2011-11-24 Presstek, Inc. Ablation-type lithographic imaging with silicone acrylate layers
US9605150B2 (en) * 2010-12-16 2017-03-28 Presstek, Llc. Recording media and related methods
KR101382696B1 (ko) * 2012-06-29 2014-04-08 엘지이노텍 주식회사 블랭킷 조성물, 블랭킷 및 이를 포함하는 인쇄 장치
US20140299356A1 (en) * 2013-04-04 2014-10-09 Chong Zhang Protective film with dye materials for laser absorption enhancement for via drilling
EP3158399B1 (de) 2014-06-23 2022-10-26 Carbon, Inc. Polyurethanharze mit mehreren mechanismen zum härten zur verwendung bei der herstellung dreidimensionaler objekte
WO2017079502A1 (en) 2015-11-05 2017-05-11 Carbon, Inc. Silicone dual cure resins for additive manufacturing
US10316213B1 (en) 2017-05-01 2019-06-11 Formlabs, Inc. Dual-cure resins and related methods

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Also Published As

Publication number Publication date
JP2721592B2 (ja) 1998-03-04
DE69128142T2 (de) 1998-04-02
US5310869A (en) 1994-05-10
CA2073253C (en) 2000-03-28
CA2073253A1 (en) 1992-05-22
DE69128142D1 (de) 1997-12-11
US5212048A (en) 1993-05-18
EP0511328B1 (de) 1997-11-05
EP0511328A1 (de) 1992-11-04
JPH05503731A (ja) 1993-06-17
WO1992009659A1 (en) 1992-06-11

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