ATE159972T1 - Beschichtstungsmittel aus silikonen und hiermit hergestellte flachdruckplatten - Google Patents
Beschichtstungsmittel aus silikonen und hiermit hergestellte flachdruckplattenInfo
- Publication number
- ATE159972T1 ATE159972T1 AT91916800T AT91916800T ATE159972T1 AT E159972 T1 ATE159972 T1 AT E159972T1 AT 91916800 T AT91916800 T AT 91916800T AT 91916800 T AT91916800 T AT 91916800T AT E159972 T1 ATE159972 T1 AT E159972T1
- Authority
- AT
- Austria
- Prior art keywords
- molecular
- weight
- printing plates
- component
- silicones
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
- C08G77/16—Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/70—Siloxanes defined by use of the MDTQ nomenclature
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Medicinal Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Paints Or Removers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Laminated Bodies (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/616,377 US5212048A (en) | 1990-11-21 | 1990-11-21 | Silicone coating formulations and planographic printing plates made therewith |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE159972T1 true ATE159972T1 (de) | 1997-11-15 |
Family
ID=24469176
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT91916800T ATE159972T1 (de) | 1990-11-21 | 1991-09-11 | Beschichtstungsmittel aus silikonen und hiermit hergestellte flachdruckplatten |
Country Status (7)
Country | Link |
---|---|
US (2) | US5212048A (de) |
EP (1) | EP0511328B1 (de) |
JP (1) | JP2721592B2 (de) |
AT (1) | ATE159972T1 (de) |
CA (1) | CA2073253C (de) |
DE (1) | DE69128142T2 (de) |
WO (1) | WO1992009659A1 (de) |
Families Citing this family (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5212048A (en) * | 1990-11-21 | 1993-05-18 | Presstek, Inc. | Silicone coating formulations and planographic printing plates made therewith |
IL114137A (en) * | 1995-06-13 | 1998-12-06 | Scitex Corp Ltd | Infrared radiation-sensitive printing plates and methods for their preparation |
US5574073A (en) * | 1996-01-17 | 1996-11-12 | Dow Corning Corporation | Curable silicone compositions which are foams or elastomers |
IL116885A0 (en) | 1996-01-24 | 1996-05-14 | Scitex Corp Ltd | An imaging apparatus for exposing a printing member |
JPH09239943A (ja) * | 1996-03-08 | 1997-09-16 | Fuji Photo Film Co Ltd | 湿し水不要平版原版 |
JP3166602B2 (ja) * | 1996-04-04 | 2001-05-14 | 住友電気工業株式会社 | 光ファイバの製造方法 |
EP0816071B1 (de) * | 1996-07-04 | 2000-10-04 | Agfa-Gevaert N.V. | Wärmeempfindliches Aufzeichnungselement, sowie Verfahren zur Herstellung von lithographischen Druckplatten damit |
US5733698A (en) * | 1996-09-30 | 1998-03-31 | Minnesota Mining And Manufacturing Company | Release layer for photoreceptors |
DE69703963T2 (de) * | 1996-11-14 | 2001-08-23 | Kodak Polychrome Graphics Llc, Norwalk | Entwicklungsfreie Flachdruckplatte |
US6020098A (en) * | 1997-04-04 | 2000-02-01 | Minnesota Mining And Manufacturing Company | Temporary image receptor and means for chemical modification of release surfaces on a temporary image receptor |
US5965243A (en) * | 1997-04-04 | 1999-10-12 | 3M Innovative Properties Company | Electrostatic receptors having release layers with texture and means for providing such receptors |
IL122953A (en) * | 1998-01-15 | 2000-11-21 | Scitex Corp Ltd | Printing member for use with a printing system and method of imaging the printing member |
US6022668A (en) * | 1998-01-19 | 2000-02-08 | Kodak Polychrome Graphics Llc | Positive-working direct write waterless lithographic printing members and methods of imaging and printing using same |
US6014929A (en) * | 1998-03-09 | 2000-01-18 | Teng; Gary Ganghui | Lithographic printing plates having a thin releasable interlayer overlying a rough substrate |
US6201063B1 (en) * | 1999-07-08 | 2001-03-13 | Dow Corning Corporation | Emulsion polymerization using a cocylic silicone |
US6132933A (en) * | 1999-07-30 | 2000-10-17 | American Dye Source, Inc. | Thermal waterless lithographic printing plates |
US6194106B1 (en) | 1999-11-30 | 2001-02-27 | Minnesota Mining And Manufacturing Company | Temporary image receptor and means for chemical modification of release surfaces on a temporary image receptor |
US6447884B1 (en) | 2000-03-20 | 2002-09-10 | Kodak Polychrome Graphics Llc | Low volume ablatable processless imaging member and method of use |
JP2002274041A (ja) * | 2001-03-21 | 2002-09-25 | Ricoh Co Ltd | 感熱記録材料の製造方法 |
US7476442B2 (en) * | 2002-07-17 | 2009-01-13 | Massachusetts Institute Of Technology | Nanoparticle chains and preparation thereof |
US7311943B2 (en) * | 2002-07-17 | 2007-12-25 | Massachusetts Institute Of Technology | Templated monolayer polymerization and replication |
EP1710093B1 (de) * | 2004-01-27 | 2013-11-20 | Asahi Kasei Chemicals Corporation | Lichtempfindliche harzzusammensetzung für lasergravierungsfähigen druckträger |
JP2007531019A (ja) | 2004-03-26 | 2007-11-01 | プレステク,インコーポレイテッド | 溶解度変化層を有する印刷部材及び関連する方法 |
US7205091B2 (en) | 2004-05-05 | 2007-04-17 | Presstek, Inc. | Lithographic printing with printing members having primer layers |
US7078152B2 (en) * | 2004-05-05 | 2006-07-18 | Presstek, Inc. | Lithographic printing with printing members having plasma polymer layers |
JP4434989B2 (ja) * | 2005-02-25 | 2010-03-17 | 富士フイルム株式会社 | 平版印刷版原版 |
US7351517B2 (en) * | 2005-04-15 | 2008-04-01 | Presstek, Inc. | Lithographic printing with printing members including an oleophilic metal and plasma polymer layers |
US8617793B2 (en) * | 2006-11-06 | 2013-12-31 | Toray Industries, Inc. | Waterless planographic printing plate precursor |
JP5495799B2 (ja) * | 2008-02-15 | 2014-05-21 | 旭化成イーマテリアルズ株式会社 | 樹脂組成物 |
US20110188023A1 (en) | 2010-02-01 | 2011-08-04 | Presstek, Inc. | Lithographic imaging and printing without defects of electrostatic origin |
US8875629B2 (en) | 2010-04-09 | 2014-11-04 | Presstek, Inc. | Ablation-type lithographic imaging with enhanced debris removal |
US20110287266A1 (en) * | 2010-05-20 | 2011-11-24 | Presstek, Inc. | Ablation-type lithographic imaging with silicone acrylate layers |
US9605150B2 (en) * | 2010-12-16 | 2017-03-28 | Presstek, Llc. | Recording media and related methods |
KR101382696B1 (ko) * | 2012-06-29 | 2014-04-08 | 엘지이노텍 주식회사 | 블랭킷 조성물, 블랭킷 및 이를 포함하는 인쇄 장치 |
US20140299356A1 (en) * | 2013-04-04 | 2014-10-09 | Chong Zhang | Protective film with dye materials for laser absorption enhancement for via drilling |
EP3158399B1 (de) | 2014-06-23 | 2022-10-26 | Carbon, Inc. | Polyurethanharze mit mehreren mechanismen zum härten zur verwendung bei der herstellung dreidimensionaler objekte |
WO2017079502A1 (en) | 2015-11-05 | 2017-05-11 | Carbon, Inc. | Silicone dual cure resins for additive manufacturing |
US10316213B1 (en) | 2017-05-01 | 2019-06-11 | Formlabs, Inc. | Dual-cure resins and related methods |
Family Cites Families (46)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3511178A (en) * | 1967-01-06 | 1970-05-12 | Minnesota Mining & Mfg | Printing plate and method |
DE1963104B2 (de) * | 1968-12-23 | 1978-08-03 | Shinetsu Chemical Co., Tokio | Heißvulkanisierbare Organopolysiloxanformmasse |
US3632375A (en) * | 1969-11-14 | 1972-01-04 | Scott Paper Co | Plate for dry planography and method of making same |
US3890149A (en) * | 1973-05-02 | 1975-06-17 | American Can Co | Waterless diazo planographic printing plates with epoxy-silane in undercoat and/or overcoat layers |
US4225663A (en) * | 1974-08-26 | 1980-09-30 | Minnesota Mining And Manufacturing Company | Driographic printing plate |
US4009032A (en) * | 1974-10-23 | 1977-02-22 | Xerox Corporation | Process for preparing waterless printing masters comprising copolymer of siloxane and thermoplastic blocks |
JPS5519755B2 (de) * | 1974-12-24 | 1980-05-28 | ||
JPS51120804A (en) * | 1975-04-14 | 1976-10-22 | Dainippon Printing Co Ltd | Plate for lithographic printing |
JPS52150103A (en) * | 1976-06-07 | 1977-12-13 | Shinetsu Chemical Co | Method of producing lithographic printing form and press plate |
JPS5353403A (en) * | 1976-10-22 | 1978-05-15 | Asahi Chemical Ind | Original form for press plate and method of producing waterrfree lithographic press plate adopting same |
JPS54163101A (en) * | 1978-06-14 | 1979-12-25 | Toray Industries | Nonnwaterrrequiring flat printing plate material* and printing plate |
US4291114A (en) * | 1978-10-18 | 1981-09-22 | Minnesota Mining And Manufacturing Co. | Imageable, composite-dry transfer sheet and process of using same |
JPS56771A (en) * | 1979-06-15 | 1981-01-07 | Clarion Co Ltd | Data transmission system |
JPS5662253A (en) * | 1979-10-25 | 1981-05-28 | Toray Ind Inc | Damping water nonrequiring lithographic master material |
JPS58102235A (ja) * | 1981-12-15 | 1983-06-17 | Toray Ind Inc | 湿し水不要平版印刷版用版面修正液 |
JPS6054991B2 (ja) * | 1982-04-02 | 1985-12-03 | ト−レ・シリコ−ン株式会社 | オルガノポリシロキサン組成物 |
JPS58191749A (ja) * | 1982-05-06 | 1983-11-09 | Toray Silicone Co Ltd | 剥離性被膜形成用オルガノポリシロキサン組成物 |
US4404276A (en) * | 1982-06-14 | 1983-09-13 | Eastman Kodak Company | Polymer compositions containing crosslinked silicone polycarbinol and having a low coefficient of friction |
EP0126192B1 (de) * | 1983-05-19 | 1986-08-27 | Toray Industries, Inc. | Beschichtungszusammensetzung und seine Anwendung |
US4596733A (en) * | 1983-12-30 | 1986-06-24 | International Business Machines Corporation | Electroerosion recording material with polyorganosiloxane overlayer |
US4472563A (en) * | 1984-02-06 | 1984-09-18 | Dow Corning Corporation | Heat curable silicones having improved room temperature stability |
JPS61264052A (ja) * | 1985-05-17 | 1986-11-21 | Shin Etsu Chem Co Ltd | 離型紙用シリコ−ン組成物 |
US4686138A (en) * | 1985-06-13 | 1987-08-11 | Mitsubishi Paper Mills, Ltd. | Direct image offset printing plates |
US4806391A (en) * | 1985-06-24 | 1989-02-21 | Philip Shorin | Silicone-based, curable, printable, hydrophobic coating compositions and processes for using the same |
US4769308A (en) * | 1985-11-11 | 1988-09-06 | Fuji Photo Film Co., Ltd. | Dry presensitized plate with photosensitive layer containing organotin |
JPS62197453A (ja) * | 1986-02-25 | 1987-09-01 | Shin Etsu Chem Co Ltd | シリコ−ン組成物 |
CA1321315C (en) * | 1986-04-11 | 1993-08-17 | Yoichi Mori | Printing plate |
US4826752A (en) * | 1986-06-25 | 1989-05-02 | Fuji Photo Film Co., Ltd. | Dry photosensitive lithographic plate comprising a silicon rubber layer containing an aromatic aminosilane |
DE3628720A1 (de) * | 1986-08-23 | 1988-02-25 | Hoechst Ag | Vorsensibilisierte druckplatte und verfahren zur herstellung einer druckform fuer den wasserlosen flachdruck |
JPS63133153A (ja) * | 1986-11-26 | 1988-06-04 | Fuji Photo Film Co Ltd | 湿し水不要感光性平版印刷版 |
JPS6474541A (en) * | 1987-09-16 | 1989-03-20 | Mitsubishi Chem Ind | Photosensitive planographic printing plate without requiring dampening water |
JPH01118843A (ja) * | 1987-11-02 | 1989-05-11 | Fuji Photo Film Co Ltd | 湿し水不要感光性平版印刷版 |
JPH01167843A (ja) * | 1987-12-24 | 1989-07-03 | Toray Ind Inc | 水なし平版印刷版の画線部形成方法 |
JPH07104599B2 (ja) * | 1988-01-04 | 1995-11-13 | 富士写真フイルム株式会社 | 湿し水不要感光性平版印刷原版 |
JP2626987B2 (ja) * | 1988-02-23 | 1997-07-02 | 富士写真フイルム株式会社 | 湿し水不要感光性平版印刷版 |
JPH01223462A (ja) * | 1988-03-03 | 1989-09-06 | Konica Corp | 湿し水不要平版印刷版材料及び湿し水不要平版印刷版の製造方法 |
JPH01235956A (ja) * | 1988-03-16 | 1989-09-20 | Fuji Photo Film Co Ltd | 水なし平版印刷原板 |
EP0333156A3 (de) * | 1988-03-16 | 1990-03-21 | Fuji Photo Film Co., Ltd. | Lithographische Platte, die kein Befeuchtungswasser benötigt |
JP2520686B2 (ja) * | 1988-03-18 | 1996-07-31 | 富士写真フイルム株式会社 | 湿し水不要感光性平版印刷板 |
US4988743A (en) * | 1988-03-21 | 1991-01-29 | General Electric Company | Radiation self-sensitized silicone polymers |
JPH01258308A (ja) * | 1988-04-06 | 1989-10-16 | Fuji Rubber Co Ltd | 導電性シリコンゴム組成物 |
FR2630450B1 (fr) * | 1988-04-21 | 1990-09-07 | Rhone Poulenc Chimie | Composition polyorganosiloxane contenant un catalyseur latent a l'etain et reticulable en couche mince |
JPH027047A (ja) * | 1988-06-27 | 1990-01-11 | Konica Corp | 湿し水不要平版印刷版材料 |
US4911075A (en) * | 1988-08-19 | 1990-03-27 | Presstek, Inc. | Lithographic plates made by spark discharges |
JPH0359174A (ja) * | 1989-07-21 | 1991-03-14 | Toray Dow Corning Silicone Co Ltd | 繊維構造物処理用シリコーンゴム組成物 |
US5212048A (en) * | 1990-11-21 | 1993-05-18 | Presstek, Inc. | Silicone coating formulations and planographic printing plates made therewith |
-
1990
- 1990-11-21 US US07/616,377 patent/US5212048A/en not_active Expired - Lifetime
-
1991
- 1991-09-11 JP JP3515377A patent/JP2721592B2/ja not_active Expired - Lifetime
- 1991-09-11 CA CA002073253A patent/CA2073253C/en not_active Expired - Fee Related
- 1991-09-11 EP EP91916800A patent/EP0511328B1/de not_active Expired - Lifetime
- 1991-09-11 WO PCT/US1991/006551 patent/WO1992009659A1/en active IP Right Grant
- 1991-09-11 DE DE69128142T patent/DE69128142T2/de not_active Expired - Lifetime
- 1991-09-11 AT AT91916800T patent/ATE159972T1/de not_active IP Right Cessation
-
1993
- 1993-02-25 US US08/022,528 patent/US5310869A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2721592B2 (ja) | 1998-03-04 |
DE69128142T2 (de) | 1998-04-02 |
US5310869A (en) | 1994-05-10 |
CA2073253C (en) | 2000-03-28 |
CA2073253A1 (en) | 1992-05-22 |
DE69128142D1 (de) | 1997-12-11 |
US5212048A (en) | 1993-05-18 |
EP0511328B1 (de) | 1997-11-05 |
EP0511328A1 (de) | 1992-11-04 |
JPH05503731A (ja) | 1993-06-17 |
WO1992009659A1 (en) | 1992-06-11 |
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Legal Events
Date | Code | Title | Description |
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RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |