ATE116742T1 - POSITIVELY WORKING LIGHT SENSITIVE MIXTURE CONTAINING A DYE AND POSITIVE WORKING LIGHT SENSITIVE RECORDING MATERIAL PRODUCED THEREFROM. - Google Patents

POSITIVELY WORKING LIGHT SENSITIVE MIXTURE CONTAINING A DYE AND POSITIVE WORKING LIGHT SENSITIVE RECORDING MATERIAL PRODUCED THEREFROM.

Info

Publication number
ATE116742T1
ATE116742T1 AT88117219T AT88117219T ATE116742T1 AT E116742 T1 ATE116742 T1 AT E116742T1 AT 88117219 T AT88117219 T AT 88117219T AT 88117219 T AT88117219 T AT 88117219T AT E116742 T1 ATE116742 T1 AT E116742T1
Authority
AT
Austria
Prior art keywords
light sensitive
working light
dye
recording material
mixture containing
Prior art date
Application number
AT88117219T
Other languages
German (de)
Inventor
Hans-Joachim Dr Dipl-Ch Merrem
Gerhard Dr Dipl-Chem Buhr
Ruediger Dr Dipl-Chem Lenz
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Application granted granted Critical
Publication of ATE116742T1 publication Critical patent/ATE116742T1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

A positive-working photosensitive composition is disclosed that comprises a photosensitive compound which is either of the o-quinone diazide type or comprises a photolytic acid donor in combination with a compound containing a C-O-C group, a binder which is soluble or swellable in an aqueous-alkaline solution and a dye of the general formula I <IMAGE> (I) The photosensitive composition of the present invention has a higher photosensitivity than comparable compositions containing other dyes.
AT88117219T 1987-10-23 1988-10-17 POSITIVELY WORKING LIGHT SENSITIVE MIXTURE CONTAINING A DYE AND POSITIVE WORKING LIGHT SENSITIVE RECORDING MATERIAL PRODUCED THEREFROM. ATE116742T1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19873735852 DE3735852A1 (en) 1987-10-23 1987-10-23 POSITIVELY WORKING LIGHT-SENSITIVE MIXTURE, CONTAINING A COLOR, AND POSITIVELY WORKING LIGHT-SENSITIVE RECORDING MATERIAL THEREOF

Publications (1)

Publication Number Publication Date
ATE116742T1 true ATE116742T1 (en) 1995-01-15

Family

ID=6338902

Family Applications (1)

Application Number Title Priority Date Filing Date
AT88117219T ATE116742T1 (en) 1987-10-23 1988-10-17 POSITIVELY WORKING LIGHT SENSITIVE MIXTURE CONTAINING A DYE AND POSITIVE WORKING LIGHT SENSITIVE RECORDING MATERIAL PRODUCED THEREFROM.

Country Status (9)

Country Link
US (2) US4927732A (en)
EP (1) EP0312950B1 (en)
JP (1) JP2603316B2 (en)
KR (1) KR960016306B1 (en)
AT (1) ATE116742T1 (en)
DD (1) DD275749A5 (en)
DE (2) DE3735852A1 (en)
HK (1) HK178995A (en)
IL (1) IL88119A (en)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63286843A (en) * 1987-05-19 1988-11-24 Nippon Zeon Co Ltd Positive type photoresist composition
JP2595598B2 (en) * 1987-12-28 1997-04-02 住友化学工業株式会社 Photoresist composition
US5218136A (en) * 1987-12-28 1993-06-08 Sumitomo Chemical Company, Limited Styryl compounds, process for preparing the same and photoresist compositions comprising the same
DE3837500A1 (en) * 1988-11-04 1990-05-23 Hoechst Ag NEW RADIATION-SENSITIVE COMPOUNDS, MADE BY THIS RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL
JP2636395B2 (en) * 1988-11-17 1997-07-30 住友化学工業株式会社 Photoresist composition
US5362598A (en) * 1989-04-10 1994-11-08 Sumitomo Chemical Co., Ltd. Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye
DE4013575C2 (en) * 1990-04-27 1994-08-11 Basf Ag Process for making negative relief copies
CA2041434A1 (en) * 1990-05-02 1991-11-03 Teijiro Kitao Resist composition
JP3064595B2 (en) * 1991-04-26 2000-07-12 住友化学工業株式会社 Positive resist composition
US5656414A (en) * 1993-04-23 1997-08-12 Fujitsu Limited Methods of forming tall, high-aspect ratio vias and trenches in photo-imageable materials, photoresist materials, and the like
EP0672954B1 (en) * 1994-03-14 1999-09-15 Kodak Polychrome Graphics LLC Radiation-sensitive composition containing a resole resin, a novolac resin, an infrared absorber and a triazine and use thereof in lithographic printing plates
US5756257A (en) * 1996-02-14 1998-05-26 Imation Corp. Color proofing article incorporating novel antihalation dye
US5763135A (en) * 1996-09-30 1998-06-09 Clariant Finance (Bvi) Limited Light sensitive composition containing an arylhydrazo dye
US6245492B1 (en) 1998-08-13 2001-06-12 International Business Machines Corporation Photoresist system and process for aerial image enhancement
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
CA2374944A1 (en) 1999-06-10 2000-12-21 Nigel Hacker Spin-on-glass anti-reflective coatings for photolithography
US20030008229A1 (en) * 2001-06-25 2003-01-09 Prakash Seth Thermally sensitive coating compositions useful for lithographic elements
AU2002227106A1 (en) 2001-11-15 2003-06-10 Honeywell International Inc. Spin-on anti-reflective coatings for photolithography
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
EP3194502A4 (en) 2015-04-13 2018-05-16 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4349619A (en) * 1979-09-19 1982-09-14 Japan Synthetic Rubber Co., Ltd. Photoresist composition
DE3324795A1 (en) * 1983-07-09 1985-01-17 Merck Patent Gmbh, 6100 Darmstadt NEGATIVE WORKING PHOTO RESIST COMPOSITIONS WITH RADIATION-ABSORBING ADDITIVES
DE3325022A1 (en) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt METHOD FOR PRODUCING NEGATIVE COPIES BY MEANS OF A MATERIAL BASED ON 1,2-CHINONDIAZIDES
JPS6088941A (en) * 1983-10-21 1985-05-18 Nagase Kasei Kogyo Kk Photoresist composition
MX170270B (en) * 1984-06-01 1993-08-11 Rohm & Haas IMAGES ON A SURFACE AND A METHOD FOR FORMING THERMALLY STABLE POSITIVE AND NEGATIVE IMAGES ON A SURFACE
JPS62500202A (en) * 1984-09-13 1987-01-22 アドバンスト・マイクロ・ディバイシズ・インコ−ポレ−テッド Improved photolithography method using positive photoresists containing non-bleaching light absorbers
JPS6193445A (en) * 1984-10-12 1986-05-12 Fuji Photo Film Co Ltd Novel photoresist composition
US4626492A (en) * 1985-06-04 1986-12-02 Olin Hunt Specialty Products, Inc. Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound
US4931381A (en) * 1985-08-12 1990-06-05 Hoechst Celanese Corporation Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment
CA1287768C (en) * 1986-01-27 1991-08-20 Thap Dominh Antireflective photoresist composition

Also Published As

Publication number Publication date
EP0312950B1 (en) 1995-01-04
KR960016306B1 (en) 1996-12-09
HK178995A (en) 1995-12-01
US5066567A (en) 1991-11-19
US4927732A (en) 1990-05-22
IL88119A (en) 1992-02-16
DD275749A5 (en) 1990-01-31
KR890007117A (en) 1989-06-19
EP0312950A3 (en) 1990-10-24
EP0312950A2 (en) 1989-04-26
DE3735852A1 (en) 1989-05-03
DE3852690D1 (en) 1995-02-16
JP2603316B2 (en) 1997-04-23
JPH01137246A (en) 1989-05-30
IL88119A0 (en) 1989-06-30

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Legal Events

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REN Ceased due to non-payment of the annual fee