ATE108029T1 - Abtastanordnung zum abtasten einer oberfläche entlang einer linie mittels optischer strahlung. - Google Patents

Abtastanordnung zum abtasten einer oberfläche entlang einer linie mittels optischer strahlung.

Info

Publication number
ATE108029T1
ATE108029T1 AT90203396T AT90203396T ATE108029T1 AT E108029 T1 ATE108029 T1 AT E108029T1 AT 90203396 T AT90203396 T AT 90203396T AT 90203396 T AT90203396 T AT 90203396T AT E108029 T1 ATE108029 T1 AT E108029T1
Authority
AT
Austria
Prior art keywords
scanning
line
surface along
optical radiation
optical
Prior art date
Application number
AT90203396T
Other languages
English (en)
Inventor
Amstel Willem Dirk Van
Joseph Louis Horijon
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Application granted granted Critical
Publication of ATE108029T1 publication Critical patent/ATE108029T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901—Optical details; Scanning details
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0031—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration for scanning purposes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901—Optical details; Scanning details
    • G01N2021/8905—Directional selective optics, e.g. slits, spatial filters
    • G01N2021/8907—Cylindrical optics

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Optics & Photonics (AREA)
  • Biochemistry (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • General Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Textile Engineering (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Lenses (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Light Guides In General And Applications Therefor (AREA)
  • Epoxy Compounds (AREA)
  • Noodles (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Facsimile Scanning Arrangements (AREA)
AT90203396T 1990-01-16 1990-12-18 Abtastanordnung zum abtasten einer oberfläche entlang einer linie mittels optischer strahlung. ATE108029T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL9000100 1990-01-16

Publications (1)

Publication Number Publication Date
ATE108029T1 true ATE108029T1 (de) 1994-07-15

Family

ID=19856420

Family Applications (1)

Application Number Title Priority Date Filing Date
AT90203396T ATE108029T1 (de) 1990-01-16 1990-12-18 Abtastanordnung zum abtasten einer oberfläche entlang einer linie mittels optischer strahlung.

Country Status (11)

Country Link
US (1) US5170037A (de)
EP (1) EP0437883B1 (de)
JP (1) JP2995238B2 (de)
KR (1) KR0170783B1 (de)
AT (1) ATE108029T1 (de)
CA (1) CA2034017C (de)
DE (1) DE69010318T2 (de)
DK (1) DK0437883T3 (de)
ES (1) ES2058766T3 (de)
FI (1) FI104297B (de)
IL (1) IL96947A (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5512760A (en) * 1993-05-06 1996-04-30 U.S. Philips Corporation Optical height detector with coaxial irradiation and image axes and plural detectors spaced along the image axis
DE19528519A1 (de) * 1995-08-03 1997-02-06 Tzn Forschung & Entwicklung Vorrichtung zur Detektion streifenförmiger Oberflächenfehler
DE19714221A1 (de) * 1997-04-07 1998-10-08 Zeiss Carl Fa Konfokales Mikroskop mit einem motorischen Scanningtisch
EP1436646A4 (de) * 2001-09-13 2006-09-13 Anzpac Systems Ltd Verfahren und vorrichtung zur artikeluntersuchung
US8441694B2 (en) * 2003-09-30 2013-05-14 Hewlett-Packard Development Company, L.P. Method and an apparatus for adjusting a scanning target area of an image reproduction device
KR100816078B1 (ko) * 2006-06-19 2008-03-24 광운대학교 산학협력단 공간영상 투영장치 및 그 방법
WO2009061458A1 (en) * 2007-11-07 2009-05-14 Amfit, Inc. Impression foam digital scanner

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH539892A (de) * 1971-03-22 1973-07-31 Zellweger Uster Ag Abtastvorrichtung für optisch erkennbare Zeichen
US3995110A (en) * 1973-12-20 1976-11-30 Xerox Corporation Flying spot scanner with plural lens correction
DE2550814C3 (de) * 1975-11-12 1979-08-09 Erwin Sick Gmbh Optik-Elektronik, 7808 Waldkirch Zeilentastvorrichtung für Materialbahnen zur Fehlstellenermittlung
DE2827705C3 (de) * 1978-06-23 1981-07-30 Erwin Sick Gmbh Optik-Elektronik, 7808 Waldkirch Gerät zur Feststellung von Fehlern an Bahnmaterial
DE3431540A1 (de) * 1984-07-02 1986-03-06 Elektro Optik Gmbh & Co Kg Verfahren zur korrektur der sphaerischen aberration und des astigmatismus eines ausmittigen lichtbuendels in einer spiegeloptik
US4872757A (en) * 1988-04-20 1989-10-10 Ball Corporation Optical convex surface profiling and gauging apparatus and method therefor

Also Published As

Publication number Publication date
FI910150A (fi) 1991-07-17
CA2034017A1 (en) 1991-07-17
EP0437883A1 (de) 1991-07-24
IL96947A0 (en) 1992-03-29
ES2058766T3 (es) 1994-11-01
FI910150A0 (fi) 1991-01-11
JPH04212120A (ja) 1992-08-03
EP0437883B1 (de) 1994-06-29
DK0437883T3 (da) 1994-10-03
FI104297B1 (fi) 1999-12-15
US5170037A (en) 1992-12-08
FI104297B (fi) 1999-12-15
JP2995238B2 (ja) 1999-12-27
DE69010318T2 (de) 1995-01-26
CA2034017C (en) 2001-08-21
DE69010318D1 (de) 1994-08-04
IL96947A (en) 1993-07-08
KR0170783B1 (ko) 1999-05-01

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee