AT376845B - Speicher-feldeffekttransistor - Google Patents

Speicher-feldeffekttransistor

Info

Publication number
AT376845B
AT376845B AT629275A AT629275A AT376845B AT 376845 B AT376845 B AT 376845B AT 629275 A AT629275 A AT 629275A AT 629275 A AT629275 A AT 629275A AT 376845 B AT376845 B AT 376845B
Authority
AT
Austria
Prior art keywords
field effect
effect transistor
memory field
memory
transistor
Prior art date
Application number
AT629275A
Other languages
English (en)
Other versions
ATA629275A (de
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE2445079A external-priority patent/DE2445079C3/de
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of ATA629275A publication Critical patent/ATA629275A/de
Application granted granted Critical
Publication of AT376845B publication Critical patent/AT376845B/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/788Field effect transistors with field effect produced by an insulated gate with floating gate
    • H01L29/7881Programmable transistors with only two possible levels of programmation
    • H01L29/7884Programmable transistors with only two possible levels of programmation charging by hot carrier injection
    • H01L29/7885Hot carrier injection from the channel
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/401Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C11/403Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh
    • G11C11/404Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh with one charge-transfer gate, e.g. MOS transistor, per cell
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0416Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing a single floating gate transistor and no select transistor, e.g. UV EPROM
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0425Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing a merged floating gate and select transistor
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • G11C16/14Circuits for erasing electrically, e.g. erase voltage switching circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • G11C16/14Circuits for erasing electrically, e.g. erase voltage switching circuits
    • G11C16/16Circuits for erasing electrically, e.g. erase voltage switching circuits for erasing blocks, e.g. arrays, words, groups
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C17/00Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Volatile Memory (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Thin Film Transistor (AREA)
AT629275A 1974-09-20 1975-08-13 Speicher-feldeffekttransistor AT376845B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2445079A DE2445079C3 (de) 1974-09-20 1974-09-20 Speicher-Feldeffekttransistor

Publications (2)

Publication Number Publication Date
ATA629275A ATA629275A (de) 1984-05-15
AT376845B true AT376845B (de) 1985-01-10

Family

ID=5926358

Family Applications (1)

Application Number Title Priority Date Filing Date
AT629275A AT376845B (de) 1974-09-20 1975-08-13 Speicher-feldeffekttransistor

Country Status (10)

Country Link
JP (1) JPS5157291A (de)
AT (1) AT376845B (de)
BE (1) BE833632A (de)
CH (1) CH591763A5 (de)
DK (1) DK141545C (de)
FR (1) FR2285719A1 (de)
GB (1) GB1483555A (de)
IT (1) IT1042654B (de)
NL (1) NL163373C (de)
SE (1) SE402186B (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5826846Y2 (ja) * 1978-10-26 1983-06-10 三菱自動車工業株式会社 シ−トベルト支持部材のガイド取付構造
JPS5857750A (ja) * 1981-10-01 1983-04-06 Seiko Instr & Electronics Ltd 不揮発性半導体メモリ
JPS5887877A (ja) * 1981-11-19 1983-05-25 Sanyo Electric Co Ltd 半導体不揮発性メモリ
JPH06252392A (ja) * 1993-03-01 1994-09-09 Nec Corp 電界効果トランジスタ
KR0149571B1 (ko) * 1995-05-04 1998-10-01 김주용 반도체 소자의 트랜지스터 구조
JP2016006894A (ja) * 2015-08-03 2016-01-14 スパンション エルエルシー 半導体装置およびその製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3419766A (en) * 1963-06-24 1968-12-31 Hitachi Ltd Method of producing insulated gate field effect transistors with improved characteristics
DE2126303A1 (de) * 1970-06-01 1971-12-16 Rca Corp Eine isolierte Gate-Elektrode aufweisender Feldeffekt-Transistor mit veränderlicher Verstärkung
DE2129181A1 (de) * 1970-06-15 1971-12-23 Intel Corp Festkörper-Speichervorrichtung mit schwebender Gate-Elektrode
US3660819A (en) * 1970-06-15 1972-05-02 Intel Corp Floating gate transistor and method for charging and discharging same
DE2201150A1 (de) * 1971-01-14 1972-08-10 Rca Corp Ladungsgekoppelte Halbleiterschaltung
DE2341822A1 (de) * 1972-09-07 1974-03-14 Philips Nv Digitales schieberegister

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3419766A (en) * 1963-06-24 1968-12-31 Hitachi Ltd Method of producing insulated gate field effect transistors with improved characteristics
DE2126303A1 (de) * 1970-06-01 1971-12-16 Rca Corp Eine isolierte Gate-Elektrode aufweisender Feldeffekt-Transistor mit veränderlicher Verstärkung
DE2129181A1 (de) * 1970-06-15 1971-12-23 Intel Corp Festkörper-Speichervorrichtung mit schwebender Gate-Elektrode
US3660819A (en) * 1970-06-15 1972-05-02 Intel Corp Floating gate transistor and method for charging and discharging same
DE2201150A1 (de) * 1971-01-14 1972-08-10 Rca Corp Ladungsgekoppelte Halbleiterschaltung
DE2341822A1 (de) * 1972-09-07 1974-03-14 Philips Nv Digitales schieberegister

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
IEEE JOURNAL OF SOLID-STATE CIRCUITS, VOL SC-7, NR.5, OKT. 1972, S.369-375. *
PROCEEDINGS OF THE 4TH CONFERENCE ON SOLID STATE DEVICES, TOKIO, 1972, SUPPLEMENT TO THE JOURNAL OF THE JAPAN SOCIETY OF APPLIED PHYSICS, VOL. 42. 1973, S.158-166 *
SOLID STATE ELECTRONICS, VOL.16, 1973, S.483-490. *

Also Published As

Publication number Publication date
NL163373C (nl) 1980-08-15
JPS5528554B2 (de) 1980-07-29
ATA629275A (de) 1984-05-15
DK141545C (da) 1980-09-29
IT1042654B (it) 1980-01-30
GB1483555A (en) 1977-08-24
SE7510483L (sv) 1976-03-22
FR2285719B1 (de) 1979-03-23
CH591763A5 (de) 1977-09-30
FR2285719A1 (fr) 1976-04-16
NL7510942A (nl) 1976-03-23
JPS5157291A (ja) 1976-05-19
BE833632A (fr) 1976-03-19
DK423275A (da) 1976-03-21
SE402186B (sv) 1978-06-19
DK141545B (da) 1980-04-14

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Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee