WO2008133213A1 - 積層誘電体製造方法 - Google Patents

積層誘電体製造方法 Download PDF

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Publication number
WO2008133213A1
WO2008133213A1 PCT/JP2008/057625 JP2008057625W WO2008133213A1 WO 2008133213 A1 WO2008133213 A1 WO 2008133213A1 JP 2008057625 W JP2008057625 W JP 2008057625W WO 2008133213 A1 WO2008133213 A1 WO 2008133213A1
Authority
WO
WIPO (PCT)
Prior art keywords
mol
raw material
glass powder
material layer
laminated dielectric
Prior art date
Application number
PCT/JP2008/057625
Other languages
English (en)
French (fr)
Inventor
Satoru Tomeno
Yasuko Osaki
Kazuo Watanabe
Katsuyoshi Nakayama
Original Assignee
Asahi Glass Company, Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Company, Limited filed Critical Asahi Glass Company, Limited
Priority to EP08740672A priority Critical patent/EP2157585A4/en
Priority to JP2009511863A priority patent/JPWO2008133213A1/ja
Publication of WO2008133213A1 publication Critical patent/WO2008133213A1/ja
Priority to US12/582,003 priority patent/US20100038014A1/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B18/00Layered products essentially comprising ceramics, e.g. refractory products
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/018Dielectrics
    • H01G4/06Solid dielectrics
    • H01G4/08Inorganic dielectrics
    • H01G4/10Metal-oxide dielectrics
    • H01G4/105Glass dielectric
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C10/00Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
    • C03C10/0036Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and a divalent metal oxide as main constituents
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C10/00Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
    • C03C10/0036Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and a divalent metal oxide as main constituents
    • C03C10/0045Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and a divalent metal oxide as main constituents containing SiO2, Al2O3 and MgO as main constituents
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C14/00Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
    • C03C14/004Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix the non-glass component being in the form of particles or flakes
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C27/00Joining pieces of glass to pieces of other inorganic material; Joining glass to glass other than by fusing
    • C03C27/06Joining glass to glass by processes other than fusing
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/02Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
    • H01B3/08Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances quartz; glass; glass wool; slag wool; vitreous enamels
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/02Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
    • H01B3/08Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances quartz; glass; glass wool; slag wool; vitreous enamels
    • H01B3/087Chemical composition of glass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/018Dielectrics
    • H01G4/06Solid dielectrics
    • H01G4/08Inorganic dielectrics
    • H01G4/12Ceramic dielectrics
    • H01G4/1209Ceramic dielectrics characterised by the ceramic dielectric material
    • H01G4/1218Ceramic dielectrics characterised by the ceramic dielectric material based on titanium oxides or titanates
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0306Inorganic insulating substrates, e.g. ceramic, glass
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4611Manufacturing multilayer circuits by laminating two or more circuit boards
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4611Manufacturing multilayer circuits by laminating two or more circuit boards
    • H05K3/4626Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
    • H05K3/4629Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials laminating inorganic sheets comprising printed circuits, e.g. green ceramic sheets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Power Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Glass Compositions (AREA)
  • Inorganic Insulating Materials (AREA)
  • Insulating Bodies (AREA)
  • Compositions Of Oxide Ceramics (AREA)

Abstract

 安定したガラスを用いる積層誘電体の製造方法の提供。  焼成前の少なくとも1層の原料層が質量%で50~80のガラス粉末、20~50のアルミナ粉末からなり当該ガラス粉末がモル%で、SiO2 45~60、Al2O3 2~10、BaO 10~30、ZnO 10~20等からなり、その原料層と隣り合う2個の原料層のガラス粉末がモル%で、SiO2 45~55、Al2O3 2~20、MgO 20~45等からなり、後者のガラス粉末のガラス転移点が前者のそれよりも50°C以上高く、隣接誘電体層の50~350°Cにおける平均線膨張係数の差の絶対値が15×10-7/°C以下である積層誘電体製造方法。
PCT/JP2008/057625 2007-04-25 2008-04-18 積層誘電体製造方法 WO2008133213A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP08740672A EP2157585A4 (en) 2007-04-25 2008-04-18 PROCESS FOR PRODUCING LAMINATED DIELECTRIC MATERIAL
JP2009511863A JPWO2008133213A1 (ja) 2007-04-25 2008-04-18 積層誘電体製造方法
US12/582,003 US20100038014A1 (en) 2007-04-25 2009-10-20 Method for producing laminated dielectric material

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-115724 2007-04-25
JP2007115724 2007-04-25

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/582,003 Continuation US20100038014A1 (en) 2007-04-25 2009-10-20 Method for producing laminated dielectric material

Publications (1)

Publication Number Publication Date
WO2008133213A1 true WO2008133213A1 (ja) 2008-11-06

Family

ID=39925667

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/057625 WO2008133213A1 (ja) 2007-04-25 2008-04-18 積層誘電体製造方法

Country Status (6)

Country Link
US (1) US20100038014A1 (ja)
EP (1) EP2157585A4 (ja)
JP (1) JPWO2008133213A1 (ja)
KR (1) KR20100014344A (ja)
TW (1) TW200912974A (ja)
WO (1) WO2008133213A1 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011046551A (ja) * 2009-08-26 2011-03-10 Nippon Electric Glass Co Ltd グリーンシート
EP2348002A1 (en) * 2008-11-14 2011-07-27 Asahi Glass Company Limited Method for producing glass member provided with sealing material layer, and method for manufacturing electronic device
JP2012250903A (ja) * 2011-05-12 2012-12-20 Nippon Electric Glass Co Ltd ガラスセラミック複合材料
JP2014212267A (ja) * 2013-04-19 2014-11-13 日本特殊陶業株式会社 セラミック配線基板

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101873702B1 (ko) 2010-06-29 2018-07-02 코닝 인코포레이티드 오버플로 하향인발 융합 공정을 사용해 공동인발하여 만들어진 다층 유리 시트
KR101837933B1 (ko) * 2013-03-29 2018-03-13 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 고온 적용을 위한 산보나이트-계열 유리-세라믹 시일
US20140309099A1 (en) 2013-04-15 2014-10-16 Ppg Industries Ohio, Inc. Low iron, high redox ratio, and high iron, high redox ratio, soda-lime-silica glasses and methods of making same
US11261122B2 (en) * 2013-04-15 2022-03-01 Vitro Flat Glass Llc Low iron, high redox ratio, and high iron, high redox ratio, soda-lime-silica glasses and methods of making same
JP6976053B2 (ja) * 2016-12-14 2021-12-01 Tdk株式会社 積層電子部品

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003069236A (ja) 2001-08-29 2003-03-07 Kyocera Corp セラミック回路基板およびその製法
JP2004063420A (ja) * 2002-07-31 2004-02-26 Matsushita Electric Ind Co Ltd 誘電体シート及びその製造方法、誘電体シート用ペースト並びにプラズマディスプレイパネル
JP2005038687A (ja) * 2003-07-14 2005-02-10 Nitto Denko Corp 高誘電体シート、その製造方法、配線回路基板およびその製造方法
WO2005108327A1 (ja) * 2004-05-06 2005-11-17 Asahi Glass Company, Limited 積層誘電体製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5137848A (en) * 1990-12-13 1992-08-11 E. I. Du Pont De Nemours And Company Dielectric composition containing kerf additive
DE69623930T2 (de) * 1995-01-27 2003-05-15 Sarnoff Corp., Princeton Gläser mit niedrigem dielektrischem verlust
JP3591437B2 (ja) * 2000-09-07 2004-11-17 株式会社村田製作所 多層セラミック基板およびその製造方法ならびに電子装置
EP1443029A4 (en) * 2001-11-05 2007-08-01 Asahi Glass Co Ltd GLASS CERAMIC COMPOSITION
US7687137B2 (en) * 2005-02-28 2010-03-30 Kyocera Corporation Insulating substrate and manufacturing method therefor, and multilayer wiring board and manufacturing method therefor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003069236A (ja) 2001-08-29 2003-03-07 Kyocera Corp セラミック回路基板およびその製法
JP2004063420A (ja) * 2002-07-31 2004-02-26 Matsushita Electric Ind Co Ltd 誘電体シート及びその製造方法、誘電体シート用ペースト並びにプラズマディスプレイパネル
JP2005038687A (ja) * 2003-07-14 2005-02-10 Nitto Denko Corp 高誘電体シート、その製造方法、配線回路基板およびその製造方法
WO2005108327A1 (ja) * 2004-05-06 2005-11-17 Asahi Glass Company, Limited 積層誘電体製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP2157585A4 *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2348002A1 (en) * 2008-11-14 2011-07-27 Asahi Glass Company Limited Method for producing glass member provided with sealing material layer, and method for manufacturing electronic device
EP2348002A4 (en) * 2008-11-14 2012-04-18 Asahi Glass Co Ltd METHOD FOR PRODUCING A GLASS ELEMENT WITH A SEALING MATERIAL LAYER AND METHOD FOR PRODUCING AN ELECTRONIC DEVICE
JP2011046551A (ja) * 2009-08-26 2011-03-10 Nippon Electric Glass Co Ltd グリーンシート
JP2012250903A (ja) * 2011-05-12 2012-12-20 Nippon Electric Glass Co Ltd ガラスセラミック複合材料
JP2014212267A (ja) * 2013-04-19 2014-11-13 日本特殊陶業株式会社 セラミック配線基板

Also Published As

Publication number Publication date
KR20100014344A (ko) 2010-02-10
TW200912974A (en) 2009-03-16
US20100038014A1 (en) 2010-02-18
EP2157585A4 (en) 2010-04-28
EP2157585A1 (en) 2010-02-24
JPWO2008133213A1 (ja) 2010-07-22

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