WO2008123224A1 - 感光性樹脂組成物 - Google Patents
感光性樹脂組成物 Download PDFInfo
- Publication number
- WO2008123224A1 WO2008123224A1 PCT/JP2008/055518 JP2008055518W WO2008123224A1 WO 2008123224 A1 WO2008123224 A1 WO 2008123224A1 JP 2008055518 W JP2008055518 W JP 2008055518W WO 2008123224 A1 WO2008123224 A1 WO 2008123224A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- resin composition
- photosensitive
- specified
- photosensitive resin
- silicone compound
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/12—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/58—Metal-containing linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
- C08L83/06—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/14—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/24612—Composite web or sheet
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Silicon Polymers (AREA)
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009509107A JP5078992B2 (ja) | 2007-04-04 | 2008-03-25 | 感光性樹脂組成物 |
US12/531,803 US8043899B2 (en) | 2007-04-04 | 2008-03-25 | Photosensitive resin composition |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-098089 | 2007-04-04 | ||
JP2007098089 | 2007-04-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008123224A1 true WO2008123224A1 (ja) | 2008-10-16 |
Family
ID=39830719
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/055518 WO2008123224A1 (ja) | 2007-04-04 | 2008-03-25 | 感光性樹脂組成物 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8043899B2 (ja) |
JP (1) | JP5078992B2 (ja) |
TW (1) | TW200907580A (ja) |
WO (1) | WO2008123224A1 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009078336A1 (ja) * | 2007-12-14 | 2009-06-25 | Asahi Kasei E-Materials Corporation | 感光性樹脂組成物 |
JP2010031272A (ja) * | 2008-07-01 | 2010-02-12 | Asahi Kasei E-Materials Corp | 感光性樹脂組成物 |
JP2010047746A (ja) * | 2008-07-01 | 2010-03-04 | Asahi Kasei E-Materials Corp | 感光性樹脂組成物 |
WO2012050201A1 (ja) * | 2010-10-14 | 2012-04-19 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物及びその製造方法 |
JP2017525834A (ja) * | 2014-06-19 | 2017-09-07 | インクロン オサケユキチュアInkron Oy | 透過性シロキサン封入剤及び接着剤 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5950937B2 (ja) | 2011-01-21 | 2016-07-13 | フラウンホーファー−ゲゼルシャフト・ツール・フェルデルング・デル・アンゲヴァンテン・フォルシュング・アインゲトラーゲネル・フェライン | 重合性組成物、それと共に得られる硬化物及びこれらの材料の使用 |
KR102134675B1 (ko) * | 2016-04-11 | 2020-07-16 | 닛산 가가쿠 가부시키가이샤 | 페난트렌환함유 반응성 실세스퀴옥산 화합물을 포함하는 중합성 조성물 |
US10899891B2 (en) * | 2016-05-30 | 2021-01-26 | Nissan Chemical Corporation | Reactive polysiloxane and polymerizable composition comprising same |
US10894800B2 (en) * | 2016-05-30 | 2021-01-19 | Nissan Chemical Corporation | Polymerizable silane compound |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63121043A (ja) * | 1986-11-10 | 1988-05-25 | Toshiba Corp | シリコ−ンレジスト材料 |
WO2001004186A1 (de) * | 1999-07-13 | 2001-01-18 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Organisch modifizierte kieselsäurepolykondensate, deren herstellung und deren verwendung |
JP2005298800A (ja) * | 2004-04-12 | 2005-10-27 | Korea Advanced Inst Of Sci Technol | 無機/有機混成オリゴマー、ナノ混成高分子及びこれらの製造方法 |
JP2007226209A (ja) * | 2006-01-25 | 2007-09-06 | Asahi Kasei Electronics Co Ltd | 感光性樹脂組成物 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI398724B (zh) * | 2005-03-15 | 2013-06-11 | Toray Industries | 感光性樹脂組成物 |
KR100927071B1 (ko) * | 2005-10-26 | 2009-11-13 | 아사히 가세이 일렉트로닉스 가부시끼가이샤 | 포지티브형 감광성 수지 조성물 |
JP5241241B2 (ja) * | 2006-01-24 | 2013-07-17 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物 |
-
2008
- 2008-03-25 WO PCT/JP2008/055518 patent/WO2008123224A1/ja active Application Filing
- 2008-03-25 JP JP2009509107A patent/JP5078992B2/ja not_active Expired - Fee Related
- 2008-03-25 US US12/531,803 patent/US8043899B2/en not_active Expired - Fee Related
- 2008-03-27 TW TW097111108A patent/TW200907580A/zh not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63121043A (ja) * | 1986-11-10 | 1988-05-25 | Toshiba Corp | シリコ−ンレジスト材料 |
WO2001004186A1 (de) * | 1999-07-13 | 2001-01-18 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Organisch modifizierte kieselsäurepolykondensate, deren herstellung und deren verwendung |
JP2005298800A (ja) * | 2004-04-12 | 2005-10-27 | Korea Advanced Inst Of Sci Technol | 無機/有機混成オリゴマー、ナノ混成高分子及びこれらの製造方法 |
JP2007226209A (ja) * | 2006-01-25 | 2007-09-06 | Asahi Kasei Electronics Co Ltd | 感光性樹脂組成物 |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009078336A1 (ja) * | 2007-12-14 | 2009-06-25 | Asahi Kasei E-Materials Corporation | 感光性樹脂組成物 |
US20100209669A1 (en) * | 2007-12-14 | 2010-08-19 | Natsumi Aoai | Photosensitive resin composition |
US8475996B2 (en) | 2007-12-14 | 2013-07-02 | Asahi Kasei E-Materials Corporation | Photosensitive resin composition |
JP5525821B2 (ja) * | 2007-12-14 | 2014-06-18 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物 |
JP2010031272A (ja) * | 2008-07-01 | 2010-02-12 | Asahi Kasei E-Materials Corp | 感光性樹脂組成物 |
JP2010047746A (ja) * | 2008-07-01 | 2010-03-04 | Asahi Kasei E-Materials Corp | 感光性樹脂組成物 |
WO2012050201A1 (ja) * | 2010-10-14 | 2012-04-19 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物及びその製造方法 |
CN103154053A (zh) * | 2010-10-14 | 2013-06-12 | 旭化成电子材料株式会社 | 感光性树脂组合物及其制造方法 |
JPWO2012050201A1 (ja) * | 2010-10-14 | 2014-02-24 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物及びその製造方法 |
JP2017525834A (ja) * | 2014-06-19 | 2017-09-07 | インクロン オサケユキチュアInkron Oy | 透過性シロキサン封入剤及び接着剤 |
Also Published As
Publication number | Publication date |
---|---|
JP5078992B2 (ja) | 2012-11-21 |
TW200907580A (en) | 2009-02-16 |
US20100123259A1 (en) | 2010-05-20 |
US8043899B2 (en) | 2011-10-25 |
TWI375126B (ja) | 2012-10-21 |
JPWO2008123224A1 (ja) | 2010-07-15 |
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