WO2008044585A1 - Electron-donating organic material for photovoltaic devices, material for photovoltaic devices, and photovoltaic devices - Google Patents
Electron-donating organic material for photovoltaic devices, material for photovoltaic devices, and photovoltaic devices Download PDFInfo
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- WO2008044585A1 WO2008044585A1 PCT/JP2007/069436 JP2007069436W WO2008044585A1 WO 2008044585 A1 WO2008044585 A1 WO 2008044585A1 JP 2007069436 W JP2007069436 W JP 2007069436W WO 2008044585 A1 WO2008044585 A1 WO 2008044585A1
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- 125000001424 substituent group Chemical group 0.000 description 6
- 238000001771 vacuum deposition Methods 0.000 description 6
- MRWWWZLJWNIEEJ-UHFFFAOYSA-N 4,4,5,5-tetramethyl-2-propan-2-yloxy-1,3,2-dioxaborolane Chemical compound CC(C)OB1OC(C)(C)C(C)(C)O1 MRWWWZLJWNIEEJ-UHFFFAOYSA-N 0.000 description 5
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- KOFLVDBWRHFSAB-UHFFFAOYSA-N 1,2,4,5-tetrahydro-1-(phenylmethyl)-5,9b(1',2')-benzeno-9bh-benz(g)indol-3(3ah)-one Chemical compound C1C(C=2C3=CC=CC=2)C2=CC=CC=C2C23C1C(=O)CN2CC1=CC=CC=C1 KOFLVDBWRHFSAB-UHFFFAOYSA-N 0.000 description 3
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- YTVNOVQHSGMMOV-UHFFFAOYSA-N naphthalenetetracarboxylic dianhydride Chemical compound C1=CC(C(=O)OC2=O)=C3C2=CC=C2C(=O)OC(=O)C1=C32 YTVNOVQHSGMMOV-UHFFFAOYSA-N 0.000 description 3
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- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 2
- 125000006575 electron-withdrawing group Chemical group 0.000 description 2
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
- C08G61/122—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides
- C08G61/123—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds
- C08G61/126—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds with a five-membered ring containing one sulfur atom in the ring
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
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Definitions
- the present invention relates to an electron donating organic material for photovoltaic elements, a photovoltaic element material using the same, and a photovoltaic element.
- solar cells are currently attracting attention as a potential energy source for energy problems that are becoming increasingly serious.
- inorganic materials such as single crystal silicon, polycrystalline silicon, amorphous silicon, and compound semiconductors are used as semiconductor materials for photovoltaic cells of solar cells.
- solar cells manufactured using inorganic semiconductors have not been widely used in ordinary households due to their high cost / cost compared to power generation methods such as thermal power generation and nuclear power generation.
- the high cost is mainly due to the process of manufacturing semiconductor thin films under vacuum and high temperature. Therefore, organic semiconductor cells using organic semiconductors and organic dyes such as conjugated polymers and organic crystals are being studied as semiconductor materials that are expected to simplify the manufacturing process.
- an electron-accepting organic material (n-type organic semiconductor) and an electron-donating organic material (p-type organic semiconductor) are mixed to increase the joint surface that contributes to photoelectric conversion.
- Barta heterojunction type (for example, see Non-Patent Document 1).
- conjugated polymers are used as the electron-donating organic material (P-type organic semiconductor), and conductive polymers with n-type semiconductor properties as the electron-accepting organic material, as well as fullerenes such as C and carbon.
- Non-Patent Document 3 G. Yu, J. Gao, JC Hummelen, F. Wudl, AJ Heeger, “ Science ", 1995, 270, 1789
- Non-Patent Document 4 X ⁇ Li, W. Zeng, Y. Zhang, Q. Hou, W. Yang, Y. Cao, “European Polymer Journal”, 2005, 41, 2923
- Patent Document 1 Japanese Unexamined Patent Publication No. 2003-347565 (Claims 1 and 3)
- Patent Document 3 US Patent Application Publication No. 2006—174937
- Patent Document 4 Japanese Patent Laid-Open No. 2003-104976 (Claims 1 and 9)
- Patent Document 5 US Patent Application Publication No. 2004-115473
- Patent Document 6 US Patent Application Publication No. 2006-52612
- An object of this invention is to provide a photovoltaic device with high photoelectric conversion efficiency. Means for solving the problem
- the present invention is an electron donating organic material for a photovoltaic device containing a conjugated polymer represented by the general formula (1), a photovoltaic device material using the same, and a photovoltaic device. .
- Fig. 1 is a schematic diagram showing one embodiment of the photovoltaic device of the present invention.
- FIG. 2 is a schematic view showing another embodiment of the photovoltaic device of the present invention.
- 1 ⁇ to 1 ⁇ ° may be the same or different, hydrogen, alkyl group, alkoxy group, aryl Selected from the group.
- R 11 and may be the same or different and are selected from hydrogen, alkyl group, aryl group, heteroaryl group and halogen.
- W, X, Y, and Z may be the same or different, and single bonds, arylene groups, heteroarylene groups, etylene groups, and ethynylene groups are also selected.
- m is 0 or 1.
- n represents a range from 1 to 1000.
- the alkyl group is, for example, a methyl group, an ethyl group, a propyl group, a butyl group, a pentynole group, a hexyl group, a heptyl group, an octyl group, a Noel group, a decyl group, an undecyl group, a dodecyl group, etc.
- Alkyl groups may be linear, branched, unsubstituted, or substituted, without any problem.
- the alkyl group preferably has 2 to 20 carbon atoms.
- Examples of the substituent in the case of substitution include an alkoxy group, an alkylthio group, a cyano group, and a halogen described later.
- the alkoxy group refers to an aliphatic hydrocarbon group via an ether bond such as a methoxy group, an ethoxy group, a propoxy group, or a butoxy group.
- the alkoxy group may be unsubstituted or substituted! /.
- the number of carbon atoms of the alkoxy group is preferably 2 or more and 20 or less.
- the aryl group is, for example, an aromatic hydrocarbon group such as a phenyl group, a naphthyl group, a biphenyl group, a phenanthrinol group, an anthrinol group, a terphenyl group, a pyrenyl group, or a fluorenyl group.
- the aryl group can be substituted even if it is unsubstituted! /!
- the carbon number of the aryl group is preferably 6 or more and 20 or less.
- the heteroaryl group includes, for example, a chenyl group, a furyl group, a pyrrolyl group, an imidazolyl group, a pyrazolyl group, an oxazolyl group, a pyridyl group, a birazyl group, a pyrimidyl group, a quinolinyl group, an isoquinolyl group, a quinoxalyl group, an atalidinyl group, Heteroaromatic group having atoms other than carbon such as rubazolinole group. Heteroaryl groups can be substituted or unsubstituted.
- the number of rings constituting the heteroaryl group is preferably 1 or more and 6 or less.
- Examples of the substituent when the alkoxy group, aryl group, and heteroaryl group are substituted include an alkyl group, an alkoxy group, an alkylthio group, a cyan group, and a halogen.
- Halogen is any one of fluorine, chlorine, bromine and iodine.
- the arylene group refers to a divalent aromatic hydrocarbon group (two bonding sites).
- the arylene group can be substituted even if it is unsubstituted! /.
- the carbon number of the arylene group is preferably 6 or more and 20 or less.
- Specific examples of arylene groups are the specific examples of arylene groups described above. Divalent groups corresponding to those listed above.
- a heteroarylene group is a divalent heteroaromatic ring group.
- the heteroarylene group may be unsubstituted or substituted.
- Specific examples of the heteroarylene group include divalent groups corresponding to those described above as specific examples of the heteroaryl group.
- the number of rings constituting the heteroarylene group is preferably 1 or more and 6 or less.
- Examples of the substituent when the arylene group, heteroarylene group or etylene group is substituted include an alkyl group, an alkoxy group, an alkylthio group, a cyano group, a halogen, and the like.
- the ethynylene group is a single C ⁇ C single triple bond.
- I ⁇ ⁇ R 12 is hydrogen or an alkyl group.
- W, X, Y and Z may be the same or different and are selected from a single bond, an arylene group, a heteroarylene group, an etylene group and an ethynylene group. In any case, two or more of these may be combined.
- X and Z are preferably a single bond, an ethynylene group which may have a substituent, or an arylene group which may have a substituent.
- W and Y may have a single bond or a substituent, and may be! /, Preferably an ethynylene group.
- the thiophene-benzothiadiazole-thiophene triad contained in the conjugated polymer represented by the general formula (1) has a characteristic of extending the light absorption wavelength region.
- Increasing the wavelength of the light absorption wavelength region is extremely advantageous in terms of increasing the short-circuit current density of the photovoltaic device. Therefore, in the present invention, it is considered that the light absorption and the carrier mobility can be increased while maintaining the excellent characteristics of the triad by inserting an etulene group outside the triad.
- n in the general formula (1) represents the degree of polymerization of the conjugated polymer, and is in the range of 1 to 1000.
- n in the general formula (1) is 1, it is referred to as a conjugated polymer. It is preferable that it is soluble in a solvent for ease of film formation. N is 1 or more. 500 or less is preferable. 100 or less is more preferable.
- the degree of polymerization of the conjugated polymer can be determined from the weight average molecular weight. The weight average molecular weight can be determined by measuring using GPC (gel permeation chromatography) and converting to a polystyrene standard sample. Further, in order to soluble in a solvent as described above, it is preferable that at least one I ⁇ to R 12 is an alkyl Le group.
- n in the general formula (1) is 1 or more and less than 10
- the number of alkyl groups in the above I ⁇ to R 12 is 1 or more and 8 or less.
- n in the general formula (1) is 10 or more, it is more preferable that the number of alkyl groups in the above R 2 to 4 is 4 or more.
- Examples of the conjugated polymer represented by the general formula (1) include a synergistic polymer represented by the following general formula (2).
- R " ⁇ R is Yogu hydrogen be the same or different, an alkyl group, an alkoxy group, selected from the Ari Le group.
- Yogu hydrogen or ⁇ also R 27 and R 28 are either the same or different N represents a range of 1 to 1000.
- the alkyl group, the alkoxy group, the aryl group, and n are the same as those described for the general formula (1).
- at least one of R 13 to R 28 is preferably an alkyl group.
- Examples of the conjugated polymer represented by the general formula (1) or the general formula (2) include the following structures.
- the conjugated polymer represented by the general formula (1) is synthesized, for example, by the method described in Advanced Functional Materials 2005, Vol. 15, pp. 1547-1552. be able to.
- boronic acid obtained by reacting (E) -1, 2-bis (2-chenyl) ethylene derivative with n-butyllithium
- An example is a method in which an ester derivative and dibromobenzothiadiazole are reacted by a Suzuki coupling method using a noradium catalyst, and the resulting product is oxidatively polymerized using iron (III) chloride.
- the conjugated polymer represented by the general formula (1) or the general formula (2) in the present invention exhibits p-type semiconductor characteristics. Therefore, in order to obtain higher photoelectric conversion efficiency, it is preferable to combine with an electron-accepting organic material (n-type organic semiconductor, hereinafter sometimes referred to as acceptor material).
- the photovoltaic device material of the present invention includes the donor material of the present invention and an acceptor material.
- the acceptor material used in the present invention is an organic material exhibiting n-type semiconductor characteristics, such as 1, 4, 5, 8-naphthalene tetracarboxylic dianhydride (NTCDA), 3, 4, 9, 10 Perylenetetracarboxylic dianhydride (PTCDA), 3, 4, 9, 10 Perylenetetracarboxylic bisbenzimidazole (PTCBI), N, N 'Dioctinole 3, 4, 9, 10 Naphtyltetracarboxydiimide (PTCDI—C8H ), 2- (4 Biphenyl) -5- (4 t-Butylphenyl) -1, 3, 4-Oxadiazole (PBD), 2, 5-Di (1 naphthyl) 1, 3, 4-Oxadiazole (BND) Oxazole derivatives such as 3- (4-biphenyl) -4 phenyl-5- (4 t-butylphenyl) -1, 2, 4-triazole (TAZ) and other triazole (TA
- PC BM butyric acid methyl ester
- CNT carbon nanotube
- Examples thereof include derivatives (CN—PPV) in which cyano groups are introduced into poly (p-phenylene vinylene) polymers.
- fullerene compounds are preferably used because of their high charge separation rate and electron transfer rate.
- C derivatives (PC BM) C derivatives (PC BM)
- the ratio (weight fraction) is not particularly limited, but the weight fraction of the conjugated polymer: acceptor material represented by the general formula (1) is preferably in the range of! -99: 99-1 More preferably, it is the range of 10-90: 90-; 10, More preferably, it is the range of 20-50: 80-50.
- the conjugated polymer (a) and the acceptor material are preferably mixed and used.
- the mixing method is not particularly limited, but there may be mentioned a method in which one or a plurality of methods such as heating, stirring and ultrasonic irradiation are combined and dissolved in the solvent after being added to the solvent at a desired ratio.
- the above-mentioned content ratio is the content ratio of the conjugated polymer and the acceptor material contained in the single layer (a).
- the organic semiconductor layer has a laminate structure of two or more layers, it means the content ratio of the conjugated polymer (a) and the ceptor material in the whole organic semiconductor layer.
- the method for removing impurities from the conjugated polymer represented by the general formula (1) and the acceptor material is not particularly limited, but the column chromatography method, the recrystallization method, the sublimation method, the reprecipitation method, Soxhlet extraction method, filtration method, ion exchange method, chelate method and the like can be used.
- column chromatography, recrystallization, and sublimation are preferably used for purification of low molecular weight organic materials.
- refining or Soxhlet extraction is preferably used for purification of high molecular weight compounds when removing low molecular weight components.
- the reprecipitation method is preferably a chelate method or an ion exchange method. Of these methods, one type may be used alone, or a plurality of methods may be combined.
- the photovoltaic element of the present invention has at least a positive electrode and a negative electrode, and includes the photovoltaic element material of the present invention between them.
- FIG. 1 is a schematic view showing an example of the photovoltaic element of the present invention.
- reference numeral 1 is a substrate
- reference numeral 2 is a positive electrode
- reference numeral 3 is an organic semiconductor layer containing a conjugated polymer and an acceptor material represented by the general formula (1)
- reference numeral 4 is a negative electrode.
- the organic semiconductor layer 3 contains the photovoltaic element material of the present invention.
- the common formula (1) The active polymer and the acceptor material are mixed! /, But they are laminated!
- the conjugated polymer (a) and the acceptor material are compatible or phase separated at the molecular level.
- the domain size of this phase separation structure is not particularly limited, but is usually from 1 nm to 50 nm.
- the layer having the conjugated polymer (a) exhibiting p-type semiconductor characteristics may be on the positive electrode side, and the layer having an acceptor material exhibiting n-type semiconductor characteristics may be on the negative electrode side. preferable.
- An example of a photovoltaic device in the case where the organic semiconductor layer 3 is laminated is shown in FIG.
- Reference numeral 5 denotes a layer having a synergistic polymer represented by the general formula (1)
- reference numeral 6 denotes a layer having an acceptor material.
- the thickness of the organic semiconductor layer is preferably 5 nm to 500 nm, more preferably 30 nm to 300 nm.
- the layer having the conjugated polymer represented by the general formula (1) preferably has a thickness of 1 nm to 400 nm, more preferably 15 nm. Force, et al. At 150 nm 3 ⁇ 4) ⁇ ⁇ .
- the organic semiconductor layer 3 may contain a conjugated polymer represented by the general formula (1) in the present invention and a donor material ( ⁇ -type organic semiconductor) other than the acceptor material.
- the donor material used here (a vertical organic semiconductor) is not particularly limited.
- a polythiophene polymer a poly- ⁇ -phenylene vinylene-based polymer, a poly- ⁇ -phenylene polymer, a polyfluorene.
- phthalocyanine derivatives porphyrin derivatives, N, N, diphenyl nitro N, N, 1 di (3-methylphenyl) 1, 4, 4, 1 diphenyl 1, 1, 1 diamin (TPD), N, N, 1-dinaphthyl N, N, 1-diphenyl 4, 4'-diphenyl 2-triamineramine derivatives such as 1, 1'-diamine (NPD), 4, 4, 2-di (carbazole-9yl) biphenyl
- Low molecular organic compounds such as force rubazole derivatives such as (CBP), oligothiophene derivatives (terthiophene, quarterthiophene, sexithiophene, octachiophen, etc.)
- a substrate on which an electrode material and an organic semiconductor layer can be stacked can be used depending on the type and application of the photoelectric conversion material.
- alkali-free glass, quartz glass Films and plates made from inorganic materials such as polyester, organic materials such as polyester, polycarbonate, polyolefin, polyamide, polyimide, polyphenylene sulfide, polyparaxylene, epoxy resin and fluorine resin can be used. It is.
- each substrate shown above has a light transmittance of about 80%.
- the light transmittance in the present invention is a value obtained by [transmitted light intensity (W / m 2 ) / incident light intensity (W / m 2 )] X 100 (%).
- a hole transport layer may be provided between the positive electrode 2 and the organic semiconductor layer 3.
- Materials for forming the hole transport layer include conductive polymers such as polythiophene polymers, poly p-phenylene vinylene polymers, polyfluorene polymers, phthalocyanine derivatives (HPc, CuPc, ZnPc, etc.), Small molecules exhibiting p-type semiconductor properties such as porphyrin derivatives
- Organic compounds are preferably used.
- polyethylene which is a polythiophene polymer is preferably used.
- the thickness of the hole transport layer is preferably from 5 nm to 600 nm, more preferably from 30 to 600.
- an electron transport layer may be provided between the organic semiconductor layer 3 and the negative electrode 4.
- the material for forming the electron transport layer is not particularly limited, but the above-described acceptor materials (NTCDA, PTCDA, PTCDI—C8H, oxazole derivatives, triazole derivatives, phenanthrene derivatives, phosphine oxide derivatives, fullerene compounds, Organic materials exhibiting n-type semiconductor properties such as CNT and CN-PPV are preferably used.
- the thickness of the electron transport layer is preferably 5 nm to 600 nm, more preferably 30 nm force, and so on.
- the photovoltaic device of the present invention it is preferable that either the positive electrode 2 or the negative electrode 4 has light transmittance.
- the light transmittance of the electrode thin film is not particularly limited as long as incident light reaches the organic semiconductor layer 3 and an electromotive force is generated.
- the thickness of the electrode thin film varies depending on the electrode material as long as it has a light-transmitting property and conductivity, but is preferably 20 ⁇ m to 300 nm.
- the thickness of the other electrode is not particularly limited as long as the other electrode has conductivity, and the transparency is not necessarily required.
- one electrode is a conductive material having a large work function, and the other electrode. It is preferable to use a conductive material having a small work function for the pole.
- An electrode using a conductive material having a large work function is a positive electrode.
- conductive materials with large work functions include transparent metal oxides such as indium and tin, and composite metal oxides (indium tin oxide (ITO ), Indium zinc oxide (IZO), etc.) are preferably used.
- the conductive material used for the positive electrode 2 is preferably one that is in ohmic contact with the organic semiconductor layer 3.
- the conductive material used for the positive electrode 2 is an ohmic junction with the hole transport layer.
- Electrode using a conductive material having a small work function is a negative electrode.
- the conductive material having a small work function there are alkali metals and alkaline earth metals, specifically lithium, magnesium and calcium. used.
- tin, silver, and aluminum are also preferably used.
- an electrode made of an alloy made of the above metal or a laminate of the above metal is also preferably used. It is also possible to improve the extraction current by introducing a metal fluoride or the like at the interface between the negative electrode 4 and the electron transport layer.
- the conductive material used for the negative electrode 4 is preferably one that is in ohmic contact with the organic semiconductor layer 3.
- the conductive material used for the negative electrode 4 is an ohmic junction with the electron transport layer.
- a transparent electrode such as ITO (corresponding to the positive electrode in this case) is formed on the substrate by sputtering or the like.
- the conjugated polymer represented by (a) -general formula (1) of the present invention and the photovoltaic device material including the acceptor material are dissolved in a solvent to form a solution, and the solution is formed on the transparent electrode. Apply to form an organic semiconductor layer.
- Solvents used at this time are preferably organic solvents such as methanol, ethanol, butanol, toluene, xylene, o-chlorophenol, acetone, ethyl acetate, ethylene glycol, tetrahydrofuran, dichloromethane, chlorophenol, dichloroethane, chloroethane.
- organic solvents such as methanol, ethanol, butanol, toluene, xylene, o-chlorophenol, acetone, ethyl acetate, ethylene glycol, tetrahydrofuran, dichloromethane, chlorophenol, dichloroethane, chloroethane.
- Examples include mouth benzene, dichlorobenzene, trichloro mouth benzene, chloronaphthalene, dimethylformamide, dimethyl sulfoxide, N-methylpyrrolidone, and butyrololatatone .
- Organic semiconductor by mixing a conjugated polymer represented by the general formula (1) and an acceptor material
- the conjugated polymer (a) and acceptor material (a) are added to the solvent in a desired ratio and dissolved using a method such as heating, stirring, or ultrasonic irradiation to form a solution, Apply on the bright electrode.
- a conjugated polymer represented by the general formula (1) is used. After applying the combined solution to form a layer having the conjugated polymer (a), the solution of the acceptor material is applied to form a layer.
- the synergistic polymer represented by the general formula (1) and the acceptor material are low molecular weight substances having a molecular weight of about 1000 or less, it is possible to form a layer using a vapor deposition method. It is.
- the organic semiconductor layer For the formation of the organic semiconductor layer, spin coating, blade coating, slit die coating, screen printing coating, bar coater coating, vertical coating, printing transfer method, dip pulling method, ink jet method, spraying Any method such as a vacuum evaporation method or a vacuum evaporation method can be used, and a formation method may be selected according to the characteristics of the organic semiconductor layer to be obtained, such as film thickness control and orientation control.
- a formation method may be selected according to the characteristics of the organic semiconductor layer to be obtained, such as film thickness control and orientation control.
- the conjugated polymer represented by the general formula (1) and the acceptor material of the present invention have a concentration of! ⁇ 40 g / l (the conjugated polymer and acceptor of (a)).
- a homogeneous organic semiconductor layer having a thickness of 5 to 200 nm is obtained by using this concentration, which is preferably (weight of the conjugated polymer and acceptor material of (a) with respect to the volume of the solution containing the material and the solvent). be able to.
- the formed organic semiconductor layer may be annealed under reduced pressure or under an inert atmosphere (nitrogen or argon atmosphere).
- a preferable temperature for the annealing treatment is 40 ° C to 300 ° C, more preferably 50 ° C to 200 ° C. Also, by performing the annealing treatment, the effective area where the stacked layers permeate and contact each other at the interface increases, and the short-circuit current can be increased. This annealing treatment may be performed after the formation of the negative electrode.
- a metal electrode such as A1 (corresponding to a negative electrode in this case) is formed on the organic semiconductor layer by a vacuum evaporation method or a sputtering method.
- the metal electrode is vacuum deposited using a low molecular weight organic material for the electron transport layer, it is preferable that the metal electrode is continuously formed while maintaining the vacuum.
- a desired p-type organic semiconductor material such as PEDOT
- spin coating, bar coating, or blade After coating by the casting method, etc., the solvent is removed using a vacuum thermostat or hot plate to form a hole transport layer.
- low molecular organic materials such as phthalocyanine derivatives and porphyrin derivatives
- a desired n-type organic semiconductor material (fullerene derivative or the like) is applied on the organic semiconductor layer by spin coating, bar coating, After applying by a casting method using a blade, spraying, etc., the solvent is removed using a vacuum thermostatic chamber or hot plate to form an electron transport layer.
- a vacuum thermostatic chamber or hot plate When using low molecular weight organic materials such as phenantorin phosphorus derivatives and C, vacuum evaporation using a vacuum evaporation machine
- PEDOT Polyethylenedioxythiophene
- PSS Polystyrene sulfonate
- PCBM Phenyl C61 butyric acid methyl ester
- PC BM Phenyl C71 butyric acid methyl ester
- the average molecular weight (number average molecular weight, weight average molecular weight) was calculated by an absolute calibration curve method using a GPC apparatus (manufactured by TOSOH, which was supplied with chloroform), and a high-speed GPC apparatus HLC-8220GPC.
- the degree of polymerization n was calculated by the following formula.
- Compound A-1 was synthesized by the method shown in Formula 1.
- Zinc powder (manufactured by Wako Pure Chemical Industries, Ltd.) 8. 47 g is added to 200 ml of tetrahydrofuran (manufactured by Wako Pure Chemical Industries, Ltd.) and titanium tetrachloride (manufactured by Wako Pure Chemical Industries, Ltd.) at 0 ° C. 7. Add 1 ml and the above compound (1 e) 12. lg. After heating under reflux for 1 hour under a nitrogen atmosphere, the resulting solution was taken up in 1500 ml of ice water and 300 ml of dichloromethane was added. The organic layer was separated, washed with 100 ml of water, and dried over magnesium sulfate. The resulting solution was purified by column chromatography (filler: silica gel, eluent: hexane) to obtain 7.47 g of compound (1-f).
- Compound A-2 was synthesized by the method shown in Formula 2.
- the obtained filtrate was subjected to Soxhlet extraction in the order of methanol, hexane, and black mouth form.
- the obtained black mouth form solution was concentrated by a rotary evaporator, and 100 ml of methanol was added.
- the mixture was filtered through a 0.45 m membrane filter, and the obtained filtrate was washed with 100 ml of methanol and vacuum dried at 60 ° C. to obtain 1 Omg of compound A-2.
- the weight average molecular weight was 7660, the number average molecular weight was 4540, and the degree of polymerization n was 7.9.
- Compound A-3 was synthesized by the method shown in Formula 3.
- the obtained solution was charged with 450 ml of water and 250 ml of hexane, and the organic layer was separated, washed with 200 ml of water, and dried over magnesium sulfate.
- the resulting solution was purified by column chromatography (filler: silica gel, eluent: hexane) to obtain 7 g of compound (3-e).
- Compound A-4 was synthesized by the method shown in Formula 4.
- Tetrahydrofuran was distilled off from the resulting solution under reduced pressure using a rotary evaporator and purified by column chromatography (filler: silica gel, eluent: dichloromethane / hexane) to obtain 7 g of compound (4-b). It was.
- Compound A-5 was synthesized by the method shown in Formula 5.
- Compound A-6 was synthesized by the method shown in Formula 6.
- Compound A-7 was synthesized by the method shown in Formula 7.
- Compound A-8 was synthesized by the method shown in Formula 8.
- Compound A-10 was synthesized by the method shown in Formula 10.
- Compound A-11 was synthesized by the method shown in Formula 11.
- Compound (11 f) was synthesized in the same manner as compound (5-f) except that compound (11 b) was used instead of compound (5-a).
- Koji Pure Chemical Industries Ltd. 0 ⁇ 27 g
- [Bis (diphenylphosphino) fecene] 17 ml palladium (aldrich) 17 mg was added and stirred at 100 ° C. for 5 hours.
- Compound A-12 was synthesized by the method shown in Formula 12.
- Compound A-13 was synthesized by the method shown in Formula 13.
- Compound (13-a) was synthesized in the same manner as Compound (7a) except that Compound (11e) was used instead of Compound (4g).
- 0.3 g of Compound (5-i) in Synthesis Example 5 and 0.358 g of Compound (13-a) were rapidly dissolved.
- 4 ml of water, 1 ⁇ 32 g of potassium carbonate, and 28 mg of tetrakis (triphenylphosphine) palladium (0) (manufactured by Tokyo Chemical Industry Co., Ltd.) were added, and the mixture was stirred at 100 ° C. for 48 hours in a nitrogen atmosphere.
- the obtained solution was poured into methanol / 36% hydrochloric acid (500 ml / 20 ml), and the generated solid was collected by filtration.
- the solid obtained is 400 ml of black mouth form. After washing with IN hydrochloric acid, it was dried over magnesium sulfate.
- the resulting solution was concentrated to 10 ml and added dropwise to 400 ml of methanol for reprecipitation.
- the obtained solid was collected by filtration to obtain 0.21 g of Compound A13.
- the weight average molecular weight was 12,100, the number average molecular weight was 6190, and the degree of polymerization n was 12.6.
- Table 1 shows the relationship between the compounds A— ;! to A13 obtained by the above method and the general formula (1).
- a glass substrate on which a 120-nm thick ITO transparent conductive layer as a positive electrode was deposited by sputtering was cut into 38 mm x 46 mm, and then ITO was patterned into a 38 mm x 13 mm rectangle by a photolithography method.
- the obtained substrate was subjected to ultrasonic cleaning for 10 minutes with an alkali cleaning solution (“Semico Clean” EL56 (trade name) manufactured by Fluti Chemical Co., Ltd.) and then with ultra pure water.
- This substrate is treated with UV / ozone for 30 minutes, and then a PEDOT: PSS aqueous solution (PEDOT 0.8% by weight, PPS 0.5% by weight) that becomes a hole transport layer on the substrate is spin coated to a thickness of lOOnm. A film was formed. After heating and drying at 200 ° C for 5 minutes on a hot plate, the above solution A was dropped on the PEDOT: PSS layer, and a p-type semiconductor layer having a thickness of 50 nm was formed by spin coating.
- PEDOT PSS aqueous solution
- the substrate p-type semiconductor layer is formed in the vacuum evaporation apparatus was evacuated to a vacuum degree in the apparatus is equal to or less than 1 X 10- 3 Pa, by a resistance heating method, 50 nm fullerene C Vapor deposited to a thickness of Cathode mask installed in the vacuum evaporation system
- the photovoltaic device thus fabricated was placed in a shield box, and the upper and lower electrodes were connected to a Hewlett-Packard Picoammeter / Voltage Source 4140B, and the ITO layer under reduced pressure (lOOPa)
- the metal halide lamp white light (100mW / cm 2 ) was irradiated from the side, and the current value was measured when the applied voltage was changed from 2V to + 2V.
- the short-circuit current density (current density value when the applied voltage is OV) is 5.74 mA / cm 2
- the open discharge pressure (applied voltage value when the current density is 0) is 0.75 V
- fill The factor (FF) was 0.33
- the photoelectric conversion efficiency calculated from these values was 1.4%.
- the fill factor and photoelectric conversion efficiency were calculated by the following formula.
- JVmax is the product of the current density and the applied voltage at the point where the product of the current density and the applied voltage is maximum when the applied voltage is between OV and the open circuit voltage value.
- Photoelectric conversion efficiency [(Short-circuit current density X Open-circuit voltage X Fill factor) / White light intensity] X 1 00
- a photoelectric conversion device was produced in the same manner as in Example 1 except that A-2 was used instead of A-1, and current-voltage characteristics were measured. At this time, the short-circuit current density was 5.21 mA / cm 2, the open-circuit voltage was 0.72 V, and the fill factor (FF) was 0.35. The photoelectric conversion efficiency calculated from these values was 1.31%.
- a photoelectric conversion device was fabricated in the same manner as in Example 1 except that P3HT (Aldrich), which is a p-type organic semiconductor, was used instead of A-1, and current-voltage characteristics were measured.
- the short-circuit current density at this time was 2.31 mA / cm 2 , the open-circuit voltage was 0.19 V, and the fill factor (FF) was 0.21, and the photoelectric conversion efficiency calculated from these values was 0.09%. .
- a photoelectric conversion element was produced in the same manner as in Example 1 except that B-1 below, which is a p-type organic semiconductor, was used instead of A-1, and current-voltage characteristics were measured.
- the short-circuit current density at this time was 2 ⁇ 25 mA / cm 2
- the open-circuit voltage was 0 ⁇ 45 V
- the fill factor (FF) was 0 ⁇ 30.
- the photoelectric conversion efficiency calculated from these values was 0.3%. It was.
- Example 1 The solution A used in Example 1 was replaced with the solution B, and the rest was the same as in Example 1, except that the solution A B was dropped onto the PEDOT: PSS layer, and an organic semiconductor layer with a thickness of lOOnm was formed by spin coating. Thereafter, the substrate and the cathode mask formed organic semiconductor layer is placed in a vacuum deposition instrumentation ⁇ , evacuated again to a vacuum degree in the apparatus is equal to or less than 1 X 10- 3 Pa, by a resistance heating method, An aluminum layer serving as a negative electrode was deposited to a thickness of 80 nm. A lead-out electrode was taken out from the upper and lower electrode forces, and a photoelectric conversion element having an area where the stripe-like ITO layer and the aluminum layer intersect with each other was 5 mm ⁇ 5 mm was produced.
- a photoelectric conversion element was produced in the same manner as in Example 3 except that A-2 was used instead of A-1, and current-voltage characteristics were measured.
- the short-circuit current density at this time was 3. ImA / cm 2 , the open-circuit voltage was 0.75 V, and the fill factor (FF) was 0.45.
- the photoelectric conversion efficiency calculated from these values was 1%.
- a photoelectric conversion device was produced in the same manner as in Example 3 except that B-1 was used instead of A-1, and current-voltage characteristics were measured.
- the short-circuit current density at this time was 0.5 mA / cm 2
- the open circuit voltage was 0.75 V
- the fill factor (FF) was 0.45.
- the photoelectric conversion efficiency calculated from these values was 0.17%. .
- the short-circuit current density at this time is 1.5 mA / cm 2
- the open-circuit voltage is 0.55 V
- the fill factor (FF) is 0.32
- the photoelectric conversion efficiency calculated from these values is 0.26%. there were.
- a photoelectric conversion element was produced in the same manner as in Example 3 except that B-3, which is a p-type organic semiconductor, was used instead of A-1, and current-voltage characteristics were measured.
- the short-circuit current density at this time was 1.7 mA / cm 2
- the open-circuit voltage was 0.52 V
- the fill factor (FF) was 0.31
- the photoelectric conversion efficiency calculated from these values was 0.27%. It was.
- Example 1 A-1 and 5.74 0.75 0.33 1.4
- Example 2 A— 2 Ceo 5.21 0.72 0.35 1.31
- Example 1 12.4 0.77 0.31 2.93
- Example 1 15.2 0.77 0.32 3.69 3]
- the photovoltaic element using the electron-donating organic material for photovoltaic element of the present invention can be applied to various photoelectric conversion elements using a photoelectric conversion function, an optical rectification function, and the like.
- photoelectric conversion elements such as solar cells
- electronic devices such as optical sensors, optical switches, and phototransistors
- optical recording materials such as optical memories
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JP2007550597A JP5309566B2 (ja) | 2006-10-11 | 2007-10-04 | 光起電力素子用電子供与性有機材料、光起電力素子用材料および光起電力素子 |
US12/441,150 US8269099B2 (en) | 2006-10-11 | 2007-10-04 | Electron donating organic material for photovoltaic devices, material for photovoltaic devices, and photovoltaic device |
CN200780037667.7A CN101522753B (zh) | 2006-10-11 | 2007-10-04 | 光伏元件用电子给予性有机材料、光伏元件用材料及光伏元件 |
EP07829174A EP2072557A4 (en) | 2006-10-11 | 2007-10-04 | ELECTRONIC ORGANIC MATERIAL FOR PHOTOVOLTAIC DEVICES, PHOTOVOLTAIC DEVICE MATERIALS AND PHOTOVOLTAIC DEVICES |
KR1020097007504A KR101361312B1 (ko) | 2006-10-11 | 2007-10-04 | 광기전력 소자용 전자 공여성 유기 재료, 광기전력 소자용 재료 및 광기전력 소자 |
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Also Published As
Publication number | Publication date |
---|---|
EP2072557A4 (en) | 2010-04-14 |
US20100006154A1 (en) | 2010-01-14 |
EP2072557A1 (en) | 2009-06-24 |
JP5309566B2 (ja) | 2013-10-09 |
CN101522753A (zh) | 2009-09-02 |
CN101522753B (zh) | 2014-01-29 |
TWI422580B (zh) | 2014-01-11 |
US8269099B2 (en) | 2012-09-18 |
KR20090063255A (ko) | 2009-06-17 |
JPWO2008044585A1 (ja) | 2010-02-12 |
TW200829560A (en) | 2008-07-16 |
KR101361312B1 (ko) | 2014-02-11 |
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