WO2004022821A1 - Coloured diamond - Google Patents
Coloured diamond Download PDFInfo
- Publication number
- WO2004022821A1 WO2004022821A1 PCT/IB2003/003783 IB0303783W WO2004022821A1 WO 2004022821 A1 WO2004022821 A1 WO 2004022821A1 IB 0303783 W IB0303783 W IB 0303783W WO 2004022821 A1 WO2004022821 A1 WO 2004022821A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- diamond
- heat treatment
- colour
- cvd diamond
- single crystal
- Prior art date
Links
- 239000010432 diamond Substances 0.000 title claims abstract description 271
- 229910003460 diamond Inorganic materials 0.000 title claims abstract description 261
- 238000000034 method Methods 0.000 claims abstract description 115
- 239000013078 crystal Substances 0.000 claims abstract description 77
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 98
- 238000000137 annealing Methods 0.000 claims description 58
- 238000010521 absorption reaction Methods 0.000 claims description 56
- 239000007789 gas Substances 0.000 claims description 52
- 230000007547 defect Effects 0.000 claims description 51
- 229910052757 nitrogen Inorganic materials 0.000 claims description 48
- 238000010438 heat treatment Methods 0.000 claims description 42
- 230000003019 stabilising effect Effects 0.000 claims description 28
- 238000001228 spectrum Methods 0.000 claims description 24
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 17
- 230000003287 optical effect Effects 0.000 claims description 16
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical group [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 12
- 239000010437 gem Substances 0.000 claims description 12
- 229910001751 gemstone Inorganic materials 0.000 claims description 11
- 229910002804 graphite Inorganic materials 0.000 claims description 9
- 239000010439 graphite Substances 0.000 claims description 9
- 229910052786 argon Inorganic materials 0.000 claims description 6
- 230000005540 biological transmission Effects 0.000 claims description 4
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- 229910052739 hydrogen Inorganic materials 0.000 description 12
- 239000001257 hydrogen Substances 0.000 description 12
- 239000000463 material Substances 0.000 description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 11
- 239000001301 oxygen Substances 0.000 description 11
- 229910052760 oxygen Inorganic materials 0.000 description 11
- 238000005424 photoluminescence Methods 0.000 description 11
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 10
- 229910052799 carbon Inorganic materials 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- 230000005284 excitation Effects 0.000 description 8
- 238000004020 luminiscence type Methods 0.000 description 8
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- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
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- 238000002347 injection Methods 0.000 description 3
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- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 230000002250 progressing effect Effects 0.000 description 2
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- 239000007858 starting material Substances 0.000 description 2
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- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
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- 239000002699 waste material Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 1
- -1 John M. King et al. Substances 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- YZCKVEUIGOORGS-NJFSPNSNSA-N Tritium Chemical compound [3H] YZCKVEUIGOORGS-NJFSPNSNSA-N 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000010351 charge transfer process Methods 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 235000019646 color tone Nutrition 0.000 description 1
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- 230000002860 competitive effect Effects 0.000 description 1
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- 229910052802 copper Inorganic materials 0.000 description 1
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- 229910052805 deuterium Inorganic materials 0.000 description 1
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- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000000497 effect on colour Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000004442 gravimetric analysis Methods 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
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- 229910001872 inorganic gas Inorganic materials 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 238000006902 nitrogenation reaction Methods 0.000 description 1
- 238000000399 optical microscopy Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
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- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910052722 tritium Inorganic materials 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/25—Diamond
- C01B32/28—After-treatment, e.g. purification, irradiation, separation or recovery
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/04—Diamond
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
- C30B33/02—Heat treatment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
Definitions
- This invention relates to a method of producing coloured diamond and more particularly coloured single crystal chemical vapour deposition (hereinafter referred to as CVD) diamond that is suitable, for example, for ornamental purposes.
- CVD chemical vapour deposition
- Intrinsic diamond has an indirect band gap of 5.5 eV and is transparent in the visible part of the spectrum. Introducing defects or colour centres, as they will be called hereinafter, which have associated energy levels within the band gap gives the diamond a characteristic colour that is dependent on the type and concentration of the colour centres. This colour can result from either absorption or photoluminescence or some combination of these two.
- One example of a common colour centre present in synthetic diamond is nitrogen which, when on a substitutional lattice site in the neutral charge state, has an associated energy level -1.7 eV below the conduction band - the resulting absorption gives the diamond a characteristic yellow/brown colour.
- the artificial production method of creating colour centres outlined in these reports comprises the steps of forming lattice defects in crystals by electron beam irradiation and, if necessary, performing annealing to cause the lattice defects to combine with nitrogen atoms contained in the crystals.
- the colours and uniformity that can be produced as a consequence of competitive defect formation and because of the strong growth sector dependence associated with the concentration of defects such as nitrogen in diamond.
- the colour of a diamond coloured by utilising a post growth colour centre formation method is the colour of the rough diamond prior to post growth treatment combined with the effect on colour of the one or more colour centres modified or produced during post growth treatment.
- EP 671482, US 5,672,395 and US 5,451 ,430 describe methods of making polycrystalline CVD diamond more transparent using an HPHT treatment that densities the diamond.
- brown natural diamond can be altered by annealing at high pressures and temperatures.
- natural type I la diamond can be made colourless by annealing at very high temperatures under stabilising pressure or it may be turned pink by annealing at rather lower temperatures, again under stabilising pressure.
- Brown colour in natural diamond is believed to be associated with plastic deformation but the exact cause of the brown colour and how it is modified by annealing is, however, still unknown.
- Hue is the attribute of colour that allows it to be classified as red, green, blue, yellow, black or white, or a hue that is intermediate between adjacent pairs or triplets of these basic hues.
- Lightness is the attribute of colour that is defined by the degree of similarity with a neutral achromatic scale starting with white and progressing through darker levels of grey and ending with black.
- Saturation is the attribute of colour that is defined by the degree of difference from an achromatic colour of the same lightness. It is also a descriptive term corresponding to the strength of a colour.
- the diamond trade uses adjectives such as intense, strong and vivid to denote different degrees of saturation assessed visually.
- Lightness is a visual quality perceived separately from saturation.
- the method generally involves providing a gas mixture which, on dissociation, can provide hydrogen or a halogen (e.g. F,CI) in atomic form and C or carbon-containing radicals and other reactive species, e.g. CH X , CF X wherein x can be 1 to 4.
- a gas mixture which, on dissociation, can provide hydrogen or a halogen (e.g. F,CI) in atomic form and C or carbon-containing radicals and other reactive species, e.g. CH X , CF X wherein x can be 1 to 4.
- oxygen containing sources may be present, as may sources for nitrogen, and for boron.
- Nitrogen can be introduced in the synthesis plasma in many forms; typically these are N , NH 3 , air and N 2 H 4 .
- a typical source gas mixture will contain hydrocarbons C x H y wherein x and y can each be 1 to 10 or halocarbons C x H y Hal z wherein x and z can each be 1 to 10 and y can be 0 to 10 and optionally one or more of the following: CO x , wherein x can be 0,5 to 2, 0 2 , H 2 , N 2 , NH 3 , B 2 H 6 and an inert gas.
- Each gas may be present in its natural isotopic ratio, or the relative isotopic ratios may be artificially controlled; for example hydrogen may be present as deuterium or tritium, and carbon may be present as 12 C or 13 C.
- Dissociation of the source gas mixture is brought about by an energy source such as microwaves, RF (radio frequency) energy, a flame, a hot filament or jet based technique and the reactive gas species so produced are allowed to deposit onto a substrate and form diamond.
- an energy source such as microwaves, RF (radio frequency) energy, a flame, a hot filament or jet based technique and the reactive gas species so produced are allowed to deposit onto a substrate and form diamond.
- CVD diamond may be produced on a variety of substrates. Depending on the nature of the substrate and details of the process chemistry, polycrystalline or single crystal CVD diamond may be produced.
- a method of producing single crystal CVD diamond of a desired colour includes the steps of providing single crystal CVD diamond which is coloured (which sometimes in itself is desirable), and heat treating the diamond under conditions suitable to produce the desired colour.
- the single crystal CVD diamond which is used as a starting material is coloured and the heat treatment is carried out under controlled conditions suitable to produce another and desirable colour in the diamond.
- the dominant colour is that which, under standard lighting and viewing conditions, an observer would pick if forced to find the most accurate description involving only one colour.
- a diamond with a given dominant colour can have a colour that is modified by a range of other colours that border the dominant colour in three-dimensional colour space, such as the CIE L*a*b* colour space described hereinafter.
- the region of pink colours is bordered by white, gray, brown, orange, purple and red colour regions. Therefore a pink diamond could, in principle, show any of these colours as a modifier to different degrees and be described appropriately as, for example, grayish pink, brownish pink or orangish pink.
- an individual colour is referred to (e.g. brown coloured diamond, green diamond) this refers to the dominant colour, and secondary colour modifiers may be present.
- diamonds are polished in such a way that, when viewed in the intended way, the (face-up) colour is rather different from the inherent colour of the diamond that is best seen when the stone is viewed from the side.
- the facets are polished in such a way that, for rays of light reaching the observer's eyes when the stone is viewed in the intended way, the path length within the stone is greatly increased by one or more internal reflections. The effect of increased path length on the colour coordinates can be modelled in the way described hereinafter.
- the colour of the single crystal CVD diamond used as starting material is typically brown. Under suitable conditions of heat treatment, the brown colour can be converted into any one of a number of desirable colours including colourless and near colourless, and particularly fancy colours.
- the term "fancy" refers to a gem trade classification of more saturated and more desirable colours in diamond. More particularly, the heat treatment may be such as to produce a range of fancy green and fancy pink colours in the diamond.
- the single crystal CVD diamond may be in the form of a layer or a piece of a layer, e.g. cut as a gemstone.
- the invention has particular application to thick diamond layers, that is diamond layers having a thickness of greater than 1 mm and to pieces produced from such layers.
- the CVD diamond layer preferably has uniform crystal quality through its thickness so that any desirable colour is not quenched or hidden by defects related to low crystalline quality in any region of the layer. It is possible with such layers or pieces of such layers to produce a range of pink and green colours, particularly fancy pink and fancy green colours, of such a nature that they could not have been anticipated from known natural diamond heat treated by known methods, or by known HPHT synthetic material treated by known methods.
- layers of single crystal CVD diamond in excess of 1 mm thick provide for the production of products, for example gemstones, in which each of three orthogonal dimensions exceeds 1 mm.
- the single crystal CVD diamond heat treated or annealed under the conditions of the invention produce a range of desirable colours which can be defined in terms of the CIE L * a*b* colour space. More particularly, it has been found that the single crystal CVD diamond after heat treatment, for a 1 mm thick parallel-sided layer produced from the diamond, has a CIE Lab b * co-ordinate which lies in any one of the following ranges:
- the heat treatment of the single crystal CVD diamond can lead to a diamond which is colourless or near colourless.
- the near colourless diamond can be defined in terms of the CIE L * a * b * colour space. More particularly, such a heat treated diamond, for a 1 mm thick parallel-sided layer produced from the diamond, may have a saturation (C * ) which is less than 10 or less than 5 or less than 2.
- the heat treatment will vary according to the nature of the as-grown CVD diamond and the desired colour to be produced in the CVD diamond.
- thick layers of brown single crystal CVD diamond or pieces cut from such layers can be annealed to a range of desirable pink to green colours at temperatures in the range of 1600 to 1700°C for a period of time, typically four hours, under diamond stabilising pressure.
- the colour of such thick diamond layers or pieces cut from such layers may also be changed to colours in the pink to green range by heat treating the layers at temperatures in the range 1400 to 1600°C for a period of time, typically four hours, at a pressure in the graphite stable region in an inert or stabilising atmosphere.
- An example of an inert atmosphere is argon (Ar).
- the single crystal CVD diamond is produced using a process that incorporates nitrogen to a concentration in the solid diamond of 0.05 - 50 ppm.
- the lower limit to this range is preferably 0.1 ppm, more preferably 0.2 ppm, and even more preferably 0.3 ppm.
- the upper limit to this range is preferably 30 ppm, more preferably 20 ppm, and even more preferably 10 ppm. This can be achieved using, for example, a plasma process in which nitrogen is present in the gas phase (initially in the form of N 2 , NH 3 , or some other N containing molecule). In order to achieve reproducible results and tailor the final product the N in the process needs to be controlled.
- Typical concentrations in the gas phase are 0.5 ppm - 500 ppm, more preferably 1 ppm - 100 ppm, and more preferably 2 ppm - 30 ppm, but those skilled in the art will understand that the uptake of nitrogen is very sensitive to the process conditions such as temperature, pressure, and gas phase composition, so the invention is not confined to these limits. Different isotopes of nitrogen may be used, for example 14 N or 15 N.
- Uptake of impurities such as nitrogen is also sensitive to the growth sector, and preferably the final layer is predominantly or essentially wholly one growth sector or type of growth sector related by symmetry.
- Growth sectors such as the ⁇ 100 ⁇ , ⁇ 111 ⁇ , ⁇ 110 ⁇ , ⁇ 111 ⁇ may be used, more preferably the growth sectors ⁇ 100 ⁇ and ⁇ 1 13 ⁇ , and most preferably the ⁇ 100 ⁇ .
- the diamond may in addition contain other dopants, such as P, S, and B in low concentration although the preferred method excludes these.
- the heat treatment is generally carried out in the temperature range of 1200°C - 2500°C.
- the lower bound to this range is generally set by achieving acceptable kinetic rates in the processes desired from the annealing process, in addition to selecting the equilibrium defect concentrations towards which the kinetics are progressing.
- the upper bound of this range is set by practical considerations, in that there is difficulty in operating HPHT processes above 2500°C, although annealing to form, in particular, near colourless diamond can be enhanced by suitable annealing above this temperature.
- the lower bound to this range is preferably 1250°C, more preferably 1300°C, and even more preferably 1400°C.
- the upper bound to this range is preferably 2000°C, more preferably 1900°C, and even more preferably 1800°C.
- This anneal takes place for a period of time in the range of 3 - 3 x 10 6 seconds.
- the lower bound to this range is preferably 30 seconds, more preferably 100 seconds, and even more preferably 300 seconds.
- the upper bound to this range is preferably 3 x 10 5 seconds, more preferably 1 x 10 5 seconds, even more preferably 2 x 10 4 seconds and even more preferably 7 x 10 3 seconds.
- the anneal may take place under diamond stabilising pressure, or may take place near or below atmospheric pressure, for example in an inert or stabilising atmosphere. Those skilled in the art will appreciate that there is an interdependency between these variables, longer anneal times usually being required at lower temperatures, or when stabilising pressure is applied at the same temperature.
- a particular range of temperatures may be more appropriate for a particular range of times, and both be different according to whether stabilising pressure is used.
- the upper temperature limit of annealing processes without diamond stabilising pressure is generally 1600°C, particularly where the anneal times are long or the process is not carefully controlled, because of the problem of graphitisation. However, annealing up to 1800°C, and in extreme cases 1900°C can be achieved without diamond stabilising pressure.
- the pressure domain can be considered to be split into two domains, the diamond stable region, often referred to as diamond stabilising pressure, and the graphite stable region.
- the most easily accessible region of the graphite stable region is that region around atmospheric pressure (1.01 x 10 5 Pa), although in a controlled gas environment is it generally fairly simple to achieve lower pressures, e.g. 1 x 10 2 Pa - 1 x 10 5 Pa, and also higher pressures e.g. 1.02 x 10 5 Pa - 5 x 10 5 Pa.
- the range of pressures below 5 x 10 5 Pa have no discernable effect on the defect annealing within the volume of the diamond.
- pressures in the range of 5 x 10 5 Pa to up to diamond stabilising pressures results in no behaviour of individual defects which differs in basic nature from that obtainable from either annealing in the diamond stable region or near atmospheric pressure, although reaction rates for example may vary as some smooth function of the pressure between these two extremes, and therefore the balance and interaction between defects may vary to some degree.
- the annealing in the method of the invention in the graphite stable region has generally been completed at atmospheric pressure for simplicity, but this does not limit the method of the invention in covering annealing at other pressures in the graphite stable region.
- the coloured CVD diamond crystal of the invention preferably has a desirable hue.
- the hue angle for a particular hue can be found by extending the line back from the point representing that hue on the a * b * colour plot as described more fully hereinafter, and shown on Figure 4.
- the hue angle of the CVD diamond after heat treatment will typically be less than 65° or less than 60° or less than 55° or less than 50°. It is well known that pink diamonds are much admired and highly prized by jewellers, collectors and consumers because of their universally acknowledged great beauty and rarity (Pink Diamonds, John M. King et al., Gems and Gemology, Summer 2002). In the diamond industry green diamonds are also highly valued and greatly admired (Collecting and Classifying Coloured Diamonds, Stephen C.
- Heat treatment or annealing conditions of the invention can increase the purity of the colour by increasing, removing, reducing or modifying absorption that contributes to colour modification. At the same time, annealing or heat treatment can increase the lightness by reducing the concentration of defects that reduce absorption over wide regions of the spectrum.
- Some of the colour centres that contribute to the colour of brown CVD diamond are unique to single crystal CVD diamond or pieces cut or produced from layers of single crystal CVD diamond, and may particularly affect the perceived colour of thick layers.
- the fact that they are different from those contributing to the colour of natural diamond is clear because they cause absorption bands that are not found in the absorption spectra of natural diamond. It is believed that some of the colour centres relate to very localised disruption of the diamond bonding within the single crystal CVD diamond.
- Evidence for this comes from Raman scattering from non-diamond carbon observable with an infrared excitation source (eg 785 nm or 1064 nm). Such Raman scattering is not observed for brown natural diamond.
- the relative strengths of the absorption bands in the visible region of the spectrum of brown single crystal CVD diamond can be altered by annealing, with concurrent changes in the Raman spectrum. Changes in the absorption spectrum are observed at much lower temperatures than are required to alter the colour of brown natural diamond. Significant colour changes can even be achieved by annealing at atmospheric pressure in an inert atmosphere at well below the temperature at which diamond graphitises in the absence of oxygen, for example at 1600°C or less. This was not anticipated because conversion of non-diamond carbon to diamond usually requires treatment under high pressure and temperature conditions in a diamond-stable regime.
- Characteristics associated with the CVD diamond growth mechanism can result in absorption bands centred at about 350 nm and about 510 nm and a band, centred in the near-infrared, that extends into the red region of the visible spectrum.
- the colour centres responsible for these bands therefore have an important influence on the colour of the as-grown CVD diamond. They are not present in natural or other synthetic diamond.
- Gemstones polished from as- grown CVD diamond can have desirable colours including orange brown and pinkish brown. When such diamond is heat treated or annealed under the conditions of the invention the relative strengths of the absorption bands can be altered, e.g. removed or reduced or increased, in a way that enhances the colour.
- a contribution to the colour change may also come from formation of colour centres via the breaking up of defects existing in the as-grown diamond or from changes in charge transfer processes that alter the dominant charge state of defects.
- the annealing or heat treatment step can therefore alter the combinations of colour centres to combinations that cannot be produced in as- grown CVD diamond, giving single crystal CVD diamond that has desirable colour coming from a novel combinations of colour centres.
- broad bands such as the 350 nm and 510 nm may exhibit small variations in the position of maximum intensity, but this does not change their identity.
- Figure 1 The UV-visible absorption spectra of sample Ex-4 recorded (a) before and (b) after annealing at 2400° C for 4 hours at a pressure of approximately 8.0 x 10 9 Pa (80 kbar)
- Figure 4 A plot of the CIELAB a * and b* values derived from the
- UV/visible absorption spectra of Ex-6 recorded (a) before and (b) after annealing at 1600° C for 4 hours at a pressure of approximately 6.5 x 10 9 Pa (65 kbar)
- Figure 5 A plot of the CIELAB L * and C * values derived from the
- UV/visible absorption spectra of Ex-6 recorded (a) before and (b) after annealing at 1600° C for 4 hours at a pressure of approximately 6.5 x 10 9 Pa (65 kbar)
- the invention achieves the controlled conversion of a coloured single crystal CVD diamond to another colour under suitable and controlled heat treatment conditions.
- the single crystal CVD diamond is preferably in the form of a thick layer or a piece cut or produced from such a layer.
- the thick layer of single crystal CVD diamond should be of high quality and is preferably made by providing a diamond substrate having a surface which is substantially free of crystal defects, providing a source gas, dissociating the source gas and allowing homo-epitaxial diamond growth on the surface which is substantially free of crystal defects.
- CVD diamond grown in such a manner is free of the inclusions which typify HPHT diamond, particularly HPHT diamond where the colour is not dominated by single substitutional nitrogen.
- the method is carried out in the presence of nitrogen which is added to the synthesis plasma.
- nitrogen produces brown colour centres in the diamond.
- nitrogen disrupts the growth of the diamond sufficiently to cause the incorporation of colour centres involving carbon bonded in non-diamond ways, while giving diamond that is of good single crystal quality as judged using x-ray techniques such as X-ray topography.
- defects primarily mean dislocations and micro cracks, but also include twin boundaries, point defects not intrinsically associated with the dopant N atoms, low angle boundaries and any other extended disruption to the crystal lattice.
- the substrate is a low birefringence type la natural, lb or lla high pressure/high temperature synthetic diamond or a CVD synthesised single crystal diamond.
- the quality of growth on a substrate which is not sufficiently free of defects rapidly degrades as the layer grows thicker and as the defect structures multiply, causing general crystal degradation, twinning and renucleation.
- the defect density is most easily characterised by optical evaluation after using a plasma or chemical etch optimised to reveal the defects (referred to as a revealing plasma etch), using for example a brief plasma etch of the type described below.
- a plasma or chemical etch optimised to reveal the defects referred to as a revealing plasma etch
- Two types of defects can be revealed:
- the preferred low density of defects is such that the density of surface etch features related to defects, as described above, are below 5 x 10 3 /mm 2 , and more preferably below 10 2 /mm 2 .
- the defect level at and below the substrate surface on which the CVD growth takes place may thus be minimised by careful preparation of the substrate.
- suitable preparation is any process applied to the material from mine recovery (in the case of natural diamond) or synthesis (in the case of synthetic material) as each stage can influence the defect density within the material at the plane which will ultimately form the substrate surface when preparation as a substrate is complete.
- Particular processing steps may include conventional diamond processes such as mechanical sawing, lapping and polishing (in this application specifically optimised for low defect levels), and less conventional techniques such as laser processing or ion implantation and lift off techniques, chemical/mechanical polishing, and both liquid and plasma chemical processing techniques.
- the surface R Q (root mean square deviation of surface profile from flat measured by stylus profilometer, preferably measured over 0,08 mm length) should be minimised, typical values prior to any plasma etch being no more than a few nanometers, i.e. less than 10 nanometers.
- One specific method of minimising the surface damage of the substrate is to include an in situ plasma etch on the surface on which the homoepitaxial diamond growth is to occur.
- this etch need not be in situ, nor immediately prior to the growth process, but the greatest benefit is achieved if it is in situ, because it avoids any risk of further physical damage or chemical contamination.
- An in situ etch is also generally most convenient when the growth process is also plasma based.
- the plasma etch can use similar conditions to the deposition or diamond growing process, but with the absence of any carbon containing source gas and generally at a slightly lower temperature to give better control of the etch rate.
- it can consist of one or more of:
- the etch consists of an oxygen etch followed by a hydrogen etch and then moving directly into synthesis by the introduction of the carbon source gas.
- the etch time/temperature is selected to enable remaining surface damage from processing to be removed, and for any surface contaminants to be removed, but without forming a highly roughened surface and without etching extensively along extended defects such as dislocations which intersect the surface and thus cause deep pits.
- the etch is aggressive, it is particularly important for this stage that the chamber design and material selection for its components be such that no material is transferred by the plasma into the gas phase or to the substrate surface.
- the hydrogen etch following the oxygen etch is less specific to crystal defects rounding off the angularities caused by the oxygen etch which aggressively attacks such defects and providing a smoother, better surface for subsequent growth.
- the surface or surfaces of the diamond substrate on which the CVD diamond growth occurs are preferably the ⁇ 100 ⁇ , ⁇ 110 ⁇ , ⁇ 113 ⁇ or ⁇ 111 ⁇ surfaces. Due to processing constraints, the actual sample surface orientation can differ from these ideal orientations up to 5°, and in some cases up to 10°, although this is less desirable as it adversely affects reproducibility. It is also important in the method of the invention that the impurity content of the environment in which the CVD growth takes place is properly controlled. More particularly, the diamond growth must take place in the presence of an atmosphere containing substantially no contaminants other than the intentionally added nitrogen or other dopants.
- the nitrogen concentration should be controlled to better than 500 parts per billion (as a molecular fraction of the total gas volume) or 5% of the target concentration in the gas phase, whichever is the larger, and preferably to better than 300 parts per billion (as a molecular fraction of the total gas volume) or 3% of the target concentration in the gas phase, whichever is the larger, and more preferably to better than 100 parts per billion (as a molecular fraction of the total gas volume) or 1 % of the target concentration in the gas phase, whichever is the larger.
- Measurement of absolute and relative nitrogen concentration in the gas phase at concentrations as low as 100 ppb requires sophisticated monitoring equipment such as that which can be achieved, for example, by gas chromatography. An example of such a method is now described:
- Standard gas chromatography (GC) art consists of: a gas sample stream is extracted from the point of interest using a narrow bore sample line, optimised for maximum flow velocity and minimum dead volume, and passed through the GC sample coil before being passed to waste.
- the GC sample coil is a section of tube coiled up with a fixed and known volume (typically 1cm 3 for standard atmospheric pressure injection) which can be switched from its location in the sample line into the carrier gas (high purity He) line feeding into the gas chromatography columns. This places a sample of gas of known volume into the gas flow entering the column; in the art, this procedure is called sample injection.
- the injected sample is carried by the carrier gas through the first GC column (filled with a molecular sieve optimised for separation of simple inorganic gases) and is partially separated, but the high concentration of primary gases (e.g. H 2 , Ar) causes column saturation which makes complete separation of, for example nitrogen difficult.
- the relevant section of the effluent from the first column is then switched into the feed of a second column, thereby avoiding the majority of the other gases being passed into the second column, avoiding column saturation and enabling complete separation of the target gas (N 2 ). This procedure is called "heart-cutting".
- the output flow of the second column is put through a discharge ionisation detector (DID), which detects the increase in leakage current through the carrier gas caused by the presence of the sample.
- DID discharge ionisation detector
- Chemical structure is identified by the gas residence time which is calibrated from standard gas mixtures.
- the response of the DID is linear over more than 5 orders of magnitude, and is calibrated by use of special calibrated gas mixtures containing the species to be detected, typically in the range of 10-100 ppm, made by gravimetric analysis and then verified by the supplier. Linearity of the DID can be verified by careful dilution experiments.
- Target N containing species include the type of gas used as a deliberate dopant (e.g. N 2 , NH 3 ) and also N 2 which may result from atmospheric contamination, and any other n containing species which may be relevant to the conditions of measurement.
- the sample coil volume is enlarged to about 5 cm 3 .
- this technique can operate effectively down to pressures of about 70 x 10 2 Pa.
- Calibration of the GC is dependent on the mass of sample injected, and the greatest accuracy is obtained by calibrating the GC using the same sample pressure as that available from the source under analysis. Very high standards of vacuum and gas handling practice must be observed to ensure that the measurements are correct.
- the point of sampling may be upstream of the synthesis chamber to characterise the incoming gases, within the chamber to characterise the chamber environment, or downstream of the chamber.
- the source gas may be any known in the art and will contain a carbon- containing material which dissociates producing radicals or other reactive species.
- the gas mixture will also generally contain gases suitable to provide hydrogen or a halogen in atomic form.
- the dissociation of the source gas is preferably carried out using microwave energy in a reactor examples of which are known in the art. However, the transfer of any impurities from the reactor should be minimised.
- a microwave system may be used to ensure that the plasma is placed away from all surfaces except the substrate surface on which diamond growth is to occur and its mount. Examples of a preferred mount materials are: molybdenum, tungsten, silicon and silicon carbide. Examples of preferred reactor chamber materials are stainless steel, aluminium, copper, gold and platinum.
- a high plasma power density should be used, resulting from high microwave power (typically 3-60kW, for substrate diameters of 25-300 mm) and high gas pressures (50-500 x 10 2 Pa, and preferably 100-450 x 10 2 Pa).
- high microwave power typically 3-60kW, for substrate diameters of 25-300 mm
- high gas pressures 50-500 x 10 2 Pa, and preferably 100-450 x 10 2 Pa.
- the thick high quality single crystal CVD diamond or a piece thereof is then subjected to heat treatment.
- the piece may, for example, take the form of a gemstone.
- Table 1 lists seven different combinations (referred to as Case 1-7) of absorption bands that can be found in as-grown brown single crystal CVD diamond.
- Case 1-7 The breakdown of the spectrum of brown CVD diamond into these absorption bands is discussed in detail in WO 03/052177A1.
- the feature at 270 nm is present in each case and it relates to isolated nitrogen impurities at substitutional sites within the diamond lattice. It is well known that the associated absorption spreads into the visible region of the absorption spectrum and gives the distinctive yellow hue of type lb diamond.
- Case 2 Broad bands at approximately 350 nm and 510 are believed to be associated with localised disruption of the CVD diamond structure that gives states within the band gap. In as-grown samples of single crystal CVD diamond, these features tend to appear together. In association with isolated substitutional nitrogen, they can give hues ranging from orange brown to pink brown, depending on the relative strengths of the three contributions.
- Case 3 Brown single crystal CVD diamond may also show a broad band centred in the NIR region of the spectrum and, when reasonably strong, the short wavelength side of this band can give rise to significant absorption at the red end of the visible spectrum. By itself this would cause a blue hue. When seen together with isolated substitutional nitrogen the resulting absorption at both ends of the spectrum gives the diamond a green hue.
- Cases 5, 6 and 7 cover three other combinations of the absorption features discussed above. These combinations can give a range of different brown hues depending on the relative strengths of the component absorption features.
- Brown single crystal CVD diamond was annealed under various conditions and the effect thereof was observed. It was found that the ramp and the 350 nm band can be substantially removed by treatment at 1400 -1600°C for four hours at atmospheric pressure in an inert atmosphere. A similar effect can also be achieved by annealing at 1600 - 1700°C for four hours under diamond-stabilising pressure. By itself these treatments can have a significant effect on the colour of the diamond in, for example, cases 1 , 2, 4, 5, 6 and 7 as shown in table 2.
- absorption relating to the negatively charged nitrogen-vacancy centre (with a zero-phonon line at 637 nm) to be significantly increased.
- the increase in the associated absorption tends to make samples look pinker in colour.
- This increased absorption may be caused by a change in charge transfer that causes more of the nitrogen-vacancy centres to be in the negative charge state. It may be caused by the formation of additional nitrogen-vacancy centres as a result of capture of released vacancies at isolated nitrogen or dissociation of more complex defects. There may also be an increase in the luminescence excited from negative nitrogen vacancy centres and in extreme cases this could affect the apparent colour of the diamond.
- the nitrogen-vacancy centre can be dissociated into an isolated substitutional nitrogen and a vacancy that migrates away.
- Nitrogen vacancy centres are therefore less likely to influence the colour of (formerly brown) diamond after annealing treatments at this or higher temperatures. After such treatments such diamond does however show strong green luminescence that may give it a greenish hue under some viewing and lighting conditions.
- the photoluminescence spectra of brown CVD diamond that has been annealed at temperatures high enough to substantially dissociate the nitrogen-vacancy defects formed during the growth process, tends to be dominated by bands in the spectral region between 450 and 550 nm.
- H3 luminescence (with a zero-phonon line at 503 nm) may be observed and, after anneals at the highest temperatures, N3 luminescence (with a zero-phonon line at 415 nm) may also be detected.
- N3 luminescence (with a zero-phonon line at 415 nm) may also be detected.
- Nd:YAG laser excitation (1064 nm)
- other photoluminescence lines may be observed at 1263 nm, 1274 nm and 1281 nm. These have also only been observed for single crystal brown CVD diamond that has been annealed under conditions that could change its colour.
- As-grown brown single crystal CVD diamond that can have its colour significantly improved by annealing treatments may show infrared absorption bands relating to the stretch modes of carbon-hydrogen bonds in the 2800 - 3000 cm "1 region of the spectrum. These bands are generally altered but not completely removed by high temperature annealing treatments and are not generally seen in the absorption spectra of natural or HPHT synthetic diamond. Some natural diamond shows a hydrogen-related absorption line at 3107 cm "1 that has never been seen in the spectra of untreated CVD diamond. Annealing of brown single crystal CVD diamond at temperatures greater than approximately 1800°C can cause the formation of the H-related defect responsible for the line at 3107 cm '1 .
- voids may give rise to reduced optical transmission towards shorter wavelengths.
- the single crystal CVD diamond of the present invention does not contain voids, either before or after annealing. Samples of such diamond were studied closely, both in cross-section and plan view, with a high magnification (x 1000) optical microscope. None that could have been a void was observed. Optical microscopy therefore sets an upper limit on the dimensions of voids of the order of 200 nm.
- TEM Transmission electron microscopy
- the chromaticity co-ordinates can be used as a measure or means of illustrating the difference between the fancy colours of single crystal CVD diamond produced by the method of the invention compared with those occurring in the other types or forms of diamond.
- a window is required to have certain absorption characteristics. This may simply be a low overall absorption, or low absorption in certain bands, or it may include the need for specific absorption peaks such as for applications measuring radiation by calorimetric means.
- the diamond of the invention has particular use in optical applications. Optical applications may not be restricted to the visible region, but may extend into the UV and into the IR and beyond. In particular it is anticipated that this material will also have application in the microwave region.
- the perceived colour of an object depends on the transmittance/absorbance spectrum of the object, the spectral power distribution of the illumination source and the response curves of the observer's eyes.
- the CIELAB chromaticity coordinates quoted in this patent application have been derived in the way described below.
- Using a standard D65 illumination spectrum and standard (red, green and blue) response curves of the eye G. Wyszecki and W.S.
- a * 500[(X/X 0 ) 1/3 - (Y/Yo) 1 3 ] (for X/X 0 > 0.008856, Y/Y 0 > 0.008856)
- Modified versions of these equations must be used outside the limits of Y/Y 0 , X/X 0 and Z/Z 0 .
- the modified versions are given in a technical report prepared by the Commission Internationale de L'Eclairage (Colorimetry (1986)).
- L * the lightness
- C * the x-axis
- a broad scale of lightness can be defined in the following way: Light: 95>L*>65, Medium: 65>L * >35 , Dark: 35>L*>05.
- the C * (saturation) numbers can be divided into saturation ranges of 10 C * units and assigned descriptive terms as below. 0-10 weak
- a 3.2 mm thick CVD layer was grown on an HPHT synthetic diamond substrate.
- the surface of the substrate on which growth was to take place was prepared according to the method described in WO 01/96634.
- This substrate was mounted on a tungsten substrate using a high temperature braze suitable for diamond. This was introduced into a microwave reactor, an etch and growth cycle used to prepare the substrate surface, and then growth commenced. More particularly:
- the reactor was pre-fitted with point of use purifiers, reducing nitrogen levels in the incoming gas stream (excluding the N 2 dopant line) to below 80 ppb, as determined by the modified GC method described above.
- Nitrogen (N 2 ) was introduced into the growth process at a concentration of 10 ppm.
- the single substitutional nitrogen concentration in this layer was estimated to be approximately 0.40 ppm from the 270 nm absorption feature in the absorption spectrum.
- the absorption spectrum also contained broad bands centred at approximately 360 nm and 520 nm and a general rise (ramp) in absorption coefficient from the red to the ultra-violet.
- the layer was polished into a round brilliant cut stone of 0.55 carats and was graded as fancy light brown, VS1. It was then annealed at 1700°C for four hours under diamond stabilising pressure of approximately 6.5 x 10 9 Pa (65 kbar). Without any further processing, it was then graded as fancy light pink brown, VS1.
- the culet of the round brilliant was enlarged to allow a quantitative absorption spectrum to be recorded. This indicated no significant change in the concentration of single substitutional nitrogen.
- the strength of the band at 360 nm and the ramp in the absorption spectrum had been substantially reduced but the band at approximately 520 nm remained largely unchanged.
- An absorption spectrum recorded at 77 K showed a weak line at 637 nm (with the associated vibronic bands) from negative nitrogen-vacancy centres.
- the photoluminescence spectrum was dominated by luminescence from the nitrogen-vacancy defects with zero-phonon lines at 575 nm and 637 nm.
- a 3.1 mm thick CVD layer was grown on an HPHT synthetic diamond substrate using a process similar to that set out in Example 1.
- the single substitutional nitrogen concentration in this sample was estimated to be approximately 0.5 ppm from the strength of the 270 nm feature in the absorption spectrum.
- the layer was polished into a round brilliant of 0.49 carats that was graded as light brown, VS1. It was then annealed at 2100°C for twenty-four hours under diamond stabilising pressure of approximately 7.5 x 10 9 Pa (75 kbar). After repolishing to 0.44 carats, it was then graded as fancy light greyish green, VS1.
- a 3.10 mm thick CVD layer was grown on an HPHT synthetic diamond substrate in a process similar to that set out in Example 1.
- the single substitutional nitrogen concentration in this sample was estimated to be approximately 0.5 ppm from the strength of the 270 nm feature in the absorption spectrum.
- the absorption spectrum also contained broad bands centred at approximately 360 nm and 515 nm and a general rise (ramp) in absorption coefficient from the red to the ultra-violet.
- the layer was polished into a round brilliant of 0.51 carats that was graded as light brown, 13. It was then annealed at 1700°C for twenty-four hours under diamond stabilising pressure of approximately 6.5 x 10 9 Pa (65 kbar). Without any further processing it was graded as light orangish pink, 13.
- the culet of the round brilliant was then enlarged to allow an absorption spectrum to be recorded. This indicated no significant change in concentration of single substitutional nitrogen.
- the strength of the band at 360 nm and the ramp in the absorption spectrum had been substantially reduced but the band at approximately 515 nm remained largely unchanged.
- the photoluminescence spectrum was dominated by photoluminescence from the N-V defects with zero-phonon lines at 575 nm and 637 nm.
- the change in perceived colour was predominantly a result of the change in the absorption spectrum.
- Single crystal CVD diamond was grown to a thickness of 2 mm on a ⁇ 100 ⁇ diamond substrate in a process similar to that set out in Example 1.
- the gas mixture included 2.5 ppm of nitrogen.
- the substrate was removed and a polished CVD sample Ex-4 measuring 4.5 mm x 4.0 mm x 2 mm was produced.
- the CVD diamond sample was then annealed at 2400° C for 4 hours under diamond stabilising pressure of approximately 8.0 x 10 9 Pa (80 kbar). After this treatment, it was near-colourless. Its UV/visible absorption spectrum is labelled
- Single crystal CVD diamond was grown to a thickness of 3 mm on a ⁇ 100 ⁇ diamond substrate in a process similar to that set out in Example 1.
- the pressure was 250 x 10 2 Pa, the substrate temperature 815°C, and the gas mixture contained 7.5 ppm of nitrogen.
- the substrate was removed and a polished cross-sectional CVD diamond slice Ex-5 measuring 3 mm x 2 mm x 0.86 mm was produced.
- This sample had an orangish brown colour. Its UV/visible absorption spectrum is labelled (a) in figure 2. In addition to absorption features associated with single substitutional nitrogen, it contains broad bands at approximately 515 nm and 365 nm. There is also a general increase in absorption coefficient towards shorter wavelengths.
- the sample was then annealed at 1900°C for 4 hours under diamond stabilising pressure of approximately 7.0 x 10 9 Pa (70 kbar). After this treatment, it was near-colourless. Its UV/visible absorption spectrum is labelled (b) in figure 2. The remaining absorption fits reasonably well to the shape of a type lb spectrum containing approximately 2.2 ppm of nitrogen in single substitutional sites.
- the annealing treatment therefore removed the additional absorption shown by the as-grown sample and made it near-colourless. From the absorbance spectra of this sample measured before and after annealing the CIELAB coordinates of the diamond were derived in the way discussed earlier. They are tabulated below. The annealing process greatly reduced the b * coordinate and the saturation, while increasing the lightness.
- Single crystal CVD diamond was grown to a thickness of 1.8 mm on a ⁇ 100 ⁇ diamond substrate in a process similar to that set out in Example 1.
- the pressure was 257 x 10 2 Pa, the substrate temperature 812°C, and the gas mixture contained 3.8 ppm of nitrogen.
- the substrate was removed and the UV/visible absorption spectrum (labelled (a) in figure 3) of the resulting brown diamond plate Ex-6 was measured.
- the sample was then annealed at 1600° C " under diamond stabilising pressure of approximately 6.5 x 10 9 Pa (65 kbar) for 4 hours. After this treatment, the dominant component of its colour was pink.
- the UV/visible absorption spectrum of the annealed sample Ex-6 is labelled (b) in figure 3. This spectrum is made up of absorption relating to single substitutional nitrogen with a concentration of approximately 1.2 ppm, a band centred at approximately 515 nm, and some residual absorption in the ultraviolet.
- the annealing treatment has removed the band centred at approximately 365 nm and has significantly reduced the general rise in absorption towards shorter wavelengths.
- Raman/photoluminescence spectra with 785 nm laser excitation were recorded at room temperature, before and after the annealing treatment, using a Renishaw Ramanascope with a CCD detector and fitted with a Olympus BH-2 microscope (x10 objective). It was found that the annealing treatment had introduced a series of photoluminescence lines in the near-infra-red region of the spectrum. These included a line at approximately 851 nm and two broader lines at approximately 816 and 825 nm.
- a 2.84 mm thick layer of CVD diamond was grown on a type lb HPHT synthetic diamond substrate in a process similar to that set out in Example 1. Growth conditions consisted of 42/25/600 seem (standard cubic centimetre per second) of CH 4 /Ar/H 2 at 330 x 10 2 Pa and a substrate temperature of 880°C with 24 ppm added N 2 .
- the substrate was removed and resulting CVD layer was polished into a rectangular cut CVD gemstone of 1.04 carats which was graded by a professional diamond grader to have a fancy dark orangey brown colour and a quality grade of SI1.
- the gemstone was annealed at 1600° C for four hours under diamond stabilising pressure of approximately 6.5 x 10 9 Pa (65 kbar). After this annealing treatment, the gemstone was graded again by the same diamond grader who judged it to have a fancy intense brownish pink colour and a quality grade of SI1.
- a 1.3 mm thick CVD layer with a very dark brown colour was grown on a ⁇ 100 ⁇ HPHT synthetic substrate in a process similar to that set out in Example 1.
- Growth conditions consisted of 30/25/300 seem (standard cubic centimetre per second) of CH 4 /Ar/H 2 at 330 x 10 2 Pa and a substrate temperature of 780°C with 46 ppm added 15 N 2 .
- the nitrogen isotope used was 5 N, which may have displaced lines associated with defects containing N from the values normally obtained with 14 N because of the mass effect.
- the substrate was removed and polished slices for annealing experiments were produced from the CVD layer. The treatment conditions are listed below.
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Abstract
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Priority Applications (10)
Application Number | Priority Date | Filing Date | Title |
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KR1020057003944A KR101052395B1 (en) | 2002-09-06 | 2003-09-05 | Colored diamonds |
JP2004533746A JP4711677B2 (en) | 2002-09-06 | 2003-09-05 | Colored diamond |
GB0506804A GB2409675B (en) | 2002-09-06 | 2003-09-05 | Modification of the colour of a single crystal CVD diamond |
AU2003259418A AU2003259418A1 (en) | 2002-09-06 | 2003-09-05 | Coloured diamond |
EP03793979A EP1537259B1 (en) | 2002-09-06 | 2003-09-05 | Method for altering the colour of a single crystal cvd diamond and diamond layer produced thereby |
AT03793979T ATE489490T1 (en) | 2002-09-06 | 2003-09-05 | METHOD FOR CHANGING THE COLOR OF A CVD-TYPE DIAMOND CRYSTAL AND DIAMOND LAYER PRODUCED THEREFROM |
DE60335117T DE60335117D1 (en) | 2002-09-06 | 2003-09-05 | METHOD FOR CHANGING THE COLOR OF A DIAMOND CRYSTAL CYCLIC DIODE AND THEREFORE MAKING A DIAMOND LAYER THEREOF |
CA2495840A CA2495840C (en) | 2002-09-06 | 2003-09-05 | Coloured diamond |
IL166905A IL166905A (en) | 2002-09-06 | 2005-02-15 | Method for altering the colour of a single crystal diamond, crystal diamonds obtained thereby and uses thereof |
HK06100056.5A HK1080122B (en) | 2002-09-06 | 2006-01-04 | Coloured diamond |
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GB0220772A GB0220772D0 (en) | 2002-09-06 | 2002-09-06 | Coloured diamond |
GB0220772.8 | 2002-09-06 | ||
GB0304029A GB0304029D0 (en) | 2003-02-21 | 2003-02-21 | Coloured diamond |
GB0304029.2 | 2003-02-21 |
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US (3) | US7172655B2 (en) |
EP (2) | EP1537259B1 (en) |
JP (1) | JP4711677B2 (en) |
KR (1) | KR101052395B1 (en) |
AT (1) | ATE489490T1 (en) |
AU (1) | AU2003259418A1 (en) |
CA (1) | CA2495840C (en) |
DE (1) | DE60335117D1 (en) |
GB (1) | GB2409675B (en) |
HK (1) | HK1080122B (en) |
IL (1) | IL166905A (en) |
RU (1) | RU2328563C2 (en) |
WO (1) | WO2004022821A1 (en) |
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Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0275063A2 (en) * | 1987-01-12 | 1988-07-20 | Sumitomo Electric Industries Limited | Light emitting element comprising diamond and method for producing the same |
EP0316856A1 (en) * | 1987-11-17 | 1989-05-24 | Sumitomo Electric Industries, Ltd. | Purple diamond and method of producing the same |
JPH01246196A (en) * | 1988-03-28 | 1989-10-02 | Sumitomo Electric Ind Ltd | Production of diamond film |
EP0615954A1 (en) * | 1993-03-15 | 1994-09-21 | Sumitomo Electric Industries, Limited | Red diamond, pink diamond and method of producing the same |
US5451430A (en) * | 1994-05-05 | 1995-09-19 | General Electric Company | Method for enhancing the toughness of CVD diamond |
EP0879904A1 (en) * | 1997-04-18 | 1998-11-25 | Sumitomo Electric Industries, Ltd. | Method and apparatus for producing single-crystalline diamond |
WO2001072406A1 (en) * | 2000-03-31 | 2001-10-04 | Gersan Establishment | High temperature/high pressure colour change of diamond |
WO2001072404A1 (en) * | 2000-03-31 | 2001-10-04 | Gersan Establishment | High temperature/high pressure colour change of diamond |
US20010031237A1 (en) * | 1998-09-28 | 2001-10-18 | Suresh Shankarappa Vagarali | High pressure/high temperature production of colorless and fancy colored diamonds |
WO2001096634A1 (en) * | 2000-06-15 | 2001-12-20 | Element Six (Pty) Ltd | Thick single crystal diamond layer method for making it and gemstones produced from the layer |
Family Cites Families (63)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US242517A (en) * | 1881-06-07 | Daniel edwards | ||
US231710A (en) * | 1880-08-31 | Albeet l | ||
US231716A (en) * | 1880-08-31 | Feedeeigk-geinnell | ||
US242513A (en) * | 1881-06-07 | Joint | ||
US231830A (en) * | 1880-08-31 | petehs | ||
US637340A (en) * | 1898-10-19 | 1899-11-21 | Century Machine Company | Type for type-writing machines. |
US3141855A (en) | 1961-08-31 | 1964-07-21 | Gen Electric | Method for and product produced by the introduction of boron atoms into the surface of diamond crystals |
NL136558C (en) | 1961-08-31 | |||
FR1341561A (en) | 1961-08-31 | 1963-11-02 | Gen Electric | Process for modifying the electrical conductivity of diamond and modified diamond obtained by this process |
IE41288B1 (en) | 1974-05-30 | 1979-12-05 | Gen Electric | Improvements in diamonds |
US4181505A (en) | 1974-05-30 | 1980-01-01 | General Electric Company | Method for the work-hardening of diamonds and product thereof |
US4174380A (en) | 1976-07-21 | 1979-11-13 | General Electric Company | Annealing synthetic diamond type Ib |
IE45102B1 (en) | 1976-07-21 | 1982-06-16 | Gen Electric | Process for converting type ib nitrogen in a diamond crystal into type ia nitrogen |
US4124690A (en) | 1976-07-21 | 1978-11-07 | General Electric Company | Annealing type Ib or mixed type Ib-Ia natural diamond crystal |
ZA797004B (en) * | 1979-01-17 | 1980-11-26 | De Beers Ind Diamond | Diamond treatment |
EP0191067B1 (en) | 1984-08-24 | 1992-01-15 | The Australian National University | Diamond compacts and process for making same |
US4985051A (en) | 1984-08-24 | 1991-01-15 | The Australian National University | Diamond compacts |
JP2571808B2 (en) | 1988-01-13 | 1997-01-16 | 住友電気工業株式会社 | Green diamond and method for producing the same |
EP0326856A1 (en) | 1988-01-28 | 1989-08-09 | Siemens Aktiengesellschaft | Electronic pulse counter |
JPH0222877A (en) * | 1988-07-11 | 1990-01-25 | Sumitomo Electric Ind Ltd | Solid-state laser element and its manufacture |
US6007916A (en) | 1989-04-06 | 1999-12-28 | Sumitomo Electric Industries, Ltd. | Synthetic single crystal diamond for wiring drawing dies and process for producing the same |
DE69215021T2 (en) * | 1991-02-15 | 1997-04-03 | Sumitomo Electric Industries | DIAMOND SYNTHESIS PROCEDURE |
US5443032A (en) * | 1992-06-08 | 1995-08-22 | Air Products And Chemicals, Inc. | Method for the manufacture of large single crystals |
US5474021A (en) | 1992-09-24 | 1995-12-12 | Sumitomo Electric Industries, Ltd. | Epitaxial growth of diamond from vapor phase |
EP0638670B1 (en) | 1993-08-11 | 2001-05-30 | General Electric Company | Method for enhancing the toughness of manufactured diamond |
JPH082997A (en) | 1994-02-22 | 1996-01-09 | General Electric Co <Ge> | Method for improving toughness of artificial diamond |
JPH07331441A (en) | 1994-03-11 | 1995-12-19 | General Electric Co <Ge> | Reinforced chemically vapor-deposited diamond |
US5672395A (en) | 1994-05-05 | 1997-09-30 | General Electric Company | Method for enhancing the toughness of CVD diamond |
JP4291886B2 (en) | 1994-12-05 | 2009-07-08 | 住友電気工業株式会社 | Low defect diamond single crystal and synthesis method thereof |
US6692714B2 (en) | 1997-10-17 | 2004-02-17 | Suresh Shankarappa Vagarali | High pressure/high temperature production of colorless and fancy-colored diamonds |
US20020172638A1 (en) * | 1997-10-17 | 2002-11-21 | General Electric Company | High pressure/high temperature production of colorless and fancy colored diamonds |
US20020081260A1 (en) | 1997-10-17 | 2002-06-27 | Suresh Shankarappa Vagarali | High pressure/high temperature production of colorless and fancy colored diamonds |
US6582513B1 (en) * | 1998-05-15 | 2003-06-24 | Apollo Diamond, Inc. | System and method for producing synthetic diamond |
CA2382785A1 (en) | 1999-08-25 | 2001-03-01 | General Electric Company | High pressure/high temperature production of colored diamonds |
US6377340B1 (en) * | 1999-10-29 | 2002-04-23 | General Electric Company | Method of detection of natural diamonds that have been processed at high pressure and high temperatures |
GB0007890D0 (en) | 2000-03-31 | 2000-05-17 | De Beers Ind Diamond | Colour change of diamond |
WO2001096633A1 (en) * | 2000-06-15 | 2001-12-20 | Element Six (Pty) Ltd | Single crystal diamond prepared by cvd |
EP1637218A3 (en) | 2000-08-11 | 2010-01-13 | Bellataire International LLC | High pressure/high temperature production of colored diamonds |
AU2001281132A1 (en) | 2000-08-11 | 2002-02-25 | Bellataire International Llc | High pressure and high temperature production of diamonds |
UA81614C2 (en) | 2001-11-07 | 2008-01-25 | Карнеги Инститьюшн Ов Вашингтон | Device for producing of diamonts, unit for sample holding (variants) and method for producing of diamonds (variants) |
GB0130005D0 (en) * | 2001-12-14 | 2002-02-06 | Diamanx Products Ltd | Boron doped diamond |
GB0130004D0 (en) | 2001-12-14 | 2002-02-06 | Diamanx Products Ltd | Coloured diamond |
US6811610B2 (en) | 2002-06-03 | 2004-11-02 | Diamond Innovations, Inc. | Method of making enhanced CVD diamond |
US7175704B2 (en) | 2002-06-27 | 2007-02-13 | Diamond Innovations, Inc. | Method for reducing defect concentrations in crystals |
EP1715086B1 (en) | 2002-06-27 | 2012-03-14 | General Electric Company | Method for reducing defect concentrations in crystals |
GB2409675B (en) | 2002-09-06 | 2007-04-25 | Element Six Ltd | Modification of the colour of a single crystal CVD diamond |
GB2430194B (en) | 2002-09-06 | 2007-05-02 | Element Six Ltd | Coloured diamond |
GB0221949D0 (en) * | 2002-09-20 | 2002-10-30 | Diamanx Products Ltd | Single crystal diamond |
GB2433737B (en) | 2002-11-21 | 2007-08-15 | Element Six Ltd | Optical quality diamond material |
GB0227261D0 (en) | 2002-11-21 | 2002-12-31 | Element Six Ltd | Optical quality diamond material |
US20050249655A1 (en) | 2003-01-08 | 2005-11-10 | Vagarali Suresh S | High pressure/high temperature production of colorless and fancy-colored diamonds |
GB0303860D0 (en) | 2003-02-19 | 2003-03-26 | Element Six Ltd | CVD diamond in wear applications |
RU2237113C1 (en) | 2003-06-26 | 2004-09-27 | Винс Виктор Генрихович | Method of manufacturing diamonds in fantasy red color |
US7157067B2 (en) | 2003-07-14 | 2007-01-02 | Carnegie Institution Of Washington | Tough diamonds and method of making thereof |
WO2005031033A1 (en) | 2003-08-26 | 2005-04-07 | Diamond Innovations, Inc. | Method of making enhanced cvd diamond |
KR20060096177A (en) | 2003-10-29 | 2006-09-08 | 스미토모덴키고교가부시키가이샤 | Method of manufacturing n-type semiconductor diamond, and n-type semiconductor diamond |
CN101023028A (en) | 2004-09-10 | 2007-08-22 | 华盛顿卡内基研究所 | Ultratough cvd single crystal diamond and three dimensional growth thereof |
RU2281350C2 (en) | 2004-10-21 | 2006-08-10 | Юрий Борисович Ткаченко | Method for treating colored diamonds and brilliants for decolorizing them and releasing stresses |
JP5362993B2 (en) | 2004-12-09 | 2013-12-11 | エレメント シックス テクノロジーズ (プロプライアタリー)リミテッド | A method for improving the crystal integrity of diamond crystals. |
EP2400531A3 (en) | 2005-06-20 | 2012-03-28 | Nippon Telegraph And Telephone Corporation | Diamond semiconductor element and process for producing the same |
EP2253733B1 (en) | 2005-06-22 | 2012-03-21 | Element Six Limited | High colour diamond |
WO2007066215A2 (en) | 2005-12-09 | 2007-06-14 | Element Six Technologies (Pty) Ltd | High crystalline quality synthetic diamond |
CN101512770A (en) | 2006-08-11 | 2009-08-19 | 阿克汗技术有限公司 | P-channel nanocrystalline diamond field effect transistor |
-
2003
- 2003-09-05 GB GB0506804A patent/GB2409675B/en not_active Expired - Lifetime
- 2003-09-05 AU AU2003259418A patent/AU2003259418A1/en not_active Abandoned
- 2003-09-05 US US10/655,040 patent/US7172655B2/en not_active Expired - Lifetime
- 2003-09-05 DE DE60335117T patent/DE60335117D1/en not_active Expired - Lifetime
- 2003-09-05 JP JP2004533746A patent/JP4711677B2/en not_active Expired - Lifetime
- 2003-09-05 KR KR1020057003944A patent/KR101052395B1/en active IP Right Grant
- 2003-09-05 AT AT03793979T patent/ATE489490T1/en not_active IP Right Cessation
- 2003-09-05 EP EP03793979A patent/EP1537259B1/en not_active Expired - Lifetime
- 2003-09-05 WO PCT/IB2003/003783 patent/WO2004022821A1/en active Application Filing
- 2003-09-05 RU RU2005110058/15A patent/RU2328563C2/en active
- 2003-09-05 CA CA2495840A patent/CA2495840C/en not_active Expired - Lifetime
- 2003-09-05 EP EP10176003.1A patent/EP2253746B1/en not_active Expired - Lifetime
-
2005
- 2005-02-15 IL IL166905A patent/IL166905A/en active IP Right Grant
-
2006
- 2006-01-04 HK HK06100056.5A patent/HK1080122B/en not_active IP Right Cessation
- 2006-12-14 US US11/610,519 patent/US20070079752A1/en not_active Abandoned
-
2009
- 2009-04-01 US US12/416,216 patent/US8110041B2/en not_active Expired - Lifetime
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0275063A2 (en) * | 1987-01-12 | 1988-07-20 | Sumitomo Electric Industries Limited | Light emitting element comprising diamond and method for producing the same |
EP0316856A1 (en) * | 1987-11-17 | 1989-05-24 | Sumitomo Electric Industries, Ltd. | Purple diamond and method of producing the same |
JPH01246196A (en) * | 1988-03-28 | 1989-10-02 | Sumitomo Electric Ind Ltd | Production of diamond film |
EP0615954A1 (en) * | 1993-03-15 | 1994-09-21 | Sumitomo Electric Industries, Limited | Red diamond, pink diamond and method of producing the same |
US5451430A (en) * | 1994-05-05 | 1995-09-19 | General Electric Company | Method for enhancing the toughness of CVD diamond |
EP0879904A1 (en) * | 1997-04-18 | 1998-11-25 | Sumitomo Electric Industries, Ltd. | Method and apparatus for producing single-crystalline diamond |
US20010031237A1 (en) * | 1998-09-28 | 2001-10-18 | Suresh Shankarappa Vagarali | High pressure/high temperature production of colorless and fancy colored diamonds |
WO2001072406A1 (en) * | 2000-03-31 | 2001-10-04 | Gersan Establishment | High temperature/high pressure colour change of diamond |
WO2001072404A1 (en) * | 2000-03-31 | 2001-10-04 | Gersan Establishment | High temperature/high pressure colour change of diamond |
WO2001096634A1 (en) * | 2000-06-15 | 2001-12-20 | Element Six (Pty) Ltd | Thick single crystal diamond layer method for making it and gemstones produced from the layer |
Non-Patent Citations (2)
Title |
---|
COLLINS A T ET AL: "Colour changes produced in natural brown diamonds by high-pressure, high-temperature treatment", DIAMOND AND RELATED MATERIALS, ELSEVIER SCIENCE PUBLISHERS, AMSTERDAM, NL, vol. 9, no. 2, March 2000 (2000-03-01), pages 113 - 122, XP004195517, ISSN: 0925-9635 * |
PATENT ABSTRACTS OF JAPAN vol. 013, no. 589 (C - 670) 25 December 1989 (1989-12-25) * |
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US11815528B2 (en) | 2012-08-22 | 2023-11-14 | President And Fellows Of Harvard College | Nanoscale scanning sensors |
US11746436B2 (en) | 2012-09-19 | 2023-09-05 | Element Six Technologies Limited | Single crystal chemical vapor deposited synthetic diamond materials having uniform color |
US9909215B2 (en) | 2013-03-15 | 2018-03-06 | Plasmability, Llc | Method of CVD plasma processing with a toroidal plasma processing apparatus |
US10443150B2 (en) | 2015-05-21 | 2019-10-15 | Plasmability, Llc | Toroidal plasma processing apparatus with a shaped workpiece holder |
US10704161B2 (en) | 2015-05-21 | 2020-07-07 | Plasmability, Llc | Toroidal plasma processing apparatus with a shaped workpiece holder |
WO2023067028A1 (en) | 2021-10-19 | 2023-04-27 | Element Six Technologies Limited | Cvd single crystal diamond |
WO2023067029A1 (en) | 2021-10-19 | 2023-04-27 | Element Six Technologies Limited | Cvd single crystal diamond |
Also Published As
Publication number | Publication date |
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RU2005110058A (en) | 2006-12-10 |
CA2495840A1 (en) | 2004-03-18 |
CA2495840C (en) | 2011-02-08 |
EP2253746A3 (en) | 2013-10-02 |
US7172655B2 (en) | 2007-02-06 |
EP1537259B1 (en) | 2010-11-24 |
ATE489490T1 (en) | 2010-12-15 |
AU2003259418A1 (en) | 2004-03-29 |
HK1080122B (en) | 2008-08-15 |
US20090291287A1 (en) | 2009-11-26 |
RU2328563C2 (en) | 2008-07-10 |
US8110041B2 (en) | 2012-02-07 |
GB0506804D0 (en) | 2005-05-11 |
JP4711677B2 (en) | 2011-06-29 |
DE60335117D1 (en) | 2011-01-05 |
EP2253746A2 (en) | 2010-11-24 |
GB2409675B (en) | 2007-04-25 |
KR101052395B1 (en) | 2011-07-28 |
HK1080122A1 (en) | 2006-04-21 |
EP2253746B1 (en) | 2015-07-22 |
KR20050067390A (en) | 2005-07-01 |
US20070079752A1 (en) | 2007-04-12 |
US20040175499A1 (en) | 2004-09-09 |
IL166905A (en) | 2011-12-29 |
JP2005538018A (en) | 2005-12-15 |
GB2409675A (en) | 2005-07-06 |
EP1537259A1 (en) | 2005-06-08 |
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