TWI656406B - 光敏性樹脂組成物 - Google Patents

光敏性樹脂組成物 Download PDF

Info

Publication number
TWI656406B
TWI656406B TW102103672A TW102103672A TWI656406B TW I656406 B TWI656406 B TW I656406B TW 102103672 A TW102103672 A TW 102103672A TW 102103672 A TW102103672 A TW 102103672A TW I656406 B TWI656406 B TW I656406B
Authority
TW
Taiwan
Prior art keywords
monomer
meth
structural unit
formula
mass
Prior art date
Application number
TW102103672A
Other languages
English (en)
Chinese (zh)
Other versions
TW201335715A (zh
Inventor
井上勝治
Original Assignee
日商住友化學股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商住友化學股份有限公司 filed Critical 日商住友化學股份有限公司
Publication of TW201335715A publication Critical patent/TW201335715A/zh
Application granted granted Critical
Publication of TWI656406B publication Critical patent/TWI656406B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW102103672A 2012-02-02 2013-01-31 光敏性樹脂組成物 TWI656406B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012020549A JP2013160825A (ja) 2012-02-02 2012-02-02 感光性樹脂組成物
JP2012-020549 2012-02-02

Publications (2)

Publication Number Publication Date
TW201335715A TW201335715A (zh) 2013-09-01
TWI656406B true TWI656406B (zh) 2019-04-11

Family

ID=49173139

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102103672A TWI656406B (zh) 2012-02-02 2013-01-31 光敏性樹脂組成物

Country Status (3)

Country Link
JP (1) JP2013160825A (ja)
KR (1) KR102021613B1 (ja)
TW (1) TWI656406B (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9675222B2 (en) 2013-03-28 2017-06-13 Yujin Robot Co., Ltd. Cleaning robot having expanded cleaning territory
TW201518862A (zh) * 2013-09-13 2015-05-16 Fujifilm Corp 感光性樹脂組成物、硬化膜的製造方法、硬化膜、液晶顯示裝置及有機ｅｌ顯示裝置
KR102182521B1 (ko) * 2014-12-30 2020-11-24 코오롱글로텍주식회사 고유연성 배리어 섬유기판 및 그의 제조방법
JP6854147B2 (ja) * 2017-02-17 2021-04-07 大阪有機化学工業株式会社 フォトスペーサー用樹脂、フォトスペーサー用樹脂組成物、フォトスペーサー及びカラーフィルタ
CN110412830B (zh) * 2018-04-27 2023-02-17 东友精细化工有限公司 感光性树脂组合物、光固化图案及图像显示装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200916956A (en) * 2007-04-18 2009-04-16 Daikin Ind Ltd Repellent resist composition
TW200937122A (en) * 2007-12-27 2009-09-01 Sumitomo Chemical Co Photosensitive resin composition

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101068111B1 (ko) * 2005-01-27 2011-09-27 주식회사 동진쎄미켐 감광성 수지 조성물
JP5021282B2 (ja) * 2006-11-28 2012-09-05 株式会社ダイセル ３，４−エポキシトリシクロ［５．２．１．０２，６］デカン環を有する構造単位を含む共重合体とその製造法
JP4935349B2 (ja) * 2006-12-28 2012-05-23 住友化学株式会社 感光性樹脂組成物
JP5083554B2 (ja) 2008-03-25 2012-11-28 Ｊｓｒ株式会社 液晶配向剤、液晶配向膜の形成方法および液晶表示素子
JP5264691B2 (ja) * 2009-12-14 2013-08-14 日本化薬株式会社 感光性樹脂及びそれを含有する感光性樹脂組成物
TWI477904B (zh) * 2010-03-26 2015-03-21 Sumitomo Chemical Co Photosensitive resin composition
CN102279527A (zh) * 2010-06-08 2011-12-14 住友化学株式会社 感光性树脂组合物
TW201214033A (en) * 2010-06-17 2012-04-01 Sumitomo Chemical Co Photosensitive resin composition

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200916956A (en) * 2007-04-18 2009-04-16 Daikin Ind Ltd Repellent resist composition
TW200937122A (en) * 2007-12-27 2009-09-01 Sumitomo Chemical Co Photosensitive resin composition

Also Published As

Publication number Publication date
TW201335715A (zh) 2013-09-01
JP2013160825A (ja) 2013-08-19
KR20130089593A (ko) 2013-08-12
KR102021613B1 (ko) 2019-09-16

Similar Documents

Publication Publication Date Title
JP6123187B2 (ja) 感光性樹脂組成物
TWI477904B (zh) Photosensitive resin composition
TWI617885B (zh) 著色光敏性樹脂組成物
TWI656406B (zh) 光敏性樹脂組成物
TWI608299B (zh) 硬化性樹脂組成物
JP7105562B2 (ja) 液晶表示装置用樹脂組成物、液晶表示装置用膜及び共重合体
TWI778963B (zh) 樹脂組成物及硬化膜
TWI571456B (zh) 光敏性樹脂組成物
JP6060539B2 (ja) 感光性樹脂組成物
TWI750321B (zh) 樹脂組成物及硬化膜
TW201809115A (zh) 硬化性樹脂組成物及硬化膜
JP5697965B2 (ja) 感光性樹脂組成物
TWI566040B (zh) 感光性樹脂組成物
TW201617392A (zh) 硬化性樹脂組合物
CN118434805A (zh) 树脂组合物、膜及显示装置
TW201837070A (zh) 樹脂組成物、膜及共聚物