TWI656406B - 光敏性樹脂組成物 - Google Patents
光敏性樹脂組成物 Download PDFInfo
- Publication number
- TWI656406B TWI656406B TW102103672A TW102103672A TWI656406B TW I656406 B TWI656406 B TW I656406B TW 102103672 A TW102103672 A TW 102103672A TW 102103672 A TW102103672 A TW 102103672A TW I656406 B TWI656406 B TW I656406B
- Authority
- TW
- Taiwan
- Prior art keywords
- monomer
- meth
- structural unit
- formula
- mass
- Prior art date
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012020549A JP2013160825A (ja) | 2012-02-02 | 2012-02-02 | 感光性樹脂組成物 |
JP2012-020549 | 2012-02-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201335715A TW201335715A (zh) | 2013-09-01 |
TWI656406B true TWI656406B (zh) | 2019-04-11 |
Family
ID=49173139
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW102103672A TWI656406B (zh) | 2012-02-02 | 2013-01-31 | 光敏性樹脂組成物 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2013160825A (ja) |
KR (1) | KR102021613B1 (ja) |
TW (1) | TWI656406B (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9675222B2 (en) | 2013-03-28 | 2017-06-13 | Yujin Robot Co., Ltd. | Cleaning robot having expanded cleaning territory |
TW201518862A (zh) * | 2013-09-13 | 2015-05-16 | Fujifilm Corp | 感光性樹脂組成物、硬化膜的製造方法、硬化膜、液晶顯示裝置及有機el顯示裝置 |
KR102182521B1 (ko) * | 2014-12-30 | 2020-11-24 | 코오롱글로텍주식회사 | 고유연성 배리어 섬유기판 및 그의 제조방법 |
JP6854147B2 (ja) * | 2017-02-17 | 2021-04-07 | 大阪有機化学工業株式会社 | フォトスペーサー用樹脂、フォトスペーサー用樹脂組成物、フォトスペーサー及びカラーフィルタ |
CN110412830B (zh) * | 2018-04-27 | 2023-02-17 | 东友精细化工有限公司 | 感光性树脂组合物、光固化图案及图像显示装置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200916956A (en) * | 2007-04-18 | 2009-04-16 | Daikin Ind Ltd | Repellent resist composition |
TW200937122A (en) * | 2007-12-27 | 2009-09-01 | Sumitomo Chemical Co | Photosensitive resin composition |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101068111B1 (ko) * | 2005-01-27 | 2011-09-27 | 주식회사 동진쎄미켐 | 감광성 수지 조성물 |
JP5021282B2 (ja) * | 2006-11-28 | 2012-09-05 | 株式会社ダイセル | 3,4−エポキシトリシクロ[5.2.1.02,6]デカン環を有する構造単位を含む共重合体とその製造法 |
JP4935349B2 (ja) * | 2006-12-28 | 2012-05-23 | 住友化学株式会社 | 感光性樹脂組成物 |
JP5083554B2 (ja) | 2008-03-25 | 2012-11-28 | Jsr株式会社 | 液晶配向剤、液晶配向膜の形成方法および液晶表示素子 |
JP5264691B2 (ja) * | 2009-12-14 | 2013-08-14 | 日本化薬株式会社 | 感光性樹脂及びそれを含有する感光性樹脂組成物 |
TWI477904B (zh) * | 2010-03-26 | 2015-03-21 | Sumitomo Chemical Co | Photosensitive resin composition |
CN102279527A (zh) * | 2010-06-08 | 2011-12-14 | 住友化学株式会社 | 感光性树脂组合物 |
TW201214033A (en) * | 2010-06-17 | 2012-04-01 | Sumitomo Chemical Co | Photosensitive resin composition |
-
2012
- 2012-02-02 JP JP2012020549A patent/JP2013160825A/ja active Pending
-
2013
- 2013-01-29 KR KR1020130009661A patent/KR102021613B1/ko active IP Right Grant
- 2013-01-31 TW TW102103672A patent/TWI656406B/zh active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200916956A (en) * | 2007-04-18 | 2009-04-16 | Daikin Ind Ltd | Repellent resist composition |
TW200937122A (en) * | 2007-12-27 | 2009-09-01 | Sumitomo Chemical Co | Photosensitive resin composition |
Also Published As
Publication number | Publication date |
---|---|
TW201335715A (zh) | 2013-09-01 |
JP2013160825A (ja) | 2013-08-19 |
KR20130089593A (ko) | 2013-08-12 |
KR102021613B1 (ko) | 2019-09-16 |
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