TWI220057B

TWI220057B - Suction type powder treatment device and method

Info

Publication number: TWI220057B
Application number: TW91115605A
Authority: TW
Inventors: Jie Tsai; Gu-Shian Lin; San-Huei Yang; Wen-Fu Juang; Duen-Shiang Jang
Original assignee: Au Optronics Corp
Priority date: 2002-07-12
Filing date: 2002-07-12
Publication date: 2004-08-01

Abstract

This invention provides a suction type powder treatment device and a method thereof. A liquid transported into a reaction pipe is made to flow at a predetermined rate through the reaction pipe. At the intersection of a powder feeding apparatus and the reaction pipe, a suction vacuum effect of the Bernoulli principle is generated to suck the powder into the reaction pipe. The powder is encapsulated by the liquid in the reaction pipe for reactive treatment. According to the present invention, accidental combustion due to powder raising and leaking can be prevented and also the dangerous gas explosion or incomplete reaction due to lumping powder can be prevented. Moreover, since the reactive combustion is carried out under liquid encapsulation, flame and smoke is not easy to spread and thus treatment efficiency and safety are greatly increased.

Description

—1^. 1220057 五、發明說明（1) 發明領域：本發明係關於一種吸入式粉末處理裝處理可燃性粉末之裝置和方…便防止2-種生’降低工安意外事故的發生。 '煙塵和月火的產發明背景：在半導體製程上，幾半各制同的氣體，譬如，=相；；=都需要使用各種不 . Η μ 私k ”才，匕積（C )製程常使用b2H6、 nh3 M SiH4，乾蝕刻製程使用CHf3 設備使用紅和化，離子植入機使用PH3和bf3。所以6,半戈、又 f的f程f備’都會有個別的氣體輸送系統來輸送反應所需的衣权軋體，且在半導體的製程設備中，從薄骐、户二乾蝕刻、離子植入和微影等主要的製裎設備，到掃。電子顯微鏡和二次離子質量分析儀等半導體表面分析儀器，皆需應用真空系統，來使這些價格昂貴的機器得以在適合的壓力％境下插作，例如，CVD製程通常把反應室 jChamber)内的壓力，控制在層流（laminar f1〇w)的區間，使分子間的碰撞得以發生，以便產生反應以進行薄膜沈積，而不會發生紊亂流（turbulent flow )特有的旋渴’影響沈積層的均勻度^ 真空系統是由許多不同的組件（parts )，如閥（vaWe—1 ^. 1220057 V. Description of the invention (1) Field of the invention: The present invention relates to a device and a method for processing flammable powder by an inhalation type powder processing device, so as to prevent 2-kinds of health and reduce accidents. 'Smoke and moonfire production background: In the semiconductor process, several half of the same gas, for example, = phase;; = all need to use a variety of. Η μ 私 k ”only, dagger product (C) process is often Using b2H6, nh3 M SiH4, dry etching process using CHf3 equipment, and red ionization, ion implantation machine using PH3 and bf3. Therefore, there will be a separate gas delivery system to transport 6,6 Ge, f f ' The rolling body required for the reaction, and in the semiconductor process equipment, from the main production equipment such as thin film, Toji dry etching, ion implantation and lithography, to scanning. Electron microscope and secondary ion mass analysis Instrument and other semiconductor surface analysis instruments, all need to apply a vacuum system, so that these expensive machines can be inserted under the appropriate pressure% environment, for example, the CVD process usually controls the pressure in the reaction chamber jChamber) in a laminar flow ( laminar f1〇w) interval, so that collisions between molecules can occur in order to generate a reaction for thin film deposition without the turbulent flow characteristic of turbulent flow, which affects the uniformity of the deposited layer ^ The vacuum system is There are many different components (parts), such as valves (vaWe

1220057 五、發明說明（2) )、管件（tubing)、壓力計（pressure gauges)和泵 (pump )等所組合而成。真空泵是整個真空系統的心臟，其目的是將反應室或儀器内的分子濃度降低，以調降壓力。通常在各反應室會各連接一泵，以便形成各反應室所需之真空狀態（並非指完全的真空度），如圖一所示。在進行反應時，會先把各種氣體，例如Pi、NHS、SFs、NFS、&或 Si扎等，通入至一反應室i，之後就使用一泵2來進行抽氣，以提供反應進行ί斤需之真空度。然而，各反應氣體在混合後會產生粉末（powder )，特別是在fVD機台所進行的反應，這些粉末微粒進入該泵2後，就造成該泵2的阻塞，影響該泵2的使用壽命。因此，為/避免該泵被阻塞，就把該泵前段之管路設計成如圖一所不，好讓所產生的粉末收集存放在一收集器（trap ) 3内，如此就不會阻塞該泵2，而只要定期清理該收集器3即可。由於該收集器3内的粉末具有可燃性，特別是在CVD機台所進行的反應更會產生此類特性的粉末’在一遇到空氣、水或異丙醇（I P A )等物質就會起反應，造成燃燒、冒煙或氣爆現象，甚至曝露在大氣中過久，亦會產生冒煙，容易造成工廠安全事故的發生，於是，目前清理該收集器3的方式是先將其拆卸，然後移置到室外進行處理。1220057 V. Description of the invention (2)), tubing, pressure gauges and pump. The vacuum pump is the heart of the entire vacuum system. Its purpose is to reduce the concentration of molecules in the reaction chamber or the instrument to regulate the pressure drop. Usually, a pump is connected to each reaction chamber in order to form the required vacuum state of each reaction chamber (not the complete vacuum), as shown in Figure 1. When carrying out the reaction, various gases, such as Pi, NHS, SFs, NFS, & Si, etc., are first passed into a reaction chamber i, and then a pump 2 is used for pumping to provide the reaction. The degree of vacuum required. However, after the reaction gases are mixed, powder (powder) is generated, especially the reaction performed on the fVD machine. When these powder particles enter the pump 2, it will cause the pump 2 to block, which will affect the service life of the pump 2. Therefore, in order to prevent the pump from being blocked, the piping at the front of the pump is designed as shown in Figure 1, so that the generated powder is collected and stored in a trap 3 so that the pump will not be blocked. The pump 2 can be cleaned regularly. Because the powder in the collector 3 is flammable, especially the reaction performed on the CVD machine will produce such a powder. 'When it encounters air, water or isopropyl alcohol (IPA), it will react. , Causing burning, smoke or gas explosion, or even exposed to the atmosphere for too long, will also generate smoke, which is likely to cause a plant safety accident, so the current way to clean the collector 3 is to disassemble it, and then Relocated outdoors for processing.

1220057 五、發明說明（3) 處理的方式乃是將拆卸之收集器3放置在戶外，再喷水，以便令粉末與水和空氣中的氧進行加快的反應燃燒。如此一來，反應燃燒所產生之有害煙塵和毒性物質，就造成環境污染，且燃燒所產生的高漲火焰可能引起火災或使處理人員受傷。再者，在收集器3喷水處理後，必須等待粉末和水完全混合以及反應冷卻，整個過程耗時約4個小時以上，而且處理一個收集器需使用三個人力來完成。因此，亟需一粉末處理裝置和方法，來有效解決上述現有處理可燃性粉末所面對的問題。發明概述：本發明之一目的即是在提供一種吸入式粉末處理的裝置和方法，其係利用白努力定律所產生之吸真空效應，來將反應性粉末，特別是可燃性粉末吸入一反應管内，以便與在該反應管内之流體進行完全反應。本發明之另一目的即是在提供一種吸入式粉末處理的裝置和方法，其係主要用來處理自燃性粉末，以便防止自燃性粉末在處理時產生煙塵和明火，並降低工安意外事故的發生。為達成上述目的並避免習知之缺點，本發明係揭示一種1220057 V. Description of the invention (3) The treatment method is to place the disassembled collector 3 outdoors and spray water, so as to accelerate the reaction and combustion of the powder with oxygen in water and air. In this way, the harmful smoke and toxic substances generated by the reaction combustion cause environmental pollution, and the rising flames generated by the combustion may cause fire or injury to the treatment personnel. Furthermore, after the water spray treatment of the collector 3, it is necessary to wait for the powder and water to be completely mixed and the reaction to be cooled. The whole process takes about 4 hours or more, and processing of one collector requires three labors to complete. Therefore, there is an urgent need for a powder processing apparatus and method to effectively solve the above-mentioned problems faced by the conventional flammable powder processing. Summary of the Invention: One object of the present invention is to provide a device and method for inhaling powder processing, which utilizes the vacuum suction effect produced by the white effort law to suck reactive powder, especially flammable powder, into a reaction tube. In order to completely react with the fluid in the reaction tube. Another object of the present invention is to provide an inhaled powder processing device and method, which are mainly used for processing spontaneous powders, in order to prevent the generation of smoke and open flames during the processing of spontaneous powders, and reduce the accidents of industrial safety occur. In order to achieve the above objectives and avoid the conventional disadvantages, the present invention discloses a

第7頁 1220057 五、發明說明（4) 吸入式粉末處理裝置，包含一進料裝置，其具有一主體及一進料管，用以送入一待處理之粉末；一反應管，其係一中空管，具有一第一管口、一第二管口及一開口，其中，該開口係界於該第一管口和該第二管口之間且與該進料裝置之進料管相連接，該第二管口係用以導入可與待處理之粉末進行反應之液體，而該第一管口係用以排出反應後之液體；一液體槽，設置於反應管之第一管口下方，且該液體槽中具有一液體，該液體係可與該待處理之粉末進行反應；以及一過濾元件，設置於該反應管之第一管口與液體槽之間。本發明之吸入式粉末處理裝置可更包含一泵，其具有一沉水管及一輸送管，其中該沉水管之一端沉入該液體槽之液體表面之下用以泵送該液體槽之液體，而該輸送管之一端係與該反應管之第二管口連接用以將液體槽之液體輸送至反應管中。在本發明裝置之另一較佳實施例中，該反應管為一螺旋狀反應管道，且該進料裝置之進料管之管徑（d2 )小於該反應管之管徑（dl)，亦即d2Sdl，更佳是，l/2dl$d2S d 1，如此，當該泵泵送液體以一預定速度進入反應管中時，會在進料管與反應管連接處因白努力效應而形成一真空區域，藉以將置入進料裝置之待處理粉末吸入反應管中 0 在本發明裝置之另一較佳實施例中，該吸入式粉末處理裝Page 7 1220057 V. Description of the invention (4) The suction type powder processing device includes a feeding device, which has a main body and a feeding tube for feeding a powder to be processed; a reaction tube, which is a The hollow tube has a first nozzle, a second nozzle, and an opening, wherein the opening is bounded between the first nozzle and the second nozzle and is connected to a feeding tube of the feeding device. Connected, the second nozzle is used to introduce a liquid that can react with the powder to be treated, and the first nozzle is used to discharge the liquid after the reaction; a liquid tank is provided in the first tube of the reaction tube Below the mouth, and there is a liquid in the liquid tank, the liquid system can react with the powder to be treated; and a filter element is disposed between the first nozzle of the reaction tube and the liquid tank. The suction type powder processing device of the present invention may further include a pump having a submerged pipe and a conveying pipe, wherein one end of the submerged pipe is sunk below the liquid surface of the liquid tank to pump the liquid of the liquid tank, One end of the conveying tube is connected to the second nozzle of the reaction tube to convey the liquid in the liquid tank to the reaction tube. In another preferred embodiment of the apparatus of the present invention, the reaction tube is a spiral reaction tube, and the diameter (d2) of the feeding tube of the feeding device is smaller than the diameter (dl) of the reaction tube. That is, d2Sdl, more preferably, l / 2dl $ d2S d 1, so that when the pump pumps liquid into the reaction tube at a predetermined speed, it will form a The vacuum area is used to suck the powder to be processed placed in the feeding device into the reaction tube. In another preferred embodiment of the device of the present invention, the suction powder processing device

第8頁 1220057 五、發明說明（5) 置更包含一液體集中元件，其係設置於該反應管與該過濾元件之間，可將從該反應管排出之反應所生成的固態和液態物質後，集中一處往下排放，並使未在該反應管内反應完全的部份得以繼續燃燒反應完全。另外，在該進料裝置之主體上方外側，設置具有一開關控制閥的一側管，可在處理完所有之粉末後，用來清洗該進料裝置。再者，本發明之另一實施態樣係有關一種吸入式粉末處理方法。本發明之方法，係藉由使送入一反應管内的一液體以一預定速度流過該反應管，而在一粉末進料裝置之進料管與該反應管交界處，產生白努力定律之吸真空效應，來將粉末吸入該反應管内，並在該反應管内液體的包覆下，進行反應處理。發明之詳細說明：請參見圖二，其係為本發明之一實施例的粉末處理裝置1 0 的剖面示意圖，包含一進料裝置1 1、一反應管1 3、一液體槽1 4以及一過濾元件1 5。其中，該進料裝置11係供所欲處理之粉末被送進本發明之粉末處理裝置1 0中，於本實施例中，該進料裝置1 1係為一Page 8 1220057 V. Description of the invention (5) The device further includes a liquid concentration element, which is disposed between the reaction tube and the filter element, and can be used for solid and liquid substances generated by the reaction discharged from the reaction tube. , The discharge is concentrated in one place, and the part that is not completely reacted in the reaction tube can continue to burn and react completely. In addition, a side pipe with an on-off control valve is provided above and outside the main body of the feeding device, which can be used to clean the feeding device after all the powder is processed. Furthermore, another aspect of the present invention relates to a suction powder processing method. The method of the present invention generates a white effort law by causing a liquid fed into a reaction tube to flow through the reaction tube at a predetermined speed, and at the junction of a feeding tube and a reaction tube of a powder feeding device The vacuum effect is used to suck the powder into the reaction tube and perform the reaction treatment under the coating of the liquid in the reaction tube. Detailed description of the invention: Please refer to FIG. 2, which is a schematic cross-sectional view of a powder processing device 10 according to an embodiment of the present invention, including a feeding device 11, a reaction tube 1 3, a liquid tank 14, and a Filter element 1 5. Wherein, the feeding device 11 is used for feeding the powder to be processed into the powder processing device 10 of the present invention. In this embodiment, the feeding device 11 is a

12200571220057

:五、發明說明（6) 漏斗狀接收谷态，包含一主體11 5及一進料管11 4。該反應管1 3係為一中空管，具有一供液體流出之第一管口 131、一供液體流進之第二管口133及一開口132，其中，該開口 1 3 2係界於該第—管口丨3 i和該第二管口 1 3 3之間，且設置於該反應管1 3之側壁上，靠近該第二管口丨3 3之一側並與該進料裝置11之該進料管114相連接，以利該待處理之粉末沿著進料裝置1 1之該進料管丨丨4被吸入該反應管 13中。於本發明之-較佳實施例巾’該反應管13為螺旋狀，以延長反應時間，且該反應管13係為塗覆一鐵氟龍 (Teflon)材質之不鏽鋼管，以避免管壁被有腐蝕性的酸性生成液體侵#而造成破洞。該液體槽1 4係設置於,該反應管13之該第一管口 131下方該液體槽1 4内具有可與該待處理之粉末進行反應之液體例如··水、酸液或驗液等。本發明可進一步包含一泵12，其係用來將該液體槽14内之液體，泵送至該反應管1 3内並使在該反應管丨3内之該液體以一預定速度流過5亥反應管1 3，以便在該進料裝置1 1之該進料管114與該反應管13之該開口132交界處，產生白努^ 定律之吸真空效應。於本實施例中，該泵12;係為一沉水式泵，包含一沉水管1 2 1及一輸送管丨2 2，其中，該沉水管 1 2 1之一端連接至該泵1 2，而另一端沉入該液體槽1 4之液V. Description of the invention (6) The funnel-shaped receiving valley state includes a main body 115 and a feeding pipe 114. The reaction tube 13 is a hollow tube, which has a first nozzle 131 for liquid to flow out, a second nozzle 133 for liquid to flow in, and an opening 132, wherein the opening 1 3 2 is bounded by The first tube opening 3 i and the second tube opening 1 3 3 are disposed on the side wall of the reaction tube 13 near one side of the second tube opening 3 3 and connected to the feeding device. The feeding tube 114 of 11 is connected to facilitate the powder to be processed to be sucked into the reaction tube 13 along the feeding tube 丨 4 of the feeding device 11. In the preferred embodiment of the present invention, the reaction tube 13 is spiral to extend the reaction time, and the reaction tube 13 is a stainless steel tube coated with a Teflon material to avoid the wall of the tube being blocked. Corrosive acid generates liquids that invade holes and cause holes. The liquid tank 14 is provided in the liquid tank 14 below the first nozzle 131 of the reaction tube 13 and has a liquid capable of reacting with the powder to be processed, such as water, acid, or test solution. . The present invention may further include a pump 12 for pumping the liquid in the liquid tank 14 into the reaction tube 13 and causing the liquid in the reaction tube 1 to flow at a predetermined speed 5 The reaction tube 13 is formed so that the vacuum suction effect of the Bai Nu ^ law is generated at the junction of the feeding tube 114 of the feeding device 11 and the opening 132 of the reaction tube 13. In this embodiment, the pump 12 is a submersible pump including a submerged pipe 1 2 1 and a conveying pipe 丨 2 2, wherein one end of the submerged pipe 1 2 1 is connected to the pump 12, And the other end sinks into the liquid in the liquid tank 14

1220057 五、發明說明（7) 體表面下，而該輸送管122之一端連接至該泵12，且另一端連接至該反應管1 3之第二管口 1 3 3，如此，該液體槽1 4 中之液體，可藉由該泵1 2經由該沉水管1 2 1至該輸送管 1 2 2，再泵送至該反應管1 3來循環使用。再者，該過濾元件1 5設置在該反應管1 3之第一管口 1 3 1與該液體槽1 4内液體之液面之間，其係用來過濾該待處理之粉末與該液體反應後所生成的固態物質。在本發明之一較佳實施例中，該進料裝置1 1之該進料管 114之管徑（d2)小於或等於該反應管13之管徑為（dl)，亦即d2 Sdl，更佳者，1/2 dl Sd2 Sdl。如此，當該泵12 將該液體槽1 4之該液體以一適當之流速泵送至該反應管1 3 時，於該反應管1 3之該開口 1 3 2與該進料管1 1 4連接處，會產生白努力效應而形成一真空區，進而將該待處理之粉末吸入該反應管1 3中，並與該反應管1 3内之該液體進行反應。該待處理之粉末與該液體反應之後會形成氣態物質、液態物質或/和固態物質。本發明之粉末處理裝置1 0更具有一罩體1 9，用以罩護該反應管1 3，且該罩體1 9具有一排氣口 1 6，以利將該待處理之粉末與該反應管1 3内之該液體反應所產生之氣體排出。再者，本發明之粉末處理裝置10進一步包含一液體集中元1220057 V. Description of the invention (7) Under the surface of the body, one end of the conveying pipe 122 is connected to the pump 12 and the other end is connected to the second nozzle 1 3 3 of the reaction tube 1 3, and thus, the liquid tank 1 The liquid in 4 can be recycled by the pump 12 through the submerged pipe 1 2 1 to the conveying pipe 1 2 2 and then pumped to the reaction pipe 1 3. In addition, the filter element 15 is disposed between the first nozzle 1 3 1 of the reaction tube 13 and the liquid level of the liquid in the liquid tank 14, and is used to filter the powder to be processed and the liquid. The solid material produced after the reaction. In a preferred embodiment of the present invention, the diameter (d2) of the feeding tube 114 of the feeding device 11 is less than or equal to the diameter of the reaction tube 13 (dl), that is, d2 Sdl, more The best, 1/2 dl Sd2 Sdl. In this way, when the pump 12 pumps the liquid in the liquid tank 14 to the reaction tube 1 3 at an appropriate flow rate, the opening 1 3 2 in the reaction tube 13 and the feed tube 1 1 4 At the connection, a white effort effect will be generated to form a vacuum zone, and the powder to be processed is sucked into the reaction tube 13 and reacts with the liquid in the reaction tube 13. After the powder to be treated reacts with the liquid, a gaseous substance, a liquid substance, and / or a solid substance are formed. The powder processing device 10 of the present invention further has a cover body 19 for covering the reaction tube 13, and the cover body 19 has an exhaust port 16 to facilitate the powder to be processed and the powder The gas produced by the liquid reaction in the reaction tube 13 is discharged. Furthermore, the powder processing apparatus 10 of the present invention further includes a liquid concentration element

第11頁 1220057 五、發明說明（8) 件1 7，其係設置於該反應管1 3之該第一管口 1 3 1與該過濾元件1 5之間，用以使在該反應管1 3内反應後之液體集中於該過濾元件1 5進行過濾。其次，該粉末處理裝置1 〇之液體槽1 0更具有一液體補給口 2 6及一液體排放口 2 5，其中該液體補給口 2 6及該液體排放口 2 5係設置於該液體槽1 4外部。在本發明之一較佳實施態樣中，在該進料裝置1 1進一步包含一孔洞1 1 1及一環狀凹槽1 1 3，其中，該孔洞1 1 1設置於該進料裝置1 1之該主體1 1 5上側方，且該環狀凹槽1 1 3係設置於該孔洞1 1 1下方並環繞該進料裝置1 1之主體1 1 5的内側，且該泵1 2之該輸送管1 2 2之連接該反應管1 3之該第二管口 1 3 3的該端，更連接一側管1 8，該側管1 8向上延伸並與該進料裝置1 1之該主體1 1 5上側方的該孔洞1 1 1相連接，如圖三所示。如此，當該泵1 2泵送該液體槽1 4的液體至該反應管1 3時，亦可同時將該液體泵送至該側管1 8中，並沿著該側管1 8經該孔洞1 1 1導入該進料裝置1 1之該主體1 1 5内，之後，流入該主體1 1 5内侧周圍之該環狀凹槽1 1 3的液體再由該環狀凹才曰1 1 3 ®流出（〇 v e r f 1 〇 w ) ’使得該液體可由四面八方流入該進料裝置1 1之該主體1 1 5，藉以清洗該進料裝置1 1。進一步，該側管1 8具有一開關控制閥1 8 1，藉以控制清洗Page 11 1220057 V. Description of the invention (8) Piece 17 is provided between the first nozzle 1 3 1 of the reaction tube 13 and the filter element 15 to make the reaction tube 1 The liquid after reaction in 3 is concentrated in the filter element 15 and filtered. Secondly, the liquid tank 10 of the powder processing device 10 has a liquid supply port 26 and a liquid discharge port 25, wherein the liquid supply port 26 and the liquid discharge port 25 are provided in the liquid tank 1. 4 outside. In a preferred embodiment of the present invention, the feeding device 1 1 further includes a hole 1 1 1 and an annular groove 1 1 3, wherein the hole 1 1 1 is disposed in the feeding device 1 1 is above the main body 1 1 5 and the annular groove 1 1 3 is disposed below the hole 1 1 1 and surrounds the inside of the main body 1 1 5 of the feeding device 1 1 and the pump 1 2 The end of the conveying pipe 1 2 2 is connected to the end of the second nozzle 1 3 3 of the reaction pipe 13, and is further connected to a side pipe 18, which extends upward and connects with the feeding device 11. The holes 1 1 1 above the main body 1 1 5 are connected, as shown in FIG. 3. In this way, when the pump 12 pumps the liquid in the liquid tank 14 to the reaction tube 13, the liquid can also be pumped into the side tube 18 at the same time, and passes through the side tube 18 through the The holes 1 1 1 are introduced into the main body 1 1 5 of the feeding device 11, and thereafter, the liquid flowing into the annular groove 1 1 3 around the inner side of the main body 1 1 5 is further referred to by the annular recess 1 1 3 ® Outflow (〇verf 1 〇w) 'so that the liquid can flow into the main body 1 1 5 of the feeding device 11 in all directions, thereby cleaning the feeding device 11. Further, the side pipe 18 has an on-off control valve 1 81 to control cleaning

第12頁 1220057Page 12 1220057

五、發明說明（9) 進料裝置11之主體11 5的時間及流量以下乃以處理一半導體製程中產生之可燃性粉末為例，一細說明本發明運用此粉末處理裝置1 〇來處理反應性粉末: 方法。首先，透過一沉水式泵1 2把在該粉末處理裝置1 〇之一液體槽1 4的液體，經過該沉水式泵1 2的一沈水管1 2 1及一輸送管1 2 2 ’泵送入一連接的反應管1 3内，該液體係可與倒入該粉末處理裝置1 〇之一進料裝置1 1的待處理之粉末進行反應。例如’若待處理之粉末為自燃性粉末時，該液體為水。該反應管1 3係為一螺旋狀反應管道，而該液體的流速、該反應管1 3的管徑d 1和長度以及進料裝置11之進料管 11 4的管位d 2，須經過計算設計，以便在進料裝置1 1之進料管114與連接該反應管13之開口 132處，產生白努力定律之吸真空效應。在^發明之一較佳實施例中，若進料管1 1 4之管徑小於反應吕1 j之官徑（d 2 S d 1 )，則當送進來的液體高速地導入該反應管13時，就會在進料裝置n之進料管應㈣之開口 132處因白努力定律而產生吸真空，迗入進料裝置11的待處理粉末被吸入反應管13中，更佳疋’進料管1 14的管徑需大於反應管13管徑的一 $dl)。 ^ Z dlV. Description of the invention (9) The time and flow rate of the main body 11 of the feeding device 11 is based on the treatment of flammable powder produced in a semiconductor process as an example. A detailed description of the present invention is to use the powder processing device 10 to process the reaction. Sexual powder: method. First, a submerged pump 12 is used to pass the liquid in a liquid tank 14 of the powder processing device 10 through a submerged pipe 1 2 1 and a conveying pipe 1 2 2 ′ of the submerged pump 12. Pumped into a connected reaction tube 13, the liquid system can react with the powder to be processed, which is poured into a feeding device 11 of the powder processing device 10. For example, 'if the powder to be treated is a self-igniting powder, the liquid is water. The reaction tube 13 is a spiral reaction tube, and the flow rate of the liquid, the diameter d 1 and the length of the reaction tube 13 and the position d 2 of the feeding tube 11 4 of the feeding device 11 must pass through. Calculate the design so that the vacuum effect of the Baili Law is generated at the feed pipe 114 of the feed device 11 and the opening 132 connected to the reaction pipe 13 In a preferred embodiment of the invention, if the diameter of the feeding tube 1 1 4 is smaller than the official diameter of the reaction tube 1 j (d 2 S d 1), the incoming liquid is introduced into the reaction tube 13 at high speed. At this time, a vacuum is generated due to the white effort law at the opening 132 of the feeding tube of the feeding device n, and the powder to be processed that has been sucked into the feeding device 11 is sucked into the reaction tube 13, which is better. The diameter of the feed tube 114 needs to be larger than the diameter of the reaction tube 13 (one $ dl). ^ Z dl

1220057 五、發明說明（ίο) 然後，當如圖一所示之收集器3内之待處理之粉末倒進該進料裝置11内時’倒入的待處理之物末就因白努力定律所產生的吸真空效應，被吸入至該反應管1 3的管道内，同時也帶進外界的空氣（含有氧），於是’該反應管13之管道内之粉末（例如由P Η 3和S i Η 4等的多種氣體混合反應而成 )、水和氧反應物，就在水的包圍環境（ambi ence )進行反應和燃燒。由於待處理之粉末是被吸入至該反應管之管道内進行反應，於是，由反應所產生的燃燒火焰就不會往該進料裝置 1 1之主體1 1 5上方冒出，而避免導致反應煙塵四處瀰漫。再者，由於該反應管1 3之管道設計成螺旋狀，因此可延長反應時間，以便使反應完全。此外，倒進該進料裝置11之粉末難免有些是成團結塊的，但在被吸入該反應管1 3時，由於在該反應管1 3之開口 1 3 2 處的水流因壓力不同而形成一紊亂流（turbulent flow )，於是就把讜等粉末團塊打散，不但能避免團塊粉末反應可能產生氣爆現象，且又有助於使粉末充分反應完全。另外，在該反應官1 3之末端下方具有一液體集中元件丨7，可使反應所生成的固態和液態物質從該反應管丨3的第一管口 1 3 1排放後，經該液體集中元件丨7將全部的該等生成物1220057 V. Description of the invention (ίο) Then, when the powder to be processed in the collector 3 is poured into the feeding device 11 as shown in FIG. The generated vacuum suction effect is sucked into the pipe of the reaction tube 13 and also brings in the outside air (containing oxygen), so 'the powder in the pipe of the reaction tube 13 (for example, by P Η 3 and S i Η 4 and other gases are mixed and reacted), water and oxygen reactants, react and burn in the environment surrounded by water. Since the powder to be treated is sucked into the pipe of the reaction tube for reaction, the combustion flame generated by the reaction will not emerge above the main body 1 1 5 of the feeding device 11 to avoid causing a reaction. The dust was everywhere. Furthermore, since the pipe of the reaction tube 13 is designed in a spiral shape, the reaction time can be extended to complete the reaction. In addition, some of the powder poured into the feeding device 11 is unavoidable, but when it is sucked into the reaction tube 13, the water flow at the opening 1 3 2 of the reaction tube 13 is formed due to different pressures. There is a turbulent flow, so the powder agglomerates such as radon are broken up, which can not only avoid the gas explosion of the agglomerate powder reaction, but also help make the powder fully react completely. In addition, a liquid concentration element 丨 7 is provided below the end of the reaction officer 13 to enable the solid and liquid substances generated by the reaction to be discharged from the first nozzle 1 3 1 of the reaction tube 3 and concentrated through the liquid. Element 丨 7 will be all these products

12200571220057

返彺下排放質集中， -^〜肢禾y 在該反應管道内反應完全的部：：：：：17的存在可使該液體集中元件丨7可以是_盛接漏斗、”。、㈣燒反應完全In this case, the concentration of the discharged substance is concentrated, and the presence of the fully-reacted part in the reaction pipe: ^ ~: The presence of 17 can make the liquid concentration element 7 can be a _sheng funnel, ". Complete response

在該液體集中元件17下方’置有一過濾元件15，使反應所生成之主要含有Si〇2的固態砂物質被篩留在該過濾元件15 上σ亥過濾元件1 5具有一過濾網（f i 11 e r )(圖未示出），於本貫施例中，該過濾元件1 5可侧向抽出以便清理，。當該過濾元件1 5盛滿該等固態砂物質後，就將該過濾元件工5 從該粉末處理裝置丨〇抽拉出來處理。而反應所生成的液態物質，則通過該過濾元件丨5排放至該粉末處理裝置丨〇之該液體槽1 4，並被引流至該泵丨2下方，以便循環使用。至於反應所生成的氣體，就由一排氣口 1 6排出，再收集到一廢氣處理室進行處理。當粉末處理之後，可將該進料裝置11之側管1 8之開關控制閥1 8 1打開，使液體由該泵丨2上方的該輸送管丨2 2流入該側官1 8中，並流進該進料裝置1丨之主體11 5内之環狀凹槽11 3 之後再溢流出，以便清洗該進料裝置11。在清洗完該進料裝置1丨之後，再把循環使用之液體從該粉末處理裝置1 0之一液體排放口 2 5排出，再收集到一廢水處理礙進行處理。A filter element 15 is disposed below the liquid concentration element 17 so that the solid sand material mainly containing Si0 2 generated by the reaction is sieved on the filter element 15 and the filter element 15 has a filter screen (fi 11 er) (not shown in the figure), in this embodiment, the filter element 15 can be pulled out laterally for cleaning. After the filter element 15 is filled with the solid sand material, the filter element 5 is pulled out of the powder processing device and processed. The liquid substance generated by the reaction is discharged through the filter element 5 to the liquid tank 14 of the powder processing device 1 0, and is drained under the pump 2 for recycling. As for the gas produced by the reaction, it is discharged through an exhaust port 16 and collected in an exhaust gas treatment chamber for processing. After the powder is processed, the on-off control valve 1 8 1 of the side pipe 18 of the feeding device 11 can be opened, so that the liquid flows from the pump 丨 2 above the conveying pipe 丨 2 2 into the side officer 18, and After flowing into the annular groove 11 3 in the main body 115 of the feeding device 1 丨, it overflows and then flows out to clean the feeding device 11. After the feeding device 1 is cleaned, the recycled liquid is discharged from a liquid discharge port 25 of the powder processing device 10, and then a waste water is collected for treatment.

第15頁 1220057 五、發明說明（12) — f Ϊ t明之吸入式粉末處理裝置，將反應性粉末在該反應管内之液以；；空間（例如-反應管内），伯，/如a & i體的包復下，與該液體進行反應。不情況，且可；免：末=粉末揚起外漏而造成意外燃燒的全反應，再者，:的i險性燃燒氣爆或不完環境。此外，不易漫延’以致不會危害人和 3〇分鐘來完成，因器之粉末僅需使用二個人力和战因而大大地提高了效率。 :士戶〔述係、利用_較佳實施例詳細說明制本發明之範圍，而且熟知此類技藝人士皆能明瞭而ΐ限而作些微的改變& $ & 卜適當 X胺μ矢认整，仍將不失本發明之要義所在，介不脫離本發明之精神和範圍。舉例而 j亦薇所欲處理之末…Γ工廠或其他性質的工 5反應性粉末，都可使用本發明之方法和浐 , 7迗至該反應管内之液體，並不限定為水，5 視所欲處理之粉末的特性來選用。可端 1220057 圖式簡單說明藉由以下詳細之描述結合所附圖式，將可輕易地了解上述之技術内容及本發明之諸多優點，其中：圖一，係為反應室連接泵之示意圖；圖二，係為本發明之粉末處理裝置的結構剖面示意圖；及圖三，係為本發明之粉末處理裝置的一進料裝置連接一側管的俯視示意圖。元件圖號說明： 1 反應室 2 泵 3 收集器 10 粉末處理裝置 11 進料裝置 111 孔洞 113 環狀凹槽 114 進料管1 15 主體 12 泵 121 沈水管 122 輸送管13 反應管 131 第一端點1 3 2 開口 133 第二端點 14 液體槽 15 過濾元件 16 排氣口 1 7液體集中元件1 8 侧管 181 開關控制閥 19 罩體 25 液體排放口 26 液體補給口 dl 反應管之管徑d2 進料管之管徑Page 15 1220057 V. Description of the invention (12)-f Ϊ t Ming suction type powder processing device, the liquid of the reactive powder in the reaction tube; space (for example-inside the reaction tube), Bo, such as a & Under the coating of the i-body, it reacts with the liquid. No situation, and it is possible; Exemption: End = full reaction of the powder to raise leakage and cause accidental combustion; furthermore,: i dangerous combustion gas explosion or endless environment. In addition, it is not easy to spread 'so as not to endanger people and it can be completed in 30 minutes, because the powder of the device requires only two human forces and warfare, thereby greatly improving efficiency. : Shihu [Description, use _ preferred embodiments to explain the scope of the invention in detail, and those skilled in the art will be able to understand and limit and make slight changes & $ & Therefore, the essence of the present invention will still be maintained without departing from the spirit and scope of the present invention. For example, at the end of the processing of J Yiwei ... The Γ factory or other reactive industrial powders can use the method of the present invention and the liquid in the reaction tube, not limited to water, 5 The characteristics of the powder to be treated are selected.可端 1220057 Brief description of the drawings By combining the following detailed description with the attached drawings, the above technical content and many advantages of the present invention can be easily understood, among which: Figure 1 is a schematic diagram of a reaction chamber connected to a pump; 2. It is a schematic cross-sectional view of the structure of the powder processing device of the present invention; and FIG. 3 is a schematic top view of a tube connected to a feeding device of the powder processing device of the present invention. Description of component drawing number: 1 reaction chamber 2 pump 3 collector 10 powder processing device 11 feeding device 111 hole 113 ring groove 114 feeding pipe 1 15 main body 12 pump 121 submerged pipe 122 conveying pipe 13 reaction pipe 131 first end Point 1 3 2 Opening 133 Second end 14 Liquid tank 15 Filter element 16 Exhaust port 1 7 Liquid concentration element 1 8 Side pipe 181 Switch control valve 19 Cover 25 Liquid discharge port 26 Liquid supply port dl Diameter of the reaction tube d2 diameter of feed pipe

第17頁Page 17

Claims

1220057 六、申請專利範圍 1. 一種吸入式粉末處理裝置，包括：一進料裝置，其具有一主體和一進料管，其中該主體係與該進料管之一端連接，用以送入一待處理之粉末；一反應管，具有一供液體流出之第一管口、一供液體進入之第二管口和一開口，其中，該開口係界於該第一管口和該第二管口之間且與該進料裝置之該進料管相連接；一液體槽，其係設置於該反應管之該第一管口下方，且該液體槽中具有一液體；以及一過濾元件，設置於該反應管之該第一管口與該液體槽之間。 2. 如申請專利範圍第1項所述之吸入式粉末處理裝置，更包含一泵，其具有一沉水管及一輸送管，其中該沉水管之一端沉入該液體槽之液體表面之下，而該輸送管之一端係與該反應管之該第二管口連接。 3. 如申請專利範圍第1項所述之吸入式粉末處理裝置，其中，該液體槽内之液體係為可與該待處理之粉末發生反應之液體。 4. 如申請專利範圍第1項所述之吸入式粉末處理裝置，其中5該液體槽内之液體係為水、酸液或驗液。 5.如申請專利範圍第1項所述之吸入式粉末處理裝置，其1220057 6. Scope of patent application 1. A suction type powder processing device, comprising: a feeding device having a main body and a feeding tube, wherein the main system is connected to one end of the feeding tube for feeding into a Powder to be treated; a reaction tube having a first nozzle for liquid to flow out, a second nozzle for liquid to enter and an opening, wherein the opening is bounded by the first nozzle and the second tube Between the mouths and connected to the feeding tube of the feeding device; a liquid tank, which is arranged below the first nozzle of the reaction tube, and has a liquid in the liquid tank; and a filter element, It is arranged between the first nozzle of the reaction tube and the liquid tank. 2. The suction type powder processing device as described in item 1 of the scope of patent application, further comprising a pump having a submerged pipe and a conveying pipe, wherein one end of the submerged pipe is sunk below the liquid surface of the liquid tank, One end of the delivery tube is connected to the second nozzle of the reaction tube. 3. The inhalation type powder processing device as described in item 1 of the scope of patent application, wherein the liquid system in the liquid tank is a liquid that can react with the powder to be processed. 4. The inhaled powder processing device as described in item 1 of the scope of patent application, wherein the liquid system in the liquid tank is water, acid or test liquid. 5. The inhaled powder processing device according to item 1 of the scope of patent application, which

第18頁 1220057 六、申請專利範圍中，該反應管為一螺旋狀反應管道。 6 ·如申請專利範圍第1項所述之吸入式粉末處理裝置，其中，該進料裝置之該進料管之管徑小於該反應管之管徑。 7. 如申請專利範圍第6項所述之吸入式粉末處理裝置，其中，該進料裝置之該進料管之管徑大於該反應管之管徑的一半。 8. 如申請專利範圍第1項所述之吸入式粉末處理裝置，進一步包括一液體集中元件，其係設置於該反應管之該第一管口與該過濾元件之間。 9. 如申請專利範圍第1項所述之吸入式粉末處理裝置，進一步包括一罩體，用以罩護該反應管，且該罩體具有一排氣口，用以排放反應所生成的氣體。 1 0.如申請專利範圍第1項所述之吸入式粉末處理裝置，其中，該液體槽進一步包括一液體補給口和一液體排放口。 11.如申請專利範圍第2項所述之吸入式粉末處理裝置，其中，該進料裝置進一步包括：一孔洞，其係設置於該主體上側方；及一環狀凹槽，其係設置該孔洞下方，並環繞於該主體内Page 18 1220057 6. In the scope of patent application, the reaction tube is a spiral reaction tube. 6. The suction type powder processing device according to item 1 of the scope of patent application, wherein the diameter of the feeding tube of the feeding device is smaller than the diameter of the reaction tube. 7. The suction-type powder processing device according to item 6 of the scope of patent application, wherein the diameter of the feeding tube of the feeding device is larger than half of the diameter of the reaction tube. 8. The inhalation type powder processing device according to item 1 of the scope of patent application, further comprising a liquid concentration element, which is disposed between the first nozzle of the reaction tube and the filter element. 9. The inhalation type powder processing device according to item 1 of the scope of patent application, further comprising a cover for covering the reaction tube, and the cover having an exhaust port for discharging the gas generated by the reaction . 10. The inhalation type powder processing device according to item 1 of the scope of patent application, wherein the liquid tank further includes a liquid supply port and a liquid discharge port. 11. The inhaled powder processing device according to item 2 of the scope of patent application, wherein the feeding device further comprises: a hole provided on the upper side of the main body; and a ring-shaped groove provided on the Below the hole and surround the body

第19頁 1220057 六、申請專利範圍侧。 1 2 ·如申請專利範圍第1 1項所述之吸入式粉末處理裝置，進一步包含一側管，其一端與該泵之輸送管相連接，而另一端與該進料裝置之孔洞相連接。 1 3 ·如申請專利範圍第1 2項所述之吸入式粉末處理裝置，其中，該側管具有一開關控制閥。 1 4 ·如申請專利範圍第1項所述之吸入式粉末處理裝置，其中，該過濾元件可向外側抽出。 1 5. —種吸入式粉末處理裝置，包括：一粉末進料裝置，其係用來送入一待處理之粉末；一反應管，其係與該粉末進料裝置相連接，並有一液體以一預定速度流經該反應管内，以便被送入之該待處理之粉末在該反應管内進行反應；一過濾元件，其係用來過濾由該反應管所排出之反應生成物；以及一液體槽，其係用來接收由該過濾元件所濾出之液態物質；其中，使該液體流經該反應管内時，在該反應管與該粉末進料裝置相連接之處，產生白努力定律之吸真空效應，以Page 19 1220057 6. Scope of patent application. 1 2 · The suction type powder processing device as described in item 11 of the scope of patent application, further comprising a side tube, one end of which is connected to the pump's delivery tube, and the other end is connected to the hole of the feeding device. 1 3 · The suction-type powder processing device according to item 12 of the scope of patent application, wherein the side pipe has an on-off control valve. 1 4 · The suction type powder processing device according to item 1 of the scope of patent application, wherein the filter element can be withdrawn to the outside. 1 5. A suction type powder processing device, comprising: a powder feeding device for feeding a powder to be processed; a reaction tube connected to the powder feeding device, and a liquid for A predetermined speed flows through the reaction tube, so that the powder to be processed is reacted in the reaction tube; a filter element is used to filter the reaction product discharged from the reaction tube; and a liquid tank , Which is used to receive the liquid substance filtered by the filter element; wherein, when the liquid flows through the reaction tube, where the reaction tube is connected to the powder feeding device, a suction of white effort law is generated. Vacuum effect

第20頁 1220057Page 20 1220057

第21頁Page 21

1220057 六、申請專利範圍 2 3.如申請專利範圍第2 2項所述之裝置，其中，該侧管係連接到該泵，並具有一開關控制閥。 2 4.如申請專利範圍第2 2項所述之裝置，其中，該粉末進料裝置之上方内側設置一環形凹槽，用以使來自該側管的液體，流入該環形凹槽再經溢流後，從四面八方清洗該粉末進料裝置。 2 5 ·如申請專利範圍第1 5項所述之裝置，還進一步包括一罩體，用以罩護該反應管，且該罩體具有一排氣口，用以排放反應所生成的氣體。 2 6.如申請專利範圍第1 9項所述之裝置，其中，該泵係為一沈水式泵。 2 7.如申請專利範圍第1 5項所述之裝置，還進一步包括一液體補給口，其係設置在該粉末處理裝置之一適當處，以便補充液體至該液體槽内。 2 8.如申請專利範圍第1 5項所述之裝置，還進一步包括一液體排放口’用以排放該液體槽内之液態物質。 2 9. —種吸入式粉末處理方法，其係藉由使送入一反應管1220057 6. Scope of patent application 2 3. The device according to item 22 of the scope of patent application, wherein the side pipe is connected to the pump and has an on-off control valve. 2 4. The device according to item 22 of the scope of patent application, wherein an annular groove is provided on the upper and inner side of the powder feeding device, so that the liquid from the side pipe flows into the annular groove and then overflows. After the flow, the powder feeder was cleaned from all sides. 25. The device according to item 15 of the scope of patent application, further comprising a cover for protecting the reaction tube, and the cover has an exhaust port for discharging the gas generated by the reaction. 2 6. The device according to item 19 of the scope of patent application, wherein the pump is a submersible pump. 2 7. The device according to item 15 of the scope of patent application, further comprising a liquid supply port which is provided at an appropriate place of the powder processing device so as to replenish liquid into the liquid tank. 2 8. The device according to item 15 of the scope of patent application, further comprising a liquid discharge port 'for discharging liquid substances in the liquid tank. 2 9. —Inhalation type powder processing method by feeding into a reaction tube

1220057 六、申請專利範圍内的一液體以一預定速度流過該反應管，而在一粉末進料裝置與該反應管交界處，產生白努力定律之吸真空效應，來將粉末吸入該反應管内，並在該反應管内液體的包覆下，進行反應處理。 3 0.如申請專利範圍第2 9項所述之方法，其中，該粉末係為一反應性粉末，並與該液體發生反應。 3 1.如申請專利範圍第2 9項所述之方法，其中，在吸入該粉末的同時，也將含氧空氣吸進該反應管内，與該粉末發生反應。 3 2.如申請專利範圍第2 9項所述之方法，其中，該粉末係為一可燃性和水溶性粉末，而該液體係為水。 3 3.如申請專利範圍第2 9項所述之方法，其中，該反應管係為一螺旋狀反應管，以使反應完全。 3 4. —種吸入式粉末處理方法，其係藉由如申請專利範圍第1或1 5項所述之吸入式粉末處理裝置，來將粉末吸入該反應管内，並在該反應管内液體的包覆下，進行反應處理。1220057 VI. A liquid within the scope of the patent application flows through the reaction tube at a predetermined speed, and at the junction of a powder feeding device and the reaction tube, a vacuum effect of the white force law is generated to suck the powder into the reaction tube. And under the coating of the liquid in the reaction tube, the reaction treatment is performed. 30. The method according to item 29 of the scope of patent application, wherein the powder is a reactive powder and reacts with the liquid. 3 1. The method according to item 29 of the scope of patent application, wherein, while inhaling the powder, oxygen-containing air is also sucked into the reaction tube to react with the powder. 3 2. The method according to item 29 of the scope of patent application, wherein the powder is a flammable and water-soluble powder, and the liquid system is water. 3 3. The method according to item 29 of the scope of patent application, wherein the reaction tube is a spiral reaction tube to complete the reaction. 3 4. A suction type powder processing method, which uses the suction type powder processing device as described in item 1 or 15 of the patent application scope to suck powder into the reaction tube, and packs the liquid in the reaction tube. Cover and perform a reaction treatment.

第23頁Page 23