TW200715375A - Low-temperature catalyzed formation of segmented nanowire of dielectric material - Google Patents
Low-temperature catalyzed formation of segmented nanowire of dielectric materialInfo
- Publication number
- TW200715375A TW200715375A TW095123863A TW95123863A TW200715375A TW 200715375 A TW200715375 A TW 200715375A TW 095123863 A TW095123863 A TW 095123863A TW 95123863 A TW95123863 A TW 95123863A TW 200715375 A TW200715375 A TW 200715375A
- Authority
- TW
- Taiwan
- Prior art keywords
- dielectric material
- low
- substrate
- segmented nanowire
- temperature catalyzed
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/005—Growth of whiskers or needles
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/04—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
- C30B11/08—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
- C30B11/12—Vaporous components, e.g. vapour-liquid-solid-growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/10—Heating of the reaction chamber or the substrate
- C30B25/105—Heating of the reaction chamber or the substrate by irradiation or electric discharge
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/38—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
- C30B29/605—Products containing multiple oriented crystallites, e.g. columnar crystallites
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/174,076 US20070004225A1 (en) | 2005-06-30 | 2005-06-30 | Low-temperature catalyzed formation of segmented nanowire of dielectric material |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200715375A true TW200715375A (en) | 2007-04-16 |
TWI335619B TWI335619B (en) | 2011-01-01 |
Family
ID=37313897
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095123863A TWI335619B (en) | 2005-06-30 | 2006-06-30 | Low-temperature catalyzed formation of segmented nanowire of dielectric material |
Country Status (3)
Country | Link |
---|---|
US (2) | US20070004225A1 (zh) |
TW (1) | TWI335619B (zh) |
WO (1) | WO2007005816A2 (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI452008B (zh) * | 2010-03-03 | 2014-09-11 | Huang Chung Cheng | 奈米結構的製造方法及奈米結構於三維結構之應用 |
TWI495612B (zh) * | 2013-01-04 | 2015-08-11 | Univ Nat Chiao Tung | 一維鈦金屬奈米結構及其製造方法 |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU2006343556B2 (en) * | 2005-12-29 | 2012-06-21 | Oned Material, Inc. | Methods for oriented growth of nanowires on patterned substrates |
US20080093693A1 (en) * | 2006-10-20 | 2008-04-24 | Kamins Theodore I | Nanowire sensor with variant selectively interactive segments |
WO2009143406A2 (en) * | 2008-05-22 | 2009-11-26 | Massachusetts Institute Of Technology | Monolayer-coated surfaces as catalytic platforms for organic reactions |
KR101027012B1 (ko) * | 2008-10-16 | 2011-04-11 | 한국과학기술연구원 | 기울어진 마이크로 기둥 배열이 형성된 고분자 및 이를위한 제작 방법 |
US8623288B1 (en) | 2009-06-29 | 2014-01-07 | Nanosys, Inc. | Apparatus and methods for high density nanowire growth |
US8569900B2 (en) * | 2009-07-20 | 2013-10-29 | Hewlett-Packard Development Company, L.P. | Nanowire sensor with angled segments that are differently functionalized |
US9463433B2 (en) * | 2013-06-24 | 2016-10-11 | Jefferson Science Associates, Llc | Nano-materials for adhesive-free adsorbers for bakable extreme high vacuum cryopump surfaces |
US9776865B2 (en) | 2013-11-01 | 2017-10-03 | Bnnt, Llc | Induction-coupled plasma synthesis of boron nitride nanotubes |
KR101771872B1 (ko) | 2014-04-24 | 2017-08-25 | 비엔엔티 엘엘씨 | 연속 질화붕소 나노튜브 섬유 |
CA2968358C (en) | 2014-11-01 | 2022-10-18 | Bnnt, Llc | Target holders, multiple-incidence angle, and multizone heating for bnnt synthesis |
KR20230048460A (ko) | 2014-12-17 | 2023-04-11 | 비엔엔티 엘엘씨 | 질화붕소 나노튜브 강화 전기 부품 |
CA2985795C (en) | 2015-05-13 | 2023-11-07 | Bnnt, Llc | Boron nitride nanotube neutron detector |
CA2986250C (en) | 2015-05-21 | 2024-01-02 | Bnnt, Llc | Boron nitride nanotube synthesis via direct induction |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5530846A (en) * | 1978-08-28 | 1980-03-04 | Hitachi Ltd | Method for manufacturing fixed memory |
US7135728B2 (en) * | 2002-09-30 | 2006-11-14 | Nanosys, Inc. | Large-area nanoenabled macroelectronic substrates and uses therefor |
US7608147B2 (en) * | 2003-04-04 | 2009-10-27 | Qunano Ab | Precisely positioned nanowhiskers and nanowhisker arrays and method for preparing them |
US7091120B2 (en) * | 2003-08-04 | 2006-08-15 | Nanosys, Inc. | System and process for producing nanowire composites and electronic substrates therefrom |
DE10335813B4 (de) * | 2003-08-05 | 2009-02-12 | Infineon Technologies Ag | IC-Chip mit Nanowires |
US7923109B2 (en) * | 2004-01-05 | 2011-04-12 | Board Of Regents, The University Of Texas System | Inorganic nanowires |
US7355235B2 (en) * | 2004-12-22 | 2008-04-08 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device and method for high-k gate dielectrics |
-
2005
- 2005-06-30 US US11/174,076 patent/US20070004225A1/en not_active Abandoned
-
2006
- 2006-06-29 WO PCT/US2006/025957 patent/WO2007005816A2/en active Application Filing
- 2006-06-30 TW TW095123863A patent/TWI335619B/zh not_active IP Right Cessation
-
2008
- 2008-12-05 US US12/315,733 patent/US20090093131A1/en not_active Abandoned
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI452008B (zh) * | 2010-03-03 | 2014-09-11 | Huang Chung Cheng | 奈米結構的製造方法及奈米結構於三維結構之應用 |
TWI495612B (zh) * | 2013-01-04 | 2015-08-11 | Univ Nat Chiao Tung | 一維鈦金屬奈米結構及其製造方法 |
US9725825B2 (en) | 2013-01-04 | 2017-08-08 | National Chiao Tung University | One-dimensional titanium nanostructure and method for fabricating the same |
Also Published As
Publication number | Publication date |
---|---|
US20090093131A1 (en) | 2009-04-09 |
WO2007005816A3 (en) | 2007-07-12 |
WO2007005816A2 (en) | 2007-01-11 |
US20070004225A1 (en) | 2007-01-04 |
TWI335619B (en) | 2011-01-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |