TW200705119A - A method for increasing optical stability of three-dimensional micro moldings - Google Patents

A method for increasing optical stability of three-dimensional micro moldings

Info

Publication number
TW200705119A
TW200705119A TW095116293A TW95116293A TW200705119A TW 200705119 A TW200705119 A TW 200705119A TW 095116293 A TW095116293 A TW 095116293A TW 95116293 A TW95116293 A TW 95116293A TW 200705119 A TW200705119 A TW 200705119A
Authority
TW
Taiwan
Prior art keywords
moldings
dimensional micro
optical
optical stability
transparency
Prior art date
Application number
TW095116293A
Other languages
English (en)
Other versions
TWI347499B (en
Inventor
Takahiro Asai
Toru Takahashi
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200705119A publication Critical patent/TW200705119A/zh
Application granted granted Critical
Publication of TWI347499B publication Critical patent/TWI347499B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B30/00—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials For Photolithography (AREA)
TW095116293A 2005-05-12 2006-05-08 A method for increasing optical stability of three-dimensional micro moldings TWI347499B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005139913 2005-05-12

Publications (2)

Publication Number Publication Date
TW200705119A true TW200705119A (en) 2007-02-01
TWI347499B TWI347499B (en) 2011-08-21

Family

ID=37396620

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095116293A TWI347499B (en) 2005-05-12 2006-05-08 A method for increasing optical stability of three-dimensional micro moldings

Country Status (7)

Country Link
US (1) US20090068600A1 (zh)
JP (1) JP4583449B2 (zh)
KR (1) KR101012574B1 (zh)
CN (1) CN101171550B (zh)
DE (1) DE112006001162T5 (zh)
TW (1) TWI347499B (zh)
WO (1) WO2006121112A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI815946B (zh) * 2018-08-30 2023-09-21 日商日產化學股份有限公司 負型感光性樹脂組成物

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009047789A (ja) * 2007-08-16 2009-03-05 Jsr Corp ドライフィルムおよびマイクロレンズとその製法
CN103207544B (zh) * 2012-01-13 2015-08-12 昆山允升吉光电科技有限公司 一种干膜显影工艺
CN107532302B (zh) * 2015-03-31 2019-10-08 日产化学工业株式会社 感光性非电解镀基底剂

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US3984244A (en) * 1974-11-27 1976-10-05 E. I. Du Pont De Nemours And Company Process for laminating a channeled photosensitive layer on an irregular surface
US4619804A (en) * 1985-04-15 1986-10-28 Eastman Kodak Company Fabricating optical record media
JPH07268177A (ja) 1994-02-08 1995-10-17 Toray Ind Inc 微小立体成形用樹脂組成物および微小立体の製造方法
JPH07281181A (ja) * 1994-04-11 1995-10-27 Toray Ind Inc 面状光学素子の製造方法
WO1998005712A1 (fr) * 1996-08-02 1998-02-12 Toppan Printing Co., Ltd. Composition de resine photosensible noire, filtre couleur produit a l'aide de celle-ci et son procede de production
JP2000162747A (ja) * 1998-11-24 2000-06-16 Fuji Photo Film Co Ltd カラー写真感光材料
DE19940921A1 (de) * 1999-08-27 2001-03-01 Agfa Gevaert Ag Photopolymerisierbares Gemisch und damit hergestelltes Aufzeichnungsmaterial
JP2001158022A (ja) * 1999-12-03 2001-06-12 Ricoh Opt Ind Co Ltd 曲面形成方法および光学素子
SG97168A1 (en) * 1999-12-15 2003-07-18 Ciba Sc Holding Ag Photosensitive resin composition
JP2001264529A (ja) * 2000-03-22 2001-09-26 Mitsubishi Chemicals Corp カラーフィルターの製造方法
JP2001290014A (ja) * 2000-04-04 2001-10-19 Nikon Corp 光学素子の製造方法及び製造システム並びにこの製造方法を用いて製作された光学素子及びこの光学素子を用いた露光装置
JP2002162747A (ja) * 2000-11-27 2002-06-07 Ricoh Opt Ind Co Ltd 多段階露光による三次元構造体製造方法
JP4153159B2 (ja) 2000-12-18 2008-09-17 富士フイルム株式会社 ネガ型感光性熱硬化性樹脂組成物、ネガ型感光性熱硬化性樹脂層転写材料、及びネガ型耐性画像形成方法
EP1395615B1 (en) * 2001-06-11 2009-10-21 Basf Se Oxime ester photoinitiators having a combined structure
JP4312598B2 (ja) * 2001-07-26 2009-08-12 チバ ホールディング インコーポレーテッド 感光性樹脂組成物
DE60336216D1 (de) * 2002-04-18 2011-04-14 Nissan Chemical Ind Ltd Positiv lichtempfindliche harzzusammensetzung und verfahren zur strukturausbildung
JP2004334184A (ja) * 2003-04-16 2004-11-25 Sharp Corp 三次元構造物形成方法および露光装置
JP4561280B2 (ja) * 2004-09-24 2010-10-13 日立化成工業株式会社 マイクロレンズアレイの製造方法、マイクロレンズアレイ用感光性樹脂組成物及びマイクロレンズアレイ用感光性エレメント

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI815946B (zh) * 2018-08-30 2023-09-21 日商日產化學股份有限公司 負型感光性樹脂組成物

Also Published As

Publication number Publication date
CN101171550B (zh) 2012-07-18
KR20070120567A (ko) 2007-12-24
WO2006121112A1 (ja) 2006-11-16
TWI347499B (en) 2011-08-21
US20090068600A1 (en) 2009-03-12
JP4583449B2 (ja) 2010-11-17
JPWO2006121112A1 (ja) 2008-12-18
CN101171550A (zh) 2008-04-30
KR101012574B1 (ko) 2011-02-07
DE112006001162T5 (de) 2008-08-21

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