SG103919A1 - Method, system, and apparatus for management of reaction loads in a lithography system - Google Patents
Method, system, and apparatus for management of reaction loads in a lithography systemInfo
- Publication number
- SG103919A1 SG103919A1 SG200301632A SG200301632A SG103919A1 SG 103919 A1 SG103919 A1 SG 103919A1 SG 200301632 A SG200301632 A SG 200301632A SG 200301632 A SG200301632 A SG 200301632A SG 103919 A1 SG103919 A1 SG 103919A1
- Authority
- SG
- Singapore
- Prior art keywords
- management
- reaction loads
- lithography
- lithography system
- loads
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Public Health (AREA)
- Toxicology (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Linear Motors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/095,070 US6784978B2 (en) | 2002-03-12 | 2002-03-12 | Method, system, and apparatus for management of reaction loads in a lithography system |
Publications (1)
Publication Number | Publication Date |
---|---|
SG103919A1 true SG103919A1 (en) | 2004-05-26 |
Family
ID=27765387
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200301632A SG103919A1 (en) | 2002-03-12 | 2003-03-10 | Method, system, and apparatus for management of reaction loads in a lithography system |
Country Status (8)
Country | Link |
---|---|
US (3) | US6784978B2 (zh) |
EP (1) | EP1345083B1 (zh) |
JP (1) | JP2003318103A (zh) |
KR (1) | KR100766059B1 (zh) |
CN (1) | CN100349068C (zh) |
DE (1) | DE60314557T2 (zh) |
SG (1) | SG103919A1 (zh) |
TW (1) | TWI293182B (zh) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6246204B1 (en) * | 1994-06-27 | 2001-06-12 | Nikon Corporation | Electromagnetic alignment and scanning apparatus |
US6538720B2 (en) * | 2001-02-28 | 2003-03-25 | Silicon Valley Group, Inc. | Lithographic tool with dual isolation system and method for configuring the same |
US7271879B2 (en) * | 2001-09-24 | 2007-09-18 | Agency For Science, Technology And Research | Decoupled planar positioning system |
US6757110B2 (en) | 2002-05-29 | 2004-06-29 | Asml Holding N.V. | Catadioptric lithography system and method with reticle stage orthogonal to wafer stage |
JP4307886B2 (ja) * | 2003-04-03 | 2009-08-05 | オリンパス株式会社 | 電磁駆動型アクチュエータ |
WO2004109780A1 (ja) * | 2003-06-04 | 2004-12-16 | Nikon Corporation | ステージ装置、固定方法、露光装置、露光方法、及びデバイスの製造方法 |
US7119884B2 (en) * | 2003-12-24 | 2006-10-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7315032B2 (en) * | 2004-05-18 | 2008-01-01 | Asml Netherlands B.V. | Lithographic apparatus and a device manufacturing method |
JP2006120798A (ja) * | 2004-10-20 | 2006-05-11 | Canon Inc | 露光装置 |
FR2912375B1 (fr) * | 2007-02-14 | 2009-12-18 | Eurocopter France | Verin electrique de commande de vol pour aeronef |
US7636170B1 (en) * | 2008-09-12 | 2009-12-22 | National Formosa University | Static/dynamic multi-function measuring device for linear unit |
JP5295855B2 (ja) * | 2009-04-28 | 2013-09-18 | 住友重機械工業株式会社 | 反力処理機構 |
DE102011016304B4 (de) * | 2010-10-22 | 2015-05-07 | Institut für Mikroelektronik- und Mechatronik-Systeme gGmbH | Vorrichtung für einen Mehrkoordinatenantrieb |
US20140133897A1 (en) * | 2012-11-12 | 2014-05-15 | Micheal Brendan O Ceallaigh | Flexurally mounted kinematic coupling with improved repeatability |
US10837492B2 (en) | 2015-11-02 | 2020-11-17 | The Regents Of The University Of Michigan | Axially compliant bearing for precision positioning |
US11231070B2 (en) | 2015-11-02 | 2022-01-25 | The Regents Of The University Of Michigan | Axially compliant bearing for precision positioning |
WO2017217960A1 (en) | 2016-06-13 | 2017-12-21 | Intel Corporation | Josephson junction damascene fabrication |
US10192773B2 (en) * | 2016-06-20 | 2019-01-29 | Nexperia B.V. | Semiconductor device positioning system and method for semiconductor device positioning |
US10564553B2 (en) * | 2017-09-26 | 2020-02-18 | Guangdong University Of Technology | Large load-bearing guide mechanism and multi-DOF large-stroke high-precision motion platform system |
CN113703377B (zh) * | 2021-10-28 | 2022-02-18 | 北京惠朗时代科技有限公司 | 一种校正*** |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5909272A (en) * | 1996-08-02 | 1999-06-01 | Canon Kabushiki Kaisha | Stage and exposure apparatus using same |
US5939852A (en) * | 1996-08-29 | 1999-08-17 | Canon Kabushiki Kaisha | Stage feeding device |
US20010020684A1 (en) * | 1998-08-14 | 2001-09-13 | Hazelton Andrew J. | Reaction force isolation system |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20684A (en) * | 1858-06-22 | Improvement in sewing-machines | ||
US864389A (en) * | 1906-10-10 | 1907-08-27 | John B Scozzafava | Ink-well. |
US4952858A (en) * | 1988-05-18 | 1990-08-28 | Galburt Daniel N | Microlithographic apparatus |
US5298939A (en) | 1991-11-04 | 1994-03-29 | Swanson Paul A | Method and apparatus for transfer of a reticle pattern onto a substrate by scanning |
US5285142A (en) * | 1993-02-09 | 1994-02-08 | Svg Lithography Systems, Inc. | Wafer stage with reference surface |
JPH07140753A (ja) * | 1993-11-19 | 1995-06-02 | Fujitsu Ltd | カラー画像形成装置 |
US5874820A (en) * | 1995-04-04 | 1999-02-23 | Nikon Corporation | Window frame-guided stage mechanism |
US6246204B1 (en) | 1994-06-27 | 2001-06-12 | Nikon Corporation | Electromagnetic alignment and scanning apparatus |
KR100399812B1 (ko) | 1994-10-11 | 2003-12-01 | 가부시키가이샤 니콘 | 스테이지용진동방지장치 |
DE69629087T2 (de) * | 1995-05-30 | 2004-04-22 | Asml Netherlands B.V. | Positionierungsgerät mit einem referenzrahmen für ein messsystem |
US5806193A (en) * | 1995-11-09 | 1998-09-15 | Nikon Corporation | Tilt and movement apparatus using flexure and air cylinder |
JP3634483B2 (ja) | 1996-02-13 | 2005-03-30 | キヤノン株式会社 | ステージ装置、及びこれを用いた露光装置やデバイス生産方法 |
JP3659529B2 (ja) * | 1996-06-06 | 2005-06-15 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
JPH1089403A (ja) | 1996-09-10 | 1998-04-07 | Nikon Corp | 防振装置 |
JPH10339976A (ja) * | 1997-06-05 | 1998-12-22 | Minolta Co Ltd | 画像形成装置 |
JP3554186B2 (ja) * | 1998-04-08 | 2004-08-18 | キヤノン株式会社 | 露光装置、デバイス製造方法および反力受け方法 |
JPH11315883A (ja) * | 1998-04-30 | 1999-11-16 | Canon Inc | 除振装置、露光装置およびデバイス製造方法 |
CN2393123Y (zh) * | 1999-11-01 | 2000-08-23 | ***电子第五十五研究所 | 大面积步进扫描式曝光机 |
US6307619B1 (en) * | 2000-03-23 | 2001-10-23 | Silicon Valley Group, Inc. | Scanning framing blade apparatus |
US6538720B2 (en) | 2001-02-28 | 2003-03-25 | Silicon Valley Group, Inc. | Lithographic tool with dual isolation system and method for configuring the same |
-
2002
- 2002-03-12 US US10/095,070 patent/US6784978B2/en not_active Expired - Lifetime
-
2003
- 2003-03-06 TW TW092104834A patent/TWI293182B/zh active
- 2003-03-10 SG SG200301632A patent/SG103919A1/en unknown
- 2003-03-11 DE DE60314557T patent/DE60314557T2/de not_active Expired - Fee Related
- 2003-03-11 EP EP03005312A patent/EP1345083B1/en not_active Expired - Fee Related
- 2003-03-12 CN CNB031200826A patent/CN100349068C/zh not_active Expired - Fee Related
- 2003-03-12 KR KR1020030015380A patent/KR100766059B1/ko not_active IP Right Cessation
- 2003-03-12 JP JP2003067367A patent/JP2003318103A/ja not_active Ceased
-
2004
- 2004-05-11 US US10/842,513 patent/US6885435B2/en not_active Expired - Fee Related
-
2005
- 2005-04-21 US US11/110,903 patent/US6989889B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5909272A (en) * | 1996-08-02 | 1999-06-01 | Canon Kabushiki Kaisha | Stage and exposure apparatus using same |
US5939852A (en) * | 1996-08-29 | 1999-08-17 | Canon Kabushiki Kaisha | Stage feeding device |
US20010020684A1 (en) * | 1998-08-14 | 2001-09-13 | Hazelton Andrew J. | Reaction force isolation system |
Also Published As
Publication number | Publication date |
---|---|
US6784978B2 (en) | 2004-08-31 |
DE60314557D1 (de) | 2007-08-09 |
EP1345083A3 (en) | 2003-10-29 |
EP1345083A2 (en) | 2003-09-17 |
DE60314557T2 (de) | 2007-10-25 |
US20040207830A1 (en) | 2004-10-21 |
JP2003318103A (ja) | 2003-11-07 |
CN1447192A (zh) | 2003-10-08 |
TW200305194A (en) | 2003-10-16 |
EP1345083B1 (en) | 2007-06-27 |
KR100766059B1 (ko) | 2007-10-11 |
US20050185163A1 (en) | 2005-08-25 |
TWI293182B (en) | 2008-02-01 |
US6989889B2 (en) | 2006-01-24 |
US6885435B2 (en) | 2005-04-26 |
US20030174304A1 (en) | 2003-09-18 |
KR20040002460A (ko) | 2004-01-07 |
CN100349068C (zh) | 2007-11-14 |
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