KR20160132548A - An Apparatus for Grinding a Lead Frame and a Method for Grinding a Lead Frame - Google Patents
An Apparatus for Grinding a Lead Frame and a Method for Grinding a Lead Frame Download PDFInfo
- Publication number
- KR20160132548A KR20160132548A KR1020150065190A KR20150065190A KR20160132548A KR 20160132548 A KR20160132548 A KR 20160132548A KR 1020150065190 A KR1020150065190 A KR 1020150065190A KR 20150065190 A KR20150065190 A KR 20150065190A KR 20160132548 A KR20160132548 A KR 20160132548A
- Authority
- KR
- South Korea
- Prior art keywords
- lead frame
- roller
- coating
- grinding
- belt
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 31
- 238000000576 coating method Methods 0.000 claims abstract description 170
- 239000011248 coating agent Substances 0.000 claims abstract description 168
- 229910003460 diamond Inorganic materials 0.000 claims description 6
- 239000010432 diamond Substances 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 229920006336 epoxy molding compound Polymers 0.000 abstract description 11
- 239000004065 semiconductor Substances 0.000 abstract description 9
- 239000000463 material Substances 0.000 description 10
- 238000005498 polishing Methods 0.000 description 8
- 230000005540 biological transmission Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000003082 abrasive agent Substances 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- 239000011253 protective coating Substances 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
Abstract
The present invention relates to a lead frame grinding apparatus and a lead frame grinding method therefor, and more particularly, to a lead frame grinding apparatus and a lead frame grinding method for grinding an epoxy molding compound (EMC) coated on a lead frame of a semiconductor to form a uniform coated surface. To a grinding apparatus and a lead frame grinding method therefor. The lead frame grinding apparatus includes a transfer unit (18) for transferring a lead frame having a coating surface; A balance coating roller (11) disposed below the transfer unit (18) so as to be able to contact the surface of the lead frame; And a grinding coating belt 123 disposed above the transfer unit 18 and arranged to be movable up and down. The balance coating roller 11 and the grinding coating belt 123 are operated by different drive units And is rotated by the operation roller 13 and the back-up roller 162 which are driven by the driving force.
Description
The present invention relates to a lead frame grinding apparatus and a lead frame grinding method therefor, and more particularly, to a lead frame grinding apparatus and a lead frame grinding method for grinding an epoxy molding compound (EMC) coated on a lead frame of a semiconductor to form a uniform coated surface. To a grinding apparatus and a lead frame grinding method therefor.
The lead frame functions as a conductor for connecting the semiconductor chip to an external circuit, and simultaneously functions as a frame for fixing the semiconductor package to the electronic circuit board. The semiconductor chip disposed in the lead frame or the lead frame may be coated with an epoxy molding compound (EMC) to protect it from the external environment. During the coating process, the lead frame may be partially overcoated. This overcoated portion reduces the level of surface uniformity of the lead frame surface and can lead to defects in the semiconductor package. Therefore, the overcoated portion needs to be polished.
Prior art related to a semiconductor lead frame is disclosed in Patent Publication No. 1999-0002969. The prior art includes a first step of exposing a coin to be electrolytically polished using a mask; A second step of applying a predetermined potential between the coining portion and the machining electrode; A third step of spraying an electrolytic polishing solution on the exposed coin part to perform electrolytic polishing; And a fourth step of separating the mask from the lead frame after electrolytic polishing is performed on the coining portion.
Japanese Patent Application Laid-Open No. 10-2006-0112307 discloses a method of manufacturing a semiconductor device, comprising: a patterning step of integrally forming a plurality of leads on a prepared base material and a tip connecting portion interconnecting tips of the leads; And a step of pressing the lead frame by using a mold having a predetermined shape, wherein a cutting process for cutting the leading end connecting portion and a setting process for forming a step up and down with respect to a lead frame portion are performed simultaneously A method of manufacturing a lead frame including a lead frame punching molding process to be performed is disclosed.
The technique related to the lead frame disclosed in the prior art does not disclose a method of making the surface of the lead frame uniform, or has a problem that a complicated process condition is required. The thickness of the lead frame may be, for example, 100 to 300 占 퐉, and the EMC coating thickness may be 60 to 70 占 퐉. A grinding method which is highly reliable and is not complicated in the process is required to form the coating thickness surface of the lead frame having such a thickness level uniformly. The prior art does not disclose a technique or method suitable for such conditions.
The present invention has been made to solve the problems of the prior art and has the following purpose.
An object of the present invention is to provide a lead frame grinding apparatus and a lead frame grinding method by which a uniform coated surface of a lead frame can be formed by contact between a belt surface and a roller surface.
According to a preferred embodiment of the present invention, a lead frame grinding apparatus comprises a transfer unit in which a lead frame having a coating surface is transferred; A balance coating roller disposed under the transfer unit so as to be able to contact the surface of the lead frame; And a grinding coating belt disposed above the transfer unit and arranged so as to be movable up and down. The balance coating roller and the grinding coating belt are rotated by the operation roller and the backup roller which are operated by different drive units.
According to another preferred embodiment of the present invention, a DLC (Diamond Like Carbon) coating is applied along the circumferential surface of the balance coating roller and a diamond coating is applied along the surface of the grinding coating belt.
According to another preferred embodiment of the present invention, a tension adjusting roller for adjusting the tension of the grinding coating belt is further included.
According to another preferred embodiment of the present invention, a method of grinding a lead frame includes the steps of: determining a pressure and a contact gap for grinding the coated surface of the lead frame; Moving the grinding coating belt positioned above the lead frame according to the pressure and the contact interval to adjust the distance between the transfer rollers disposed below the lead frame; Moving the lead frame between the grinding coating belt and the transfer roller by operating the transfer roller; And performing a grinding process on the coating surface of the lead frame while rotating the coating belt in a direction opposite to the rotation direction of the transport roller.
The lead frame grinding apparatus according to the present invention is highly reliable by mechanical polishing and processing while allowing overcoating of the coating surface of the lead frame to be eliminated. In addition, it is possible to control precision while making continuous operation possible. In addition, the grinding apparatus according to the present invention is easy to control the coating thickness while simplifying the polishing process.
Figs. 1A and 1B are a front view and a plan view, respectively, of an embodiment of a grinding apparatus according to the present invention.
FIG. 2A illustrates an example of a process of belt grinding in a grinding apparatus according to the present invention.
FIG. 2B illustrates an example of the progress of roller grinding in the grinding apparatus according to the present invention.
3A and 3B illustrate an embodiment of a grinding method of a lead frame coated surface according to the present invention.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to the embodiments shown in the accompanying drawings, but the present invention is not limited thereto. In the following description, components having the same reference numerals in different drawings have similar functions, so that they will not be described repeatedly unless necessary for an understanding of the invention, and the known components will be briefly described or omitted. However, It should not be understood as being excluded from the embodiment of Fig.
Figs. 1A and 1B are a front view and a plan view, respectively, of an embodiment of a grinding apparatus according to the present invention.
1A and 1B, a grinding apparatus according to the present invention includes a
The grinding apparatus according to the present invention has a function of adjusting the thickness of the coated surface of the lead frame. The adjustment of the thickness includes adjusting the average thickness of the coated surface and adjusting the level of surface uniformity such as average roughness. The surface of the lead frame may be a protective coating, for example, of a synthetic resin material such as an epoxy molding compound (EMC). A coating surface having various protective coatings or other purposes can be formed on the surface of the lead frame, and the grinding apparatus according to the present invention can be applied to the thickness control of various coating surfaces formed on the lead frame surface.
The grinding apparatus according to the present invention may be arranged in a suitable frame and may have various control units or display units for operation. The grinding apparatus can be operated according to a predetermined condition, for example, by a program, and the operating state can be displayed on the display unit. Further, the operating conditions are input through the input unit, whereby the grinding apparatus can be operated. The grinding apparatus according to the present invention is not limited by the operation method or the installation of additional apparatus for operation.
The lead frame for the semiconductor package can be moved along the
The
The surface of the lead frame can be polished or ground by the
The grinding
The
The surface where the grinding
The
The grinding
Various tension control structures can be applied to the grinding apparatus according to the present invention and the present invention is not limited to the embodiments shown.
The lead frame on which the polishing of the coated surface is completed by the grinding
1, the balancing
Various driving apparatuses can be applied to the grinding apparatus according to the present invention, and the present invention is not limited to the illustrated embodiments.
The operation structure of the grinding
FIG. 2A illustrates an example of a process of belt grinding in a grinding apparatus according to the present invention.
Referring to FIG. 2A, the
The grinding
FIG. 2B illustrates an example of the progress of roller grinding in the grinding apparatus according to the present invention.
2B, the
When the
Various transfer structures can be applied to the grinding apparatus according to the present invention and the present invention is not limited to the embodiments shown.
Hereinafter, a grinding method of a lead frame by a grinding apparatus according to the present invention will be described.
3A and 3B illustrate an embodiment of a grinding method of a lead frame coated surface according to the present invention.
FIG. 3A shows a side view of an embodiment of a grinding apparatus according to the present invention, and FIG. 3B shows an embodiment of a process in which a coated surface of a lead frame is ground by the grinding apparatus shown in FIG.
As shown in FIG. 3B, a grinding method of a lead frame according to the present invention includes: a step (P31) of determining a pressure and a contact gap for grinding a coating surface of a lead frame; (P32) moving the grinding coating belt positioned above the lead frame according to the pressure and the contact interval to adjust the distance between the conveying rollers disposed below the lead frame; Moving the lead frame between the grinding coating belt and the transfer roller by operating the transfer roller (P33); And a step (P34) of grinding the coating surface of the lead frame while rotating the coating belt in a direction opposite to the rotation direction of the transport roller.
The leadframe can be, for example, an EMC coating, and can be partially overcoated. The grinding apparatus can improve the surface characteristics of the coated surface of the lead frame while removing such overcoated portions. The pressure and contact interval for grinding mean the pressure on the coating surface of the lead frame of the grinding belt, and the contact interval means the separation distance between the surface of the grinding belt and the
The lead frame can be fed through the inlet and can be conveyed to the
The coated surface of the lead frame can be polished by various methods to improve the surface characteristics and the present invention is not limited to the embodiments shown.
The lead frame grinding apparatus according to the present invention is highly reliable by mechanical polishing and processing while allowing overcoating of the coating surface of the lead frame to be eliminated. In addition, it is possible to control precision while making continuous operation possible. In addition, the grinding apparatus according to the present invention is easy to control the coating thickness while simplifying the polishing process.
While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention . The invention is not limited by these variations and modifications, but is limited only by the claims appended hereto.
11:
13, 13a: Actuation roller 15:
16: drive unit 18:
19: moving
123: grinding coating belt 124: tension adjusting unit
131: rotation shaft 132: power transmission unit
151: clamp unit 152: height adjustment unit
161: rotating shaft 162: backup roller
163: intermediate connection unit 165: power transmission unit
M: Motor R1, R2: Roller unit
Claims (4)
A balance coating roller (11) disposed below the transfer unit (18) so as to be able to contact the surface of the lead frame; And
And a grinding coating belt (123) disposed above the transfer unit (18) and arranged to be movable up and down,
Wherein the balance coating roller (11) and the grinding coating belt (123) are rotated by an actuating roller (13) and backup roller (162) actuated by different drive units.
Moving the grinding coating belt positioned above the lead frame according to the pressure and the contact interval to adjust the distance between the transfer rollers disposed under the lead frame;
Moving the lead frame between the grinding coating belt and the transfer roller by operating the transfer roller; And
And rotating the coating belt in a direction opposite to the rotation direction of the conveying roller while advancing a grinding process on the coating surface of the lead frame.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020150065190A KR101696875B1 (en) | 2015-05-11 | 2015-05-11 | An Apparatus for Grinding a Lead Frame and a Method for Grinding a Lead Frame |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020150065190A KR101696875B1 (en) | 2015-05-11 | 2015-05-11 | An Apparatus for Grinding a Lead Frame and a Method for Grinding a Lead Frame |
Publications (2)
Publication Number | Publication Date |
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KR20160132548A true KR20160132548A (en) | 2016-11-21 |
KR101696875B1 KR101696875B1 (en) | 2017-01-16 |
Family
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Family Applications (1)
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KR1020150065190A KR101696875B1 (en) | 2015-05-11 | 2015-05-11 | An Apparatus for Grinding a Lead Frame and a Method for Grinding a Lead Frame |
Country Status (1)
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KR (1) | KR101696875B1 (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20000052113A (en) | 1999-01-29 | 2000-08-16 | 윤종용 | Test signal generating circuit for semiconductor device |
KR20060112307A (en) | 2005-04-25 | 2006-10-31 | 삼성테크윈 주식회사 | Method for manufacturing a lead frame and press system for the same |
JP2012020390A (en) * | 2010-07-16 | 2012-02-02 | Yoshikawa Kogyo Co Ltd | Platy member polishing device |
-
2015
- 2015-05-11 KR KR1020150065190A patent/KR101696875B1/en active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20000052113A (en) | 1999-01-29 | 2000-08-16 | 윤종용 | Test signal generating circuit for semiconductor device |
KR20060112307A (en) | 2005-04-25 | 2006-10-31 | 삼성테크윈 주식회사 | Method for manufacturing a lead frame and press system for the same |
JP2012020390A (en) * | 2010-07-16 | 2012-02-02 | Yoshikawa Kogyo Co Ltd | Platy member polishing device |
Also Published As
Publication number | Publication date |
---|---|
KR101696875B1 (en) | 2017-01-16 |
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