KR19980037095U - Gas Leak Detection Device - Google Patents
Gas Leak Detection Device Download PDFInfo
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- KR19980037095U KR19980037095U KR2019960050111U KR19960050111U KR19980037095U KR 19980037095 U KR19980037095 U KR 19980037095U KR 2019960050111 U KR2019960050111 U KR 2019960050111U KR 19960050111 U KR19960050111 U KR 19960050111U KR 19980037095 U KR19980037095 U KR 19980037095U
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
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- H01L21/67017—Apparatus for fluid treatment
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Abstract
본 고안은 가스누설 검출장치에 관한 것으로, 가스누설이 체크되는 스펙트로메타에 연결설치된 터보펌프와 러핑펌프를 없애고, 측면에 손잡이부를 설치하여 장치의 이동을 간편하게 하였으며, 또한 테스트포트에 캡과 오링을 형성시키고 클램프로 고정시키어 불순물이 내부로 유입되는 것을 방지한다.The present invention relates to a gas leakage detection device, and removes the turbo pump and roughing pump connected to the spectrometer to check the gas leakage, and the handle portion is installed on the side to facilitate the movement of the device, and also the cap and O-ring in the test port Forming and clamping to prevent the ingress of impurities.
Description
제1도와 제2도와 제3도는 종래의 가스누설 검출장치를 설명하기 위한 도면이고,1 and 2 and 3 are views for explaining a conventional gas leakage detection device,
제4도와 제5도는 본 고안의 가스누설 검출장치를 설명하기 위한 도면이다.4 and 5 are views for explaining the gas leakage detection apparatus of the present invention.
* 도면의 주요부분에 대한 부호의 설명** Explanation of symbols for the main parts of the drawings *
10,20:스펙트로메터11:터보펌프10,20: Spectrometer 11: Turbo Pump
12:러핑펌프13,23:연결통로12: roughing pump 13, 23: connection passage
15:이온 컬렉터16:증폭기15: Ion collector 16: Amplifier
17:마크네트 필트24:오링17: Mark net filter 24: O-ring
25:덮개26:핸들25: cover 26: handle
27:누설율측정부27: leak rate measuring unit
본 고안은 고진공이 요구되는 반도체 제조장비에서 가스의 누설과 누설되는 부위를 감지하는 가스누설 검출장치에 관한 것으로, 특히 가스누설이 검사되는 스펙트로메타를 가스누설이 예상되는 장비 내 챔버에 탈착 및 장착을 자유롭게 하기에 적당한 가스누설 검출장치에 관한 것이다.The present invention relates to a gas leakage detection device for detecting gas leakage and leaking parts in a semiconductor manufacturing equipment requiring high vacuum, and in particular, a spectrometer in which gas leakage is inspected is removed and mounted in a chamber in an equipment where gas leakage is expected. The present invention relates to a gas leakage detecting device suitable for freeing the gas.
제1도와 제2도와 제3도는 종래의 가스누설 검출장치를 설명하기 위한 도면으로, 제1도는 종래의 가스누설 검출장치의 사시도이고, 제2도는 종래의 가스누설 검출장치의 개략적인 도면이다.1 and 2 and 3 are views for explaining a conventional gas leakage detection device, Figure 1 is a perspective view of a conventional gas leakage detection device, Figure 2 is a schematic diagram of a conventional gas leakage detection device.
제3도는 종래의 가스누설 검출장치에서 가스누설이 검사되는 스펙트로메타 튜브의 구성도이다.3 is a configuration diagram of a spectrometer tube in which gas leakage is inspected in a conventional gas leakage detecting apparatus.
이하, 첨부된 도면을 참조하여 설명하겠다.Hereinafter, with reference to the accompanying drawings will be described.
종래의 가스누설 검출장치는 제1도와 제2도와 제3도와 같이, 진공챔버와 연결통로에 의해 연결되어, 진공 챔버 내의 일정부위에 발생된 가스누설이 스펙트로메타에 의해 검출되는 종래의 가스누설 검출장치는 진공 챔버 내의 누설이 감지되는 스펙트로메타(spectrometer)(10)와, 스펙트로메타에 연결되어 스펙트로메타 내부를 고진공으로 만들어 주기 위한 터보펌프와, 터보펌프를 가동하기 위해 일정압력으로 러핑되는 러핑펌프를 갖으며, 이때 장치의 상부에는 누설확인공정이 진행될 장비의 챔버와 연결되는 연결통로(13)가 형성되며, 연결통로의 입구에는 개폐밸브(14)가 설치된다.The conventional gas leakage detecting apparatus is connected to the vacuum chamber by a connecting passage as shown in FIGS. 1 and 2 and 3 so that a gas leak is detected by spectrometer. The apparatus includes a spectrometer 10 in which leakage in the vacuum chamber is detected, a turbo pump connected to the spectrometer to make the inside of the spectrometer high vacuum, and a roughing pump roughed at a constant pressure to operate the turbopump. At this time, the upper portion of the device is formed with a connecting passage 13 is connected to the chamber of the equipment to be leak check process, the opening and closing valve 14 is installed at the inlet of the connecting passage.
이와 같은 구성을 갖는 종래의 가스누설 검출장치를 통하여 반도체 장비에서 누설이 예상되는 챔버에서 누설유무 및 누설 정도가 검출되는 과정을 살펴보면 다음과 같다.Looking at the process of detecting the presence of leakage and the degree of leakage in the chamber is expected to leak in the semiconductor equipment through the conventional gas leakage detection device having such a configuration as follows.
우선 먼저, 가스누설연부를 테스트할 반도체 장비의 진공챔버를 장치의 연결 통로(13)에 결합시킨다.First, the vacuum chamber of the semiconductor equipment to be tested for the gas leakage edge is coupled to the connection passage 13 of the apparatus.
그런 후, 터보펌프와 러핑펌프(12)를 작동시키어 스펙트로메타(10) 내부를 진공으로 형성시켜 스펙트로메타가 동작할 수 있는 분위기를 만든다.Thereafter, the turbopump and the roughing pump 12 are operated to form a vacuum inside the spectrometer 10 to create an atmosphere in which the spectrometa can operate.
이어서 챔버의 누설이 예상되는 부위에 헬륨가스를 주입하여 리크를 검출한다.Subsequently, helium gas is injected into the site where the leakage of the chamber is expected to detect the leak.
즉, 제1도의 (다)와 같이, 챔버내 헬륨이 주입된 부위에 누설이 있는 경우, 누설된 헬륨은 고진공상태의 스펙트로메타(10)에 주입되며, 이러한 헬륨은 스펙트로메타내의 이온소스에서 이온화된다.That is, as shown in (c) of FIG. 1, when there is a leak in the region where helium is injected, the leaked helium is injected into the high vacuum spectrometer 10, and such helium is ionized at an ion source in the spectrometer. do.
그리고 헬륨이온을 제외한 음이온은 그라운드슬릿(ground slit)(16)에 의해 배출되며, 마그네트 슬릿(magnet field)(17)에서 자기장에 통과되어 헬륨이온만을 걸러낸다.Anions other than helium ions are discharged by the ground slit 16 and pass through the magnetic field in the magnet field 17 to filter only helium ions.
이어서 걸러진 헬륨이온은 이온컬렉터(ion collector)(15)에 의해 검출되며, 검출된 헬륨이온은 그 질량이 측정되어 증폭기(16)를 통하여 증폭되어 챔버의 리크가 감지된다.Subsequently, the filtered helium ions are detected by an ion collector 15, and the detected helium ions are measured and amplified through the amplifier 16 to detect a leak in the chamber.
그러나 종래의 가스누설 검출장치에서 사용되는 터버펌프와 러프펌프가 고가일 뿐만 아니라 그 부피가 크기 때문에 누설테스트 시, 공간적인 제약을 받는다.However, since the turbopump and rough pump used in the conventional gas leakage detection device are expensive and their volume is large, they are subject to spatial constraints in the leakage test.
또한, 가스누설검출을 하기 위해서는 우선 먼저 터보펌프와 러프펌프를 이용하여 스펙트로메타를 진공으로 유지시켜 주어야 하므로 그에 따른 시간손실이 큰 문제점이 발생된다.In addition, in order to detect gas leakage, first, the spectrometer must be maintained in a vacuum using a turbo pump and a rough pump, and thus a large time loss occurs.
본 고안은 이러한 문제를 해결하고자 안출된 것으로, 부피가 커서 공간을 많이 차지하는 검출장치의 부피를 감소시키고, 누설이 예상되는 장비의 챔버위치로 손쉽게 운반가능한 가스누설 검출장치를 목적으로 한다.The present invention has been made to solve such a problem, and aims to reduce the volume of the detection device that occupies a large volume and to easily carry a gas leakage detection device that can be easily transported to the chamber position of the equipment that is expected to leak.
상기와 같은 목적을 달성하고자 본 고안은 가스누설이 체크되는 스펙트로메타에 연결설치된 터보펌프와 러핑펌프를 없애고, 측면에 손잡이부를 설치하여 장치의 이동을 간편하게 하였으며, 또한 테스트포트에 캡과 오링을 형성시키고 클램프로 죄어주어 불순물이 내부로 유입되는 것을 방지한다.In order to achieve the above object, the present invention eliminates the turbo pump and roughing pump connected to the spectrometer to check for gas leakage, installs a handle on the side to simplify the movement of the device, and also forms a cap and an O-ring in the test port. And clamp it to prevent impurities from getting inside.
제4도와 제5도는 본 고안의 가스누설 검출장치를 설명하기 위한 도면으로, 제4도는 본 고안의 가스누설 검출장치를 검사하고자 하는 장치와 챔버와 연결시킨 것을 보인 도면이고, 제5도는 본 고안의 가스누설 검출장치의 단면도로, 이하 첨부된 도면을 참조하여 설명하면 다음과 같다.4 and 5 are views for explaining the gas leakage detection apparatus of the present invention, Figure 4 is a view showing the gas leakage detection device of the present invention is connected to the device and the chamber to be examined, Figure 5 is the present invention As a cross-sectional view of the gas leakage detection apparatus, it will be described with reference to the accompanying drawings as follows.
본 고안의 가스누설 검출장치는 제4도와 제5도와 같이, 일측에 형성된 연결통로를 통하여 누설검사가 진행될 진공챔버와 결합되는 몸체와, 몸체 내부에 형성되며, 진공챔버 내의 누설이 감지되는 스펙트로메타로 구성되며, 몸체에는 연결통로를 밀봉시키는 밀봉수단과, 휴대가능하도록 핸들(handle)이 형성되며, 스펙트로메타에는 스펙트로메타의 신호를 입력으로 받아서 입력된 신호에 의해 누설의 유무 및 그 정도가 표시되는 누설율측정부가 설치된다.The gas leakage detecting apparatus of the present invention has a body coupled to the vacuum chamber to be leak-tested through a connection passage formed at one side as shown in FIGS. 4 and 5, and a spectrometer formed inside the body and detecting leakage in the vacuum chamber. It consists of a sealing means for sealing the connecting passage on the body, and a handle (handle) is formed to be portable, the spectrometer is a signal of the spectrometer received by the input signal indicating the presence and degree of leakage by the input signal Leak rate measuring section is installed.
또한, 밀봉수단으로는 연결통로 외주면에 형성된 홈과, 홈에 삽입되는 오링(24)과, 연결통로에 밀폐되는 덮개(25)와, 덮개로 밀폐된 연결통로를 죄어주는 클램프가 구비되어져서, 연결통로 내로 불순물이 유입되는 것을 방지한다.In addition, the sealing means is provided with a groove formed on the outer peripheral surface of the connecting passage, an O-ring 24 inserted into the groove, a cover 25 sealed in the connecting passage, and a clamp for clamping the connecting passage sealed by the cover, Prevents the entry of impurities into the connecting passage.
이와 같은 구성을 갖는 본 고안의 가스누설 검출장치를 통하여 반도체 장비에서 누설이 예상되는 챔버에서 누설유무 및 누설정도가 검출되는 과정을 살펴보면 다음과 같다.Looking at the process of detecting the presence of leakage and the degree of leakage in the chamber is expected to leak in semiconductor equipment through the gas leakage detection device of the present invention having such a configuration as follows.
우선먼저, 진공챔버를 스펙트로메타의 연결통로(23)에 결합시키고, 연결통로 입구에 설치된 개폐밸브를 오픈시킨다.First of all, the vacuum chamber is coupled to the connection passage 23 of the spectrometer, and the on-off valve installed at the inlet of the connection passage is opened.
그리고 장비의 챔버 하부에 설치된 고진공밸브(28)를 오픈시키고 터보펌프와 러핑펌프를 작동시켜 스펙트로메타 내부를 진공상태로 유지시키고 12V의 전압을 인가시켜 준다.Then, the high vacuum valve 28 installed in the lower chamber of the equipment is opened and the turbo pump and the roughing pump are operated to maintain the inside of the spectrometer in a vacuum state and apply a voltage of 12V.
그런후, 누설이 예측되는 챔버의 해당부에 헬륨을 주입하면 압력비가 낮은 헬륨가스는 챔버의 연결통로를 거쳐 스펙트로메타로 유입되며, 스펙트로메타 내의 이온소스에서 이온화되어 그라운드 슬릿(ground slit)을 통해 배출된다.Then, when helium is injected into the chamber where leakage is expected, helium gas with a low pressure ratio flows into the spectrometer through the passage of the chamber, ionized by an ion source in the spectrometer, and then through the ground slit. Discharged.
이러한 배출된 이온들은 마그네트필드의 자기장을 통과하면서 헬륨만 전달되어 이온컬렉터에 모여 그 질량이 측정된 후, 증폭기에서 증폭되어 누설율측정부에 표시된다.The discharged ions pass through the magnetic field of the magnet field, and only helium is transferred to the ion collector, the mass of which is measured, and then amplified by the amplifier and displayed on the leak rate measuring unit.
따라서, 해당부위가 누설된 경우, 주입된 헬륨은 스펙트로메타로 유입되어 누설율측정부 (27)를 통해 누설치가 표시되어져서, 누설의 유무 및 정도를 체크 가능하다.Therefore, when the corresponding part is leaked, the injected helium flows into the spectrometer and the leak value is displayed through the leak rate measuring unit 27, so that the presence or absence of the leak can be checked.
또한, 본 고안의 가스누설 검출장치는 누설 체크가 완료되거나 또는 평상시 사용하지 않을 경우에는 연결통로(23)에 오링(24)과 덮개(25)를 씌운후, 클램프로 조여 내부로 불순물이 유입되지 않도록 한다.In addition, the gas leakage detection device of the present invention, when the leak check is completed or not normally used, the O-ring 24 and the cover 25 are put on the connecting passage 23, and then clamped with a clamp so that impurities do not flow into the interior. Do not
또한, 챔버의 타라인의 누설여부를 체크하고자 할 경우에는 스펙트로메타측면에 형성된 핸들(26)을 이용하여 쉽게 운반가능하다.In addition, when it is desired to check the leakage of the other line of the chamber, it is easily transported using the handle 26 formed on the spectrometer side.
상기에서 살펴본 바와 같이, 종래의 가스누설 검출장치에서 사용되는 터보펌프와 러핑펌프가 고가일 뿐만 아니라 부피가 크기 때문에 이동시, 공간적인 제약을 받았지만 본 고안의 검출기는 장비의 챔버에 형성된 진공펌프를 이용하여 스펙트로메타 내부의 진공을 유지시킴에 따라, 별도의 터보펌프 및 러핑펌프를 설치하지 않아도 되며, 또한 포터블이므로 운반에 용이하다.As described above, the turbo pump and the roughing pump used in the conventional gas leakage detection device are not only expensive but also have a large volume, so they are limited in space during movement, but the detector of the present invention uses a vacuum pump formed in the chamber of the equipment. Therefore, by maintaining the vacuum inside the spectrometer, it is not necessary to install a separate turbo pump and roughing pump, and also portable because it is easy to transport.
즉, 스펙트로메타를 장비의 챔버에 직접 부착/탈착시킬 수 있고, 챔버의 타라인의 누설이 예상되는 부위로 쉽게 이동 가능하다.That is, the spectrometer can be directly attached / removed to the chamber of the equipment, and can be easily moved to the site where the other line of the chamber is expected to leak.
또한, 그 부피가 작기 때문에 좁은 공간 내에서도 누설 체크가 가능하다.In addition, since the volume is small, leakage check can be performed even in a narrow space.
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