KR102006059B1 - 스핀 코팅 프로세스에서 결함 제어를 위한 덮개 플레이트 - Google Patents
스핀 코팅 프로세스에서 결함 제어를 위한 덮개 플레이트 Download PDFInfo
- Publication number
- KR102006059B1 KR102006059B1 KR1020167025698A KR20167025698A KR102006059B1 KR 102006059 B1 KR102006059 B1 KR 102006059B1 KR 1020167025698 A KR1020167025698 A KR 1020167025698A KR 20167025698 A KR20167025698 A KR 20167025698A KR 102006059 B1 KR102006059 B1 KR 102006059B1
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- fluid flow
- flow member
- ring
- shaped section
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
- B05D1/005—Spin coating
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Coating Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/US2014/018054 WO2015126425A1 (en) | 2014-02-24 | 2014-02-24 | Cover plate for defect control in spin coating |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20160125429A KR20160125429A (ko) | 2016-10-31 |
KR102006059B1 true KR102006059B1 (ko) | 2019-07-31 |
Family
ID=53878750
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020167025698A KR102006059B1 (ko) | 2014-02-24 | 2014-02-24 | 스핀 코팅 프로세스에서 결함 제어를 위한 덮개 플레이트 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6448064B2 (ja) |
KR (1) | KR102006059B1 (ja) |
CN (1) | CN106132564B (ja) |
WO (1) | WO2015126425A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107159522B (zh) * | 2017-05-24 | 2023-04-07 | 吉林大学 | 一种在叶轮表面均匀涂覆聚氨酯减阻材料的装置 |
CN108031612A (zh) * | 2017-11-28 | 2018-05-15 | 宁波美固力磁电有限公司 | 一种点胶机 |
CN108816672B (zh) * | 2018-06-19 | 2020-06-26 | 吉林大学 | 一种在旋转涂覆叶轮过程中节约材料的方法 |
JP6606239B1 (ja) * | 2018-08-22 | 2019-11-13 | 株式会社オリジン | 塗布物質塗布済対象物の製造方法 |
JP7402655B2 (ja) * | 2019-10-17 | 2023-12-21 | 東京エレクトロン株式会社 | 基板処理装置 |
CN111687017A (zh) * | 2020-04-24 | 2020-09-22 | 河北叁迪光学科技有限公司 | 一种用于手表的3d曲面屏及其喷涂工艺 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6013316A (en) | 1998-02-07 | 2000-01-11 | Odme | Disc master drying cover assembly |
US6261635B1 (en) | 1999-08-27 | 2001-07-17 | Micron Technology, Inc. | Method for controlling air over a spinning microelectronic substrate |
US8387635B2 (en) | 2006-07-07 | 2013-03-05 | Tel Fsi, Inc. | Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluids |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
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DE2359276C3 (de) * | 1973-11-28 | 1979-11-08 | Bayer Ag, 5090 Leverkusen | Vorrichtung zum quantitativen Aufbringen einer gegebenenfalls verschäumten Flüssigkeit auf eine Fadenschar |
JPS6376431A (ja) * | 1986-09-19 | 1988-04-06 | Hitachi Ltd | スピン塗布装置 |
JPH0248066A (ja) * | 1988-08-10 | 1990-02-16 | Fuji Photo Film Co Ltd | スピン塗布装置 |
US5395649A (en) * | 1992-02-04 | 1995-03-07 | Sony Corporation | Spin coating apparatus for film formation over substrate |
JP3248232B2 (ja) * | 1992-02-04 | 2002-01-21 | ソニー株式会社 | レジスト塗布装置及びレジストの回転塗布方法 |
US5211753A (en) * | 1992-06-15 | 1993-05-18 | Swain Danny C | Spin coating apparatus with an independently spinning enclosure |
TW268905B (ja) * | 1993-05-20 | 1996-01-21 | Tokyo Electron Co Ltd | |
JP3605852B2 (ja) * | 1994-05-18 | 2004-12-22 | ソニー株式会社 | 基板の回転塗布装置 |
JPH0871484A (ja) * | 1994-08-31 | 1996-03-19 | Mitsubishi Chem Corp | スピンコーター |
JPH0910658A (ja) * | 1995-06-27 | 1997-01-14 | Hitachi Ltd | 塗布方法および塗布装置 |
JPH11345763A (ja) * | 1998-06-02 | 1999-12-14 | Nippon Foundry Inc | 半導体基板の処理装置 |
JP4043163B2 (ja) * | 1999-12-24 | 2008-02-06 | エム・セテック株式会社 | 薬液塗布方法とその装置 |
US6866431B2 (en) * | 2002-02-19 | 2005-03-15 | Canon Kabushiki Kaisha | Light amount adjustment apparatus, manufacturing method, and photographing apparatus |
TWI265550B (en) * | 2002-05-14 | 2006-11-01 | Toshiba Corp | Fabrication method, manufacturing method for semiconductor device, and fabrication device |
US7323124B2 (en) * | 2002-08-14 | 2008-01-29 | Fujifilm Corporation | Optical disc cover layer formation method and optical disc cover layer formation device |
US6716285B1 (en) * | 2002-10-23 | 2004-04-06 | The United States Of America As Represented By The Secretary Of The Air Force | Spin coating of substrate with chemical |
TWI229367B (en) * | 2002-12-26 | 2005-03-11 | Canon Kk | Chemical treatment apparatus and chemical treatment method |
JP3890026B2 (ja) * | 2003-03-10 | 2007-03-07 | 東京エレクトロン株式会社 | 液処理装置および液処理方法 |
ES2339262T3 (es) * | 2004-06-25 | 2010-05-18 | Toray Industries, Inc. | Conjunto de hilado para el hilado seco-humedo y dispositivo y metodo para producir el haz de fibras. |
KR101690047B1 (ko) * | 2008-05-09 | 2016-12-27 | 티이엘 에프에스아이, 인코포레이티드 | 개방 동작 모드와 폐쇄 동작 모드사이를 용이하게 변경하는 처리실 설계를 이용하여 마이크로일렉트로닉 워크피이스를 처리하는 장치 및 방법 |
JP2010137153A (ja) * | 2008-12-10 | 2010-06-24 | Tdk Corp | スピンコート装置、スピンコート方法及び情報記録媒体の製造方法 |
-
2014
- 2014-02-24 CN CN201480077666.5A patent/CN106132564B/zh active Active
- 2014-02-24 WO PCT/US2014/018054 patent/WO2015126425A1/en active Application Filing
- 2014-02-24 JP JP2016570760A patent/JP6448064B2/ja active Active
- 2014-02-24 KR KR1020167025698A patent/KR102006059B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6013316A (en) | 1998-02-07 | 2000-01-11 | Odme | Disc master drying cover assembly |
US6261635B1 (en) | 1999-08-27 | 2001-07-17 | Micron Technology, Inc. | Method for controlling air over a spinning microelectronic substrate |
US8387635B2 (en) | 2006-07-07 | 2013-03-05 | Tel Fsi, Inc. | Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluids |
Also Published As
Publication number | Publication date |
---|---|
JP2017508616A (ja) | 2017-03-30 |
JP6448064B2 (ja) | 2019-01-09 |
CN106132564A (zh) | 2016-11-16 |
KR20160125429A (ko) | 2016-10-31 |
WO2015126425A1 (en) | 2015-08-27 |
CN106132564B (zh) | 2019-12-20 |
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