KR100744037B1 - 유기 전기발광소자 제조장치 - Google Patents
유기 전기발광소자 제조장치 Download PDFInfo
- Publication number
- KR100744037B1 KR100744037B1 KR1020000087252A KR20000087252A KR100744037B1 KR 100744037 B1 KR100744037 B1 KR 100744037B1 KR 1020000087252 A KR1020000087252 A KR 1020000087252A KR 20000087252 A KR20000087252 A KR 20000087252A KR 100744037 B1 KR100744037 B1 KR 100744037B1
- Authority
- KR
- South Korea
- Prior art keywords
- organic
- insulating film
- separation wall
- electrode layer
- electroluminescent device
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 claims abstract description 34
- 238000000926 separation method Methods 0.000 claims abstract description 34
- 238000000034 method Methods 0.000 claims abstract description 28
- 239000000758 substrate Substances 0.000 claims abstract description 27
- 239000002184 metal Substances 0.000 claims abstract description 26
- 239000011368 organic material Substances 0.000 claims abstract description 17
- 239000002904 solvent Substances 0.000 claims abstract description 11
- 238000001816 cooling Methods 0.000 claims abstract description 10
- 239000011521 glass Substances 0.000 claims abstract description 9
- 230000008878 coupling Effects 0.000 claims abstract description 8
- 238000010168 coupling process Methods 0.000 claims abstract description 8
- 238000005859 coupling reaction Methods 0.000 claims abstract description 8
- 238000007789 sealing Methods 0.000 claims abstract description 5
- 238000005401 electroluminescence Methods 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 55
- 239000010408 film Substances 0.000 description 28
- 238000002347 injection Methods 0.000 description 13
- 239000007924 injection Substances 0.000 description 13
- 229920002120 photoresistant polymer Polymers 0.000 description 10
- 239000010409 thin film Substances 0.000 description 7
- 238000000151 deposition Methods 0.000 description 6
- 239000011159 matrix material Substances 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 230000008021 deposition Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 229920005596 polymer binder Polymers 0.000 description 1
- 239000002491 polymer binding agent Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000010897 surface acoustic wave method Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/17—Passive-matrix OLED displays
- H10K59/173—Passive-matrix OLED displays comprising banks or shadow masks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
- H10K71/441—Thermal treatment, e.g. annealing in the presence of a solvent vapour in the presence of solvent vapors, e.g. solvent vapour annealing
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
이하, 첨부된 도면을 참조하여 본 발명의 바람직한 실시예를 상세하게 설명하도록 한다.
Claims (3)
- 기판 상에 애노드 ITO전극층이 형성되고, 상기 애노드 ITO전극층 상에 절연막 및 음극분리벽이 형성되며, 상기 절연막 상에 다층의 유기물층이 형성되고, 상기 유기물층 상에 캐소드금속전극층이 형성된 구조의 유기 전기발광소자(Electro-Luminescent display)를 제조하기 위한 유기 전기발광소자 제조장치로서,상기 금속전극층을 형성하기 위한 금속챔버와, 상기 다층의 유기물층 형성을 위한 제1 및 제2 유기챔버와, 보조적인 챔버의 추가를 위한 스페어챔버결합부와, 보호 및 실링 공정을 수행하는 글로브박스를 구비하며,상기 스페어챔버결합부에는 상기 절연막 및 음극분리벽 형성의 인라인화 공정을 위한 진공챔버가 설치되고,상기 진공챔버는 그 내부 일측에 냉각타겟기판과 경사진 UV노광기가 복수로 설치되고, 그 대향측에 글래스기판이 설치됨과 더불어 그 전방에 마스크홀더에 의해 지지되면서 상기 절연막 및 음극분리벽에 대응하는 금속마스크 및 휘발성 용매의 휘발을 위한 핫스테이지가 설치된 것을 특징으로 하는 유기 전기발광소자 제조장치.
- 제 1항에 있어서, 상기 냉각타겟기판은 회전형으로 형성된 것을 특징으로 하는 유기 전기발광소자 제조장치.
- 제 1항에 있어서, 상기 휘발성의 가벼운 용매를 제거하기 위한 터보펌프가 더 갖추어진 것을 특징으로 하는 유기 전기발광소자 제조장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020000087252A KR100744037B1 (ko) | 2000-12-30 | 2000-12-30 | 유기 전기발광소자 제조장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020000087252A KR100744037B1 (ko) | 2000-12-30 | 2000-12-30 | 유기 전기발광소자 제조장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20020057020A KR20020057020A (ko) | 2002-07-11 |
KR100744037B1 true KR100744037B1 (ko) | 2007-08-01 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020000087252A KR100744037B1 (ko) | 2000-12-30 | 2000-12-30 | 유기 전기발광소자 제조장치 |
Country Status (1)
Country | Link |
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KR (1) | KR100744037B1 (ko) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08111285A (ja) * | 1994-10-07 | 1996-04-30 | Tdk Corp | 有機エレクトロルミネセンス素子の製造方法及びその装置 |
JPH09275075A (ja) * | 1995-06-26 | 1997-10-21 | Matsushita Electric Ind Co Ltd | 光電子材料の製造方法、並びにその光電子材料を用いた応用素子及び応用装置 |
JPH10241858A (ja) * | 1997-02-25 | 1998-09-11 | Tdk Corp | 有機エレクトロルミネッセンス表示装置の製造方法および製造装置 |
JPH10270164A (ja) * | 1997-03-26 | 1998-10-09 | Idemitsu Kosan Co Ltd | 有機エレクトロルミネッセンス素子の製造方法およびその製造装置 |
-
2000
- 2000-12-30 KR KR1020000087252A patent/KR100744037B1/ko active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08111285A (ja) * | 1994-10-07 | 1996-04-30 | Tdk Corp | 有機エレクトロルミネセンス素子の製造方法及びその装置 |
JPH09275075A (ja) * | 1995-06-26 | 1997-10-21 | Matsushita Electric Ind Co Ltd | 光電子材料の製造方法、並びにその光電子材料を用いた応用素子及び応用装置 |
JPH10241858A (ja) * | 1997-02-25 | 1998-09-11 | Tdk Corp | 有機エレクトロルミネッセンス表示装置の製造方法および製造装置 |
JPH10270164A (ja) * | 1997-03-26 | 1998-10-09 | Idemitsu Kosan Co Ltd | 有機エレクトロルミネッセンス素子の製造方法およびその製造装置 |
Also Published As
Publication number | Publication date |
---|---|
KR20020057020A (ko) | 2002-07-11 |
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