JPS5810763B2 - Stamper processing method for information storage medium - Google Patents
Stamper processing method for information storage mediumInfo
- Publication number
- JPS5810763B2 JPS5810763B2 JP3353076A JP3353076A JPS5810763B2 JP S5810763 B2 JPS5810763 B2 JP S5810763B2 JP 3353076 A JP3353076 A JP 3353076A JP 3353076 A JP3353076 A JP 3353076A JP S5810763 B2 JPS5810763 B2 JP S5810763B2
- Authority
- JP
- Japan
- Prior art keywords
- stamper
- information storage
- fluorine
- nickel
- storage medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Manufacturing Optical Record Carriers (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Description
【発明の詳細な説明】
この発明は録音用レコード板、或いは録画用ビデオディ
スク板等の製作に用いるスタンパ−のフッ素系フィルム
による表面処理方法に関するものであり、特にグロー放
電重合手段により効果的に表面処理が行える様にした方
法に係るものである従来、音楽等を録音するレコード板
、或いは、音及び映像を記録するビデオディスク等は広
く採用され、新技術が開発される様になって来ているが
、該種情報記憶兼再生用ディスク板は合成樹脂製等の量
産体であるため一般には所謂スタンパ−よりプレス或い
は射出等の成形加工によって製作されている。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for surface treating a stamper using a fluorine-based film for use in the production of recording discs, video disc discs, etc. Conventionally, record boards for recording music, video discs for recording sound and images, etc. have been widely adopted, and new technologies have been developed. However, since the disc plate for storing and reproducing information is a mass-produced product made of synthetic resin or the like, it is generally manufactured by a molding process such as pressing or injection using a so-called stamper.
而して、該スタンパ−の製作に於てはラッカー被膜に前
記音声、或いは画像等の情報を記録し、それよりマスタ
ー盤を作り、更にマザー盤を複製し、反転してスタンパ
−を製作する。Therefore, in producing the stamper, information such as the audio or image is recorded on the lacquer film, a master disc is made from it, and the mother disc is further duplicated and reversed to produce the stamper. .
そして、該スタンパ−は一般にニッケルメッキにより一
段処理され、更にクロムメッキによる二段処理を行い耐
物理化学性を帯びる様にされて来た。The stamper has generally been subjected to one step of nickel plating and then a second step of chromium plating to impart physical and chemical resistance.
さりながら、近来、化学公害の問題のクローズアップ、
省資源問題によるメッキコストの高騰等の制約のため該
クロムメッキによるスタンパ−の表面処理が出来難い問
題が発生して来た。However, recently, the problem of chemical pollution has been brought into close focus.
Due to constraints such as a rise in plating costs due to resource saving issues, a problem has arisen in which it is difficult to treat the surface of stampers by chromium plating.
そして、一方に於ては情報処理、記憶媒体ストックの需
要増は日ましに大きくなり、該需要に約し上記問題点は
製産量に於てもコストに於てもブレーキをかける様にな
る欠点が生じて来た。On the other hand, the demand for information processing and storage media stock is increasing day by day, and in order to meet this demand, the above-mentioned problems are a disadvantage that will put a brake on both production volume and costs. has arisen.
この発明の目的は、上記従来技術に基づいて行なわれて
いたスタンパ−のクロムメッキによる表面処理に伴う問
題点に鑑み、グ冶−放電重合法を利用することによりフ
ッ素系化合物フィルムを被覆させてニッケルスタンパ−
表面にクロムメッキ化工を施すことの無い、しかも、耐
物理的化学的作用を高めると共に成形する樹脂ディスク
のスタンパ−からの剥離が容易に行なわれる様にして生
産性を高め得ることが出来る優れた情報記憶体用スタン
パ−処理方法を提供せんとするものである。In view of the problems associated with the surface treatment of stampers by chromium plating, which has been carried out based on the above-mentioned prior art, it is an object of the present invention to coat a fluorine-based compound film by utilizing a gun discharge polymerization method. nickel stamper
It is an excellent product that does not require chrome plating on the surface, and can increase productivity by increasing resistance to physical and chemical effects and making it easier to peel off the molded resin disk from the stamper. It is an object of the present invention to provide a stamper processing method for an information storage medium.
次に上記目的に沿うこの発明の実施例を図面を参照して
説明すれば以下の通りである。Next, embodiments of the present invention in accordance with the above object will be described below with reference to the drawings.
図に於て1はスタンパ−処理装置であり、反応鍾2はフ
レーム3により基台4に固定されており、その頂部には
適宜シール機構5を介して同じく基台に固設された減速
モータ6の延下回動軸7が内外に貫通され、該回動軸7
の下端にはスタンパ−適宜着脱固定装置8が設けられて
いる。In the figure, reference numeral 1 denotes a stamper processing device, and a reaction plate 2 is fixed to a base 4 by a frame 3, and a deceleration motor, which is also fixed to the base, is attached to the top of the frame 3 via a seal mechanism 5. 6 is penetrated inwardly and outwardly, and the rotating shaft 7
A stamper attachment/detachment fixing device 8 is provided at the lower end of the stamper.
9は基板であり、適宜昇降装置10により昇降可能にさ
れ、上昇した場合は前記反応鍾2の下端縁に張設したシ
ール材11に緊密に当接し前記反応鍾2を気密にシール
する。Reference numeral 9 denotes a substrate, which can be raised and lowered by a lifting device 10 as appropriate, and when raised, it comes into close contact with a sealing material 11 stretched over the lower edge of the reaction tube 2 to airtightly seal the reaction tube 2.
又、該基板9の反応鍾2内に臨む部分に2個の気密シー
ル機構12.13が装着され、一方の気密シール機構1
2には図示しない真空ポンプに連絡されている真空ダク
ト14がバルブ15を有して上方に向けて設けられ、又
、他の気密シール機構13にはガス送給管16がバルブ
17を有して上方に向けて設けられている。Further, two airtight seal mechanisms 12 and 13 are attached to the portion of the substrate 9 facing into the reaction chamber 2, one of which is the airtight seal mechanism 1.
2 has a vacuum duct 14 connected to a vacuum pump (not shown) and has a valve 15 facing upward, and the other airtight seal mechanism 13 has a gas supply pipe 16 having a valve 17. It is placed facing upwards.
18は昇化装置であり、電熱ヒータ19が前記基板9の
シール機構20.21を介して回路22゜23により高
電流電源24に連絡されている。Reference numeral 18 denotes a heating device, and an electric heater 19 is connected to a high current power source 24 through a circuit 22.23 through a sealing mechanism 20.21 of the substrate 9.
25は計測用電流計である。25 is a measuring ammeter.
又、該高電流電源24からは上記回路22に切換スイッ
チ26を介して他の回路27が前記回動軸7に設けられ
た通電ブラシ装置28に連絡している。Further, from the high current power source 24, another circuit 27 is connected to the circuit 22 via a changeover switch 26 to an energizing brush device 28 provided on the rotating shaft 7.
上記構成のスタンパ−処理装置に於て、昇降装置10に
より基板9を所定量下降し、固定装置8に予め通常のニ
ッケルメッキ工程まで処理されたニッケルスタンパ−2
9を固定し、再び昇降装置10により該基板9を上昇さ
せて反応鍾2の下端縁シール材11に緊着させて該反応
鍾2内を気密状態にし、バルブ17を閉じバルブ15を
開いて図示しない真空ポンプ(オイル拡散ポンプを含む
)により反応鍾2内を減圧真空化し、例えば、0.01
mmHg程度の真空圧状態になったところでバルブ17
を開き、図示しないフッ素化合物供給源よりフッ素化合
物ガスを該反応鍾2内に導入し、バルブ17.15のコ
ントロールにより反応鍾2内を0.1〜0.OOIHg
程度の真空圧に維持する。In the stamper processing apparatus configured as described above, the substrate 9 is lowered by a predetermined amount by the lifting device 10, and the nickel stamper 2, which has been previously processed to the normal nickel plating process, is placed on the fixing device 8.
9 is fixed, the substrate 9 is raised again by the lifting device 10 and brought into close contact with the lower edge sealing material 11 of the reaction tube 2 to make the inside of the reaction tube 2 airtight, and the valve 17 is closed and the valve 15 is opened. A vacuum pump (not shown) (including an oil diffusion pump) is used to reduce the pressure inside the reaction chamber 2 to a vacuum of, for example, 0.01.
When the vacuum pressure reaches about mmHg, close the valve 17.
is opened, a fluorine compound gas is introduced into the reaction chamber 2 from a fluorine compound supply source (not shown), and the inside of the reaction chamber 2 is adjusted to 0.1 to 0.0 by controlling the valve 17.15. OOIHg
Maintain a certain level of vacuum pressure.
尚、上記フッ素化合物としてはテトラフロロエチレン、
又は、四フッ化樹脂の熱分解物(テフロンの熱分解物)
、トリフロロ・クロロエチレン、アリルトリフロロアセ
チレン、パーフロロブチルメタアクリレート、或いはフ
ッ化カーボン等が採用可能であるが、これらはガス状で
も良いが、固体でも良く、その場合はバルブ17を閉じ
、前記昇化装置18上に載置してスイッチ26をONに
することにより電熱ヒータ19により昇化させて前記同
様真空ガス圧にすることが可能である。In addition, the above-mentioned fluorine compounds include tetrafluoroethylene,
Or thermal decomposition product of tetrafluoride resin (thermal decomposition product of Teflon)
, trifluorochloroethylene, allyltrifluoroacetylene, perfluorobutyl methacrylate, or fluorinated carbon, etc. These may be gaseous or solid. In that case, the valve 17 is closed and the above-mentioned By placing it on the elevating device 18 and turning on the switch 26, it can be elevated by the electric heater 19 and brought to the same vacuum gas pressure as described above.
又、上記フッ素系化合物と共に不活性ガスの存在下に於
て真空下にグロー放電せしめることは差し支かえない。Further, glow discharge may be performed together with the above-mentioned fluorine-based compound under vacuum in the presence of an inert gas.
勿論、ガス、固体昇化の併用を行うことは何ら差し支か
えないものである。Of course, there is no problem in using a combination of gas and solid ascent.
又、上記フッ素化合物ガスと共に他の有機化合物を併用
することも可能であり、その場合の有機化合物としては
、例えば、エチレン、アセチレン、プロピレン、スチレ
ン、ビニリデンクロライド、キシレン樹脂、テトラシア
ノエチレン、アクリロニトリル、マロンニトリル、クロ
ロベンゼン、ヘキサメチルベンゼン、トルエン、バラニ
トロトルエン、アニリン、ナフタレンパラトルイヂン、
フェロセン、チオフェン、チオアセトアミド等が採用可
能である。It is also possible to use other organic compounds together with the above fluorine compound gas, and examples of the organic compounds in that case include ethylene, acetylene, propylene, styrene, vinylidene chloride, xylene resin, tetracyanoethylene, acrylonitrile, Malonitrile, chlorobenzene, hexamethylbenzene, toluene, varanitrotoluene, aniline, naphthalene para-toluidine,
Ferrocene, thiophene, thioacetamide, etc. can be employed.
而して、前記フッ素化合物ガス真空圧下に於てスイッチ
26により回路23.27間に300〜6キロボルトの
電圧を印加するとニッケルスタンパ−29と電極19と
の間にはグロー放電が発生し、その結果、該ニッケルス
タンパ−29表面に0.2〜2ミクロンの含フツ素系被
膜がコーティング形成される。When a voltage of 300 to 6 kilovolts is applied between the circuits 23 and 27 by the switch 26 under the vacuum pressure of the fluorine compound gas, a glow discharge is generated between the nickel stamper 29 and the electrode 19. As a result, a 0.2 to 2 micron fluorine-containing film is formed on the surface of the nickel stamper 29.
そのコーティングプロセス中、或いは放電後減速モータ
6を、例えば、ニッケルスタンパ−29をして周速01
〜3インチ/秒で移動回動させるとより効果的であるが
、その角速度及び使用する化合物の種類により被膜厚は
異なるため、適宜選定すれば良い。During the coating process or after discharge, the deceleration motor 6 is reduced to a circumferential speed of 01 by using, for example, a nickel stamper 29.
It is more effective to move and rotate at ~3 inches/second, but since the coating thickness varies depending on the angular velocity and the type of compound used, it may be selected appropriately.
尚、フッ素化合物のコーティングの量的割合は1時間当
り0.3〜0.9 g r (I KW当り0.06〜
0.1モル)である。The quantitative rate of fluorine compound coating is 0.3 to 0.9 g r per hour (0.06 to 0.9 g per I KW).
0.1 mol).
尚、グロー放電する際に、あらかじめ、真空下に不活性
ガス(例えば、アルゴンガスが好適である)にて置換し
、例えば、アルゴンガス気流中にT リD −放電せし
めて、ニッケルスタンパ−29の表面状態をフッ素系フ
ィルムでコーティングし易い状態にすることはこの発明
の実施に何ら差し支えないものである。In addition, when performing glow discharge, in advance, the atmosphere is replaced with an inert gas (for example, argon gas is suitable) under vacuum, and for example, T-recharge is performed in an argon gas stream, and the nickel stamper 29 is There is no problem in carrying out the present invention if the surface condition of the substrate is made to be easily coated with a fluorine-based film.
上記実施例に則す実施例を示せば次の通りである。Examples based on the above embodiments are as follows.
実験例 ■
フッ素化合物封入方式:昇化方式
フッ素化合物:テフロン粉末1部の混合物真空圧:IX
IF”i礪Hg
通電状態=50サイ多ル、2KV、1分通電コーティン
グ被膜二〇、5ミクロン
実験例 ■
フッ素化合物:パーフルオロブチルメタアクリレート
他条件:実験例■と同じ
コーティング被膜二0.8ミクロン
実験例 ■
フッ素化合物:パーフルオロブテン
他条件:実験例■と同じ
コーティング被膜二0.6ミクロン
上記3実験例の結果、スタンパ−の耐物理化学性、ディ
スク樹脂板の剥離性は極めて良好であった。Experimental example ■ Fluorine compound encapsulation method: Elevation method Fluorine compound: Mixture of 1 part of Teflon powder Vacuum pressure: IX
IF”i 礪Hg Current status = 50 volts, 2KV, 1 minute energization Coating film 20.5 microns Experimental example ■ Fluorine compound: perfluorobutyl methacrylate Other conditions: Same coating film as experimental example ■ 20.8 Micron experimental example ■ Fluorine compound: Perfluorobutene Other conditions: Same coating film as in experimental example ■ 20.6 micron As a result of the above three experimental examples, the physicochemical resistance of the stamper and the peelability of the disk resin plate were extremely good. there were.
上記の様にこの発明によれば、情報記憶体のニッケルス
タンパ−の表面処理に於て、該ニッケルスタンパ−をフ
ッ素化合物真空中にてグロー放電させて該グ爾−放電重
合処理によりニッケルスタンパ−表面に含フツ素系フィ
ルムを被覆する様にしたので、基本的にクロムメッキに
代替してコーティング出来るため低コストで表面処理が
出来る利点がある上に無公害裡に処理出来るメリットが
ある。As described above, according to the present invention, in the surface treatment of the nickel stamper of the information storage body, the nickel stamper is glow discharged in a fluorine compound vacuum, and the nickel stamper is treated by the glow discharge polymerization treatment. Since the surface is coated with a fluorine-containing film, the coating can basically replace chromium plating, which has the advantage of being able to treat the surface at low cost and in a non-polluting manner.
加えて、耐化学性が強いばかりでなく製品ディスク板の
合成樹脂の剥離性が良い等の優れた効果がある。In addition, it has excellent effects such as not only strong chemical resistance but also good releasability of the synthetic resin of the product disk plate.
又、使用する装置も極めて簡単であり、操作も容易でメ
ンテナンス、ランニングコストも安い副次的効果がある
。Additionally, the device used is extremely simple, easy to operate, and has low maintenance and running costs.
図面はこの発明の実施例を示す1態様図である。 The drawing is a diagram showing one aspect of an embodiment of the invention.
Claims (1)
被覆させる処理方法において、マザー盤より反転して得
られたスタンパ−原盤に対してニッケルメッキを施した
ニッケルスタンパ−をフッ素化合物を含む真空中でグロ
ー放電処理することにより該ニッケルスタンパ−表面に
クロー放電重合による含フツ素系フィルムを被覆するこ
とを特徴とする情報記憶体用スタンパ−処理方法。1. In a processing method for coating the surface of a stamper for information storage with a fluorine-based film, a nickel stamper plated with nickel is applied to a stamper master disc obtained by inverting it from a mother disc in a vacuum containing a fluorine compound. 1. A method for processing a stamper for an information storage medium, which comprises coating the surface of the nickel stamper with a fluorine-containing film produced by claw discharge polymerization by glow discharge treatment.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3353076A JPS5810763B2 (en) | 1976-03-29 | 1976-03-29 | Stamper processing method for information storage medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3353076A JPS5810763B2 (en) | 1976-03-29 | 1976-03-29 | Stamper processing method for information storage medium |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52117102A JPS52117102A (en) | 1977-10-01 |
JPS5810763B2 true JPS5810763B2 (en) | 1983-02-28 |
Family
ID=12389089
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3353076A Expired JPS5810763B2 (en) | 1976-03-29 | 1976-03-29 | Stamper processing method for information storage medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5810763B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61197603U (en) * | 1985-05-31 | 1986-12-10 | ||
JPS6242851U (en) * | 1985-04-17 | 1987-03-14 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57130203A (en) * | 1981-02-02 | 1982-08-12 | Sanyo Electric Co Ltd | Master disk |
SK163296A3 (en) * | 1994-06-23 | 1997-08-06 | Unilever Nv | A device and process for stamping detergent bars |
US6300042B1 (en) * | 1998-11-24 | 2001-10-09 | Motorola, Inc. | Lithographic printing method using a low surface energy layer |
-
1976
- 1976-03-29 JP JP3353076A patent/JPS5810763B2/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6242851U (en) * | 1985-04-17 | 1987-03-14 | ||
JPS61197603U (en) * | 1985-05-31 | 1986-12-10 |
Also Published As
Publication number | Publication date |
---|---|
JPS52117102A (en) | 1977-10-01 |
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