JPS559551A - Photo resist film comprising forming required image by active light shielding material - Google Patents

Photo resist film comprising forming required image by active light shielding material

Info

Publication number
JPS559551A
JPS559551A JP8229278A JP8229278A JPS559551A JP S559551 A JPS559551 A JP S559551A JP 8229278 A JP8229278 A JP 8229278A JP 8229278 A JP8229278 A JP 8229278A JP S559551 A JPS559551 A JP S559551A
Authority
JP
Japan
Prior art keywords
active light
release type
material layer
type material
light shielding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8229278A
Other languages
Japanese (ja)
Inventor
Hajime Kakumaru
Nobuyuki Hayashi
Hiroshi Hiramatsu
Hideo Machida
Shin Kawakami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON SHII M K KK
Showa Denko Materials Co Ltd
Original Assignee
NIPPON SHII M K KK
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON SHII M K KK, Hitachi Chemical Co Ltd filed Critical NIPPON SHII M K KK
Priority to JP8229278A priority Critical patent/JPS559551A/en
Publication of JPS559551A publication Critical patent/JPS559551A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE: To improve the productivity of forming required images composed of photosensitive resin film on substrates by providing the photosensitive resin film on the transparent release type material layer formed beforehand with required images by active light shielding material.
CONSTITUTION: Required images using active light shielding material such as printing ink is formed preferably by a rotary press printing method on a transparent release type material layer such as polyethylene terephthalate film. Next, a photosensitive resin film layer is provided to thicknesses 20 to 100μm on the back thereof and further a release type material layer such as polyethylene film, if necessary, is provided. The release type material layer is removed from this laminated photo resist film and the photosensitive resin layer is laminated in close contact onto the substrate to be permanently modified. Next, active light is radiated, after which the transparent release type material layer is removed and the photo resist images are formed by developing.
COPYRIGHT: (C)1980,JPO&Japio
JP8229278A 1978-07-06 1978-07-06 Photo resist film comprising forming required image by active light shielding material Pending JPS559551A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8229278A JPS559551A (en) 1978-07-06 1978-07-06 Photo resist film comprising forming required image by active light shielding material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8229278A JPS559551A (en) 1978-07-06 1978-07-06 Photo resist film comprising forming required image by active light shielding material

Publications (1)

Publication Number Publication Date
JPS559551A true JPS559551A (en) 1980-01-23

Family

ID=13770455

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8229278A Pending JPS559551A (en) 1978-07-06 1978-07-06 Photo resist film comprising forming required image by active light shielding material

Country Status (1)

Country Link
JP (1) JPS559551A (en)

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