JPS559551A - Photo resist film comprising forming required image by active light shielding material - Google Patents
Photo resist film comprising forming required image by active light shielding materialInfo
- Publication number
- JPS559551A JPS559551A JP8229278A JP8229278A JPS559551A JP S559551 A JPS559551 A JP S559551A JP 8229278 A JP8229278 A JP 8229278A JP 8229278 A JP8229278 A JP 8229278A JP S559551 A JPS559551 A JP S559551A
- Authority
- JP
- Japan
- Prior art keywords
- active light
- release type
- material layer
- type material
- light shielding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: To improve the productivity of forming required images composed of photosensitive resin film on substrates by providing the photosensitive resin film on the transparent release type material layer formed beforehand with required images by active light shielding material.
CONSTITUTION: Required images using active light shielding material such as printing ink is formed preferably by a rotary press printing method on a transparent release type material layer such as polyethylene terephthalate film. Next, a photosensitive resin film layer is provided to thicknesses 20 to 100μm on the back thereof and further a release type material layer such as polyethylene film, if necessary, is provided. The release type material layer is removed from this laminated photo resist film and the photosensitive resin layer is laminated in close contact onto the substrate to be permanently modified. Next, active light is radiated, after which the transparent release type material layer is removed and the photo resist images are formed by developing.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8229278A JPS559551A (en) | 1978-07-06 | 1978-07-06 | Photo resist film comprising forming required image by active light shielding material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8229278A JPS559551A (en) | 1978-07-06 | 1978-07-06 | Photo resist film comprising forming required image by active light shielding material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS559551A true JPS559551A (en) | 1980-01-23 |
Family
ID=13770455
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8229278A Pending JPS559551A (en) | 1978-07-06 | 1978-07-06 | Photo resist film comprising forming required image by active light shielding material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS559551A (en) |
-
1978
- 1978-07-06 JP JP8229278A patent/JPS559551A/en active Pending
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