JPS55126247A - Fixing method for photomask substrate - Google Patents

Fixing method for photomask substrate

Info

Publication number
JPS55126247A
JPS55126247A JP3400979A JP3400979A JPS55126247A JP S55126247 A JPS55126247 A JP S55126247A JP 3400979 A JP3400979 A JP 3400979A JP 3400979 A JP3400979 A JP 3400979A JP S55126247 A JPS55126247 A JP S55126247A
Authority
JP
Japan
Prior art keywords
substrate
pattern face
beveled
fixing method
faces
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3400979A
Other languages
Japanese (ja)
Inventor
Tsuneo Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP3400979A priority Critical patent/JPS55126247A/en
Publication of JPS55126247A publication Critical patent/JPS55126247A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To secure fixation and to closely contact a pattern face with a substrate, by not protruding fixing members outside the pattern face using a substrate with only the edge of a pattern face side of the main faces beveled largely. CONSTITUTION:Beveled faces 9 are formed all around the edge of the pattern face side of the main surfaces of substrate 8 for a photomask. Beveled faces 9 of substrate 8 can be securely fixed with substrate receiver 6 and fixing members 10, and moreover, members 10 can be set lower than pattern face 2 of substrate 8 by H', permitting pattern face 2 to be brought in close contact with another substrate.
JP3400979A 1979-03-22 1979-03-22 Fixing method for photomask substrate Pending JPS55126247A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3400979A JPS55126247A (en) 1979-03-22 1979-03-22 Fixing method for photomask substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3400979A JPS55126247A (en) 1979-03-22 1979-03-22 Fixing method for photomask substrate

Publications (1)

Publication Number Publication Date
JPS55126247A true JPS55126247A (en) 1980-09-29

Family

ID=12402417

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3400979A Pending JPS55126247A (en) 1979-03-22 1979-03-22 Fixing method for photomask substrate

Country Status (1)

Country Link
JP (1) JPS55126247A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013539549A (en) * 2010-08-10 2013-10-24 株式会社ディスコ Improved mask for rim wafer photolithography

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013539549A (en) * 2010-08-10 2013-10-24 株式会社ディスコ Improved mask for rim wafer photolithography
US9063407B2 (en) 2010-08-10 2015-06-23 Disco Corporation Photolithography mask method for a wafer, method for producing same, and photolithography method for wafer using the same

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