JPS55126247A - Fixing method for photomask substrate - Google Patents
Fixing method for photomask substrateInfo
- Publication number
- JPS55126247A JPS55126247A JP3400979A JP3400979A JPS55126247A JP S55126247 A JPS55126247 A JP S55126247A JP 3400979 A JP3400979 A JP 3400979A JP 3400979 A JP3400979 A JP 3400979A JP S55126247 A JPS55126247 A JP S55126247A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- pattern face
- beveled
- fixing method
- faces
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/60—Substrates
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE:To secure fixation and to closely contact a pattern face with a substrate, by not protruding fixing members outside the pattern face using a substrate with only the edge of a pattern face side of the main faces beveled largely. CONSTITUTION:Beveled faces 9 are formed all around the edge of the pattern face side of the main surfaces of substrate 8 for a photomask. Beveled faces 9 of substrate 8 can be securely fixed with substrate receiver 6 and fixing members 10, and moreover, members 10 can be set lower than pattern face 2 of substrate 8 by H', permitting pattern face 2 to be brought in close contact with another substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3400979A JPS55126247A (en) | 1979-03-22 | 1979-03-22 | Fixing method for photomask substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3400979A JPS55126247A (en) | 1979-03-22 | 1979-03-22 | Fixing method for photomask substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55126247A true JPS55126247A (en) | 1980-09-29 |
Family
ID=12402417
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3400979A Pending JPS55126247A (en) | 1979-03-22 | 1979-03-22 | Fixing method for photomask substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55126247A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013539549A (en) * | 2010-08-10 | 2013-10-24 | 株式会社ディスコ | Improved mask for rim wafer photolithography |
-
1979
- 1979-03-22 JP JP3400979A patent/JPS55126247A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013539549A (en) * | 2010-08-10 | 2013-10-24 | 株式会社ディスコ | Improved mask for rim wafer photolithography |
US9063407B2 (en) | 2010-08-10 | 2015-06-23 | Disco Corporation | Photolithography mask method for a wafer, method for producing same, and photolithography method for wafer using the same |
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