JPS5399771A - Soft x-ray transfer mask - Google Patents

Soft x-ray transfer mask

Info

Publication number
JPS5399771A
JPS5399771A JP1298677A JP1298677A JPS5399771A JP S5399771 A JPS5399771 A JP S5399771A JP 1298677 A JP1298677 A JP 1298677A JP 1298677 A JP1298677 A JP 1298677A JP S5399771 A JPS5399771 A JP S5399771A
Authority
JP
Japan
Prior art keywords
soft
transfer mask
ray transfer
ray
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1298677A
Other languages
Japanese (ja)
Other versions
JPS5427709B2 (en
Inventor
Masaru Miyazaki
Kayao Takemoto
Satoru Nakayama
Toshiki Kadota
Katsumi Suzuki
Takanao Shiratori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Hitachi Ltd
NEC Corp
Nippon Telegraph and Telephone Corp
Original Assignee
Fujitsu Ltd
Hitachi Ltd
NEC Corp
Nippon Telegraph and Telephone Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd, Hitachi Ltd, NEC Corp, Nippon Telegraph and Telephone Corp, Nippon Electric Co Ltd filed Critical Fujitsu Ltd
Priority to JP1298677A priority Critical patent/JPS5399771A/en
Publication of JPS5399771A publication Critical patent/JPS5399771A/en
Publication of JPS5427709B2 publication Critical patent/JPS5427709B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To produce a soft X-ray transfer mask by drilling holes at the reinforcing frame and covering the hole with the film of SiO2, etc. transparent to the visible light and then providing mark on the thin film.
COPYRIGHT: (C)1978,JPO&Japio
JP1298677A 1977-02-10 1977-02-10 Soft x-ray transfer mask Granted JPS5399771A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1298677A JPS5399771A (en) 1977-02-10 1977-02-10 Soft x-ray transfer mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1298677A JPS5399771A (en) 1977-02-10 1977-02-10 Soft x-ray transfer mask

Publications (2)

Publication Number Publication Date
JPS5399771A true JPS5399771A (en) 1978-08-31
JPS5427709B2 JPS5427709B2 (en) 1979-09-11

Family

ID=11820516

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1298677A Granted JPS5399771A (en) 1977-02-10 1977-02-10 Soft x-ray transfer mask

Country Status (1)

Country Link
JP (1) JPS5399771A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62136021A (en) * 1985-12-10 1987-06-19 Canon Inc Mask structure for lithography

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5057778A (en) * 1973-09-17 1975-05-20

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5057778A (en) * 1973-09-17 1975-05-20

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62136021A (en) * 1985-12-10 1987-06-19 Canon Inc Mask structure for lithography

Also Published As

Publication number Publication date
JPS5427709B2 (en) 1979-09-11

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