JPS5399771A - Soft x-ray transfer mask - Google Patents
Soft x-ray transfer maskInfo
- Publication number
- JPS5399771A JPS5399771A JP1298677A JP1298677A JPS5399771A JP S5399771 A JPS5399771 A JP S5399771A JP 1298677 A JP1298677 A JP 1298677A JP 1298677 A JP1298677 A JP 1298677A JP S5399771 A JPS5399771 A JP S5399771A
- Authority
- JP
- Japan
- Prior art keywords
- soft
- transfer mask
- ray transfer
- ray
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To produce a soft X-ray transfer mask by drilling holes at the reinforcing frame and covering the hole with the film of SiO2, etc. transparent to the visible light and then providing mark on the thin film.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1298677A JPS5399771A (en) | 1977-02-10 | 1977-02-10 | Soft x-ray transfer mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1298677A JPS5399771A (en) | 1977-02-10 | 1977-02-10 | Soft x-ray transfer mask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5399771A true JPS5399771A (en) | 1978-08-31 |
JPS5427709B2 JPS5427709B2 (en) | 1979-09-11 |
Family
ID=11820516
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1298677A Granted JPS5399771A (en) | 1977-02-10 | 1977-02-10 | Soft x-ray transfer mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5399771A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62136021A (en) * | 1985-12-10 | 1987-06-19 | Canon Inc | Mask structure for lithography |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5057778A (en) * | 1973-09-17 | 1975-05-20 |
-
1977
- 1977-02-10 JP JP1298677A patent/JPS5399771A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5057778A (en) * | 1973-09-17 | 1975-05-20 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62136021A (en) * | 1985-12-10 | 1987-06-19 | Canon Inc | Mask structure for lithography |
Also Published As
Publication number | Publication date |
---|---|
JPS5427709B2 (en) | 1979-09-11 |
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