JPS5117672A - - Google Patents
Info
- Publication number
- JPS5117672A JPS5117672A JP7574475A JP7574475A JPS5117672A JP S5117672 A JPS5117672 A JP S5117672A JP 7574475 A JP7574475 A JP 7574475A JP 7574475 A JP7574475 A JP 7574475A JP S5117672 A JPS5117672 A JP S5117672A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- ing And Chemical Polishing (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US48985374A | 1974-07-19 | 1974-07-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5117672A true JPS5117672A (de) | 1976-02-12 |
| JPS5312793B2 JPS5312793B2 (de) | 1978-05-04 |
Family
ID=23945535
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7574475A Expired JPS5312793B2 (de) | 1974-07-19 | 1975-06-23 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS5312793B2 (de) |
| DE (1) | DE2528666C2 (de) |
| FR (1) | FR2279135A1 (de) |
| GB (1) | GB1507752A (de) |
| IT (1) | IT1039152B (de) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4142107A (en) * | 1977-06-30 | 1979-02-27 | International Business Machines Corporation | Resist development control system |
| US4328298A (en) * | 1979-06-27 | 1982-05-04 | The Perkin-Elmer Corporation | Process for manufacturing lithography masks |
| JPS5695770U (de) * | 1979-12-20 | 1981-07-29 | ||
| DE3529966C1 (de) * | 1985-08-22 | 1987-01-15 | Kernforschungsz Karlsruhe | Verfahren zur Herstellung von Masken fuer die Roentgentiefenlithographie |
| KR920010065B1 (ko) * | 1989-04-20 | 1992-11-13 | 삼성전자 주식회사 | X선 마스크 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE568197A (de) * | 1957-06-12 | |||
| US3649393A (en) * | 1970-06-12 | 1972-03-14 | Ibm | Variable depth etching of film layers using variable exposures of photoresists |
| US3743842A (en) * | 1972-01-14 | 1973-07-03 | Massachusetts Inst Technology | Soft x-ray lithographic apparatus and process |
-
1975
- 1975-06-03 FR FR7518148A patent/FR2279135A1/fr active Granted
- 1975-06-20 IT IT2458175A patent/IT1039152B/it active
- 1975-06-23 JP JP7574475A patent/JPS5312793B2/ja not_active Expired
- 1975-06-27 DE DE19752528666 patent/DE2528666C2/de not_active Expired
- 1975-07-01 GB GB2776375A patent/GB1507752A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2279135B1 (de) | 1977-07-22 |
| JPS5312793B2 (de) | 1978-05-04 |
| FR2279135A1 (fr) | 1976-02-13 |
| DE2528666A1 (de) | 1976-01-29 |
| GB1507752A (en) | 1978-04-19 |
| IT1039152B (it) | 1979-12-10 |
| DE2528666C2 (de) | 1984-11-22 |