JPH0954205A - Production of prism sheet - Google Patents
Production of prism sheetInfo
- Publication number
- JPH0954205A JPH0954205A JP7227159A JP22715995A JPH0954205A JP H0954205 A JPH0954205 A JP H0954205A JP 7227159 A JP7227159 A JP 7227159A JP 22715995 A JP22715995 A JP 22715995A JP H0954205 A JPH0954205 A JP H0954205A
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- silicon single
- prism sheet
- sides
- protective film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Optical Elements Other Than Lenses (AREA)
- Liquid Crystal (AREA)
- Light Guides In General And Applications Therefor (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、フィルム・液晶パ
ネル等を照明するバックライトにおいて、輝度値向上の
ため用いられる樹脂性プリズムシートに関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resin prism sheet used for improving a brightness value in a backlight for illuminating a film / liquid crystal panel or the like.
【０００２】[0002]
【従来の技術】従来のバックライト用樹脂プリズムシー
トは、金属板等剛体上をダイヤモンドバイト等で切断加
工し、一方向に周期的な凹の三角形状を形成し、これを
樹脂に転写させていた。転写されたプリズムシートは凸
面と平面からなる構成となる。このプリズムシートをバ
ックライトに用いる際は、図２に示すように、バックラ
イト３上に２枚のプリズムシート２をほぼ直交させて平
面側をバックライト側として配置する使用法を採ってい
る。これは、プリズムシートによる輝度値向上効果は、
断面が三角形となる方向に働くためである。2. Description of the Related Art In a conventional resin prism sheet for a backlight, a rigid body such as a metal plate is cut and processed by a diamond bite or the like to form a periodic triangular triangle shape which is transferred to a resin. It was The transferred prism sheet has a convex surface and a flat surface. When this prism sheet is used for a backlight, as shown in FIG. 2, a method is used in which two prism sheets 2 are substantially orthogonal to each other on the backlight 3 and the plane side is arranged as the backlight side. This is because the effect of improving the brightness value by the prism sheet is
This is because the section works in the direction of a triangle.
【０００３】[0003]
【発明が解決しようとする課題】前述したように、従来
のプリズムシートでは２枚使用となっている。これを１
枚とするため、四角錘形状を持つプリズムシート作製が
試みられている。しかし、金属板等剛体上に三角形状を
一方向に切削加工後、直交方向に再度切削加工すると、
四角錘頂点部にバリ等欠陥が発生しやすく、転写の元と
なる金型の加工が困難なため実用に至っていない。As described above, the conventional prism sheet uses two sheets. This one
Since the number of sheets is one, it has been attempted to manufacture a prism sheet having a quadrangular pyramid shape. However, if a triangular shape is cut on a rigid body such as a metal plate in one direction and then cut again in the orthogonal direction,
Defects such as burrs are likely to occur at the apex of the quadrangular pyramid, and it is difficult to process the die that is the source of the transfer, so that it has not been put into practical use.
【０００４】[0004]
【課題を解決するための手段】本発明は、保護膜を有す
るシリコン単結晶（１００）面上に辺の方向が［１１
０］方向である正方形にて分割し、その正方形辺部にフ
ォトレジストパターンをフォトリソグラフにより作製
し、このシリコン単結晶の保護膜をエッチングによりフ
ォトレジストパターンと同一パターンとし、次にこのシ
リコン単結晶をアルカリ性溶液にてエッチングし正方形
部に｛１１１｝面を四側面とする凹の正四角錐を形成し
さらに凹の正四角錐四側面上に離型材層を設け凹の正四
角錐を樹脂転写し、凸の正四角錐プリズムを多数形成す
ることによりプリズムシートを作製するものである。According to the present invention, the direction of side is [11] on a silicon single crystal (100) plane having a protective film.
[0] direction is divided into squares, a photoresist pattern is formed on the sides of the square by photolithography, and the protective film of this silicon single crystal is etched to the same pattern as the photoresist pattern. Is etched with an alkaline solution to form a square regular pyramid with {111} planes as the four sides on the square part, and a release material layer is provided on the four sides of the regular square pyramid. The prism sheet is manufactured by forming a large number of regular quadrangular pyramid prisms.
【０００５】[0005]
【発明の実施の形態】シリコン単結晶として入手容易な
シリコンウェハーを用いることとし、以下、本発明の実
施手順を説明する。BEST MODE FOR CARRYING OUT THE INVENTION A silicon wafer which is easily available as a silicon single crystal will be used, and the procedure for carrying out the present invention will be described below.
【０００６】まず、辺の方向が平行である正方形を配置
したフォトマスクを作製する。次にシリコン酸化膜ある
いはシリコン窒化膜を保護膜として有する（１００）シ
リコンウェハー上にフォトマスク内正方形の辺の方向が
［１１０］となるようにフォトリソグラフ技術によりフ
ォトレジストパターンを形成する。このときフォトレジ
ストは、正方形辺部に存在するようにネガ・ポジを選定
する。First, a photomask in which squares whose sides are parallel to each other are arranged is manufactured. Next, a photoresist pattern is formed on the (100) silicon wafer having a silicon oxide film or a silicon nitride film as a protective film by a photolithography technique so that the direction of the side of the square in the photomask is [110]. At this time, for the photoresist, the negative and positive are selected so that the photoresist exists on the side of the square.
【０００７】さらに、シリコンウェハー上保護膜をエッ
チングし、フォトレジストパターンと同一パターンとす
る。このエッチングは、保護膜がシリコン酸化膜の場合
は弗酸，硝弗酸等で可能であり、ドライエッチングにお
いては、シリコン酸化膜，シリコン窒化膜両者共可能で
ある。Further, the protective film on the silicon wafer is etched to have the same pattern as the photoresist pattern. This etching can be performed with hydrofluoric acid, nitric hydrofluoric acid or the like when the protective film is a silicon oxide film, and with dry etching, both the silicon oxide film and the silicon nitride film can be used.
【０００８】その後、シリコンウェハーを水酸化カリウ
ム，水酸化ナトリウム等のアルカリ性溶液でエッチング
すると、上述正方形部には｛１１１｝面を四側面とする
凹の 面である（１１１）面のエッチング速度が（１００）面
に比較し遅いため、結果として（１１１）面が露出する
ためである。After that, when the silicon wafer is etched with an alkaline solution such as potassium hydroxide or sodium hydroxide, the above-mentioned square portion has a concave shape having four sides on the {111} plane. This is because the etching rate of the (111) plane, which is a plane, is slower than that of the (100) plane, and as a result, the (111) plane is exposed.
【０００９】次に、凹の正四角錘四側面上にシリコンオ
イル，真空拡散ポンプオイル等の離型材層を蒸着等によ
り形成し、紫外線硬化樹脂，熱硬化樹脂等にて転写する
と、図１に示すように凸の正四角錘プリズム１が多数存
在するプリズムシートが得られる。Next, a mold release material layer such as silicon oil or vacuum diffusion pump oil is formed on the four side surfaces of the concave regular square pyramid by vapor deposition or the like, and transferred with an ultraviolet curable resin, a thermosetting resin or the like. As shown, a prism sheet having a large number of convex regular square pyramid prisms 1 is obtained.
【００１０】[0010]
【発明の効果】本発明は、フォトリソグラフ，エッチン
グ工程を用い四角錘を形成するため頂点部にバリ等欠陥
のない凸の四角錘プリズム群が作製できる。それにより
従来２枚使用であったものが１枚となる。According to the present invention, since a quadrangular pyramid is formed by using photolithography and an etching process, a convex quadrangular pyramid prism group having no defects such as burrs at the apex can be manufactured. As a result, the number of sheets used in the past is reduced to one.
【００１１】[0011]
図１ 本発明プリズムシート 斜視図 図２ 従来プリズムシートの形状及びそれの使用形態を
示す斜視図Fig. 1 Perspective view of the present invention prism sheet Fig. 2 Perspective view showing the shape of a conventional prism sheet and its usage
【００１２】[0012]
１ 凸の正四角錘プリズム ２ 従来のプリズムシート ３ バックライト 1 Convex square pyramid prism 2 Conventional prism sheet 3 Backlight
Claims (1)
００）面上を辺の方向が［１１０］方向である正方形に
て分割し、その正方形辺部にフォトレジストパターンを
フォトリソグラフにより作製する工程。 （２）上記処理をしたシリコン単結晶の保護膜をエッチ
ングによりフォトレジストパターンと同一パターンとす
る工程。 （３）次にこのシリコン単結晶をアルカリ性溶液にてエ
ッチングし、正方形部に｛１１１｝面を四側面とする凹
の正四角錐を形成する工程。 （４）上記凹の正四角錐四側面上に離型材層を設け、さ
らにこの凹の正四角錐を樹脂転写する工程。 この４工程からなる凸の正四角錐プリズムを多数形成し
たプリズムシートの製造方法。1. A silicon single crystal having a protective film (1)
The step of dividing the (00) plane into squares whose sides are in the [110] direction and forming a photoresist pattern on the sides of the squares by photolithography. (2) A step of etching the silicon single crystal protective film which has been subjected to the above-mentioned treatment into the same pattern as the photoresist pattern. (3) Next, a step of etching this silicon single crystal with an alkaline solution to form a concave regular square pyramid having four sides on the {111} plane in the square portion. (4) A step of providing a release material layer on the four sides of the concave regular pyramid and further transferring the concave regular pyramid with resin. A method for manufacturing a prism sheet having a large number of convex regular pyramidal prisms formed by these four steps.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7227159A JPH0954205A (en) | 1995-08-12 | 1995-08-12 | Production of prism sheet |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7227159A JPH0954205A (en) | 1995-08-12 | 1995-08-12 | Production of prism sheet |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0954205A true JPH0954205A (en) | 1997-02-25 |
Family
ID=16856426
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7227159A Pending JPH0954205A (en) | 1995-08-12 | 1995-08-12 | Production of prism sheet |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0954205A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006341868A (en) * | 2005-06-08 | 2006-12-21 | Key Tranding Co Ltd | Decorative container |
| CN1303459C (en) * | 2002-11-19 | 2007-03-07 | 阿尔卑斯电气株式会社 | Illumination device and LCD device |
| WO2007037250A1 (en) * | 2005-09-28 | 2007-04-05 | Zeon Corporation | Light diffusion plate and backlight device |
| US7849022B2 (en) | 2006-07-11 | 2010-12-07 | Fujifilm Corporation | Optical functional sheet, and display device |
| CN109856715A (en) * | 2019-04-03 | 2019-06-07 | 苏州宝瑞德纳米光学材料有限公司 | A kind of micro-prism structure and its application |
-
1995
- 1995-08-12 JP JP7227159A patent/JPH0954205A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1303459C (en) * | 2002-11-19 | 2007-03-07 | 阿尔卑斯电气株式会社 | Illumination device and LCD device |
| JP2006341868A (en) * | 2005-06-08 | 2006-12-21 | Key Tranding Co Ltd | Decorative container |
| WO2007037250A1 (en) * | 2005-09-28 | 2007-04-05 | Zeon Corporation | Light diffusion plate and backlight device |
| US7849022B2 (en) | 2006-07-11 | 2010-12-07 | Fujifilm Corporation | Optical functional sheet, and display device |
| CN109856715A (en) * | 2019-04-03 | 2019-06-07 | 苏州宝瑞德纳米光学材料有限公司 | A kind of micro-prism structure and its application |
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