JPH0614188B2 - Method and apparatus for coating electrophotographic recording material substrate, etc. - Google Patents
Method and apparatus for coating electrophotographic recording material substrate, etc.Info
- Publication number
- JPH0614188B2 JPH0614188B2 JP58201105A JP20110583A JPH0614188B2 JP H0614188 B2 JPH0614188 B2 JP H0614188B2 JP 58201105 A JP58201105 A JP 58201105A JP 20110583 A JP20110583 A JP 20110583A JP H0614188 B2 JPH0614188 B2 JP H0614188B2
- Authority
- JP
- Japan
- Prior art keywords
- coating
- coating liquid
- hopper
- base material
- distribution chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0241—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to elongated work, e.g. wires, cables, tubes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0525—Coating methods
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/06—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying two different liquids or other fluent materials, or the same liquid or other fluent material twice, to the same side of the work
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Coating Apparatus (AREA)
- Photoreceptors In Electrophotography (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Description
【発明の詳細な説明】 ［産業上の利用分野］ 本発明はエンドレスに形成された連続周面を有する基材
の外面上に塗布液を塗布する電子写真記録体基材等の塗
布方法および装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method and apparatus for coating a base material for electrophotographic recording material, etc., which applies a coating liquid on the outer surface of a base material having a continuous peripheral surface formed endlessly. Regarding
［発明の背景］ 本出願人は、電子写真記録体基材等のビード塗布装置と
して、スライドホッパー型の塗布装置を先に特願昭57-7
4030号として提案した。この先提案技術によれば、エン
ドレスに形成された連続面を有する基材の外面上に塗布
する装置において、塗布液分配室及び塗布液分配室につ
ながる塗布液分配スリットが連続であり、塗布液分配室
に塗布液を供給する塗布液供給手段が塗布液分配室に連
続してあり、塗布液分配スリットの内側に位置し、塗布
液分配スリットの塗布液流出口の下側に連続して下方斜
めに傾斜しかつエンドレスに形成された連続面を有する
基材外寸よりやや大なる寸法において終端をなすように
構成された液スライド面を有し、基材外寸よりやや大き
く、液スライド面終端より下方に延びるホッパーエッジ
（唇状部）を有する塗布装置により塗布が行われる。こ
の塗布装置によれば、スライド面を用いるため高粘度の
塗布液による塗布には適さない。またこの装置では、基
材を取り囲むように配置された塗布液分配室へパイプ等
の供給手段を用いて塗布液を供給しており、該塗布液は
前記パイプを押し出され塗布液供給口において、前記塗
布液分配室内を左右に分散し、該分配室に沿って基材を
取り囲むように流れ、塗布液分配スリットを介して該基
材外面上に塗布される。このため、前記塗布液分配スリ
ットを介して基材へ塗布される塗布液は、端部のないエ
ンドレスの液流れを構成するため、基材を基準にして塗
布液供給口の対向側の塗布液分配室内において、前記左
右に分散して流れる。この際、特に塗布液が分散系であ
る場合、流れてきた液流れの端部同志の衝突により、塗
布される基材の一部、即ち液の衝突の位置にスジ故障や
膜厚不良が生じる欠点を、本発明者は見出した。係る欠
点は、塗布する基材がエンドレスではなくシート状の場
合に一般的に用いられている塗布方法、例えば、特開昭
49-42343号や同54-124039号記載の技術の場合には、液
スライド面が単なる平面であると共に塗布液が略同一幅
のまま平面上を流下する構成であるので、前述した供給
した液流れの側端部同志の衝突が全くあり得ないため全
く予想し得ないことであった。BACKGROUND OF THE INVENTION The present applicant has previously filed a patent application for a slide hopper type coating device as a bead coating device for an electrophotographic recording material substrate or the like in Japanese Patent Application No. 57-7.
Proposed as No. 4030. According to the previously proposed technique, in an apparatus for coating on the outer surface of a base material having a continuous surface formed endlessly, the coating liquid distribution chamber and the coating liquid distribution slit connected to the coating liquid distribution chamber are continuous, and the coating liquid distribution slit is continuous. The coating liquid supply means for supplying the coating liquid to the chamber is connected to the coating liquid distribution chamber, is located inside the coating liquid distribution slit, and is continuously slanted downward below the coating liquid outlet of the coating liquid distribution slit. Has a continuous surface that is inclined and endless, and has a liquid slide surface configured to terminate at a dimension slightly larger than the outer dimension of the base material, and is slightly larger than the outer dimension of the base material. The application is performed by an application device having a hopper edge (lip portion) extending downward. According to this coating device, since the slide surface is used, it is not suitable for coating with a highly viscous coating liquid. Further, in this apparatus, the coating liquid is supplied to the coating liquid distribution chamber arranged so as to surround the substrate by using a supply means such as a pipe, and the coating liquid is extruded from the pipe, and at the coating liquid supply port, The coating liquid distribution chamber is dispersed right and left, flows so as to surround the base material along the distribution chamber, and is applied onto the outer surface of the base material through the coating liquid distribution slit. Therefore, the coating liquid applied to the base material through the coating liquid distribution slit constitutes an endless liquid flow having no end, and therefore the coating liquid on the opposite side of the coating liquid supply port with respect to the base material. In the distribution chamber, it flows in a distributed manner to the left and right. At this time, particularly when the coating liquid is a dispersion system, due to the collision of the end portions of the flowing liquid flow, a streak failure or a film thickness defect occurs at a part of the substrate to be coated, that is, the position of the liquid collision The inventor has found a drawback. Such a drawback is caused by a coating method which is generally used when the substrate to be coated is in the form of a sheet rather than an endless one, for example, JP
In the case of the technique described in No. 49-42343 or No. 54-124039, since the liquid slide surface is a simple flat surface and the coating liquid flows down on the flat surface with substantially the same width, the liquid supplied as described above. It was totally unpredictable because there could be no collision between the side ends of the stream.
また、用いられる塗布液として、感光性素材を有機溶媒
に溶解した溶媒系のものと、感光性素材を分散剤に分散
した分散系のものとがあるが、特に分散系の塗布液の場
合には、塗布液分配室内における停滞時間が長くなる
と、即ち、「分配室内停滞時間＜凝集開始時間」の状態
にあると、２次凝集を起こし、さらに該塗布液の粘度が
低い場合には前記凝集が顕著に生じるという問題が生じ
ることも判った。このため、本発明者は上記対策とし
て、分散安定剤の添加や粘度の増加等を試みたが、電子
写真記録体においては、分散剤の添加は性能低下につな
がり、又２次凝集の発生しにくい粘度まで増加させる
と、スライド面上の液流下が円滑に行われず、必要且つ
均一な塗膜が得られないという欠点が生じた。Further, as the coating liquid used, there are a solvent system in which a photosensitive material is dissolved in an organic solvent and a dispersion system in which a photosensitive material is dispersed in a dispersant, and particularly in the case of a dispersion type coating liquid. When the stagnation time in the coating liquid distribution chamber becomes long, that is, when the stagnation time in the distribution liquid is less than the aggregation start time, secondary aggregation occurs, and when the viscosity of the coating liquid is low, the aggregation occurs. It was also found that there is a problem in that For this reason, the present inventor has attempted to add a dispersion stabilizer and increase the viscosity as a countermeasure, but in the electrophotographic recording medium, the addition of a dispersant leads to a decrease in performance and also causes secondary aggregation. When the viscosity was increased to a difficult level, the liquid flow on the slide surface was not smoothly performed, and there was a drawback that a necessary and uniform coating film could not be obtained.
［発明の目的］ 本発明は上記スライド型ホッパー装置における欠点を解
決すべく成されたもので、高粘度塗布液は勿論のこと、
分散系の塗布液にも適用でき、エンドレスに形成された
連続周面を塗布する場合、スジ故障を起こすことなく均
一且つ必要な膜厚が安定に得られるよう塗布することが
可能な塗布方法および装置を提供することにある。[Object of the Invention] The present invention has been made to solve the drawbacks in the above-mentioned slide type hopper device.
A coating method that can be applied to a dispersion type coating solution and, when a continuous peripheral surface formed endlessly is applied, can be applied so that a uniform and required film thickness can be stably obtained without causing streak failure, and To provide a device.
本発明の他の目的は、分散安定性の悪い塗布液であって
も、感光性素材の凝集を生ぜしめることなく基材へ塗布
可能な塗布方法および装置を提供するにある。Another object of the present invention is to provide a coating method and apparatus capable of coating a base material without causing agglomeration of a photosensitive material even if the coating solution has poor dispersion stability.
本発明の更に他の目的ないし付随する目的は本明細書の
以下の記述によって明らかにされる。Other and further objects of the present invention will be made clear by the following description of the present specification.
［課題を解決するための手段］ 上記目的を達成するための本発明の塗布方法は、塗布液
かき取り刃を有さず、膜厚に必要とされる量の塗布液を
ホッパー塗布面に設けられた塗布液流出口に押出す押出
しホッパー塗布方法において、固定の塗布装置を用い、
電子写真記録体基材の如く、エンドレスに形成された連
続周面を有すると共に一端から他端まで同一形状を有す
る柱状又は筒状の基材を連続的に上又は下方向に移動さ
せながら、１又は２以上の塗布液を塗布する方法であっ
て、塗布液分配室に供給された塗布液を、エンドレスの
塗布液分配スリットを通して前記基材周面を取り囲むよ
うに基材全周に亘って近接形成されたホッパー塗布面に
設けられたエンドレスの塗布液流出口に直接押し出し、
前記基材とホッパー塗布面との間の全周に亘って形成さ
れた接液部又はビート部に連続的に供給して塗布するこ
とを特徴とする。[Means for Solving the Problems] In the coating method of the present invention for achieving the above object, a coating liquid scraping blade is not provided, and an amount of coating liquid required for film thickness is provided on a hopper coating surface. In the extrusion hopper coating method of extruding to the coating liquid outlet that is, using a fixed coating device,
While continuously moving upward or downward a columnar or cylindrical substrate having an endless continuous peripheral surface and having the same shape from one end to the other, such as an electrophotographic recording medium substrate, Alternatively, a method of applying two or more coating liquids, wherein the coating liquid supplied to the coating liquid distribution chamber is brought close to the entire circumference of the base material so as to surround the peripheral surface of the base material through an endless coating liquid distribution slit. Directly extruded to the endless coating liquid outlet provided on the formed hopper coating surface,
The present invention is characterized in that the liquid-contacting portion or the beat portion formed over the entire circumference between the base material and the hopper application surface is continuously supplied and applied.
また、上記本発明法を実施する場合に用いて適切である
本発明の装置は、塗布液かき取り刃を有さず、膜厚に必
要とされる量の塗布液をホッパー塗布面に設けられた塗
布液流出口に押出す押出しホッパー塗布装置において、
固定の塗布装置により、電子写真記録体基材の如く、エ
ンドレスに形成された連続周面を有すると共に一端から
他端まで同一形状を有する柱状又は筒状の基材を連続的
に上又は下方向に移動させながら、１又は２以上の塗布
液を塗布する装置であって、該基材周面を取り囲むよう
に且つ塗布液が、接液部又はビート部において連続的に
接液又はビート形成可能な間隙を全周に亘って維持する
ようにエンドレスのホッパー塗布面が形成されており、
該ホッパー塗布面に、前記塗布液が直接押し出される塗
布液流出口がエンドレスに形成されて成るホッパー装置
を有しており、該ホッパー装置には、前記ホッパー塗布
面に塗布液分配スリットを通じて、塗布液を直接供給す
る塗布液分配室が基材周面を取り囲むように設けられて
いることを特徴とする。The apparatus of the present invention, which is suitable for use when carrying out the method of the present invention, does not have a coating liquid scraping blade, and is provided with an amount of the coating liquid required for the film thickness on the hopper coating surface. In the extrusion hopper coating device that extrudes to the coating liquid outlet,
With a fixed coating device, a columnar or tubular base material having an endless continuous peripheral surface and the same shape from one end to the other end, like an electrophotographic recording material base material, is continuously moved upward or downward. A device for applying one or more coating liquids while moving to a substrate, which is capable of continuously contacting or forming beetlets so as to surround the peripheral surface of the base material and at the liquid contacting portion or the beat portion. An endless hopper coating surface is formed to maintain a wide gap over the entire circumference.
The hopper has a hopper device in which the coating liquid outlet for directly extruding the coating liquid is endlessly formed on the hopper coating surface, and the hopper device has a coating liquid distribution slit on the hopper coating surface for coating. A coating liquid distribution chamber for directly supplying the liquid is provided so as to surround the peripheral surface of the base material.
尚、エンドレスに形成された連続面を有する基材の外面
上への薄膜で均一な塗布に関しては、他の方法として、
スプレー塗布法、浸漬塗布法、ブレード塗布法、ロール
塗布法等の種々の方法（各々については下記にて詳説）
が検討されているが、何れの方法においても先に提案し
た特願昭５７−７４０３０号及び本願発明の技術の様に
満足すべきものが得られない。In addition, as for the uniform coating with a thin film on the outer surface of the base material having a continuous surface formed endlessly, as another method,
Various methods such as spray coating method, dip coating method, blade coating method, roll coating method, etc. (each is explained in detail below)
However, in any of the methods, satisfactory results can not be obtained like the previously proposed Japanese Patent Application No. 57-74030 and the technique of the present invention.
スプレー塗布法ではスプレーガンより噴出した塗布液滴
が該エンドレスに形成された連続面を有する基材の外周
面上に到達するまでに溶媒が蒸発するために塗布液滴の
固形分濃度が上昇してしまい、それにともない塗布液滴
の粘度上昇がおこって液滴が面に到達した時、液滴が面
上を充分に広がらないため、あるいは乾燥固化してしま
った粒子が表面に付着するため、塗布表面の平滑性の良
いものが得られない。また該連続面を有する基材への液
滴の到達率が100%でなく部分的にも不均一であるため、
膜厚コントロールが非常に困難である。更に、高分子溶
液等では糸引きを起こす事があるため使用する溶媒及び
樹脂に制限がある。ブレード塗布法、ロール塗布法は例
えば円筒上基材の長さ方向にブレードもしくはロールを
配置し該円筒状基材を円周方向に回転させて塗布を行い
円筒状基材を１回転させた後ブレードもしくはロールを
後退させるものである。しかしながら、ブレードもしく
はロールを後退させる際、塗布液の粘性により、塗布膜
厚の一部に他の部分より厚い部分が生じ、均一な塗膜が
得られない欠点がある。特開昭54−87229号公報、特開
昭54−128740号公報には、ブレード塗布におけるブレー
ドが真空と大気の切換え可能なタンクもしくはシリンダ
ー内のピストンの運動の方向の変化とつながっており、
ブレードを後退させる際前記真空側に切り換えることに
より余剰な塗布液を吸い取り均一な塗膜を得るものであ
る。しかしながら、均一な塗膜を得るためには吸引する
タイミングの設定や吸引する塗布液量の精密な制御が必
要となる、この制御が複雑かつ困難であるなどの欠点が
ある。In the spray coating method, the solvent evaporates by the time the coating droplets ejected from the spray gun reach the outer peripheral surface of the base material having the endlessly formed continuous surface, so that the solid content concentration of the coating droplets increases. When the droplets reach the surface due to the increase in viscosity of the applied droplets, the droplets do not spread sufficiently on the surface, or the dried and solidified particles adhere to the surface. The smoothness of the coated surface cannot be obtained. Further, since the arrival rate of the droplets to the base material having the continuous surface is not 100% and partially uneven,
It is very difficult to control the film thickness. Further, since a polymer solution or the like may cause stringing, there are restrictions on the solvent and resin used. The blade coating method and the roll coating method include, for example, arranging a blade or a roll in the length direction of a cylindrical base material, rotating the cylindrical base material in the circumferential direction to perform coating, and rotating the cylindrical base material once. The blade or roll is retracted. However, when the blade or roll is retracted, there is a drawback in that a part of the coating film thickness is thicker than other parts due to the viscosity of the coating liquid, and a uniform coating film cannot be obtained. JP-A-54-87229 and JP-A-54-128740 disclose that a blade in blade coating is connected to a change in the direction of movement of a piston in a tank or a cylinder that can switch between vacuum and atmosphere.
By switching to the vacuum side when the blade is retracted, the excess coating liquid is absorbed to obtain a uniform coating film. However, in order to obtain a uniform coating film, it is necessary to set the suction timing and precisely control the amount of coating liquid to be sucked, and there are drawbacks such that this control is complicated and difficult.
浸漬塗布法（特開昭49−130736号公報参照）は、上記に
おけるような塗布膜表面の平滑性、塗布膜の均一性の悪
い点は改良される。しかし塗布膜厚の制御が塗布液物性
（粘度、表面張力、密度）と塗布速度に支配され塗布液
物性の調整が非常に重要であり、また塗布速度も低く制
限されるため生産性が悪い等の欠点がある。The dip coating method (see Japanese Patent Laid-Open No. 49-130736) improves the above-mentioned problems of poor smoothness of the coating film surface and uniformity of the coating film. However, the control of the coating film thickness is governed by the physical properties of the coating liquid (viscosity, surface tension, density) and the coating speed, and adjustment of the physical properties of the coating liquid is very important. Also, the coating speed is limited to a low level, resulting in poor productivity. There is a drawback of.
特開昭56−15864号公報、特開昭56−15865号公報、特開
昭56−15866号公報には、円筒状基材円周にあるクリア
ランスを持って配置されたかき取り刃を移動させ、塗布
をおこなうため形成する膜厚はかき取り刃と円筒状基材
のクリアランスにより決定され、その膜厚はクリアラン
スの約１／２となり均一な膜厚を得るためには円筒状基
材を回転させたりクリアランスを一定に保つためにかき
取り刃の保持方法を提案している。さらに塗膜厚を変化
させる場合においては塗膜厚はクリアランスの約１／２
となるため、必要とする塗膜厚に応じたクリアランスを
有するようなかき取り刃を用意し交換する必要があり、
膜厚変更のたびに作業員は煩雑な作業を強いられる。ま
たかき取り刃の設定精度が即膜厚精度となるため精度に
遊び（可変性）がなく、塗布膜厚の微調整が非常にむず
かしい。この点、本発明によれば、押し出しホッパーの
塗布液流出口が、エンドレス周面を有する柱状又は筒状
基材を取り囲む構成、即ち、接液部又はビード部が、上
記被塗布基材を囲む状態で連続的に塗布するので、いわ
ゆる調心効果がみられ、塗布膜厚が均一となり、更に接
液状態又はビードが形成される範囲内で送液量によって
膜厚が決まるため膜厚の微調整が容易である。JP-A-56-15864, JP-A-56-15865, and JP-A-56-15866 move a scraping blade arranged with a clearance on the circumference of a cylindrical substrate, The film thickness to be formed for coating is determined by the clearance between the scraping blade and the cylindrical substrate. The film thickness is about 1/2 of the clearance and the cylindrical substrate is rotated to obtain a uniform film thickness. In order to keep the clearance constant, the scraping blade holding method is proposed. Furthermore, when changing the coating thickness, the coating thickness is about 1/2 of the clearance.
Therefore, it is necessary to prepare and replace a scraping blade having a clearance according to the required coating thickness.
Every time the film thickness is changed, the worker is forced to perform complicated work. Further, since the setting accuracy of the scraping blade is the film thickness accuracy immediately, there is no play (variability) in accuracy, and it is very difficult to finely adjust the coating film thickness. In this regard, according to the present invention, the coating liquid outlet of the extrusion hopper surrounds the columnar or cylindrical base material having the endless peripheral surface, that is, the liquid contact portion or the bead portion surrounds the base material to be coated. Since it is applied continuously in the state, so-called centering effect is seen, the applied film thickness becomes uniform, and the film thickness is fine because the film thickness is determined by the liquid transfer amount in the wetted state or within the range where beads are formed. Easy to adjust.
［発明の具体的構成］ 本発明は単層塗布の場合は勿論のこと、同時重量塗布の
場合にも適用可能である。[Specific Structure of the Invention] The present invention is applicable not only in the case of single layer coating but also in the case of simultaneous weight coating.
先ず、単層塗布の場合について主に説明する。本発明に
係る塗布装置は、エンドレスに形成された連続面を有す
ると共に一端から他端まで同一形状を有する柱状又は筒
状の基材の外面上に塗布する装置において、塗布液分配
室及び塗布液分配室につながる塗布液分配スリットが連
続であり、塗布液分配室（チャンバー室）に塗布液を供
給する塗布液供給手段が塗布液分配室に連結してあり、
前記塗布液分配スリットを通ってその出口である塗布液
流出口が、エンドレスに形成された連続周面を有する基
材外寸よりやや大なる寸法において形成された塗布面と
の間の全周に設けられ、該塗布面は前記基材外寸より0.
05〜１mm大きく、より好ましくは塗布膜厚をh0mmとする
と２h0mmから４h0mmまでの範囲であり、塗布方向長さ0.
1〜10mm、より好ましくは0.5〜４mmを有するものである
のが望ましい。また該塗布面はその上端より鉛直下方及
びそれより30度までの範囲内で前記基材の反対側に傾斜
したものであり、より好ましくは鉛直下方及びそれより
20度迄の範囲内で傾いて延びるものがよい。First, the case of single-layer coating will be mainly described. The coating apparatus according to the present invention is an apparatus for coating on the outer surface of a columnar or cylindrical base material having a continuous surface formed endlessly and having the same shape from one end to the other end. A coating liquid distribution slit connected to the distribution chamber is continuous, and a coating liquid supply means for supplying the coating liquid to the coating liquid distribution chamber (chamber chamber) is connected to the coating liquid distribution chamber,
The coating liquid outlet, which is the outlet through the coating liquid distribution slit, has the entire circumference between the coating surface formed in a dimension slightly larger than the outer dimension of the base material having the continuous peripheral surface formed endlessly. It is provided, and the coating surface is 0.
It is larger by 05 to 1 mm, more preferably from 2h 0 mm to 4h 0 mm when the coating thickness is h 0 mm, and the coating direction length is 0.
It is desirable to have a diameter of 1 to 10 mm, more preferably 0.5 to 4 mm. Further, the coating surface is vertically downward from the upper end and inclined to the opposite side of the substrate within a range of up to 30 degrees from it, more preferably vertically downward and
It is preferable that it extends at an angle of up to 20 degrees.
又塗布装置に供給された塗布液は一端塗布液分配室に溜
められ、これに連続する塗布液分配スリットに塗布液を
均一に分配するようにされるが、前記塗布液を前記スリ
ットに均一に分配しかつ前記スリットに分配された塗布
液を基材面に均一に塗布できるようにするには、前記塗
布液分配スリットに対する前記塗布液分配室の圧力損失
比は40以上であり、好ましくは40〜100,000の範囲内で
ある。圧力損失が40未満の場合は、塗布液の均一な分配
及び塗布ができにくくなり、100,000を超えると塗布液
分配室を大きくするとか、スリットを長くする必要が生
じ装置構造上問題を生ずる。Further, the coating liquid supplied to the coating device is temporarily stored in the coating liquid distribution chamber, and the coating liquid is evenly distributed to the coating liquid distribution slits continuous with the coating liquid distribution chamber. In order to allow the coating liquid to be distributed and distributed to the slit to be uniformly applied to the substrate surface, the pressure loss ratio of the coating liquid distribution chamber to the coating liquid distribution slit is 40 or more, preferably 40. Within the range of ~ 100,000. If the pressure loss is less than 40, it becomes difficult to uniformly distribute and apply the coating liquid, and if it exceeds 100,000, the coating liquid distribution chamber needs to be enlarged or the slit needs to be elongated, which causes a problem in the structure of the apparatus.
本発明の塗布装置は、ホッパー塗布面内に、エンドレス
形成された連続面を有する基材を挿入し、前記装置に対
して基材を連続的に上又は下方向に移動させ、塗布液分
配スリットを通って塗布液流出口から押し出された塗布
液は、直接該基材外周面に塗布される。The coating device of the present invention is a hopper coating surface, a base material having an endless continuous surface is inserted, the base material is continuously moved upward or downward with respect to the device, and a coating liquid distribution slit is provided. The coating liquid extruded from the coating liquid outlet through the coating liquid is directly applied to the outer peripheral surface of the base material.
上記本実施例の装置では、ホッパーエッジと該基材との
間の全周に形成されるビードによらず接液塗布の場合、
エンドレスの塗布液流出口から押し出された塗布液が直
接基材に塗布されるため、粘度増加により塗布が不能と
なる事はないため、顔料分散系における２次凝集に対し
ても、２次凝集の発生し難い粘度において塗布が行える
という利点がある。さらに塗布液流出口から押し出され
た塗布液が直接基材に塗布されるため、被塗布基材の調
心効果がみられる。In the apparatus of the present embodiment, in the case of liquid contact coating regardless of the beads formed on the entire circumference between the hopper edge and the base material,
Since the coating liquid extruded from the endless coating liquid outlet is directly applied to the base material, the coating does not become impossible due to an increase in viscosity. There is an advantage that coating can be performed at a viscosity at which the occurrence of Further, since the coating liquid extruded from the coating liquid outlet is directly applied to the base material, the centering effect of the base material to be coated can be seen.
次に、電子写真感光体では、均一に十数μｍ以下という
薄膜が要求される事が多く、こういう場合、粘度を増加
させられず、分散系塗布液の場合にはスライドホッパー
型装置と同様の問題が生じる事がわかった。Next, the electrophotographic photosensitive member is often required to have a thin film having a uniform thickness of not more than ten and several μm. In such a case, the viscosity cannot be increased, and in the case of the dispersion type coating liquid, the same as in the slide hopper type device. I knew there was a problem.
この場合、塗布液分配室に対して、塗布に必要な液量よ
りも過剰量の塗布液を供給すると共に該過剰量の塗布液
を該塗布液分配室外へ取り出しながら塗布を行う事によ
って、スジのない良好な塗布が可能となる。In this case, a streak is generated by supplying an excess amount of the coating liquid to the coating liquid distribution chamber and removing the excess amount of the coating liquid from the coating liquid distribution chamber. It is possible to achieve a good coating without any damage.
本発明の塗布装置における塗布液分配室に、塗布液を供
給する塗布液供給手段および塗布液を排出する塗布液排
出手段としては、パイプを用いることが好ましく、かつ
塗布液の安定性、均一性等のより一層の向上のため、各
々２以上の複数のパイプ等を配設してもよい。Pipes are preferably used as the coating liquid supply means for supplying the coating liquid and the coating liquid discharging means for discharging the coating liquid to the coating liquid distribution chamber in the coating apparatus of the present invention, and the stability and uniformity of the coating liquid are preferable. In order to further improve the above, two or more pipes may be provided for each.
本発明の塗布装置による塗布は次のようにして行われ
る。即ち、エンドレスに形成された連続周面を有する基
材を移動させながら塗布液を塗布する塗布装置におい
て、該基材周面を取り囲むように且つ塗布液が基材に連
続して接液可能な間隙を全周に維持するようにホッパー
塗布面が形成されており、該ホッパー塗布面に塗布液分
配スリットを通じて塗布液を直接供給する塗布液分配室
が基材周面を取り囲むように設けられており、且つ該塗
布液分配室へ塗布液を連続的に供給する塗布液供給口が
設けられると共に、該塗布液を該塗布液分配室外へ排出
する塗布液排出口が塗布装置に設けられており、該塗布
液分配室内にポンプ等により送られた塗布液が前記塗布
液供給口より供給され、該供給口からの塗布液は基材の
円周方向に分配され、これを取り囲むように流れ、一部
は前記塗布液分配スリットを通じて、その出口である塗
布液流出口より流出し、他の一部は前記塗布液排出口よ
り前記分配室外へ排出される。前記塗布液流出口より押
し出された塗布液は、前記間隙の全周に流出し、基材の
周面の接液部において塗布される。The coating by the coating device of the present invention is performed as follows. That is, in a coating device that applies a coating liquid while moving a base material having a continuous peripheral surface formed endlessly, the coating liquid can continuously contact the base material so as to surround the peripheral surface of the base material. A hopper coating surface is formed so as to maintain the gap on the entire circumference, and a coating liquid distribution chamber that directly supplies the coating liquid to the hopper coating surface through a coating liquid distribution slit is provided so as to surround the peripheral surface of the base material. And a coating liquid supply port for continuously supplying the coating liquid to the coating liquid distribution chamber, and a coating liquid discharge port for discharging the coating liquid to the outside of the coating liquid distribution chamber are provided in the coating device. The coating liquid sent by a pump or the like into the coating liquid distribution chamber is supplied from the coating liquid supply port, the coating liquid from the supply port is distributed in the circumferential direction of the substrate, and flows so as to surround it. Part of the coating liquid distribution slip Through, flows out from the coating liquid flow outlet which is the outlet, the other part is discharged to the distributor outdoor from the coating liquid discharge port. The coating liquid extruded from the coating liquid outlet flows out to the entire circumference of the gap and is coated at the liquid contact portion on the peripheral surface of the base material.
本発明に係る塗布液供給装置は、単層塗布装置のみなら
ず、２以上の塗布液を同時塗布する重畳塗布装置にも好
適に用いることができる。その詳細は以下の実施例で説
明する。The coating liquid supply device according to the present invention can be suitably used not only in a single-layer coating device but also in a superimposed coating device that simultaneously coats two or more coating liquids. The details will be described in the following examples.
［実施例］ 以下、本発明の実施例を添付図面に従って詳述する。し
かし本発明は以下に述べる実施態様に限定されるもので
はない。EXAMPLES Examples of the present invention will be described in detail below with reference to the accompanying drawings. However, the present invention is not limited to the embodiments described below.
第１−ａ図および第１−ｂ図は本発明に係る塗布装置に
おける２層同時塗布の場合の実施例であり、第１−ａ図
は排出口のないもの、第１−ｂ図は排出口のあるものの
基材への塗布状態を示す断面図であり、第２図はホッパ
ー装置の要部拡大断面図である。FIGS. 1-a and 1-b are examples of simultaneous two-layer coating in the coating apparatus according to the present invention. FIG. 1-a has no discharge port, and FIG. 1-b shows discharge. FIG. 2 is a cross-sectional view showing a state in which an outlet is provided on a substrate, and FIG. 2 is an enlarged cross-sectional view of a main part of a hopper device.
各図において、１は塗布装置本体、２は塗布液を塗布す
るホッパー装置である。３Ａ、３Ｂは塗布液分配室で、
該各分配室３Ａ、３Ｂには各々異なる塗布液Ｓ１、Ｓ２
を供給する供給パイプ４Ａ、４Ｂが前記分配室３Ａ、３
Ｂの塗布液供給口５Ａ、５Ｂに連結されている。第１−
ｂ図における６Ａ、６Ｂは排出パイプであり、前記塗布
液供給口５Ａ、５Ｂに対向する位置であり、前記分配室
３Ａ、３Ｂに形成された排出口７Ａ、７Ｂに連結されて
いる。８Ａ、８Ｂは塗布液分配スリットで、端部を持た
ず基材外周を取り囲むように全周に連続して形成されて
いる。９は塗布液流出口で、ホッパー塗布面10とその下
方に形成された下部端面11との間に設けられている。In each drawing, 1 is a coating apparatus main body, and 2 is a hopper apparatus for coating a coating liquid. 3A and 3B are coating liquid distribution chambers,
Different coating liquids S1 and S2 are provided in the respective distribution chambers 3A and 3B.
Supply pipes 4A, 4B for supplying
B is connected to the coating liquid supply ports 5A and 5B. 1st-
6A and 6B in FIG. 6B are discharge pipes, which are positions facing the coating liquid supply ports 5A and 5B, and are connected to discharge ports 7A and 7B formed in the distribution chambers 3A and 3B. Reference numerals 8A and 8B denote coating liquid distribution slits, which are continuously formed over the entire circumference so as not to have an end portion and to surround the outer circumference of the base material. Reference numeral 9 denotes a coating liquid outlet, which is provided between the hopper coating surface 10 and a lower end surface 11 formed below the hopper coating surface 10.
塗布液Ｓ１、Ｓ２は図示しないポンプ等により供給パイ
プ４Ａ、４Ｂを介して分配室３Ａ、３Ｂに供給される。
そこで塗布液Ｓ１、Ｓ２は塗布装置本体（円筒形）１の
円周方向に分配され、スリット８Ａ、８Ｂを介して塗布
液流出口９より流出される。一部の塗布液は分配スリッ
ト８Ａ、８Ｂを経て２層の重層に形成された状態で塗布
液流出口９より円周方向に均一且つ連続的に流出し、前
記基材外周面13に２層の層状Ｌ１、Ｌ２に塗布される。
また前記各塗布液Ｓ１、Ｓ２の他の一部、所謂過剰塗布
液は塗布液排出口７Ａ、７Ｂより排出パイプ６Ａ、６Ｂ
を介して各分配室３Ａ、３Ｂ外へ排出される。The coating liquids S1 and S2 are supplied to the distribution chambers 3A and 3B via supply pipes 4A and 4B by a pump (not shown) or the like.
Then, the coating liquids S1 and S2 are distributed in the circumferential direction of the coating apparatus main body (cylindrical) 1 and flow out from the coating liquid outlet 9 through the slits 8A and 8B. A part of the coating liquid flows out uniformly and continuously in the circumferential direction from the coating liquid outlet 9 in a state of being formed into a two-layered structure through the distribution slits 8A and 8B, and two layers are formed on the outer peripheral surface 13 of the base material. Is applied to the layered layers L1 and L2.
Further, other parts of the coating liquids S1 and S2, so-called excess coating liquid, are discharged from the coating liquid discharge ports 7A and 7B to discharge pipes 6A and 6B.
Through the distribution chambers 3A, 3B.
本発明の好ましい実施態様では、ホッパー塗布面径と円
筒形基材外径との差は0.05〜１mmの範囲であるが、より
好ましくは、塗布膜厚をh0mmとすると２h0mmから４h0mm
までの範囲である。またホッパー塗布面は、その上端よ
り鉛直下方及びそれより30度までの範囲で基材と反対側
に傾斜したものであり、より好ましくは鉛直下方及びそ
れより20度までの範囲である。In a preferred embodiment of the present invention, the difference between the hopper coated surface diameter and the cylindrical substrate outer diameter is in the range of 0.05 to 1 mm, more preferably 2h 0 mm to 4h when the coating film thickness is h 0 mm. 0 mm
The range is up to. Also, the hopper application surface is inclined vertically downward from the upper end and up to 30 degrees from it, and is more preferably inclined vertically downward and up to 20 degrees from the base material.
本装置において塗布された塗布膜は円筒形基材円周方向
に、継ぎ目なく分配室分配スリットが配置されているた
め塗布された塗膜は、継ぎ目なくエンドレスで且つ均一
なものである。又塗膜厚は塗布液供給量と円筒形の移動
速度により決定されるため容易にコントロールが可能で
あり、同時に塗布速度は浸漬法に比べはるかに速くでき
る。Since the coating film applied in this apparatus has the distribution chamber distribution slits arranged seamlessly in the circumferential direction of the cylindrical substrate, the applied film is seamless and endless. Further, the coating thickness can be easily controlled because it is determined by the amount of coating liquid supplied and the moving speed of the cylindrical shape, and at the same time, the coating speed can be much faster than that of the dipping method.
また本発明では第３図に示す如く、塗布装置本体１の対
向する側に供給パイプ４Ｃ、４Ｄを設け塗布液分配室３
Ａ、３Ｂに塗布液Ｓを過剰量供給し、過剰塗布液Ｓを該
分配室３Ａ、３Ｂより、前記供給パイプ４Ｃ、４Ｂに直
交して排出パイプ６Ｃ、６Ｄを設け、前記分配室３Ａ、
３Ｂ外へ排出するようにしてもよい。さらに分配室３
Ａ、３Ｂに通じる各供給・排出パイプは必要に応じて複
数本設けてもよい。この場合、分配室内の塗布液流れが
停滞することがないように配置すればよい。Further, in the present invention, as shown in FIG. 3, the supply pipes 4C and 4D are provided on the opposite sides of the coating apparatus main body 1, and the coating liquid distribution chamber 3 is provided.
An excessive amount of the coating liquid S is supplied to A and 3B, and the excess coating liquid S is provided from the distribution chambers 3A and 3B so that discharge pipes 6C and 6D are orthogonal to the supply pipes 4C and 4B.
You may make it discharge | emit outside 3B. Distribution room 3
Plural supply / discharge pipes leading to A and 3B may be provided if necessary. In this case, it may be arranged so that the flow of the coating liquid in the distribution chamber does not become stagnant.
さらにまず、排出パイプより排出された塗布液は、例え
ば攪拌器による攪拌等の処理を行った後再び塗布液とし
て供給パイプに供給されるように、塗布液を循環させる
よう構成してもよい。Furthermore, first, the coating liquid discharged from the discharge pipe may be circulated so that the coating liquid is supplied to the supply pipe as the coating liquid again after being subjected to processing such as stirring by a stirrer.
本発明では、塗布液分配室内の塗布液を排出する塗布液
排出口または排出パイプに、塗布液の排出液量を規制す
るバルブやポンプを設け、供給側だけによらず、排出側
においても液量調節を行うようにしてもよい。In the present invention, a valve or a pump for regulating the discharge amount of the coating liquid is provided at the coating liquid discharge port or the discharge pipe for discharging the coating liquid in the coating liquid distribution chamber, and the liquid is discharged not only on the supply side but also on the discharge side. The amount may be adjusted.
本発明に係る塗布液の供給は、供給パイプから供給さ
れ、一部は塗布液分配スリットを通じて塗布面に流出
し、他の一部は排出パイプにより排出され、この液の流
れは連続的に行われるが、塗布液の凝集時間を考慮して
塗布液を一定時間毎に供給するなど、塗布液供給を間欠
的に行ってもよい。The supply of the coating liquid according to the present invention is supplied from the supply pipe, part of which flows out to the coating surface through the coating liquid distribution slit, and the other part of which is discharged by the discharge pipe. However, the coating liquid may be supplied intermittently by, for example, supplying the coating liquid at regular intervals in consideration of the aggregation time of the coating liquid.
以上、本発明の実施例では２つの塗布液を同時重畳塗布
する場合について述べたが、３以上の塗布層（例えば、
電子写真感光体等の記録体の製造に用いる場合の下引
層、電荷発生層、電荷輸送層等。特開昭51−90827号、
同57−67934号、同57−179857号等参照。）を同時重畳
塗布することも可能であり、さらに単層のみの塗布も可
能である。本発明に係る装置は薄膜で均一な塗布膜を要
求する電子写真感光体等の記録体ドラム、静電記録体の
製造、ローラー表面上への被覆、エンドレス帯状物等の
外周面への塗膜形成等に用いられそれらに制限されるこ
とはない。即ちエンドレスに形成された連続面を有する
基材の外面上の塗布装置として用いられる。As described above, in the embodiments of the present invention, the case where two coating liquids are simultaneously superposed and coated is described, but three or more coating layers (for example,
An undercoat layer, a charge generation layer, a charge transport layer, etc. when used in the production of a recording body such as an electrophotographic photoreceptor. JP-A-51-90827,
See 57-67934 and 57-179857. ) Can be applied simultaneously and simultaneously, and it is also possible to apply only a single layer. The apparatus according to the present invention requires a thin and uniform coating film such as a recording drum such as an electrophotographic photoreceptor, manufacturing of an electrostatic recording member, coating on a roller surface, and coating on the outer peripheral surface of an endless belt. It is used for forming and the like and is not limited to them. That is, it is used as a coating device on the outer surface of a base material having an endless continuous surface.
なおホッパー塗布面と円筒形基材は、ある間隙を持って
配置されているため円筒形ドラムを傷つけることがな
い。以上本発明について直接塗布法を説明したが、本発
明の適用に際し、接液部にビート部（特公昭58−907
号、同51−39980号等参照）が形成されてもよい。Since the hopper application surface and the cylindrical substrate are arranged with a certain gap, the cylindrical drum is not damaged. The direct coating method has been described above with respect to the present invention. However, when the present invention is applied, the bead portion (the Japanese Examined Patent Publication No.
No. 51-39980, etc.) may be formed.
本発明において、塗布液が流出口９より円周方向で均一
に流出するためには、塗布液分配室に供給される際、分
配室抵抗(Pc)と、塗布液分配スリットを流れる際のスリ
ット抵抗(Ps)とがPs/Pc≧40で、より好ましくは40〜10
0,000の範囲内の関係に保たれる事により、塗布液を安
定且つ均一に塗布することが可能である。In the present invention, in order for the coating liquid to flow out uniformly from the outlet 9 in the circumferential direction, the distribution chamber resistance (Pc) when supplied to the coating liquid distribution chamber and the slit when flowing through the coating liquid distribution slit. Resistance (Ps) is Ps / Pc ≧ 40, more preferably 40 to 10
By maintaining the relationship within the range of 000, it is possible to apply the coating solution stably and uniformly.
上記関係は、単層または重畳塗布のいずれの塗布装置に
おいても成り立ち、重畳塗布の場合には、溶媒系または
分散系の塗布液の粘度や塗布液供給速度および供給圧に
応じて、各々前記分配室抵抗(Pc)とスリット抵抗(Ps)と
が決定されていればよい。The above relationship holds true in any coating device of single layer or superposition coating, and in the case of superposition coating, the distribution is performed depending on the viscosity of the solvent-based or dispersion-based coating liquid, the coating liquid supply speed and the supply pressure. It suffices that the room resistance (Pc) and the slit resistance (Ps) are determined.
［実験例］ 以下、本発明の実験例について説明する。[Experimental Example] An experimental example of the present invention will be described below.
被塗布物である基材は、外径100mmのアルミニウム製の
ドラムであり、該ドラムに下層に電荷発生層（ＣＧＬ）
を、その上に電荷輸送層（ＣＴＬ）を塗布した。各々の
塗布液組成および塗布条件を下記する。The substrate to be coated is a drum made of aluminum having an outer diameter of 100 mm, and the drum has a charge generation layer (CGL) as a lower layer.
Was coated with a charge transport layer (CTL). The composition of each coating solution and the coating conditions are described below.
ＣＧＬ塗布液組成 モノアゾ顔料25重量部、ポリカーボネート25重量部を粉
砕混合した後、1,2−ジクロルエタン850重量部を加え、
ボールミルにて24時間分散を行い、塗布液を得た。該塗
布液の粘度は100cp（Ｂ型粘度計No.２ローター60rpm）
であった。CGL coating liquid composition 25 parts by weight of monoazo pigment and 25 parts by weight of polycarbonate were pulverized and mixed, and then 850 parts by weight of 1,2-dichloroethane was added,
A ball mill was used for dispersion for 24 hours to obtain a coating solution. The viscosity of the coating solution is 100 cp (B-type viscometer No. 2 rotor 60 rpm)
Met.
ＣＴＬ塗布液組成 ポリカーボネート100重量部、ポリビニルカルバゾール
（ＰＶＫ）75重量部、1,2−ジクロルエタン1045重量部
を攪拌溶解し、塗布液を得た。該塗布液の粘度は200cp
であった。Composition of CTL coating liquid 100 parts by weight of polycarbonate, 75 parts by weight of polyvinylcarbazole (PVK), and 1045 parts by weight of 1,2-dichloroethane were dissolved by stirring to obtain a coating liquid. The viscosity of the coating solution is 200 cp
Met.
実験例１ 第１図に示す２層塗布用の塗布装置を１層塗布用とした
ものを用いて下記塗布条件にて上記組成のＣＴＬ塗布液
の塗布を行ったところ、均一な塗膜が得られた。Experimental Example 1 A CTL coating liquid of the above composition was applied under the following coating conditions using the one-layer coating device for two-layer coating shown in FIG. 1 to obtain a uniform coating film. Was given.
塗布条件 塗布速度（ドラム上昇速度）＝２m/min ＣＴＬ供給量＝107cc/min （乾燥後膜厚＝25μｍ相当、乾燥前膜厚
＝170μｍ） 塗布装置内径＝100.5mm 実験例２ 第１図に示す２層塗布用の塗布装置を１層塗布用とし、
且つ塗布液供給口の反対側の位置に過剰塗布液排出口を
設けたものを用いて下記塗布条件にて上記組成のＣＧＬ
塗布液の塗布を行ったところ、均一な塗膜が得られた。Coating conditions Coating speed (drum rising speed) = 2m / min CTL supply rate = 107cc / min (film thickness after drying = 25μm, film thickness before drying = 170μm) Coating device inner diameter = 100.5mm Experimental example 2 Shown in Fig. 1 The coating device for two-layer coating is for one-layer coating,
A CGL having the above composition was prepared under the following coating conditions by using an excess coating solution discharge port provided on the opposite side of the coating solution supply port.
When the coating liquid was applied, a uniform coating film was obtained.
塗布条件 塗布速度（ドラム上昇速度）＝2m/min 乾燥前の塗膜の厚さ＝20μｍ（塗布自身に必要な送液量
＝12.6cc/m in)塗布装置内径＝100.1mm 使用した塗布装置の分配室の容積＝100cc 送液量＝112.6cc/min（塗布液の凝集沈降開始時間が約
２分のため、 塗布液の分配室内滞留時間を１分
となるようにした。送液は供給口よりポン プに
より送液した。） 過剰塗布液量＝100cc/min（排出口より連続的に抜き出
した。） 比較例１ 特開昭56−15864号公報記載の塗布方法により前記組成
の塗布液の塗布を行った。Coating conditions Coating speed (drum rise speed) = 2m / min Thickness of coating film before drying = 20μm (Amount of liquid required for coating itself = 12.6cc / m in) Coating device inner diameter = 100.1mm Volume of distribution chamber = 100 cc Liquid feed rate = 112.6 cc / min (Because the start time of aggregation and sedimentation of the coating liquid is about 2 minutes, the residence time of the coating liquid in the distribution chamber was set to 1 minute. Liquid was sent by pump.) Excessive coating liquid amount = 100 cc / min (continuously withdrawn from the discharge port) Comparative Example 1 A coating liquid of the above composition was prepared by the coating method described in JP-A-56-15864. Application was performed.
この塗布方法でのかき取り後の膜厚は、かき取り刃とド
ラムのクリアランスの約半分となるので乾燥前膜厚＝20
μｍを得るため、かき取り刃の内径を100.08mm、かき取
り刃移動速度を2m/min、ドラム回転数を400rpmとして塗
布を行った。The film thickness after scraping by this coating method is about half the clearance between the scraping blade and the drum, so the film thickness before drying = 20
In order to obtain μm, the inner diameter of the scraping blade was 100.08 mm, the scraping blade moving speed was 2 m / min, and the drum rotation speed was 400 rpm.
得られた塗膜は、約５mmピッチのスパイラル状の濃淡む
らが発生した。ＣＧＬ塗布液は顔料分散系の液であるた
め擬塑性を示し、液に働く剪断力がなくなると急激に粘
度が上がる性質を有しており、また乾燥前の膜厚が20μ
ｍと薄いためレベリングされなかったために濃淡むらが
発生したものと思われる。ドラム回転数を大きくしレベ
リング効果が出易い条件を検討したが100rpmが塗布でき
る限界であった。このとき、スパイラル状の濃淡むらは
ピッチが小さくなったが依然残っており結局均一な塗膜
は得られなかった。The resulting coating film had spiral-shaped unevenness of light and shade with a pitch of about 5 mm. Since the CGL coating liquid is a pigment dispersion liquid, it exhibits pseudoplasticity, and has the property of rapidly increasing viscosity when the shearing force acting on the liquid is removed, and the film thickness before drying is 20μ.
It is thought that unevenness in shade occurred because it was not leveled because it was as thin as m. The conditions under which the drum rotation speed was increased and the leveling effect was easily obtained were examined, but 100 rpm was the limit for application. At this time, the spiral shading unevenness was reduced in pitch but still remained, and a uniform coating film could not be obtained.
比較例２ かき取り刃の内径を100.6mmとした以外は比較例１と同
様にして塗布を行った。Comparative Example 2 Coating was performed in the same manner as in Comparative Example 1 except that the inner diameter of the scraping blade was 100.6 mm.
得られた塗膜は、ＣＧＬと異なり外観上は均一な塗膜が
得られたが、膜厚を測定したところ、約５mmピッチで３
μｍの膜厚変動があった。1,2−ジクロルエタンは比較
的蒸発が早いため乾燥過程で粘度が上昇しレベリングさ
れなかったものと思われる。The obtained coating film was uniform in appearance unlike CGL, but the film thickness was measured and found to be 3 mm at a pitch of about 5 mm.
There was a film thickness variation of μm. It is considered that 1,2-dichloroethane was not leveled because the viscosity increased during the drying process because the evaporation was relatively fast.
［発明の効果］ 以上の如く本発明によれば、上記スライド型ホッパー装
置における欠点である塗布液同志の衝突によるスジ故障
や膜厚不良が生じることがないと共に、特に分散系の塗
布液による２次凝集が起こるのを防止して、且ついわゆ
る調心効果によって１または２以上の塗布液を基材周面
上に均一な膜厚で塗布することが可能である。[Effects of the Invention] As described above, according to the present invention, it is possible to prevent streak failures and film thickness defects due to collision of coating liquids, which are the drawbacks of the above slide type hopper device. It is possible to prevent the subsequent aggregation from occurring and to apply one or more coating solutions with a uniform film thickness on the peripheral surface of the substrate by the so-called centering effect.
第１−ａ図および第１−ｂ図は本発明に係る塗布装置に
よる２層同時塗布の場合の実施例であり、第１−ａ図は
排出口のないもの、第１−ｂ図は排出口のあるものの基
材への塗布状態を示す断面図であり、第２図はホッパー
装置の要部拡大断面図、第３図は本発明の他の実施例を
示す塗布装置の平面図である。 図中において、１は塗布装置本体、３Ａ、３Ｂは塗布液
分配室、４Ａ、４Ｂは供給パイプ、５Ａ、５Ｂは塗布液
供給口、６Ａ、６Ｂは排出パイプ、７Ａ、７Ｂは塗布液
排出口、８Ａ、８Ｂは塗布液分配スリット、９は塗布液
流出口、10はホッパー塗布面、11は下部端面、12は基
材、Ｓ、Ｓ１、Ｓ２は塗布液を各々指示する。FIGS. 1-a and 1-b are examples of simultaneous two-layer coating by the coating apparatus according to the present invention. FIG. 1-a has no discharge port, and FIG. 1-b shows discharge. It is sectional drawing which shows the coating state to the base material with an outlet, FIG. 2 is an enlarged sectional view of the principal part of a hopper apparatus, and FIG. 3 is a top view of the coating apparatus which shows other Example of this invention. . In the figure, 1 is a coating apparatus main body, 3A and 3B are coating liquid distribution chambers, 4A and 4B are supply pipes, 5A and 5B are coating liquid supply ports, 6A and 6B are discharge pipes, and 7A and 7B are coating liquid discharge ports. , 8A and 8B are coating liquid distribution slits, 9 is a coating liquid outlet, 10 is a hopper coating surface, 11 is a lower end face, 12 is a base material, and S, S1 and S2 are coating liquids.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 山本 幸一 東京都日野市さくら町１番地 小西六写真 工業株式会社内 (56)参考文献 特開 昭49−42343（ＪＰ，Ａ) 特開 昭54−124039（ＪＰ，Ａ) 特開 昭56−15864（ＪＰ，Ａ) 特公 昭51−39980（ＪＰ，Ｂ１) 特公 昭53−2768（ＪＰ，Ｂ１) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Koichi Yamamoto 1 Sakura-cho, Hino-shi, Tokyo Inside Konishi Roku Photo Co., Ltd. (56) References JP-A-49-42343 (JP, A) JP-A-54- 124039 (JP, A) JP 56-15864 (JP, A) JP 51-39980 (JP, B1) JP 53-2768 (JP, B1)
Claims (4)
される量の塗布液をホッパー塗布面に設けられた塗布液
流出口に押出す押出しホッパー塗布方法において、固定
の塗布装置を用い、電子写真記録体基材の如く、エンド
レスに形成された連続周面を有すると共に一端から他端
まで同一形状を有する柱状又は筒状の基材を連続的に上
又は下方向に移動させながら、１又は２以上の塗布液を
塗布する方法であって、塗布液分配室に供給された塗布
液を、エンドレスの塗布液分配スリットを通して前記基
材周面を取り囲むように基材全周に亘って近接形成され
たホッパー塗布面に設けられたエンドレスの塗布液流出
口に直接押し出し、前記基材とホッパー塗布面との間の
全周に亘って形成された接液部又はビート部に連続的に
供給して塗布することを特徴とする電子写真記録体基材
等の塗布方法。1. An extrusion hopper coating method which does not have a blade for scraping the coating liquid and which extrudes an amount of the coating liquid required for the film thickness to a coating liquid outlet provided on a hopper coating surface. Using an apparatus, a columnar or tubular base material having a continuous peripheral surface formed endlessly and having the same shape from one end to the other end, such as an electrophotographic recording material base material, is continuously moved upward or downward. While applying the coating liquid, one or more coating liquids are applied, and the coating liquid supplied to the coating liquid distribution chamber is surrounded by the entire circumference of the substrate so as to surround the peripheral surface of the substrate through an endless coating liquid distribution slit. Directly extruded to the endless coating liquid outlet provided on the hopper coating surface formed in close proximity to the wetted portion or beat portion formed over the entire circumference between the base material and the hopper coating surface. Supply and apply continuously The method of coating such as an electrophotographic recording medium substrate, wherein the door.
よりも過剰量の塗布液を供給すると共に、該過剰量の塗
布液を該塗布液分配室外へ取り出しながら塗布すること
を特徴とする特許請求の範囲第１項記載の塗布方法。2. A coating liquid is supplied to the coating liquid distribution chamber in an amount more than the amount required for coating, and the excess amount of coating liquid is applied while being taken out of the coating liquid distribution chamber. The coating method according to claim 1, which is characterized.
される量の塗布液をホッパー塗布面に設けられた塗布液
流出口に押出す押出しホッパー塗布装置において、固定
の塗布装置により、電子写真記録体基材の如く、エンド
レスに形成された連続周面を有すると共に一端から他端
まで同一形状を有する柱状又は筒状の基材を連続的に上
又は下方向に移動させながら、１又は２以上の塗布液を
塗布する装置であって、該基材周面を取り囲むように且
つ塗布液が、接液部又はビート部において連続的に接液
又はビート形成可能な間隙を全周に亘って維持するよう
にエンドレスのホッパー塗布面が形成されており、該ホ
ッパー塗布面に、前記塗布液が直接押し出される塗布液
流出口がエンドレスに形成されて成るホッパー装置を有
しており、該ホッパー装置には、前記塗布液流出口に塗
布液分配スリットを通じて、塗布液を直接供給する塗布
液分配室が基材周面を取り囲むように設けられているこ
とを特徴とする電子写真記録体基材等の塗布装置。3. A fixed coating in an extrusion hopper coating device which does not have a blade for scraping the coating liquid and which pushes out an amount of the coating liquid required for film thickness to a coating liquid outlet provided on a hopper coating surface. With the device, a columnar or tubular substrate having an endless continuous peripheral surface and the same shape from one end to the other is continuously moved upward or downward like an electrophotographic recording medium substrate. However, it is an apparatus for applying one or two or more coating liquids, and the coating liquid surrounds the peripheral surface of the base material and has a gap in which the coating liquid can be continuously wetted or formed in a beat portion in a wetted portion or a beat portion. An endless hopper coating surface is formed so as to be maintained over the entire circumference, and the hopper coating surface is provided with a hopper device in which a coating solution outlet for directly extruding the coating solution is formed endlessly. And the hot The apparatus is provided with a coating liquid distribution chamber for directly supplying the coating liquid to the coating liquid outlet through the coating liquid distribution slit so as to surround the peripheral surface of the base material. Material coating device.
給口と共に、該塗布液を前記塗布液分配室外へ排出する
塗布液排出口が設けられていることを特徴とする特許請
求の範囲第３項記載の塗布装置。4. A coating liquid supply port for supplying the coating liquid to the coating liquid distribution chamber, and a coating liquid discharge port for discharging the coating liquid to the outside of the coating liquid distribution chamber. The coating apparatus according to claim 3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58201105A JPH0614188B2 (en) | 1983-10-28 | 1983-10-28 | Method and apparatus for coating electrophotographic recording material substrate, etc. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58201105A JPH0614188B2 (en) | 1983-10-28 | 1983-10-28 | Method and apparatus for coating electrophotographic recording material substrate, etc. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6095440A JPS6095440A (en) | 1985-05-28 |
| JPH0614188B2 true JPH0614188B2 (en) | 1994-02-23 |
Family
ID=16435483
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58201105A Expired - Lifetime JPH0614188B2 (en) | 1983-10-28 | 1983-10-28 | Method and apparatus for coating electrophotographic recording material substrate, etc. |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0614188B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2604744B2 (en) * | 1987-05-09 | 1997-04-30 | 三井東圧化学株式会社 | Continuous production method of photoreceptor drum |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3920862A (en) * | 1972-05-01 | 1975-11-18 | Eastman Kodak Co | Process by which at least one stripe of one material is incorporated in a layer of another material |
| JPS514110B2 (en) * | 1973-04-17 | 1976-02-09 | ||
| JPS5487229A (en) * | 1977-12-23 | 1979-07-11 | Fujitsu Ltd | Coating device of photo sensitive drum for zerography |
| JPS54124039A (en) * | 1978-03-01 | 1979-09-26 | Agfa Gevaert Nv | Method and apparatus for providing multii layers on web by curtain coating |
| JPS54128740A (en) * | 1978-03-29 | 1979-10-05 | Fujitsu Ltd | Production of photosensitive drum for zerography |
| JPS5615866A (en) * | 1979-07-17 | 1981-02-16 | Matsushita Electric Ind Co Ltd | Method of applying coating material to peripheral surface of cylindrical substrate |
| JPS6038982B2 (en) * | 1979-07-17 | 1985-09-04 | 松下電器産業株式会社 | Apparatus for applying coating material to the outer peripheral surface of a cylindrical substrate |
| JPS5615864A (en) * | 1979-07-17 | 1981-02-16 | Matsushita Electric Ind Co Ltd | Method of applying coating material on peripheral surface of cylindrical-substrate |
-
1983
- 1983-10-28 JP JP58201105A patent/JPH0614188B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6095440A (en) | 1985-05-28 |
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