JP7506508B2 - 荷電粒子線照射システム、及び荷電粒子線照射方法 - Google Patents
荷電粒子線照射システム、及び荷電粒子線照射方法 Download PDFInfo
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- JP7506508B2 JP7506508B2 JP2020062493A JP2020062493A JP7506508B2 JP 7506508 B2 JP7506508 B2 JP 7506508B2 JP 2020062493 A JP2020062493 A JP 2020062493A JP 2020062493 A JP2020062493 A JP 2020062493A JP 7506508 B2 JP7506508 B2 JP 7506508B2
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- 239000002245 particle Substances 0.000 title claims description 166
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Claims (2)
- 被照射体に対して荷電粒子線を照射する荷電粒子線照射システムであって、
走査電磁石で前記荷電粒子線を走査することで、前記被照射体に対して前記荷電粒子線を照射する照射部と、
前記被照射体に対するスキャンパターン情報に対応する前記走査電磁石への電流指令値を、前記走査電磁石により生じる磁場の掃引速度に基づいて設定する設定部と、を備える、荷電粒子線照射システム。 - 前記設定部は、前記スキャンパターンを前記走査電磁石の励磁パターンに変換する変換テーブルによって、前記走査電磁石への前記電流指令値を設定し、
前記変換テーブルは、前記走査電磁石の励磁の周波数に応じた情報を有している、請求項1に記載の荷電粒子線照射システム。
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Citations (2)
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JP2012029821A (ja) | 2010-07-30 | 2012-02-16 | Hitachi Ltd | 粒子線治療システム及び粒子線照射方法 |
JP2017209372A (ja) | 2016-05-26 | 2017-11-30 | 住友重機械工業株式会社 | 荷電粒子線治療装置 |
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JP2012029821A (ja) | 2010-07-30 | 2012-02-16 | Hitachi Ltd | 粒子線治療システム及び粒子線照射方法 |
JP2017209372A (ja) | 2016-05-26 | 2017-11-30 | 住友重機械工業株式会社 | 荷電粒子線治療装置 |
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