JP6541073B2 - 低級炭化水素用の脱水素触媒、及び芳香族化合物の製造方法 - Google Patents
低級炭化水素用の脱水素触媒、及び芳香族化合物の製造方法 Download PDFInfo
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- 238000006356 dehydrogenation reaction Methods 0.000 title claims description 151
- 239000003054 catalyst Substances 0.000 title claims description 82
- 229930195733 hydrocarbon Natural products 0.000 title claims description 81
- 150000002430 hydrocarbons Chemical class 0.000 title claims description 81
- 150000001491 aromatic compounds Chemical class 0.000 title claims description 47
- 238000004519 manufacturing process Methods 0.000 title claims description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 63
- 238000006243 chemical reaction Methods 0.000 claims description 57
- 239000004215 Carbon black (E152) Substances 0.000 claims description 34
- 239000000377 silicon dioxide Substances 0.000 claims description 31
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- 229910052698 phosphorus Inorganic materials 0.000 claims description 24
- 229910052738 indium Inorganic materials 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 10
- 239000000956 alloy Substances 0.000 claims description 8
- 229910045601 alloy Inorganic materials 0.000 claims description 8
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 107
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 36
- 239000000571 coke Substances 0.000 description 28
- 239000007789 gas Substances 0.000 description 28
- 239000002243 precursor Substances 0.000 description 19
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- 230000015572 biosynthetic process Effects 0.000 description 11
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- 150000001875 compounds Chemical class 0.000 description 10
- 238000002360 preparation method Methods 0.000 description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 9
- 150000001336 alkenes Chemical class 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
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- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 6
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- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 4
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- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
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- 238000005899 aromatization reaction Methods 0.000 description 1
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- 229910052763 palladium Inorganic materials 0.000 description 1
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Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
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- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Description
硝酸インジウム(活性成分の前駆体)を蒸留水に溶解して、水溶液を調整した。この水溶液を、粒子状のシリカ(耐火性の担体)へ含浸させた。続いて、担体を120℃で2時間乾燥した。乾燥後の担体を、空気中500℃で3時間加熱した。以上の工程により、シリカ(担体)と、シリカに担持されたインジウム(活性成分)と、を備える脱水素触媒を得た。この触媒を試料A1と記す。シリカとしては、富士シリシア化学(株)製のCARiACT Q‐3を用いた。シリカの平均粒径は、70μmであった。シリカの比表面積は、550m2/gであった。シリカの細孔容積は、0.3cc/gであった。シリカの平均細孔径は、3nmであった。脱水素触媒におけるインジウム(金属)の含有量(担持量)は、脱水素触媒の全質量に対して、10質量%であった。
CCH4(%)={(M0−M1)/M0}×100 (1)
式1中のM0は、反応管へ供給したメタンのモル数の合計値である。M1は、反応管から排出されたメタンのモル数の合計値である。つまり、M1は、未反応のメタンのモル数の合計値である。
SCOKE(%)={(M0−M1−M2)/M0}×100 (2)
式2中のM0は、式1中のM0と同じである。式2中のM1は、式1中のM1と同じである。式2中のM2は、反応管から排出されるガスに含まれる炭化水素(メタンを除く。)を構成する炭素原子のモル数の合計値である。つまり、M2は、脱水素反応によって生成したガス中に含まれる炭素原子のモル数の合計値である。なお、メタン転化率が低い場合、生成ガス中の炭素原子のモル数の算出において誤差が生じ易い。したがって、メタンの完全脱水素反応が進行したと想定して、生成した水素のモル数から、生成ガス中の炭素原子の炭素モル数を算出してもよい。
試料A2〜A11として、インジウムの代わりに、下記表1又は表2に記載の活性成分を備える脱水素触媒を其々作製した。試料A2〜A11の作製では、活性成分の前駆体として、下記表1又は表2に記載の化合物を用いた。試料A2〜A11其々の組成及び作製方法は、活性成分を除いて、試料A1の作製方法と同じであった。
試料B1〜B8の作製では、インジウムの代わりに、下記表3又は表4に記載の第一活性成分と第二活性成分とを担体に担持した。試料B1〜B8の作製では、第一活性成分の前駆体として、下記表3又は表4に記載の化合物を用いた。試料B1〜B8の作製では、第二活性成分の前駆体として、下記表3又は表4に記載の化合物を用いた。試料B1〜B8の作製では、第一活性成分のモル数(m1)と、第二活性成分のモル数(m2)との比(m1/m2)を、下記表3又は表4に記載の値に調整した。
試料C1〜C7の作製では、インジウム(金属)の担持量を、下記表5に記載の値に調整した。試料C2〜C7の作製では、担体として、シリカの代わりに、下記表5に記載の担体を用いた。
試料A1と同じである未使用の脱水素触媒を用いて、6通りの脱水素反応(実験D1〜D6)を個別に実施した。各脱水素反応の反応温度は、下記表6に示す値に調整した。各脱水素反応では、反応開始から3時間経過した時点において、反応管から排出されるガスを所定量採取した。採取された其々のガスを個別に、試料A1の場合と同様の方法で分析した。各脱水素反応の生成物として検出された炭化水素及び水素其々のモル数を、下記表6に示す。各脱水素反応におけるメタン転化率(CCH4)及びコーク選択率(SCOKE)を、下記表6に示す。実験D1〜D6の各反応において反応管へ供給したメタンの流量は同じであり、各脱水素反応の反応時間も同じである。つまり、各脱水素反応の原料であるメタンの絶対量は同じである。したがって、下記表6に示す各成分のモル数の大小関係は、各成分の収率の大小関係と一致する。
試料A1と同じである未使用の脱水素触媒を用いて、4通りの脱水素反応(実験E1〜E4)を個別に実施した。各脱水素反応では、反応管へ供給するメタンガスの単位時間当たりの流量を、下記表7に示す値に調整した。各脱水素反応では、反応開始から3時間経過した時点において、反応管から排出されるガスを所定量採取した。採取された其々のガスを個別に、試料A1の場合と同様の方法で分析した。各脱水素反応の生成物として検出された炭化水素及び水素其々のモル数を、下記表7に示す。各脱水素反応におけるメタン転化率(CCH4)及びコーク選択率(SCOKE)を、下記表7に示す。各実験の生成物として測定された各成分のモル数は、各成分の収率に正比例する。
Claims (6)
- シリカを含む担体と、
前記担体に担持されたNi、P及びInと、
を備える、
低級炭化水素用の脱水素触媒。 - シリカを含む担体と、
前記担体に担持された、Ni及びPを含む合金と、
を備える、
低級炭化水素用の脱水素触媒。 - 請求項1又は2に記載の脱水素触媒を用いた低級炭化水素の脱水素により、芳香族化合物を生成させる工程を備える、
芳香族化合物の製造方法。 - 前記低級炭化水素の脱水素の反応温度を、500〜1000℃に調整する、
請求項3に記載の芳香族化合物の製造方法。 - 前記低級炭化水素の脱水素が行われる反応器内の圧力を、101325×10−1〜101325×10Paに調整する、
請求項3又は4に記載の芳香族化合物の製造方法。 - 前記低級炭化水素の脱水素における重量時間空間速度を、0.1〜100hr−1に調整する、
請求項3〜5のいずれか一項に記載の芳香族化合物の製造方法。
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