JP6053081B2 - 光学系の少なくとも1つの光学素子を作動させる機構 - Google Patents
光学系の少なくとも1つの光学素子を作動させる機構 Download PDFInfo
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- JP6053081B2 JP6053081B2 JP2015544401A JP2015544401A JP6053081B2 JP 6053081 B2 JP6053081 B2 JP 6053081B2 JP 2015544401 A JP2015544401 A JP 2015544401A JP 2015544401 A JP2015544401 A JP 2015544401A JP 6053081 B2 JP6053081 B2 JP 6053081B2
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- 230000007246 mechanism Effects 0.000 title claims description 36
- 206010023230 Joint stiffness Diseases 0.000 claims description 16
- 238000007789 sealing Methods 0.000 claims description 2
- 238000000926 separation method Methods 0.000 claims description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 14
- 238000013461 design Methods 0.000 description 9
- 238000005286 illumination Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 230000001419 dependent effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000021715 photosynthesis, light harvesting Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000009471 action Effects 0.000 description 2
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- 238000000429 assembly Methods 0.000 description 2
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- 239000000463 material Substances 0.000 description 2
- 230000005405 multipole Effects 0.000 description 2
- 230000003071 parasitic effect Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 210000001747 pupil Anatomy 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000000110 cooling liquid Substances 0.000 description 1
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- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
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- 230000004048 modification Effects 0.000 description 1
- ORQBXQOJMQIAOY-UHFFFAOYSA-N nobelium Chemical compound [No] ORQBXQOJMQIAOY-UHFFFAOYSA-N 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000002918 waste heat Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
- G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
- G02B7/1827—Motorised alignment
- G02B7/1828—Motorised alignment using magnetic means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Reciprocating, Oscillating Or Vibrating Motors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Description
光学素子に力を及ぼす少なくとも1つのアクチュエータ
を備え、アクチュエータは、継手剛性を少なくとも部分的に補償するアクチュエータ剛性を有する機構。
Claims (16)
- 光学系の少なくとも1つの光学素子を作動させる機構であって、前記光学素子(101)は、継手剛性を有する少なくとも1つの継手(102)により少なくとも1つの傾斜軸を中心に傾斜可能である機構において、
前記光学素子(101)に力を及ぼす少なくとも1つのアクチュエータ(104)
を備え、前記アクチュエータ(104)は、前記継手剛性を少なくとも部分的に補償するアクチュエータ剛性を有する機構。 - 請求項1に記載の機構において、前記アクチュエータ剛性及び前記継手剛性は、前記アクチュエータ(104)の所定の動作範囲にわたって相互に逆の符号を有することを特徴とする機構。
- 請求項2に記載の機構において、前記アクチュエータ剛性及び前記継手剛性は、前記アクチュエータ(104)の前記所定の動作範囲にわたって前記アクチュエータ剛性の各値の最大50パーセント絶対値に関して相互にずれていることを特徴とする機構。
- 請求項1〜3のいずれか1項に記載の機構において、前記アクチュエータ(104)は、少なくとも1つの磁石(106〜108)を有する回転子(103、603)と、電流を印加することができるコイル(112、612)を含む固定子(109、609)とを有することを特徴とする機構。
- 請求項4に記載の機構において、真空シール用の分離層を回転子(603)と固定子(609)との間に設けたことを特徴とする機構。
- 請求項1〜5のいずれか1項に記載の機構において、該機構は、前記光学素子(101)用の平行ガイド(420)を有することを特徴とする機構。
- 請求項6に記載の機構において、前記平行ガイド(420)は、回転子(103、603)と固定子(109、609)との間に働く力を前記アクチュエータ(104)の駆動方向と平行な力成分に変換して、該力成分が前記継手剛性を少なくとも部分的に補償するようにすることを特徴とする機構。
- 請求項6又は7に記載の機構において、前記平行ガイド(420)を2つの板ばね要素(421、422)から構成したことを特徴とする機構。
- 請求項1〜8のいずれか1項に記載の機構において、前記光学素子(101)は、少なくとも2つの傾斜軸を中心に傾斜可能であることを特徴とする機構。
- 請求項1〜9のいずれか1項に記載の機構において、前記光学系は、複数の光学素子を有し、該素子のそれぞれに少なくとも1つの前記アクチュエータを割り当てたことを特徴とする機構。
- 請求項10に記載の機構において、前記光学素子は、相互に独立して調整可能であることを特徴とする機構。
- 請求項10又は11に記載の機構において、前記光学素子に割り当てた前記アクチュエータを、少なくとも2つの異なる平面に配置したことを特徴とする機構。
- 請求項1〜12のいずれか1項に記載の機構において、前記光学系は、ファセットミラー(6、7)であることを特徴とする機構。
- 請求項1〜13のいずれか1項に記載の機構において、前記光学系は、マイクロリソグラフィ投影露光装置の光学系であることを特徴とする機構。
- 請求項1〜14のいずれか1項に記載の機構を備えた投影露光装置。
- 請求項15に記載の投影露光装置において、該投影露光装置を、30nm未満の動作波長で動作するよう設計したことを特徴とする投影露光装置。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261731260P | 2012-11-29 | 2012-11-29 | |
DE102012221831.9 | 2012-11-29 | ||
US61/731,260 | 2012-11-29 | ||
DE102012221831.9A DE102012221831A1 (de) | 2012-11-29 | 2012-11-29 | Anordnung zur Aktuierung wenigstens eines optischen Elementes in einem optischen System |
PCT/EP2013/073270 WO2014082830A1 (en) | 2012-11-29 | 2013-11-07 | Arrangement for actuating at least one optical element in an optical system |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2016234830A Division JP6389860B2 (ja) | 2012-11-29 | 2016-12-02 | 光学系の少なくとも1つの光学素子を作動させる機構 |
Publications (2)
Publication Number | Publication Date |
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JP2016503519A JP2016503519A (ja) | 2016-02-04 |
JP6053081B2 true JP6053081B2 (ja) | 2016-12-27 |
Family
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Family Applications (2)
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JP2015544401A Active JP6053081B2 (ja) | 2012-11-29 | 2013-11-07 | 光学系の少なくとも1つの光学素子を作動させる機構 |
JP2016234830A Active JP6389860B2 (ja) | 2012-11-29 | 2016-12-02 | 光学系の少なくとも1つの光学素子を作動させる機構 |
Family Applications After (1)
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JP2016234830A Active JP6389860B2 (ja) | 2012-11-29 | 2016-12-02 | 光学系の少なくとも1つの光学素子を作動させる機構 |
Country Status (7)
Country | Link |
---|---|
US (2) | US9665011B2 (ja) |
EP (1) | EP2926185A1 (ja) |
JP (2) | JP6053081B2 (ja) |
KR (2) | KR101764514B1 (ja) |
CN (2) | CN104781715B (ja) |
DE (1) | DE102012221831A1 (ja) |
WO (1) | WO2014082830A1 (ja) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
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DE102012221831A1 (de) | 2012-11-29 | 2014-06-05 | Carl Zeiss Smt Gmbh | Anordnung zur Aktuierung wenigstens eines optischen Elementes in einem optischen System |
DE102014224991A1 (de) * | 2014-12-05 | 2016-06-09 | Carl Zeiss Smt Gmbh | Verstellsystem-Bauelement, Baugruppe, Spiegelanordnung und Projektionsbelichtungsanlage für dieMikrolithographie |
DE102014224994A1 (de) * | 2014-12-05 | 2015-12-17 | Carl Zeiss Smt Gmbh | Spiegelanordnung, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
WO2016087565A1 (de) * | 2014-12-05 | 2016-06-09 | Carl Zeiss Smt Gmbh | Verstellsystem-bauelement, baugruppe, spiegelanordnung und projektionsbelichtungsanlage für die mikrolithographie |
EP3045205B1 (en) * | 2015-01-16 | 2017-12-13 | Pronova Solutions, LLC | Systems for adjusting a rotating gantry system |
CN107015341B (zh) * | 2016-01-27 | 2020-08-21 | 佳能株式会社 | 光学设备、投影光学***、曝光装置及物品制造方法 |
DE102016208008A1 (de) * | 2016-05-10 | 2017-11-16 | Carl Zeiss Smt Gmbh | Lageranordnung für eine Lithographieanlage sowie Lithographieanlage |
DE102016217479A1 (de) * | 2016-09-14 | 2017-09-14 | Carl Zeiss Smt Gmbh | Optisches modul mit verkippbaren optischen flächen |
JP6854638B2 (ja) * | 2016-12-21 | 2021-04-07 | キヤノン株式会社 | 光学装置、露光装置、および物品の製造方法 |
DE102017207433A1 (de) * | 2017-05-03 | 2018-04-19 | Carl Zeiss Smt Gmbh | Abstützung eines optischen Elements |
JP7093221B2 (ja) * | 2018-04-26 | 2022-06-29 | キヤノン株式会社 | 光学装置の調整方法、光学装置の製造方法、および、物品製造方法 |
DE102018207949A1 (de) * | 2018-05-22 | 2019-05-29 | Carl Zeiss Smt Gmbh | Baugruppe in einer mikrolithographischen Projektionsbelichtungsanalge |
US20230377788A1 (en) * | 2020-10-30 | 2023-11-23 | Micro-Epsilon-Messtechnik Gmbh & Co. Kg | Electromagnetic actuator |
DE102021201203A1 (de) * | 2021-02-09 | 2022-08-11 | Carl Zeiss Smt Gmbh | System und projektionsbelichtungsanlage |
DE102022203433A1 (de) * | 2022-04-06 | 2023-10-12 | Carl Zeiss Smt Gmbh | Verbindung von komponenten einer optischen einrichtung |
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JPH06118330A (ja) * | 1991-12-06 | 1994-04-28 | Nec Corp | ミラー駆動機構 |
DE69423070T2 (de) * | 1993-11-16 | 2000-07-13 | Daewoo Electronics Co., Ltd. | Anordnung von gesteuerten Dünnschichtspiegeln für ein optisches Projektionssystem und Verfahren zu deren Herstellung |
DE19504568A1 (de) | 1995-02-11 | 1996-08-14 | Zeiss Carl Fa | Kippspiegelanordnung |
EP0831269B1 (de) * | 1996-09-19 | 2003-09-10 | Carl Zeiss | Kippvorrichtung |
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EP1001512A3 (en) * | 1998-11-10 | 2001-02-14 | Asm Lithography B.V. | Actuator and transducer |
JP4282966B2 (ja) * | 2002-09-20 | 2009-06-24 | 株式会社リコー | ポリゴンミラースキャナ |
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DE102006020734A1 (de) * | 2006-05-04 | 2007-11-15 | Carl Zeiss Smt Ag | Beleuchtungssystem für die EUV-Lithographie sowie erstes und zweites optisches Element zum Einsatz in einem derartigen Beleuchtungssystem |
NL1036511A1 (nl) * | 2008-02-13 | 2009-08-14 | Asml Netherlands Bv | Movable support, position control system, lithographic apparatus and method of controlling a position of an exchangeable object. |
DE102009000099A1 (de) | 2009-01-09 | 2010-07-22 | Carl Zeiss Smt Ag | Mikrospiegelarray mit Doppelbiegebalken Anordnung und elektronischer Aktorik |
DE102008009600A1 (de) | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie |
WO2010049076A2 (de) * | 2008-10-20 | 2010-05-06 | Carl Zeiss Smt Ag | Optische baugruppe zur führung eines strahlungsbündels |
CN102265219B (zh) | 2008-12-11 | 2014-07-16 | 卡尔蔡司Smt有限责任公司 | 投射曝光设备中的光学元件的重力补偿 |
DE102010001388A1 (de) * | 2010-01-29 | 2011-08-04 | Carl Zeiss SMT GmbH, 73447 | Facettenspiegel zum Einsatz in der Mikrolithografie |
JP5740819B2 (ja) * | 2010-02-22 | 2015-07-01 | 株式会社ニコン | 空間光変調器の製造方法、空間光変調器、照明光発生装置および露光装置 |
JP6309765B2 (ja) * | 2010-12-20 | 2018-04-11 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 光学素子を取り付ける配置構成 |
JP6091434B2 (ja) | 2011-02-17 | 2017-03-08 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 光学マウント及びeuv露光装置 |
DE102012221242A1 (de) * | 2012-11-21 | 2013-03-21 | Carl Zeiss Smt Gmbh | Elektroaktive Polymere als Aktuator für optische Elemente von Projektionsbelichtungsanlagen |
DE102012221831A1 (de) | 2012-11-29 | 2014-06-05 | Carl Zeiss Smt Gmbh | Anordnung zur Aktuierung wenigstens eines optischen Elementes in einem optischen System |
-
2012
- 2012-11-29 DE DE102012221831.9A patent/DE102012221831A1/de not_active Withdrawn
-
2013
- 2013-11-07 WO PCT/EP2013/073270 patent/WO2014082830A1/en active Application Filing
- 2013-11-07 JP JP2015544401A patent/JP6053081B2/ja active Active
- 2013-11-07 KR KR1020157013786A patent/KR101764514B1/ko active IP Right Grant
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KR20150080560A (ko) | 2015-07-09 |
US10303065B2 (en) | 2019-05-28 |
KR20170091169A (ko) | 2017-08-08 |
DE102012221831A1 (de) | 2014-06-05 |
CN104781715B (zh) | 2018-05-08 |
US20170261859A1 (en) | 2017-09-14 |
JP6389860B2 (ja) | 2018-09-12 |
CN108519672B (zh) | 2021-08-03 |
JP2017083856A (ja) | 2017-05-18 |
KR102005650B1 (ko) | 2019-07-30 |
US20150198892A1 (en) | 2015-07-16 |
WO2014082830A1 (en) | 2014-06-05 |
CN104781715A (zh) | 2015-07-15 |
JP2016503519A (ja) | 2016-02-04 |
EP2926185A1 (en) | 2015-10-07 |
KR101764514B1 (ko) | 2017-08-02 |
CN108519672A (zh) | 2018-09-11 |
US9665011B2 (en) | 2017-05-30 |
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