JP5284740B2 - 陽極酸化皮膜の形成方法とそれを用いたアルミニウム合金部材 - Google Patents
陽極酸化皮膜の形成方法とそれを用いたアルミニウム合金部材 Download PDFInfo
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- JP5284740B2 JP5284740B2 JP2008246381A JP2008246381A JP5284740B2 JP 5284740 B2 JP5284740 B2 JP 5284740B2 JP 2008246381 A JP2008246381 A JP 2008246381A JP 2008246381 A JP2008246381 A JP 2008246381A JP 5284740 B2 JP5284740 B2 JP 5284740B2
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- Japan
- Prior art keywords
- film
- aluminum alloy
- voltage
- film thickness
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/024—Anodisation under pulsed or modulated current or potential
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Drying Of Semiconductors (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
Description
Claims (3)
- 硫酸、または硫酸とシュウ酸の混酸溶液中で、JIS6061アルミニウム合金基材の表面に、クラック発生量が少なく、かつ熱反射率が低い陽極酸化皮膜を形成する方法であって、形成された前記皮膜の全膜厚における膜厚方向の積算電圧が1650V・μm以上であり、前記アルミニウム合金基材と陽極酸化皮膜の界面から膜厚方向に25μmの位置と前記皮膜表面までの間の皮膜を、電解電圧27V以下で形成し、かつ、前記界面から膜厚方向に25μmの位置までの積算電圧が820V・μm以上で1000V・μm以下であることを特徴とする陽極酸化皮膜の形成方法。
- 前記アルミニウム合金基材の表面が、その表面を表面粗さ計により、評価長さを4mm、カットオッフ値を0.8mmとして、粗さ曲線と平均線の交点が2個で1ピークカウントPcとする条件で測定したときに、単位評価長さあたりのピークカウントPcが70カウント/mm以上の形態を有することを特徴とする請求項1に記載の陽極酸化皮膜の形成方法。
- 請求項1または2に記載の陽極酸化皮膜の形成方法により、前記皮膜が形成されたプラズマ処理装置の真空チャンバおよびこの真空チャンバ内に付設されるアルミニウム合金部材。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008246381A JP5284740B2 (ja) | 2008-09-25 | 2008-09-25 | 陽極酸化皮膜の形成方法とそれを用いたアルミニウム合金部材 |
US13/120,600 US9005765B2 (en) | 2008-09-25 | 2009-09-16 | Method for forming anodic oxide film, and aluminum alloy member using the same |
PCT/JP2009/066191 WO2010035674A1 (ja) | 2008-09-25 | 2009-09-16 | 陽極酸化皮膜の形成方法とそれを用いたアルミニウム合金部材 |
CN2009801277803A CN102099509B (zh) | 2008-09-25 | 2009-09-16 | 阳极氧化皮膜的形成方法和使用其的铝合金构件 |
TW98132499A TWI402379B (zh) | 2008-09-25 | 2009-09-25 | An anodic oxide film forming method and an aluminum alloy member using the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008246381A JP5284740B2 (ja) | 2008-09-25 | 2008-09-25 | 陽極酸化皮膜の形成方法とそれを用いたアルミニウム合金部材 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010077485A JP2010077485A (ja) | 2010-04-08 |
JP5284740B2 true JP5284740B2 (ja) | 2013-09-11 |
Family
ID=42059675
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008246381A Expired - Fee Related JP5284740B2 (ja) | 2008-09-25 | 2008-09-25 | 陽極酸化皮膜の形成方法とそれを用いたアルミニウム合金部材 |
Country Status (5)
Country | Link |
---|---|
US (1) | US9005765B2 (ja) |
JP (1) | JP5284740B2 (ja) |
CN (1) | CN102099509B (ja) |
TW (1) | TWI402379B (ja) |
WO (1) | WO2010035674A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5635419B2 (ja) | 2010-02-24 | 2014-12-03 | 株式会社神戸製鋼所 | 陽極酸化皮膜の形成方法 |
CN105420781A (zh) * | 2015-11-24 | 2016-03-23 | 山西江淮重工有限责任公司 | 一种快速成膜铸铝硬质阳极氧化工艺 |
CN110129854B (zh) * | 2018-02-08 | 2021-07-09 | 华为技术有限公司 | 一种氧化膜的制备方法和终端设备 |
CN115246194A (zh) * | 2019-04-20 | 2022-10-28 | 浙江师范大学 | 一种异质结构界面增强方法 |
CN113981500B (zh) * | 2021-12-09 | 2023-03-28 | 陕西宝成航空仪表有限责任公司 | 硬铝合金壳体零件的草酸阳极氧化工艺方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5431802A (en) * | 1985-05-10 | 1995-07-11 | Showa Aluminum Corporation | Cylinder tube and process for producing same |
US6242111B1 (en) * | 1992-09-17 | 2001-06-05 | Applied Materials, Inc. | Anodized aluminum susceptor for forming integrated circuit structures and method of making anodized aluminum susceptor |
JPH0874091A (ja) * | 1994-09-02 | 1996-03-19 | Kobe Steel Ltd | AlまたはAl合金製真空チャンバの製造方法 |
JP2943634B2 (ja) * | 1994-11-16 | 1999-08-30 | 株式会社神戸製鋼所 | AlまたはAl合金製真空チャンバ部材の表面処理方法 |
US5775892A (en) * | 1995-03-24 | 1998-07-07 | Honda Giken Kogyo Kabushiki Kaisha | Process for anodizing aluminum materials and application members thereof |
JP3608707B2 (ja) * | 1997-06-09 | 2005-01-12 | 株式会社神戸製鋼所 | 真空チャンバ部材及びその製造方法 |
JPH11140690A (ja) * | 1997-11-14 | 1999-05-25 | Kobe Steel Ltd | 耐熱割れ性および耐食性に優れたAl材料 |
JP4194143B2 (ja) * | 1998-10-09 | 2008-12-10 | 株式会社神戸製鋼所 | ガス耐食性とプラズマ耐食性に優れたアルミニウム合金材 |
JP2001335989A (ja) | 2000-05-31 | 2001-12-07 | Kobe Steel Ltd | 耐食性に優れる陽極酸化Al基金属材、その製造方法およびそれを用いたプラズマ雰囲気用Al基金属部品 |
US7033447B2 (en) * | 2002-02-08 | 2006-04-25 | Applied Materials, Inc. | Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus |
US20070029207A1 (en) * | 2005-08-05 | 2007-02-08 | Alcoa Inc. | Oxide coating for enhancing metal formability |
JP4796464B2 (ja) * | 2005-11-17 | 2011-10-19 | 株式会社神戸製鋼所 | 耐食性に優れたアルミニウム合金部材 |
JP4168066B2 (ja) * | 2006-08-11 | 2008-10-22 | 株式会社神戸製鋼所 | プラズマ処理装置に用いられる陽極酸化処理用アルミニウム合金およびその製造方法、陽極酸化皮膜を有するアルミニウム合金部材、ならびにプラズマ処理装置 |
JP4649419B2 (ja) * | 2007-01-17 | 2011-03-09 | ジヤトコ株式会社 | アルミニウム材料の表面処理方法 |
JP5064935B2 (ja) * | 2007-08-22 | 2012-10-31 | 株式会社神戸製鋼所 | 耐久性と低汚染性を兼備した陽極酸化処理アルミニウム合金 |
-
2008
- 2008-09-25 JP JP2008246381A patent/JP5284740B2/ja not_active Expired - Fee Related
-
2009
- 2009-09-16 WO PCT/JP2009/066191 patent/WO2010035674A1/ja active Application Filing
- 2009-09-16 CN CN2009801277803A patent/CN102099509B/zh not_active Expired - Fee Related
- 2009-09-16 US US13/120,600 patent/US9005765B2/en not_active Expired - Fee Related
- 2009-09-25 TW TW98132499A patent/TWI402379B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US20110174627A1 (en) | 2011-07-21 |
JP2010077485A (ja) | 2010-04-08 |
CN102099509A (zh) | 2011-06-15 |
CN102099509B (zh) | 2012-10-03 |
US9005765B2 (en) | 2015-04-14 |
TW201018751A (en) | 2010-05-16 |
WO2010035674A1 (ja) | 2010-04-01 |
TWI402379B (zh) | 2013-07-21 |
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