JP4333613B2 - High silicon steel sheet - Google Patents
High silicon steel sheet Download PDFInfo
- Publication number
- JP4333613B2 JP4333613B2 JP2005079829A JP2005079829A JP4333613B2 JP 4333613 B2 JP4333613 B2 JP 4333613B2 JP 2005079829 A JP2005079829 A JP 2005079829A JP 2005079829 A JP2005079829 A JP 2005079829A JP 4333613 B2 JP4333613 B2 JP 4333613B2
- Authority
- JP
- Japan
- Prior art keywords
- concentration
- steel sheet
- back surfaces
- difference
- silicon steel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Manufacturing Of Steel Electrode Plates (AREA)
- Soft Magnetic Materials (AREA)
Description
本発明は、トランスやモーターの鉄心材料として使用される高周波磁気特性に優れた高珪素鋼板およびその製造方法に関する。 The present invention relates to a high-silicon steel plate excellent in high-frequency magnetic properties used as a core material for transformers and motors, and a method for producing the same.
高珪素鋼板は、トランスやモーターの鉄心材料に使用され、Ｓｉの含有量が増すほど鉄損が低減し、Ｓｉ：６．５ｗｔ．％では磁歪が０となり、最大透磁率のピークとなる等、優れた磁気特性を示すことが知られている。 The high silicon steel sheet is used as a core material for transformers and motors, and the iron loss decreases as the Si content increases, and Si: 6.5 wt. % Is known to exhibit excellent magnetic properties such as magnetostriction being 0 and the peak of maximum permeability.
従来、高珪素鋼板の製造方法として、低珪素鋼を圧延により薄板とした後、鋼板表面からＳｉを浸透拡散させる、いわゆる浸珪法が知られている。しかし、拡散により均一Ｓｉ濃度の高珪素鋼板を製造しようとすると極めて時間がかかる。そこで、特許文献１〜５には、表層のＳｉ濃度が６．５ｗｔ．％となって、板厚方向にＳｉの濃度分布が存在する時点で拡散処理を打ち切り、全体の処理時間を短くすることが提案されている。また、このようにしてＳｉ濃度分布を形成した珪素鋼板は、高周波での鉄損が低いことが示されている。 Conventionally, as a method for producing a high silicon steel plate, a so-called siliconization method is known in which low silicon steel is made into a thin plate by rolling and then Si is infiltrated and diffused from the surface of the steel plate. However, it takes an extremely long time to produce a high silicon steel sheet having a uniform Si concentration by diffusion. Therefore, in Patent Documents 1 to 5, the Si concentration of the surface layer is 6.5 wt. It has been proposed to stop the diffusion process when the Si concentration distribution exists in the thickness direction and shorten the entire processing time. Moreover, it has been shown that the silicon steel sheet in which the Si concentration distribution is formed in this way has low iron loss at high frequencies.
このように、高周波特性、特に高周波での鉄損を低減するために、板厚方向にＳｉ濃度勾配を形成することが有効であるが、上記公報に開示されている浸珪法を用いて板厚方向にＳｉ濃度勾配を形成しても、所望の低鉄損特性が得られない場合がある。
本発明はかかる事情に鑑みてなされたものであって、安定して優れた高周波磁気特性を示す珪素鋼板およびその製造方法を提供することを目的とする。 This invention is made | formed in view of this situation, Comprising: It aims at providing the silicon steel plate which shows the stable high frequency magnetic characteristic, and its manufacturing method.
本発明者らは、このようにＳｉ濃度勾配を形成した珪素鋼板において、高周波鉄損が低くならない場合が生じる原因について検討した。その結果、表層Ｓｉ濃度が高く板厚中心部のＳｉ濃度が低いＳｉ濃度分布が形成されていても、表裏面のＳｉ濃度差が大きければ高周波鉄損は低下しないことを見出した。 The present inventors examined the cause of the case where the high-frequency iron loss does not become low in the silicon steel sheet having the Si concentration gradient formed as described above. As a result, it has been found that even if a Si concentration distribution is formed in which the Si concentration in the surface layer is high and the Si concentration in the central portion of the plate thickness is low, the high frequency iron loss does not decrease if the Si concentration difference between the front and back surfaces is large.
このような表裏面のＳｉ濃度差が生じるのは、浸珪法によりＳｉ化合物を浸珪させる際に、製造条件のばらつき等により、表面と裏面とでＳｉ化合物ガスの供給量が異なること等が考えられる。 The difference in Si concentration between the front and back surfaces is that when the Si compound is siliconized by the siliconization method, the supply amount of the Si compound gas differs between the front and back surfaces due to variations in manufacturing conditions, etc. Conceivable.
また、このような表裏面でのＳｉ濃度差を抑制するには、表裏面のＳｉ濃度差に起因する鋼板の反りを測定し、その反り量が一定の狭い範囲になるように、表裏面から供給するＳｉ化合物の量を制御することが有効であることを見出した。 Moreover, in order to suppress the Si concentration difference between the front and back surfaces, the warpage of the steel sheet due to the Si concentration difference between the front and back surfaces is measured, and from the front and back surfaces, the amount of warpage is within a certain narrow range. It has been found that it is effective to control the amount of Si compound to be supplied.
本発明は、このような知見に基づいてなされたものであり、鋼板の表面側および裏面側からＳｉ化合物ガスを供給して鋼板表裏面からＳｉを浸透させる浸珪処理および浸透させたＳｉを鋼板内に拡散する拡散処理を施し製造された、板厚方向にＳｉの濃度勾配を有し、表面のＳｉ濃度が板厚中心部のＳｉ濃度より高く、板厚方向のＳｉ濃度の最大と最小の差が０．３ｗｔ．％以上、表層のＳｉ濃度が５〜７ｗｔ．％の高珪素鋼板であって、前記表面側および前記裏面側からのＳｉ化合物ガスの供給量をそれぞれに制御して、表裏面のＳｉ濃度の差を１ｗｔ．％以内、幅方向の反り高さを製品幅に対して１％以下としたことを特徴とする高珪素鋼板を提供する。 The present invention has been made on the basis of such knowledge. The silicon compound gas is supplied from the front side and the back side of the steel sheet to infiltrate Si from the front and back surfaces of the steel sheet, and the infiltrated Si is steel sheet. Produced by diffusion treatment that diffuses in , having a Si concentration gradient in the plate thickness direction, the Si concentration on the surface is higher than the Si concentration in the center of the plate thickness, and the maximum and minimum Si concentrations in the plate thickness direction The difference is 0.3 wt. % Or more and the surface Si concentration is 5 to 7 wt. % High-silicon steel sheet, each of which controls the supply amount of Si compound gas from the front surface side and the back surface side, so that the difference in Si concentration between the front and back surfaces is 1 wt. Provided is a high silicon steel sheet characterized in that the warp height in the width direction is 1% or less with respect to the product width .
本発明によれば、板厚方向にＳｉの濃度勾配を有し、表面のＳｉ濃度を板厚中心部のＳｉ濃度より高くし、板厚方向のＳｉ濃度の最大と最小の差を０．３ｗｔ．％以上、表層のＳｉ濃度を５〜７ｗｔ．％とし、さらに表裏面のＳｉ濃度の差を１ｗｔ％以内とすることにより、安定して優れた高周波磁気特性を示す珪素鋼板を得ることができる。 According to the present invention, there is a Si concentration gradient in the plate thickness direction, the Si concentration on the surface is made higher than the Si concentration at the center of the plate thickness, and the difference between the maximum and minimum Si concentrations in the plate thickness direction is 0.3 wt. . % Or more, and the Si concentration of the surface layer is 5 to 7 wt. %, And the difference in Si concentration between the front and back surfaces is within 1 wt%, it is possible to obtain a silicon steel sheet that exhibits stable and excellent high-frequency magnetic properties.
以下本発明について具体的に説明する。
本発明においては、板厚方向にＳｉの濃度勾配を有し、表面のＳｉ濃度が板厚中心部のＳｉ濃度より高く、板厚方向のＳｉ濃度の最大と最小の差が０．３ｗｔ．％以上、表層のＳｉ濃度が５〜７ｗｔ．％の高珪素鋼板において、表裏面のＳｉ濃度の差を１ｗｔ．％以内とする。
The present invention will be specifically described below.
In the present invention, there is a Si concentration gradient in the plate thickness direction, the Si concentration on the surface is higher than the Si concentration in the center portion of the plate thickness, and the difference between the maximum and minimum Si concentrations in the plate thickness direction is 0.3 wt. % Or more and the surface Si concentration is 5 to 7 wt. % High silicon steel sheet, the difference in Si concentration between the front and back surfaces is 1 wt. %.
５ｋＨｚ以上の高周波での鉄損を下げるには、鋼板の表層近傍のみ透磁率を高くし、そこに磁束を集中させることで見かけの板厚を薄くすることが有効である。そのために、本発明では、表層のＳｉ濃度を高くし、板厚中心部のＳｉ濃度を低くして、板厚方向にＳｉの濃度勾配を形成し、板厚表層部のみ透磁率を高めている。 In order to reduce the iron loss at a high frequency of 5 kHz or more, it is effective to increase the permeability only in the vicinity of the surface layer of the steel sheet and to reduce the apparent thickness by concentrating the magnetic flux there. Therefore, in the present invention, the Si concentration in the surface layer is increased, the Si concentration in the center portion of the plate thickness is decreased, a Si concentration gradient is formed in the plate thickness direction, and the magnetic permeability is increased only in the plate thickness surface layer portion. .
しかし、表面と裏面とのＳｉ濃度の差が大きい場合には、高周波鉄損が低くならないことが判明した。そこで、本発明では、表裏面のＳｉ濃度の差を１ｗｔ．％以内と規定する。このように表裏面のＳｉ濃度の差を１ｗｔ．％と規定することにより、安定して低い高周波鉄損を得ることができる。このように表裏面でのＳｉ濃度の差が小さい場合に鉄損が低くなるのは、表裏の高透磁率領域の安定形成と、良好な形状による内部歪の軽減のためと推定される。 However, it has been found that the high-frequency iron loss does not decrease when the difference in Si concentration between the front surface and the back surface is large. Therefore, in the present invention, the difference in Si concentration between the front and back surfaces is 1 wt. It is prescribed within%. Thus, the difference in Si concentration between the front and back surfaces is 1 wt. By defining it as%, a low-frequency iron loss can be stably obtained. The reason why the iron loss is reduced when the difference in Si concentration between the front and back surfaces is small is presumed to be because of the stable formation of the high permeability regions on the front and back surfaces and the reduction of internal strain due to the good shape.
表層のＳｉ濃度は５〜７ｗｔ．％の範囲とする。これは、表層Ｓｉ濃度が５ｗｔ．％未満の場合および７ｗｔ．％超の場合には、上述したような鋼板の表層近傍の透磁率を高める効果が低いからである。表層のＳｉ濃度のより好ましい範囲は６〜７ｗｔ．％である。 The Si concentration of the surface layer is 5 to 7 wt. % Range. This is because the surface Si concentration is 5 wt. % And 7 wt. This is because the effect of increasing the magnetic permeability in the vicinity of the surface layer of the steel sheet as described above is low when it exceeds%. A more preferable range of the Si concentration in the surface layer is 6 to 7 wt. %.
また、板厚方向のＳｉ濃度の最大と最小の差が０．３ｗｔ．％以上となるようなＳｉ濃度勾配を形成することにより、表層に磁束を集中させる効果を発揮させることができ、高周波鉄損を有効に低下させることができる。 The difference between the maximum and minimum Si concentrations in the plate thickness direction is 0.3 wt. By forming a Si concentration gradient that is at least%, the effect of concentrating the magnetic flux on the surface layer can be exhibited, and the high-frequency iron loss can be effectively reduced.
本発明に係るＳｉの濃度勾配を有する珪素鋼板は、例えば、化学気相蒸着（ＣＶＤ、浸珪処理）法、物理気相蒸着（ＰＶＤ）法、クラツド技術、めっき技術等によって製造することが可能であるが、これらの中ではＣＶＤ法によって製造することが好ましい。 The silicon steel sheet having a Si concentration gradient according to the present invention can be manufactured by, for example, chemical vapor deposition (CVD, siliconization) method, physical vapor deposition (PVD) method, cladding technique, plating technique, etc. However, among these, it is preferable to manufacture by the CVD method.
ＣＶＤ法においては、鋼板をＳｉ系化合物を含む無酸化性ガス雰囲気で浸珪処理し、次いで、Ｓｉ系化合物を含まない無酸化性ガス雰囲気でＳｉの拡散処理を行ってＳｉの拡散速度を制御し、表層のＳｉ濃度が板厚中心部のＳｉ濃度よりも高い状態にあるうちに打ち切ることにより、上述のようなＳｉ濃度分布を形成することができる。 In the CVD method, the steel sheet is subjected to a siliconization treatment in a non-oxidizing gas atmosphere containing a Si-based compound, and then Si is diffused in a non-oxidizing gas atmosphere containing no Si-based compound to control the Si diffusion rate. Then, the Si concentration distribution as described above can be formed by cutting off while the Si concentration in the surface layer is higher than the Si concentration in the central portion of the plate thickness.
また、鋼板表面からＳｉを浸透させる浸珪処理および浸透させたＳｉを鋼板内に拡散させる拡散処理をＳｉ化合物を含む無酸化性雰囲気で同時的に行って浸珪および拡散速度を制御し、表層のＳｉ濃度が板厚中心部のＳｉ濃度よりも高い状態にあるうちに打ち切り、上述のようなＳｉ濃度分布を形成することもできる。 In addition, the silicidation treatment for infiltrating Si from the steel sheet surface and the diffusion treatment for diffusing the infiltrated Si into the steel sheet are performed simultaneously in a non-oxidizing atmosphere containing Si compound to control the silicidation and diffusion rate, and the surface layer It is possible to form the Si concentration distribution as described above by cutting off while the Si concentration is higher than the Si concentration at the center of the plate thickness.
後者の方法によれば、浸珪処理および拡散処理を同一雰囲気で同時的に行うことにより、炉の構造を簡略化することができるとともに、従来拡散炉で問題となっていた鋼板酸化も抑制することができ、また、浸珪・拡散処理炉における雰囲気調整、ＳｉＣｌ４ガスの導入箇所およびその流量、ならびに鋼板Ｓの移動速度等を調節することにより、Ｓｉ濃度分布を制御しやすく、極めて自由度の高い処理を行うことができる。 According to the latter method, the structure of the furnace can be simplified by simultaneously performing the siliconization treatment and the diffusion treatment in the same atmosphere, and also suppress the oxidation of the steel plate which has been a problem in the conventional diffusion furnace. It is also possible to control the Si concentration distribution by adjusting the atmosphere in the siliconization / diffusion treatment furnace, the location and flow rate of the SiCl 4 gas, the moving speed of the steel sheet S, etc. High processing can be performed.
ここで、浸珪処理は、Ｓｉ化合物ガスを用いて行う。処理に用いるＳｉ化合物ガスは、特に限定されるものではなく、ＳｉＨ４、Ｓｉ２Ｈ５、ＳｉＣｌ４等を用いることができるが、中でもＳｉＣｌ４が好ましい。処理ガスとしてＳｉＣｌ４を用いる場合には、処理温度を１０２３〜１２５０℃の範囲にすることが好ましい。また、浸珪処理および拡散処理の際のＳｉＣｌ４の濃度は０．０２〜３５ｍｏｌ％とすることが好ましい。 Here, the siliconization treatment is performed using Si compound gas. The Si compound gas used for the treatment is not particularly limited, and SiH 4 , Si 2 H 5 , SiCl 4, and the like can be used. Of these, SiCl 4 is preferable. When SiCl 4 is used as the processing gas, it is preferable to set the processing temperature in the range of 1023 to 1250 ° C. The concentration of SiCl 4 during siliconizing treatment and diffusion treatment is preferably a 0.02~35mol%.
Ｓｉ化合物ガスは、通常、鋼板の表面側および裏面側から供給されるが、このガスの供給量を制御することにより、表裏面のＳｉ濃度差を１ｗｔ．％以内にすることができる。 The Si compound gas is normally supplied from the front surface side and the back surface side of the steel sheet. By controlling the supply amount of this gas, the Si concentration difference between the front and back surfaces is 1 wt. % Can be within.
ただし、実操業においては、リアルタイムで表裏面のＳｉ濃度差を測定することが困難であるため、炉出側で鋼板の幅方向の反り（Ｃ反り）の高さを計測し、反り高さが製品幅に対して１％以下となるように、鋼板の表裏面から供給するＳｉ化合物の量を制御することが好ましい。つまり、表裏面のＳｉ濃度差が大きいほど鋼板の反りが大きくなるという関係があり、この反り高さが１％以下であれば、表裏面のＳｉ濃度差が１ｗｔ．％以下となるので、炉の出側で鋼板の反り高さを計測し、これが製品幅に対して１％以下となるように鋼板の表裏面から供給するＳｉ化合物の量をフィードバック制御することにより、表裏面のＳｉ濃度差を１ｗｔ．％以内にすることができる。 However, in actual operation, since it is difficult to measure the Si concentration difference between the front and back surfaces in real time, the height of the warp in the width direction of the steel sheet (C warp) is measured on the furnace exit side, and the warp height is It is preferable to control the amount of Si compound supplied from the front and back surfaces of the steel sheet so that it is 1% or less with respect to the product width. That is, there is a relationship that the warpage of the steel sheet increases as the Si concentration difference between the front and back surfaces increases. If the warp height is 1% or less, the Si concentration difference between the front and back surfaces is 1 wt. By measuring the warp height of the steel sheet on the exit side of the furnace and feedback controlling the amount of Si compound supplied from the front and back surfaces of the steel sheet so that this is 1% or less of the product width. The difference in Si concentration between the front and back surfaces is 1 wt. % Can be within.
本発明において、Ｓｉ以外の成分は特に限定されるものではなく、通常この種の鋼板として用いられる範囲であればよい。すなわち、Ｃ≦０．０２ｗｔ．％、０．０５ｗｔ．％≦Ｍｎ≦０．５ｗｔ．％、Ｐ≦０．０１ｗｔ．％、Ｓ≦０．０２ｗｔ．％、０．００１ｗｔ．％≦ｓｏｌ．Ａｌ≦０．０６ｗｔ．％、Ｎ≦０．０１ｗｔ．％の範囲が好ましい。 In this invention, components other than Si are not specifically limited, What is necessary is just the range normally used as this kind of steel plate. That is, C ≦ 0.02 wt. %, 0.05 wt. % ≦ Mn ≦ 0.5 wt. %, P ≦ 0.01 wt. %, S ≦ 0.02 wt. %, 0.001 wt. % ≦ sol. Al ≦ 0.06 wt. %, N ≦ 0.01 wt. % Range is preferred.
Ｃは多量に含有されると磁気時効を引き起こすため、０．０２ｗｔ．％以下とすることが好ましい。特性上、その下限は特に存在しないが、経済的に除去する観点からは０．００１ｗｔ．％とすることが好ましい。 When C is contained in a large amount, it causes magnetic aging, so 0.02 wt. % Or less is preferable. There is no particular lower limit in terms of characteristics, but 0.001 wt. % Is preferable.
Ｍｎは多量に含有されると鋼板が脆くなるため、０．５ｗｔ．％以下とすることが好ましい。また、その含有量が低く過ぎると、熱延工程で破断や表面キズを誘発するため、０．０５ｗｔ．％以上であることが好ましい。 If Mn is contained in a large amount, the steel sheet becomes brittle. % Or less is preferable. On the other hand, if the content is too low, rupture and surface scratches are induced in the hot rolling process. % Or more is preferable.
Ｐは磁気特性から見ると好ましい元素であるが、多量に含有されると鋼板の加工性を劣化させるため、０．０１ｗｔ．％以下であることが好ましい。特性上、その下限は特に存在しないが、経済的に除去する観点からは０．００１ｗｔ．％とすることが好ましい。 P is a preferable element from the viewpoint of magnetic properties. However, if contained in a large amount, P deteriorates the workability of the steel sheet, so 0.01 wt. % Or less is preferable. There is no particular lower limit in terms of characteristics, but 0.001 wt. % Is preferable.
Ｓは加工性を劣化させるため、０．０２ｗｔ．％以下とすることが好ましい。特性上、その下限は特に存在しないが、経済的に除去する観点からは０．００１ｗｔ．％とすることが好ましい。 Since S deteriorates workability, 0.02 wt. % Or less is preferable. There is no particular lower limit in terms of characteristics, but 0.001 wt. % Is preferable.
ｓｏｌ．Ａｌは同じく加工性を害するため、０．０６ｗｔ．％以下とすることが好ましい。一方、脱酸剤としての必要性から０．００１ｗｔ．％以上が好ましい。 sol. Since Al also harms workability, 0.06 wt. % Or less is preferable. On the other hand, from the necessity as a deoxidizer, 0.001 wt. % Or more is preferable.
Ｎは多量に含有されると窒化物を形成して磁気特性を劣化させるため、０．０１ｗｔ．％以下であることが好ましい。特性上、その下限は特に存在しないが、現在の製鋼技術では０．０００１ｗｔ．％が事実上の下限となる。 When N is contained in a large amount, a nitride is formed and the magnetic properties are deteriorated. % Or less is preferable. Although there is no lower limit in terms of characteristics, 0.0001 wt. % Is the practical lower limit.
なお、表裏面のＳｉ濃度およびＳｉ濃度の最大と最小との差は、全板厚をＥＰＭＡ分析して得られるＳｉ濃度プロファイルから決定することができる。また、本発明の効果は鋼板の板厚によらず得ることができる。 The Si concentration on the front and back surfaces and the difference between the maximum and minimum Si concentrations can be determined from the Si concentration profile obtained by EPMA analysis of the total thickness. Moreover, the effect of this invention can be acquired irrespective of the plate | board thickness of a steel plate.
以下、本発明の実施例について説明する。
（実施例１）
板厚０．３ｍｍ、幅６４０ｍｍの３ｗｔ．％珪素鋼板に種々の条件で浸珪処理し、板厚方向に０．３％以上のＳｉ濃度差を有する高珪素鋼板を試作し、表裏Ｓｉ濃度と鉄損値との相関を調査した。
Examples of the present invention will be described below.
Example 1
3 wt. With a plate thickness of 0.3 mm and a width of 640 mm. % Silicon steel plate was subjected to siliconization treatment under various conditions, a high silicon steel plate having a Si concentration difference of 0.3% or more in the plate thickness direction was prototyped, and the correlation between the front and back Si concentration and the iron loss value was investigated.
浸珪処理炉の温度は１２００℃、均熱温度は、１１５０℃、１０００℃、９００℃の３つのゾーンに分けて設定した。ライン速度は１０ｍｐｍで一定とし、表裏面それぞれに供給するＳｉＣｌ４の流量を変化させ、鋼板表裏のＳｉ値を変化させ、鉄損値を測定した。表１に、表裏面のＳｉ濃度、表裏のＳｉ濃度差、平均Ｓｉ濃度差（ΔＳｉ）、および鉄損値（エプスタイン測定値）を示す。また、併せて鋼板のＣ反り高さを示す。なお、板厚中心部のＳｉ濃度はいずれも３ｗｔ．％であった。また、平均ΔＳｉは以下の式で計算した値である。
平均ΔＳｉ＝（表面Ｓｉ＋裏面Ｓｉ）／２−板中心部Ｓｉ
The temperature of the siliconizing furnace was set at 1200 ° C, and the soaking temperature was set in three zones of 1150 ° C, 1000 ° C, and 900 ° C. The line speed was fixed at 10 mpm, the flow rate of SiCl 4 supplied to the front and back surfaces was changed, the Si values on the front and back surfaces of the steel sheet were changed, and the iron loss value was measured. Table 1 shows the Si concentration on the front and back surfaces, the Si concentration difference between the front and back surfaces, the average Si concentration difference (ΔSi), and the iron loss value (Epstein measurement value). In addition, the C warp height of the steel sheet is also shown. The Si concentration at the center of the plate thickness is 3 wt. %Met. The average ΔSi is a value calculated by the following equation.
Average ΔSi = (surface Si + back surface Si) / 2−plate center portion Si
表１に示すように、本発明を満たすものは、表層Ｓｉ濃度に応じて、低い鉄損値が得られた。また、表層のＳｉ濃度が６．５ｗｔ．％のものは、均一な６．５ｗｔ．％Ｓｉのものに比較して低い鉄損値が得られた。これに対し、表層のＳｉ濃度が外れるものや、表裏面のＳｉ濃度の差が１ｗｔ．％以上あるものは、鉄損値が高いことが確認された。また、表裏面のＳｉ濃度の差が１ｗｔ．％以内のものは、Ｃ反り高さが鋼板幅の１％以下であることが確認された。 As shown in Table 1, those satisfying the present invention obtained low iron loss values depending on the surface layer Si concentration. Moreover, the Si concentration of the surface layer is 6.5 wt. % Is uniform 6.5 wt. Low iron loss values were obtained compared to those of% Si. On the other hand, the Si concentration of the surface layer deviates or the difference in Si concentration between the front and back surfaces is 1 wt. It was confirmed that the iron loss value was high for those having a% or more. The difference in Si concentration between the front and back surfaces is 1 wt. %, The C warp height was confirmed to be 1% or less of the steel plate width.
（実施例２）
板厚０．１ｍｍ、幅６４０ｍｍの３ｗｔ．％珪素鋼板に種々の条件で浸珪処理し、板厚方向に０．３％以上のＳｉ濃度差を有する高珪素鋼板を試作し、表裏Ｓｉ濃度と鉄損値との相関を調査した。
(Example 2)
3 wt. With a plate thickness of 0.1 mm and a width of 640 mm. % Silicon steel plate was subjected to siliconization treatment under various conditions, a high silicon steel plate having a Si concentration difference of 0.3% or more in the plate thickness direction was prototyped, and the correlation between the front and back Si concentration and the iron loss value was investigated.
浸珪処理炉の温度は１２００℃、均熱温度は、１１００℃、９５０℃、８００℃の３つのゾーンに分けて設定した。ライン速度は２０ｍｐｍで一定とし、表裏面それぞれに供給するＳｉＣｌ４の流量を変化させ、鋼板表裏のＳｉ値を変化させ、鉄損値を測定した。表２に、表裏面のＳｉ濃度、表裏のＳｉ濃度差、平均Ｓｉ濃度差（ΔＳｉ）、および鉄損値（エプスタイン測定値）を示す。また、併せて鋼板のＣ反り高さを示す。なお、板厚中心部のＳｉ濃度はいずれも３〜５ｗｔ．％であった。 The temperature of the siliconizing furnace was set to 1200 ° C., and the soaking temperature was set in three zones of 1100 ° C., 950 ° C., and 800 ° C. The line speed was fixed at 20 mpm, the flow rate of SiCl 4 supplied to the front and back surfaces was changed, the Si values on the front and back surfaces of the steel sheet were changed, and the iron loss value was measured. Table 2 shows the Si concentration on the front and back surfaces, the Si concentration difference between the front and back surfaces, the average Si concentration difference (ΔSi), and the iron loss value (Epstein measurement value). In addition, the C warp height of the steel sheet is also shown. The Si concentration at the center of the plate thickness is 3 to 5 wt. %Met.
表２に示すように、本発明を満たすものは、表層Ｓｉ濃度に応じて、低い鉄損値が得られた。また、表層のＳｉ濃度が６．５ｗｔ．％のものは、均一な６．５ｗｔ．％Ｓｉのものに比較して低い鉄損値が得られた。これに対し、表層のＳｉ濃度が外れるものや、表裏面のＳｉ濃度の差が１ｗｔ．％以上あるものは、鉄損値が高いことが確認された。また、表裏面のＳｉ濃度の差が１ｗｔ．％以内のものは、Ｃ反り高さが鋼板幅の１％以下であることが確認された。 As shown in Table 2, those satisfying the present invention obtained low iron loss values depending on the surface layer Si concentration. Moreover, the Si concentration of the surface layer is 6.5 wt. % Is uniform 6.5 wt. Low iron loss values were obtained compared to those of% Si. On the other hand, the Si concentration of the surface layer deviates or the difference in Si concentration between the front and back surfaces is 1 wt. It was confirmed that the iron loss value was high for those having a% or more. The difference in Si concentration between the front and back surfaces is 1 wt. %, The C warp height was confirmed to be 1% or less of the steel plate width.
本発明によれば、安定して優れた高周波磁気特性を示す珪素鋼板を得ることができるので、トランスやモーターの鉄心材料として好適である。 According to the present invention, a silicon steel plate that exhibits stable and excellent high-frequency magnetic properties can be obtained, which is suitable as a core material for transformers and motors.
Claims (1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005079829A JP4333613B2 (en) | 2005-03-18 | 2005-03-18 | High silicon steel sheet |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005079829A JP4333613B2 (en) | 2005-03-18 | 2005-03-18 | High silicon steel sheet |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11436098A Division JP3896688B2 (en) | 1998-03-12 | 1998-04-10 | Method for producing high silicon steel sheet |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005240185A JP2005240185A (en) | 2005-09-08 |
| JP4333613B2 true JP4333613B2 (en) | 2009-09-16 |
Family
ID=35022213
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005079829A Expired - Fee Related JP4333613B2 (en) | 2005-03-18 | 2005-03-18 | High silicon steel sheet |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4333613B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102348826B (en) | 2009-03-13 | 2014-03-12 | 新日铁住金株式会社 | Non-oriented magnetic steel sheet and method for producing same |
| CN108884535B (en) | 2016-03-31 | 2020-08-18 | 杰富意钢铁株式会社 | Electromagnetic steel sheet and method for producing same |
| EP3725906A1 (en) | 2017-12-12 | 2020-10-21 | JFE Steel Corporation | Multilayer electromagnetic steel sheet |
| WO2019117089A1 (en) | 2017-12-12 | 2019-06-20 | Ｊｆｅスチール株式会社 | Multilayer electromagnetic steel sheet |
| US20220239202A1 (en) * | 2019-05-28 | 2022-07-28 | Jfe Steel Corporation | Method for manufacturing motor core |
-
2005
- 2005-03-18 JP JP2005079829A patent/JP4333613B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005240185A (en) | 2005-09-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5446377B2 (en) | Oriented electrical steel sheet and manufacturing method thereof | |
| KR102129846B1 (en) | Electronic steel sheet and its manufacturing method | |
| WO1999046417A1 (en) | Silicon steel sheet and method for producing the same | |
| JP4333613B2 (en) | High silicon steel sheet | |
| TWI393792B (en) | Non - directional electrical steel sheet and manufacturing method thereof | |
| JP7334673B2 (en) | Non-oriented electrical steel sheet and manufacturing method thereof | |
| CN114514332A (en) | Non-oriented electromagnetic steel sheet and method for producing same | |
| JP3896688B2 (en) | Method for producing high silicon steel sheet | |
| JP2541383B2 (en) | High silicon steel sheet with excellent soft magnetic properties | |
| JP4269350B2 (en) | Method for producing high silicon steel sheet | |
| JP5664286B2 (en) | Method for producing high silicon steel sheet | |
| JP2605511B2 (en) | Method for producing high silicon steel strip by continuous line | |
| JP5664287B2 (en) | Method for producing high silicon steel sheet | |
| JPH09291351A (en) | High silicon steel sheet excellent in workability and its production | |
| JP4470556B2 (en) | Manufacturing method of high silicon steel sheet by continuous line | |
| JPH11199988A (en) | Silicon steel sheet having gradient of silicon concentration | |
| JPH11293416A (en) | High silicon steel plate low in residual magnetic flux density and its production | |
| RU2779397C1 (en) | Sheet of non-textured electrical steel | |
| JP3395647B2 (en) | Method for producing silicon steel sheet having Si concentration distribution using siliconizing method | |
| JP2528748B2 (en) | Method of manufacturing silicon steel sheet by continuous line | |
| JP2528746B2 (en) | Method for manufacturing high silicon steel sheet | |
| JP3570331B2 (en) | Method for producing high silicon steel sheet with excellent surface properties | |
| JPH11241150A (en) | Silicon steel sheet low in residual magnetic flux density and excellent in workability | |
| JP2004270011A (en) | Method for producing high magnetic flux density non-directional magnetic steel sheet for rotary machine | |
| JPH11293417A (en) | Silicon steel sheet excellent in magnetic aging property and low in residual magnetic flux density |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080624 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080825 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090303 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090415 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20090602 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20090615 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120703 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120703 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130703 Year of fee payment: 4 |
|
| LAPS | Cancellation because of no payment of annual fees |