JP3475594B2 - Manufacturing method of photoreceptor for electrophotography - Google Patents
Manufacturing method of photoreceptor for electrophotographyInfo
- Publication number
- JP3475594B2 JP3475594B2 JP21032795A JP21032795A JP3475594B2 JP 3475594 B2 JP3475594 B2 JP 3475594B2 JP 21032795 A JP21032795 A JP 21032795A JP 21032795 A JP21032795 A JP 21032795A JP 3475594 B2 JP3475594 B2 JP 3475594B2
- Authority
- JP
- Japan
- Prior art keywords
- sealing
- treatment
- value
- sealing treatment
- oxide film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Photoreceptors In Electrophotography (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は電子写真感光体に使用す
るアルミニウム基板の製造方法に係り、特に陽極酸化、
封孔処理後の洗浄容易なアルミニウム基板の製造方法に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an aluminum substrate used for an electrophotographic photosensitive member, and particularly to anodizing,
The present invention relates to a method for manufacturing an aluminum substrate that can be easily cleaned after a sealing treatment.
【0002】[0002]
【従来の技術】電子写真の技術は従来から複写機の分野
で発展を遂げ、最近ではレーザプリンターなどにも応用
され、従来のインパクトプリンターとは比較にならない
ほど高画質,高速,静粛性を誇り、急速に広まってい
る。これらの装置で使用される感光体は導電性の基板表
面に光導電層を設けて形成される。光導電層としては、
最近、有機物質を使用したものが主流で、機能分離型の
層構成を示す電子写真用感光体が一般的である。2. Description of the Related Art Electrophotographic technology has been developed in the field of copying machines, and has recently been applied to laser printers, etc., and boasts image quality, high speed, and quietness that are incomparable to conventional impact printers. , Is spreading rapidly. Photoreceptors used in these devices are formed by providing a photoconductive layer on the surface of a conductive substrate. As the photoconductive layer,
Recently, organic materials are mainly used, and electrophotographic photoreceptors having a function-separated layer structure are common.
【0003】図3は従来の電子写真用感光体を示す断面
図である。アルミニウム基板1の上にアンダーコート層
2、電荷発生層3、電荷輸送層4が順次積層される。ア
ンダーコート層としては、ポリアミドを代表とする有機
樹脂を使用するタイプとアルミニウム基板の表面に陽極
酸化皮膜を形成させるタイプの2種類に分けられるが、
高温高湿環境下で電子写真用感光体を使用する際には後
者の方が信頼性が高く有利である。FIG. 3 is a sectional view showing a conventional electrophotographic photosensitive member. An undercoat layer 2, a charge generation layer 3, and a charge transport layer 4 are sequentially laminated on an aluminum substrate 1. The undercoat layer is classified into two types: a type using an organic resin typified by polyamide and a type forming an anodized film on the surface of an aluminum substrate.
When the electrophotographic photoreceptor is used in a high temperature and high humidity environment, the latter is more reliable and advantageous.
【0004】[0004]
【発明が解決しようとする課題】陽極酸化処理は一般に
脱脂、水洗、エッチングの工程とそれに続く硫酸による
陽極酸化と陽極酸化後の封孔処理からなる。封孔処理は
アルミニウム基板の汚染を防止し、また洗浄性を向上さ
せる目的等で行われる。その封孔処理方法としては純水
による封孔処理,蒸気による封孔処理,酢酸ニッケルに
よる封孔処理等があるが、酢酸ニッケルによる封孔処理
が簡便な方法として一般的に用いられる。The anodizing treatment generally comprises degreasing, washing with water and etching, followed by anodizing with sulfuric acid and sealing treatment after anodizing. The sealing treatment is performed for the purpose of preventing the aluminum substrate from being contaminated and improving the cleaning property. As the sealing treatment method, there are a sealing treatment with pure water, a sealing treatment with steam, a sealing treatment with nickel acetate and the like, and the sealing treatment with nickel acetate is generally used as a simple method.
【0005】封孔処理された後に感光層を直接塗布する
と、陽極酸化皮膜表面に残存する封孔剤中のイオンや酸
化物(酢酸ニッケルを用いる場合、酸化ニッケルなど)
により、感光体としての電位保持率(暗減衰率)が低下
し、印字品質に悪影響を与える(反転現像方式において
かぶり現象や黒点が発生する。)
このために陽極酸化して封孔処理した皮膜の洗浄処理が
行われる。使用する洗浄剤はpH9〜10のアルカリ系
洗剤が効果的であるが、陽極酸化皮膜の封孔度で左右さ
れる表面状態によって、陽極酸化皮膜の耐アルカリ性が
弱い場合や洗浄性が悪い場合がある。耐アルカリ性が弱
い場合は、陽極酸化皮膜表面が部分的にエッチングさ
れ、感光層を塗布した際の膜厚むらが生じ、印字品質に
反映され、濃度むらの原因となる。また洗浄性が悪い場
合は、表面のイオンや酸化物の除去効率が悪く、黒点等
の印字欠陥の原因となる。When the photosensitive layer is directly coated after the sealing treatment, the ions and oxides in the sealing agent remaining on the surface of the anodic oxide film (such as nickel oxide when nickel acetate is used)
As a result, the potential holding rate (dark decay rate) of the photoconductor is lowered, which adversely affects the printing quality (fogging phenomenon and black spots occur in the reversal development method). The cleaning process is performed. As the cleaning agent to be used, an alkaline detergent having a pH of 9 to 10 is effective, but depending on the surface condition that depends on the sealing degree of the anodized film, the anodized film may have weak alkali resistance or poor detergency. is there. If the alkali resistance is weak, the surface of the anodic oxide film is partially etched, resulting in uneven film thickness when the photosensitive layer is applied, which is reflected in print quality and causes uneven density. If the cleaning property is poor, the removal efficiency of ions and oxides on the surface is poor, which causes printing defects such as black spots.
【0006】陽極酸化皮膜の表面状態を左右する封孔度
は、陽極酸化皮膜のアドミッタンス値(以下Y値と称す
る)を用いて表示することができる。Y値が低いほど陽
極酸化皮膜の耐アルカリ性が良好であるのでY値がある
程度低い状態(膜厚20μm換算の測定値で60μS未
満、望ましくは20μS以下)で使用するのが好まし
い。The degree of sealing which influences the surface condition of the anodic oxide film can be displayed using the admittance value (hereinafter referred to as Y value) of the anodic oxide film. The lower the Y value is, the better the alkali resistance of the anodic oxide film is. Therefore, it is preferably used in a state where the Y value is somewhat low (measured value in terms of film thickness of 20 μm is less than 60 μS, preferably 20 μS or less).
【0007】前述の目的のために処理温度または処理時
間等の封孔処理条件を強化することによってY値を下げ
ることが行われたが、この場合はY値は小さくなるもの
の陽極酸化皮膜表面のイオンや酸化物が増加してイオン
や酸化物の除去効率が悪くなり印字品質が悪くなるとい
う問題があった。この発明は上述の点に鑑みてなされそ
の目的は、陽極酸化皮膜の封孔度を高めるとともに陽極
酸化皮膜表面に付着するイオンや酸化物を少なくするこ
とにより、陽極酸化皮膜表面の耐アルカリ性や洗浄性を
高め、黒点や濃度むらの発生を抑えて印字特性の良好な
電子写真用感光体を提供することにある。For the above-mentioned purpose, the Y value has been lowered by strengthening the sealing treatment conditions such as the treatment temperature or the treatment time. In this case, the Y value becomes small but the surface of the anodized film is reduced. There is a problem in that the amount of ions and oxides increases, the efficiency of removing ions and oxides deteriorates, and the print quality deteriorates. This invention has been made in view of the above points, and its object is to increase the sealing degree of the anodic oxide film and reduce the amount of ions and oxides attached to the surface of the anodic oxide film, thereby improving the alkali resistance and cleaning of the anodic oxide film surface. The purpose of the present invention is to provide an electrophotographic photosensitive member having improved printing properties and suppressing black spots and density unevenness and having good printing characteristics.
【0008】[0008]
【課題を解決するための手段】上述の目的はこの発明に
よればアルミニウム基板の表面に陽極酸化皮膜を形成し
たのちに有機感光層を積層する電子写真用感光体の製造
方法において、前記陽極酸化皮膜を形成したのちに封孔
度がアドミッタンス値で60ないし100μSとなる封
孔処理を行い、水蒸気雰囲気中に保持して封孔度をアド
ミッタンス値で60μS未満にし次いで洗浄処理するこ
とにより達成される。According to the present invention, the above object is to provide a method for producing an electrophotographic photoreceptor in which an organic photosensitive layer is laminated after forming an anodized film on the surface of an aluminum substrate. Achieved by performing a sealing treatment after the film is formed so that the sealing degree is 60 to 100 μS as an admittance value, and keeping it in a water vapor atmosphere so that the sealing degree is less than 60 μS as an admittance value and then performing a cleaning treatment. .
【0009】上述の発明において、水蒸気雰囲気中に保
持する時間D(h)は、雰囲気温度をT〔K〕、水蒸気
圧および飽和水蒸気圧をそれぞれpおよびPとした場合
に、下記(1)式を満足するものとする。In the above invention, the time D (h) of holding in the steam atmosphere is expressed by the following formula (1) when the atmospheric temperature is T [K] and the steam pressure and the saturated steam pressure are p and P, respectively. Shall be satisfied.
【0010】[0010]
【数2】
T・D・p/P≧300 ・・・ (1)
さらに上述の発明において、封孔処理は酢酸ニッケルま
たは純水による封孔処理であるとすることが有効であ
る。## EQU00002 ## T.D.p / P.gtoreq.300 (1) Further, in the above-mentioned invention, it is effective that the sealing treatment is a sealing treatment with nickel acetate or pure water.
【0011】[0011]
【作用】温和な封孔処理では陽極酸化皮膜の表面に付着
するイオンや酸化物の量は少ない。封孔処理された陽極
酸化皮膜を水蒸気雰囲気中に保持すると、水分によって
水和反応を起こし、陽極酸化皮膜の表面にイオンや酸化
物が付着することなく、先の温和な封孔処理で得られた
陽極酸化皮膜の封孔度がさらに改善される。[Function] In a mild sealing treatment, the amount of ions and oxides attached to the surface of the anodized film is small. When the sealed anodic oxide film is kept in a water vapor atmosphere, hydration reaction occurs due to water, and ions and oxides do not adhere to the surface of the anodic oxide film. Further, the sealing degree of the anodized film is further improved.
【0012】式(1)を満足する条件下で水蒸気雰囲気
中に保持するとY値が60μS未満の値となる。例えば
酢酸ニッケルまたは純水による封孔処理したあとに水蒸
気雰囲気中に保持すると封孔度の改善が顕著に起こる。When kept in a water vapor atmosphere under conditions satisfying the expression (1), the Y value becomes a value of less than 60 μS. For example, after the sealing treatment with nickel acetate or pure water, the sealing degree is remarkably improved when kept in a steam atmosphere.
【0013】[0013]
【実施例】次にこの発明の実施例を図面に基づいて説明
する。図1は陽極酸化皮膜につきアドミッタンス値で6
0ないし100μSの封孔処理をしたものの相対湿度3
0%におけるアドミッタンスの水蒸気雰囲気中保持時間
依存性を示す線図である。Embodiments of the present invention will now be described with reference to the drawings. Figure 1 shows an admittance value of 6 for anodized films.
Relative humidity 3 with 0 to 100 μS sealing treatment
It is a diagram which shows the retention time dependence in 0% of admittance in a steam atmosphere.
【0014】雰囲気の相対湿度を30%RHに設定し、
雰囲気温度を5,10,50,90℃の4条件で皮膜の
Y値の推移を測定した。10℃以上の温度でY値の低下
が顕著である。図2は陽極酸化皮膜につきアドミッタン
ス値で60ないし100μSの封孔処理をしたものの雰
囲気温度10℃におけるアドミッタンスの水蒸気雰囲気
中保持時間依存性を示す線図である。Setting the relative humidity of the atmosphere to 30% RH,
The transition of the Y value of the film was measured under four conditions of atmospheric temperature of 5, 10, 50 and 90 ° C. The decrease in Y value is remarkable at a temperature of 10 ° C. or higher. FIG. 2 is a diagram showing the dependency of the admittance in the steam atmosphere at the atmospheric temperature of 10 ° C. on the anodic oxide film which has been subjected to the sealing treatment of 60 to 100 μS in the admittance value.
【0015】雰囲気温度を10℃に設定し、相対湿度を
10,20,50,80%RHの4条件で皮膜のY値の
推移を測定した。10%RH以上の環境でY値の低下が
顕著に認められた。このようにして陽極酸化皮膜の封孔
度を効率的に向上させるには雰囲気温度10℃以上、相
対湿度10%RH以上にすればよい。この環境では少な
くとも12時間(望ましくは1日以上)保持すれば良
い。The transition of the Y value of the film was measured under the four conditions of ambient temperature of 10 ° C. and relative humidity of 10, 20, 50 and 80% RH. A significant decrease in Y value was observed in an environment of 10% RH or more. In this way, in order to efficiently improve the sealing degree of the anodized film, the ambient temperature may be 10 ° C. or higher and the relative humidity may be 10% RH or higher. In this environment, it should be held for at least 12 hours (preferably one day or more).
【0016】雰囲気温度をT〔K〕、水蒸気圧をp、飽
和水蒸気圧をP、封孔処理完了後の水蒸気雰囲気中の保
持時間をD〔h〕とするときに、これらの間には式
(1)の関係が成立する。When the atmospheric temperature is T [K], the steam pressure is p, the saturated steam pressure is P, and the holding time in the steam atmosphere after completion of the sealing treatment is D [h], there are equations between these. The relationship of (1) is established.
【0017】[0017]
【数3】
T・D・p/P≧300 ・・・ (1)
アルミニウム基板を陽極酸化処理する前に、脱脂洗浄す
るのが好ましい。脱脂効果を高めるため、通常は苛性ソ
ーダ等のアルカリによりエッチングを行うが、大きなエ
ッチングピットを生じない酸によるエッチングが好まし
い。## EQU00003 ## T.D.p / P.gtoreq.300 (1) It is preferable to perform degreasing cleaning before anodizing the aluminum substrate. In order to enhance the degreasing effect, etching is usually carried out with an alkali such as caustic soda, but etching with an acid that does not produce large etching pits is preferred.
【0018】陽極酸化は硫酸中での処理で硫酸濃度は1
60〜200g/l が最適である。電解中の温度は18〜
22℃が良いが、特に20〜21℃が好ましい。硫酸中
の溶存アルミ量は10g/l 以下、望ましくは3〜7g/l
が良い。陽極酸化後にアドミッタンス値で60ないし1
00μSの封孔処理を行うためには酢酸ニッケルを用い
るが純水による処理でも良い。封孔処理温度としては6
0〜80℃が良いが、70℃程度が最適である。処理時
間は5〜10分で8〜10分が好ましい。
実施例1
切削加工したアルミニウム基板を脱脂剤(アルキレンF
300K:貴和化学(株)、濃度60g/l 、温度50
℃、5分間)を用いて脱脂し純水で洗浄した。脱脂効果
を高めるため、苛性ソーダ(50g/l 、40℃、15
秒)を用いてエッチングを行った。中和処理は硝酸(1
05g/l 、23℃、5分)で処理し水洗した。電解処理
は硫酸(150g/l )中において温度20℃で20分間
行い水洗した。封孔処理は5g/l の酢酸ニッケル(添加
剤:シーレックスB(メルテックス(株)、2g/l )を
用いて実施した(pH=5.8 、65℃)。封孔処理後に
純水で洗浄し乾燥させアルミニウム基板を複数作製し
た。これら基板のアドミッタンス値をJISの規定に従
って測定し89μSのアドミッタンス値を得た(測定器
Fischer 製アノテスタ)。The anodic oxidation is a treatment in sulfuric acid and the sulfuric acid concentration is 1
The optimum value is 60 to 200 g / l. The temperature during electrolysis is 18-
22 ° C is preferable, but 20 to 21 ° C is particularly preferable. Dissolved aluminum content in sulfuric acid is 10g / l or less, preferably 3-7g / l
Is good. 60 to 1 in admittance value after anodization
Nickel acetate is used to perform the sealing treatment of 00 μS, but treatment with pure water may be used. The sealing temperature is 6
0 to 80 ° C is preferable, but about 70 ° C is optimal. The treatment time is 5 to 10 minutes, preferably 8 to 10 minutes. Example 1 A degreasing agent (alkylene F
300K: Kiwa Chemical Co., Ltd., concentration 60g / l, temperature 50
It was degreased by using (.degree. C., 5 minutes) and washed with pure water. To enhance the degreasing effect, caustic soda (50g / l, 40 ℃, 15
Second) was used for etching. Neutralization treatment is nitric acid (1
It was treated with 05 g / l, 23 ° C., 5 minutes) and washed with water. The electrolytic treatment was carried out in sulfuric acid (150 g / l) at a temperature of 20 ° C. for 20 minutes and washing with water. The sealing treatment was carried out using 5 g / l of nickel acetate (additive: Seelex B (Meltex Co., Ltd., 2 g / l) (pH = 5.8, 65 ° C.). After the sealing treatment, it was washed with pure water. A plurality of aluminum substrates were dried and the admittance values of these substrates were measured according to JIS standards to obtain an admittance value of 89 μS (measuring instrument).
Fischer Anotesta).
【0019】得られた素管を2時間、50%RHにおい
て278、303、313Kに各々保持しアドミッタン
ス値を測定した。次に得られた素管をアルカリ系洗浄剤
(UクリーナーAD68:上村工業)で洗浄したのち純
水で濯ぎ、65℃の温純水で乾燥させた。次に電荷発生
層(X型無金属フタロシアニンを塩化ビニル酢酸ビニル
共重合体に40重量%の比率で分散させたもの)を塗布
して80℃の乾燥炉で30分間乾燥させた。続いて電荷
輸送層(ポリカーボネートとヒドラゾン系材料を混合し
たもの)を塗布し、90℃の乾燥炉で2時間乾燥させて
感光体を作製した。The obtained tube was held at 278, 303, 313K at 50% RH for 2 hours, and the admittance value was measured. Next, the obtained tube was washed with an alkaline cleaner (U cleaner AD68: Uemura Kogyo), rinsed with pure water, and dried with warm pure water at 65 ° C. Next, a charge generation layer (X-type metal-free phthalocyanine dispersed in vinyl chloride / vinyl acetate copolymer at a ratio of 40% by weight) was applied and dried in a drying oven at 80 ° C. for 30 minutes. Subsequently, a charge transport layer (a mixture of polycarbonate and a hydrazone material) was applied and dried in a drying oven at 90 ° C. for 2 hours to prepare a photoreceptor.
【0020】作製した感光体を画像評価した結果が表1
に示される。Table 1 shows the results of image evaluation of the produced photoconductor.
Shown in.
【0021】[0021]
【表1】 [Table 1]
【0022】表1から雰囲気温度が303K以上のとき
にT・D・p/Pの値が300を越えて、Y値が60μ
S未満となるとともに黒点や濃度むらの発生率が0とな
っていることがわかる。
実施例2
アルミニウム基板を脱脂剤(ファインクリーナー31
5:日本パーカライジング(株)、温度50℃)により
脱脂を行い、水洗して脱脂剤を除去した。その後、HN
O3 によりさらに脱脂を行った。次に電解処理は硫酸中
で、温度を20℃で24分間行い純水で洗浄した。封孔
処理は純水を用い、温度は70℃で8.5分間行った
後、純水で超音波洗浄して熱風乾燥させ、陽極酸化皮膜
を形成させてアルミニウム基板(素管)を1000本作
製した。これら基板のアドミッタンス値は88μSであ
った。得られた素管を323°K、30%RHで1〜7
時間および24時間放置し、Y値を測定した。From Table 1, when the atmospheric temperature is 303 K or more, the value of T · D · p / P exceeds 300 and the Y value is 60 μ.
It can be seen that the rate of occurrence of black spots and uneven density becomes 0 as well as the value becomes less than S. Example 2 A degreasing agent (fine cleaner 31
5: Degreasing was performed by Nippon Parkerizing Co., Ltd., temperature 50 ° C., and washing was performed to remove the degreasing agent. Then HN
Further degreasing was carried out with O 3 . Next, electrolytic treatment was carried out in sulfuric acid at a temperature of 20 ° C. for 24 minutes, and washing was performed with pure water. Pure water was used for the sealing treatment at a temperature of 70 ° C. for 8.5 minutes, then ultrasonic cleaning was performed with pure water and dried with hot air to form an anodized film, and 1000 aluminum substrates (element tubes) were formed. It was made. The admittance value of these substrates was 88 μS. 1 ~ 7 at 323 ° K and 30% RH
After standing for 24 hours and 24 hours, the Y value was measured.
【0023】次に得られた素管をアルカリ系洗浄剤(U
クリーナーAD68:上村工業)で洗浄したのち純水で
濯ぎ、65℃の温純水で乾燥させた。次に電荷発生層
(X型無金属フタロシアニンを塩化ビニル酢酸ビニル共
重合体に40重量%の比率で分散させたもの)を塗布し
て80℃の乾燥炉で30分間乾燥させた。続いて電荷輸
送層(ポリカーボネートとヒドラゾン系材料を混合した
もの)を塗布し、90℃の乾燥炉で2時間乾燥させて感
光体を作製した。Then, the obtained blank tube is treated with an alkaline cleaning agent (U
Cleaner AD68: Uemura Kogyo), rinsed with pure water, and dried with warm pure water at 65 ° C. Next, a charge generation layer (X-type metal-free phthalocyanine dispersed in vinyl chloride / vinyl acetate copolymer at a ratio of 40% by weight) was applied and dried in a drying oven at 80 ° C. for 30 minutes. Subsequently, a charge transport layer (a mixture of polycarbonate and a hydrazone material) was applied and dried in a drying oven at 90 ° C. for 2 hours to prepare a photoreceptor.
【0024】作製した感光体を画像評価した結果が表2
に示される。Table 2 shows the results of image evaluation of the produced photoreceptor.
Shown in.
【0025】[0025]
【表2】 [Table 2]
【0026】表2に示すように保持時間が4hより大き
い場合にT・D・p/Pの値が300を越えて、Y値が
60μS未満となるとともに黒点や濃度むらの発生率が
0となっていることがわかる。As shown in Table 2, when the holding time is longer than 4 hours, the value of T · D · p / P exceeds 300, the Y value becomes less than 60 μS, and the occurrence rate of black spots and uneven density is 0. You can see that it has become.
【0027】[0027]
【発明の効果】この発明によれば所定の条件下で封孔処
理し、次いで水蒸気雰囲気中に保持するので、温和な封
孔処理で得られた封孔度が水蒸気雰囲気処理でさらにそ
の度合が増し、水蒸気雰囲気処理に続く洗浄処理におけ
る耐アルカリ性が向上するとともに、温和な封孔処理で
陽極酸化皮膜表面に付着した少量のイオンや酸化物が、
水蒸気雰囲気処理に続くアルカリ洗浄処理で効率良く除
去されることとなり、黒点や濃度むら発生の抑えられた
電子写真用感光体が得られる。According to the present invention, since the sealing treatment is performed under a predetermined condition and then kept in the steam atmosphere, the degree of sealing obtained by the mild sealing treatment is further increased by the steam atmosphere treatment. Increased, the alkali resistance in the cleaning process following the steam atmosphere treatment is improved, and a small amount of ions and oxides attached to the surface of the anodic oxide film by the mild sealing treatment,
It is efficiently removed by the alkali cleaning treatment subsequent to the steam atmosphere treatment, and an electrophotographic photoconductor in which black spots and density unevenness are suppressed can be obtained.
【0028】前記した式(1)を満足する条件は水蒸気
雰囲気処理の最適条件であり、封孔度がY値で60μS
未満の閾値を達成し、黒点や濃度むらの発生が皆無とな
る。酢酸ニッケル封孔処理したあとに水蒸気雰囲気処理
すると封孔度の改善が顕著に起こり特性の良好な電子写
真用感光体が容易に得られる。The condition satisfying the above equation (1) is the optimum condition for the steam atmosphere treatment, and the sealing degree is 60 μS in Y value.
A threshold value of less than is achieved, and black spots and uneven density are completely eliminated. When the treatment with steam atmosphere is performed after the nickel acetate sealing treatment, the sealing degree is remarkably improved, and the electrophotographic photoreceptor having excellent characteristics can be easily obtained.
【図1】陽極酸化皮膜につきアドミッタンス値で60な
いし100μSの封孔処理をしたものの相対湿度30%
におけるアドミッタンスの水蒸気雰囲気中保持時間依存
性を示す線図FIG. 1 Relative humidity of 30% of anodized film with admittance value of 60 to 100 μS.
Diagram showing the retention time dependence of admittance in water vapor atmosphere
【図2】陽極酸化皮膜につきアドミッタンス値で60な
いし100μSの封孔処理をしたものの雰囲気温度10
℃におけるアドミッタンスの水蒸気雰囲気中保持時間依
存性を示す線図FIG. 2 is an ambient temperature of 10 when the anodic oxide film is sealed with an admittance value of 60 to 100 μS.
Diagram showing the dependence of admittance at ℃ in holding time in a steam atmosphere
【図3】従来の電子写真用感光体を示す断面図FIG. 3 is a sectional view showing a conventional electrophotographic photoreceptor.
1 アルミニウム基板 2 アンダーコート層 3 電荷発生層 4 電荷輸送層 1 Aluminum substrate 2 Undercoat layer 3 Charge generation layer 4 Charge transport layer
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平8−248662(JP,A) 特開 昭63−311260(JP,A) 特開 平2−5068(JP,A) 特開 平7−5717(JP,A) 特開 平1−280768(JP,A) 特開 平7−84391(JP,A) 特開 平1−114852(JP,A) (58)調査した分野(Int.Cl.7,DB名) G03G 5/00 - 5/16 ─────────────────────────────────────────────────── --- Continuation of the front page (56) References JP-A-8-248662 (JP, A) JP-A-63-311260 (JP, A) JP-A-2-5068 (JP, A) JP-A-7- 5717 (JP, A) JP-A-1-280768 (JP, A) JP-A-7-84391 (JP, A) JP-A-1-114852 (JP, A) (58) Fields investigated (Int.Cl. 7 , DB name) G03G 5/00-5/16
Claims (3)
形成したのちに有機感光層を積層する電子写真用感光体
の製造方法において、前記陽極酸化皮膜を形成したのち
に封孔度がアドミッタンス値で60ないし100μSと
なる封孔処理を行い、水蒸気雰囲気中に保持して封孔度
をアドミッタンス値で60μS未満にし次いで洗浄処理
することを特徴とする電子写真用感光体の製造方法。1. A method for manufacturing an electrophotographic photoreceptor, comprising forming an anodic oxide film on the surface of an aluminum substrate and then laminating an organic photosensitive layer on the aluminum substrate. After forming the anodic oxide film, the degree of sealing is admittance value. A method for producing an electrophotographic photosensitive member, which comprises performing a sealing treatment of 60 to 100 μS, maintaining the sealing in a water vapor atmosphere so that the degree of sealing is less than 60 μS in admittance value, and then performing a cleaning treatment.
気雰囲気中に保持する時間D(h)は、雰囲気温度をT
〔K〕、水蒸気圧および飽和水蒸気圧をそれぞれpおよ
びPとした場合に、下記(1)式を満足することを特徴
とする電子写真用感光体の製造方法。 【数1】 T・D・p/P≧300 ・・・ (1)2. The manufacturing method according to claim 1, wherein the time D (h) of holding in a steam atmosphere is T
[K], where steam pressure and saturated steam pressure are p and P, respectively, a method for producing an electrophotographic photoreceptor, which satisfies the following formula (1): [Equation 1] T · D · p / P ≧ 300 (1)
処理は酢酸ニッケルまたは純水による封孔処理であるこ
とを特徴とする電子写真用感光体の製造方法。3. The method for manufacturing an electrophotographic photoreceptor according to claim 1, wherein the sealing treatment is a sealing treatment with nickel acetate or pure water.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP21032795A JP3475594B2 (en) | 1995-08-18 | 1995-08-18 | Manufacturing method of photoreceptor for electrophotography |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21032795A JP3475594B2 (en) | 1995-08-18 | 1995-08-18 | Manufacturing method of photoreceptor for electrophotography |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0954452A JPH0954452A (en) | 1997-02-25 |
JP3475594B2 true JP3475594B2 (en) | 2003-12-08 |
Family
ID=16587591
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JP21032795A Expired - Lifetime JP3475594B2 (en) | 1995-08-18 | 1995-08-18 | Manufacturing method of photoreceptor for electrophotography |
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JP (1) | JP3475594B2 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3012537B2 (en) * | 1996-11-19 | 2000-02-21 | 新潟日本電気株式会社 | Electrophotographic photoreceptor and method of manufacturing the same |
FR2867471A1 (en) * | 2004-03-09 | 2005-09-16 | Oreal | New isoquinoline 1,3-dione derivative useful in the composition for conferring the optical effects of the composition, preferably the optical fluorescence or optical brightener |
JP2007528377A (en) * | 2004-03-09 | 2007-10-11 | ロレアル | Composition comprising optically active monomer compound, method of using the composition, monomer compound, polymer comprising monomer compound, and use thereof |
JPWO2019077706A1 (en) * | 2017-10-18 | 2020-02-06 | 富士電機株式会社 | Electrophotographic photoreceptor, method of manufacturing the same, and electrophotographic apparatus |
JP7001144B2 (en) * | 2020-12-23 | 2022-01-19 | 富士電機株式会社 | Photoreceptor for electrophotographic, its manufacturing method and electrophotographic equipment |
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1995
- 1995-08-18 JP JP21032795A patent/JP3475594B2/en not_active Expired - Lifetime
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JPH0954452A (en) | 1997-02-25 |
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