JP2879662B2 - Charged particle beam generator - Google Patents
Charged particle beam generatorInfo
- Publication number
- JP2879662B2 JP2879662B2 JP8178675A JP17867596A JP2879662B2 JP 2879662 B2 JP2879662 B2 JP 2879662B2 JP 8178675 A JP8178675 A JP 8178675A JP 17867596 A JP17867596 A JP 17867596A JP 2879662 B2 JP2879662 B2 JP 2879662B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- charged particle
- particle beam
- shape
- hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000002245 particle Substances 0.000 title claims description 89
- 230000001133 acceleration Effects 0.000 claims description 13
- 238000013459 approach Methods 0.000 claims description 9
- 150000002500 ions Chemical class 0.000 description 26
- 230000000052 comparative effect Effects 0.000 description 8
- 238000011109 contamination Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 238000002474 experimental method Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000009826 distribution Methods 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000007772 electrode material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000004904 shortening Methods 0.000 description 2
- 239000011324 bead Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000000994 depressogenic effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000005686 electrostatic field Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Description
【0001】[0001]
【発明の属する技術分野】本発明は、静電場を利用して
荷電粒子をプラズマ中から抽出する荷電粒子ビ−ム発生
装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a charged particle beam generator for extracting charged particles from plasma using an electrostatic field.
【0002】[0002]
【従来の技術】従来の荷電粒子ビ−ム発生装置は、円形
のスクリ−ン電極孔と円形の加速電極孔が対を成し、こ
れらの間に電圧を加えることによりプラズマ生成室のプ
ラズマから荷電粒子を抽出及び加速することによって荷
電粒子ビ−ムレットを生み出している。これらの電極孔
は、各電極に2次元的に複数存在してそれぞれが対を成
して荷電粒子ビームレットを生み出し、それらの荷電粒
子ビ−ムレットの合成により荷電粒子ビ−ムを形成して
いる。2. Description of the Related Art In a conventional charged particle beam generator, a circular screen electrode hole and a circular accelerating electrode hole form a pair, and a voltage is applied between them to generate plasma from a plasma in a plasma generation chamber. A charged particle beamlet is created by extracting and accelerating the charged particles. A plurality of these electrode holes are two-dimensionally present at each electrode, and each pair forms a pair of charged particle beamlets, and forms a charged particle beam by synthesizing the charged particle beamlets. I have.
【0003】[0003]
【発明が解決しようとする課題】前記従来の荷電粒子ビ
−ム発生装置においては、スクリ−ン電極孔の径、間隔
およびプラズマの密度の程度により、あるいは電極製造
上での電極孔の歪みにより、荷電粒子ビ−ムレットの断
面形状が非円形となり、加速電極孔が偏摩耗し、また加
速電極や減速電極に荷電粒子が衝突してそれを損耗さ
せ、荷電粒子ビーム発生装置の寿命や無保守運転時間を
低下させると共に、加速電極や減速電極の損耗により発
生する飛散物質により周囲を汚染させる等の問題が起き
ることがある。また、荷電粒子ビームレットの集合体で
ある荷電粒子ビームも非円形となり、荷電粒子ビームの
通路上に円形のゲート弁等がある場合には、荷電粒子が
これに衝突してこれを損耗させその寿命を低下させると
共に、ゲート弁等が損耗して発生する飛散物質により周
囲が汚染される等の問題が起きることがあり、特定範囲
の荷電粒子ビ−ム量で正常な運転ができないという問題
点があった。In the above-mentioned conventional charged particle beam generator, the diameter and the interval of the screen electrode holes and the degree of the plasma density, or the distortion of the electrode holes during the production of the electrodes, cause the problem. The cross section of the charged particle beamlet becomes non-circular, and the accelerating electrode hole wears unevenly, and charged particles collide with the accelerating and decelerating electrodes, causing them to be worn away. In addition to shortening the operation time, problems such as contamination of the surroundings by scattered substances generated by wear of the acceleration electrode and the deceleration electrode may occur. In addition, the charged particle beam, which is an aggregate of charged particle beamlets, is also non-circular.If there is a circular gate valve or the like on the path of the charged particle beam, the charged particles collide with this and wear it, causing In addition to shortening the service life, problems such as contamination of the surroundings due to scattered substances generated by wear of the gate valve etc. may occur, and normal operation cannot be performed with a charged particle beam amount in a specific range. was there.
【0004】そこで、本発明は、従来の荷電粒子発生装
置における前記問題点を解消しようとするものであっ
て、荷電粒子ビ−ムレットの断面形状が非円形となる程
度を最小限にとどめ、あるいは非円形の位相をずらせる
ことにより、荷電粒子ビ−ムレットまたは荷電粒子ビ−
ムの断面形状の円度を高め、荷電粒子ビーム発生装置の
寿命と無保守運転時間を長くすることができる荷電粒子
発生装置を提供することを目的とする。ただし、ここで
言う円には真円、楕円および長円が含まれる。Accordingly, the present invention is to solve the above-mentioned problems in the conventional charged particle generator, and minimizes the degree to which the cross-sectional shape of the charged particle beamlet becomes non-circular, or By shifting the non-circular phase, the charged particle beamlet or charged particle beam
It is an object of the present invention to provide a charged particle generator capable of increasing the circularity of the cross-sectional shape of a system and extending the life and maintenance-free operation time of the charged particle beam generator. However, the circle mentioned here includes a perfect circle, an ellipse, and an ellipse.
【0005】[0005]
【課題を解決するための手段】単一の電極孔から出た荷
電粒子ビームレットの断面形状は、あらゆる条件下で円
であると考えられるのに、多数の電極孔を有するスクリ
ーン電極及び加速電極から出た荷電粒子ビームレットの
断面形状は非円形となる。その原因を調べるために、本
発明者は、図5に示す荷電粒子ビーム発生実験装置20
を製作して、それによりイオンビームレットの断面形状
(即ち、イオンビームレット断面におけるイオン電流密
度)を測定した。通常の荷電粒子発生装置は何百何千以
上の多数の電極孔を有しているが、該実験装置において
は、スクリーン電極22の円形電極孔23及び加速電極
24の円形電極孔25はそれぞれ中央の円形電極孔23
1、251とその周囲に等間隔に配置された6つの電極孔
232、252合計7個づつしか開いてない。また、加速
電極の下流にコーン状のセパレータ26を置き、中央の
電極孔231、251から出たイオンのみを下流側に通過
させるようにした。SUMMARY OF THE INVENTION A cross section of a charged particle beamlet emerging from a single electrode hole is considered to be circular under all conditions, but a screen electrode and an acceleration electrode having a large number of electrode holes. The cross-sectional shape of the charged particle beamlet exiting from is non-circular. In order to investigate the cause, the present inventor used a charged particle beam generation experiment apparatus 20 shown in FIG.
Was manufactured, and thereby the cross-sectional shape of the ion beamlet (that is, the ion current density in the cross section of the ion beamlet) was measured. A typical charged particle generator has hundreds of thousands or more of a large number of electrode holes. In the experimental apparatus, the circular electrode hole 23 of the screen electrode 22 and the circular electrode hole 25 of the accelerating electrode 24 are each located at the center. Circular electrode hole 23
1 , 7 and six electrode holes 23 2 , 25 2 arranged at equal intervals around the opening are only seven in total. Further, downstream of the acceleration electrode placed a conical separator 26, and only the ions emitted from the center of the electrode holes 23 1, 25 1 to pass to the downstream side.
【0006】この荷電粒子ビーム発生実験装置におい
て、円筒形状の放電室21の中で生成したイオンを両電
極間の電場によって放電室から引出し、中央の電極孔か
ら出たイオンのみを分離して通過させ、加速電極から2
5cm離れた31cm×31cmの平面上でイオンビームレ
ットの断面形状を計測した結果、図8に示すようなイオ
ン電流密度分布が得られた。なお、この等イオン電流密
度線は、5×0.0001A/m2から1×0.01A/
m2までを5×0.0001A/m2間隔で描いたもので
あり、総ビームレット電流は106μAである。この図
から明らかなように、電極孔から出た直後のイオンビー
ムレットは、略60°毎にイオン電流密度の等高線が顕
著に外側に出っ張っている現象が観察される。In this charged particle beam generation experiment apparatus, ions generated in the cylindrical discharge chamber 21 are extracted from the discharge chamber by an electric field between the two electrodes, and only ions emitted from the central electrode hole are separated and passed. And 2 from the accelerating electrode
As a result of measuring the cross-sectional shape of the ion beamlet on a plane of 31 cm × 31 cm separated by 5 cm, an ion current density distribution as shown in FIG. 8 was obtained. The isoionic current density line ranges from 5 × 0.0001 A / m 2 to 1 × 0.01 A / m 2.
m 2 are drawn at 5 × 0.0001 A / m 2 intervals, and the total beamlet current is 106 μA. As is clear from this figure, in the ion beamlet immediately after exiting from the electrode hole, a phenomenon is observed in which the contour line of the ion current density protrudes remarkably outward at approximately every 60 °.
【0007】この出っ張り部分と実験装置の電極孔の位
置とを対比させた場合、等高線が外側に出っ張っている
部分には、隣接の電極孔がなく、電極孔のある部分では
等高線が凹んでいることが判明した。このような現象が
現れる原因のひとつとして、各電極孔の「縄張り」、即
ち各電極孔がある範囲において互いに他の電極孔に影響
を及ぼすことが考えられる。スクリーン電極面近傍に達
したイオンは、最終的にいずれかの電極孔から引き出さ
れるか、スクリーン電極そのものに衝突して中性化す
る。今、イオンの生成量を一定にして、引き出し能力、
あるいは引出電圧を次第に上げていくことを考えると、
各電極孔の縄張りは最初円形だったのが、大きくなるに
従って隣接の電極孔の縄張りと接するようになり、究極
的には正六角形になる。この形が引き出しを通じて強調
された結果が図8に示された形状となったものと考えら
れる。When the protruding portion is compared with the position of the electrode hole of the experimental apparatus, the portion where the contour lines protrude outward has no adjacent electrode hole, and the contour line is depressed in the portion having the electrode holes. It has been found. One of the causes of such a phenomenon is considered to be "territory" of each electrode hole, that is, each electrode hole affects another electrode hole within a certain range. The ions that have reached the vicinity of the screen electrode surface are eventually extracted from any of the electrode holes, or collide with the screen electrode itself to be neutralized. Now, with a constant amount of ion generation,
Or considering that the extraction voltage is gradually increased,
The territory of each electrode hole was initially circular, but as it became larger, it came into contact with the territory of the adjacent electrode hole, and eventually became a regular hexagon. It is considered that the result of this shape being emphasized through the drawer was the shape shown in FIG.
【0008】本発明者は、以上の知見に基づきさらに研
究を進めた結果、円形の電極孔を電極孔の「縄張り」を
考慮して逆に非円形化することによって荷電粒子ビーム
レットの円度を高めることができ、且つ非円形ビームレ
ットの位相をずらせることにより荷電粒子ビームの円度
を高めることができることが判明し、本発明に到達した
ものである。As a result of further research based on the above findings, the present inventor has found that the circularity of the charged particle beamlet is reduced by making the circular electrode hole non-circular in consideration of the “territory” of the electrode hole. Have been found to be able to increase the circularity of the charged particle beam by shifting the phase of the non-circular beamlets, and have reached the present invention.
【0009】即ち、本発明の荷電粒子ビーム発生装置
は、スクリ−ン電極の電極孔形状を非円形にして、荷電
粒子ビ−ムレットの断面形状の円度を高めたことを特徴
とする技術的手段を採用することによって前記問題点を
解決したものである。また、他の解決手段として、加速
電極の電極孔形状を非円形にすることによっても、荷電
粒子ビ−ムレットの断面形状の円度を高めることが可能
であり、前記問題点を解決することができる。さらに、
スクリーン電極の電極孔及び加速電極の電極孔の両方を
非円形にすると、より効果的に荷電粒子ビームレットの
断面形状の円度を高めることが可能である。なお、前記
各電極孔の形状を非円形化させる度合いは、元来の荷電
粒子ビ−ムレットの断面形状の非円形化の度合いに応じ
て調整することが好ましい。That is, the charged particle beam generating apparatus of the present invention is characterized in that the shape of the electrode hole of the screen electrode is made non-circular to increase the circularity of the sectional shape of the charged particle beamlet. This problem has been solved by adopting means. Further, as another solution, it is possible to increase the circularity of the cross-sectional shape of the charged particle beamlet by making the shape of the electrode hole of the acceleration electrode non-circular, thereby solving the above problem. it can. further,
By making both the electrode hole of the screen electrode and the electrode hole of the acceleration electrode non-circular, it is possible to more effectively increase the circularity of the cross-sectional shape of the charged particle beamlet. The degree of making the shape of each of the electrode holes non-circular is preferably adjusted according to the degree of non-circularity of the cross-sectional shape of the original charged particle beamlet.
【0010】前記電極孔の非円形化は、スクリーン電極
においては、隣接の電極孔との最接近点で径が最大に、
最接近点間の中点で径が最小になっているのが効果的で
あり、望ましい。また、加速電極においては、隣接の電
極孔との最接近点で径が最小に、最接近点間の中点で径
が最大になっているのが効果的であり望ましい。The non-circularity of the electrode hole is such that, in the screen electrode, the diameter becomes maximum at the closest point to the adjacent electrode hole,
It is effective and desirable that the diameter be minimum at the midpoint between the points of closest approach. In the accelerating electrode, it is effective and desirable that the diameter be minimum at the point of closest approach to the adjacent electrode hole and maximized at the midpoint between the points of closest approach.
【0011】さらに、本発明の荷電粒子発生装置は、ス
クリーン電極の電極孔および加速電極の電極孔の2次元
的配置を2種以上組み合わせることにより、荷電粒子ビ
ームの断面形状の円度を高めることができ、荷電粒子ビ
ームの非円形化を解決したものである。Further, the charged particle generator according to the present invention increases the circularity of the cross-sectional shape of the charged particle beam by combining two or more two-dimensional arrangements of the electrode hole of the screen electrode and the electrode hole of the acceleration electrode. This solves the non-circularization of the charged particle beam.
【0012】[0012]
【発明の実施の形態】本発明に係る荷電粒子ビーム発生
装置の実施形態を図1〜図2に基づき説明する。図1は
本実施形態の荷電粒子ビーム発生装置の概略を示し、プ
ラズマ生成室1にスクリ−ン電極2を取り付け、これと
電気的に絶縁されるようにスペ−サ5を介して加速電極
3を取り付けてある。このとき互いに対となるべきスク
リ−ン電極2の電極孔6と加速電極3の電極孔7の横断
面方向のずれが過大にならないようにする。さらに同様
のやり方によりスペ−サ5を介して減速電極4を取り付
けてある。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a charged particle beam generator according to the present invention will be described with reference to FIGS. FIG. 1 schematically shows a charged particle beam generator according to the present embodiment, in which a screen electrode 2 is attached to a plasma generation chamber 1, and an acceleration electrode 3 is provided via a spacer 5 so as to be electrically insulated therefrom. Is attached. At this time, the deviation of the electrode hole 6 of the screen electrode 2 and the electrode hole 7 of the accelerating electrode 3 to be paired with each other is prevented from being excessively large. Further, the deceleration electrode 4 is attached via the spacer 5 in a similar manner.
【0013】本実施形態では、スクリーン電極の電極孔
6の形状は、図2に示すように、角取りした正六角形と
し、各電極孔はその頂点aの位置が隣接の電極孔6との
最接近点になるように配置されている。従って、その場
合各電極孔は、最接近点で径が最大に、最接近点間の中
点で径が最小になっている。一方、加速電極3の電極孔
7の形状は、図3に示すように、角取りした正六角形と
し、各電極孔はその辺b上の位置が隣接の電極孔7との
最接近点となるように配置されている。従って、加速電
極3の電極孔7は、隣接の電極孔との最接近点で径が最
小に、最接近点間の中点(即ち、頂点)で径が最大にな
っている。なお、減速電極の電極孔8の形状は、荷電粒
子ビームレットの円度を高めるのに殆ど作用しないの
で、円形にしてある。In this embodiment, as shown in FIG. 2, the shape of the electrode hole 6 of the screen electrode is a rounded regular hexagon, and the position of the vertex a of each electrode hole is the closest to the adjacent electrode hole 6. It is arranged to be the approaching point. Therefore, in this case, each electrode hole has a maximum diameter at the closest point and a minimum diameter at a middle point between the closest points. On the other hand, as shown in FIG. 3, the shape of the electrode hole 7 of the accelerating electrode 3 is a rounded regular hexagon, and the position on each side b of the electrode hole is the closest point to the adjacent electrode hole 7. Are arranged as follows. Therefore, the diameter of the electrode hole 7 of the accelerating electrode 3 is minimum at the point of closest approach to the adjacent electrode hole, and is maximum at the midpoint (ie, the vertex) between the points of closest approach. The shape of the electrode hole 8 of the deceleration electrode is circular because it hardly acts to increase the circularity of the charged particle beamlet.
【0014】本実施形態の荷電粒子ビーム発生装置は以
上のように構成され、スクリーン電極の電極孔形状を非
円形にする技術的意味は、電極孔の縄張りを円形に近づ
けることにあり、隣接の電極孔がない方向の孔径を予め
小さくしておくことにより、より高い電圧まで縄張りを
円形に近く保つことができる。従って、スクリーン電極
の電極孔を角取りした正六角形とし、その頂点aが隣接
の電極孔6との最接近点になるようにすることによっ
て、荷電粒子ビームレットを円形に近づけることができ
る。この場合、引き出し電圧が低い場合には、逆に縄張
りを歪ませる結果をもたらすが、必要とする引き出し能
力の範囲に合わせて最適な形状を選択することが最も有
利である。The charged particle beam generator of this embodiment is configured as described above, and the technical meaning of making the electrode hole shape of the screen electrode non-circular is to make the territory of the electrode hole close to a circle, By reducing the hole diameter in the direction where there is no electrode hole in advance, the territory can be kept close to a circle up to a higher voltage. Therefore, the charged particle beamlet can be made closer to a circular shape by forming the electrode hole of the screen electrode into a regular hexagon with a rounded corner and the vertex a being the closest point to the adjacent electrode hole 6. In this case, if the extraction voltage is low, the territory may be distorted, but it is most advantageous to select an optimal shape according to the required range of the extraction capability.
【0015】一方、加速電極の電極孔7は、加速電極に
よって形成される電場を考えると、孔径が小さい部分の
方がわずかに電場が強く、引き出し能力が高い。従っ
て、図6のイオンビームレットの断面形状において等高
線が出っ張っている部分に対応して、孔径を大きくすれ
ば、この出っ張りを押えるのに効果がある。この原理に
より、本実施形態のように、加速電極の電極孔7を角取
りした正六角形とし、その辺bの位置が隣接の電極孔7
との最接近点になるようにすることによって、効果的に
荷電粒子ビームレットを円形に近づけることができる。On the other hand, considering the electric field formed by the accelerating electrode, the electrode hole 7 of the accelerating electrode has a slightly stronger electric field in a portion having a smaller hole diameter, and has a higher drawing ability. Therefore, if the diameter of the hole is increased corresponding to the portion where the contour lines protrude in the cross-sectional shape of the ion beamlet in FIG. 6, it is effective to suppress the protrusion. According to this principle, as in the present embodiment, the electrode hole 7 of the accelerating electrode is formed into a regular hexagon with a chamfered shape, and the position of the side b is set to the adjacent electrode hole 7.
By making the point closest to the above, the charged particle beamlet can be effectively made close to a circle.
【0016】以上のように、本発明の荷電粒子ビ−ム発
生装置は、装置自体が元来有していた荷電粒子ビ−ムレ
ットの断面形状を非円形化する効果に対し、これと異な
る位相の非円形化をする効果が重乗して打ち消し合い、
荷電粒子ビ−ムレットの断面形状の円度を高めるように
働くようにしたものである。荷電粒子ビームレーットの
円度が高まる結果、断面の径が最小な円形となるので、
荷電粒子ビ−ムレットの通路となる加速電極や減速電極
に荷電粒子が衝突してこれを損耗させる度合いが減少す
る。それ故、電極が損耗して発生する電極材物質の飛散
により、周囲が汚染される度合いが減少する。さらに損
耗と汚染の度合いが減少することにより、荷電粒子ビ−
ム発生装置の寿命や、無保守運転期間が延びる効果があ
る。As described above, the charged particle beam generating apparatus of the present invention has a different phase from the effect of making the cross-sectional shape of the charged particle beamlet originally possessed by the apparatus itself non-circular. The effect of non-circularization is multiplied and canceled out,
The charged particle beamlets serve to increase the circularity of the cross-sectional shape. As the circularity of the charged particle beam rate increases, the diameter of the cross section becomes the smallest circle,
The degree to which charged particles collide with the accelerating electrode and the decelerating electrode serving as the path of the charged particle beamlet and are worn out is reduced. Therefore, the degree of contamination of the surroundings by the scattering of the electrode material generated due to the wear of the electrodes is reduced. Furthermore, the degree of wear and contamination is reduced, resulting in charged particle beads.
This has the effect of extending the life of the system and the maintenance-free operation period.
【0017】図4は荷電粒子ビームの断面形状の円度を
高めるようにした本発明の荷電粒子ビーム発生装置の実
施形態を示し、図はスクリーン電極の電極孔の配置を示
しているが、加速電極の電極孔も同様な配置となってい
る。FIG. 4 shows an embodiment of the charged particle beam generator of the present invention in which the circularity of the cross-sectional shape of the charged particle beam is increased, and FIG. 4 shows the arrangement of the electrode holes of the screen electrode. The electrode holes of the electrodes have the same arrangement.
【0018】本実施形態においては、スクリーン電極9
の中央部10と周辺部12で配置方向が異なるように電
極孔13が配置され、中央部10の電極孔群は、図4に
おいて水平方向に六方最密充填型に配置され、周辺部1
1の電極群は垂直方向に六方最密充填型に配置されてい
る。このように、スクリーン電極及び加速電極の電極孔
の2次元的配置を2種類以上組み合わせることによっ
て、荷電粒子ビームレット相互の断面形状の非円形化の
位相のずれによる非円形化の打消合いにより円度が高ま
るように働く。In this embodiment, the screen electrode 9
The electrode holes 13 are arranged so that the arrangement directions are different between the central part 10 and the peripheral part 12 of the central part 10. The electrode holes in the central part 10 are arranged in a hexagonal close-packed type in the horizontal direction in FIG.
One electrode group is arranged in a hexagonal close-packed type in the vertical direction. As described above, by combining two or more kinds of the two-dimensional arrangement of the electrode holes of the screen electrode and the acceleration electrode, the non-circularization due to the phase shift of the non-circularization of the cross-sectional shape of the charged particle beamlets is canceled out by the cancellation of the non-circularization. Work to increase the degree.
【0019】従って、本発明によれば、図4に示すよう
に、各電極孔の形状は従来と同様の円形の場合であって
も、荷電粒子ビームの円度を向上させることができる。
しかしながら、個々の電極孔の形状を前述した例えば図
2又は図3に示した形状にして組み合わせることによっ
て、個々の荷電粒子ビームレット断面形状の円度の向上
と相俟ってより効果的である。また、電極孔の2次元的
配置も図4の配置に限るものでなく、例えば単純縦横配
置型と六方最密充填型との組合せ等でも可能である。Therefore, according to the present invention, as shown in FIG. 4, the circularity of the charged particle beam can be improved even when the shape of each electrode hole is the same as the conventional one.
However, by combining the shape of the individual electrode holes with the shape shown in, for example, FIG. 2 or FIG. 3, it is more effective in combination with the improvement of the circularity of the cross-sectional shape of each charged particle beamlet. . Further, the two-dimensional arrangement of the electrode holes is not limited to the arrangement shown in FIG. 4, but may be a combination of a simple vertical / horizontal arrangement type and a hexagonal close-packed type, for example.
【0020】以上、本発明の好適な実施形態を示した
が、本発明は前記実施形態に限るものでなく、その技術
的思想の範囲内で種々の設計変更が可能である。例え
ば、図1に示す実施形態では3枚電極構造の荷電粒子ビ
ーム発生装置の例を示したが、電極は3枚に限定される
ものではない。また図2および図3の実施例は六方最密
充填型の孔配置方法を示したが、六方最密充填型に限定
されるものではなく、例えば単純縦横配置型等、荷電粒
子ビーム発生装置の容量や用途等の条件に応じて、最適
配置を採用すれば良い。さらに図1の実施形態では各電
極が平面形状となっているが、平面に限定されるもので
はない。Although the preferred embodiment of the present invention has been described above, the present invention is not limited to the above-described embodiment, and various design changes can be made within the scope of the technical idea. For example, although the embodiment shown in FIG. 1 shows an example of a charged particle beam generator having a three-electrode structure, the number of electrodes is not limited to three. 2 and 3 show the hexagonal close-packed type hole arrangement method, but the present invention is not limited to the hexagonal close-packed type hole arrangement method. An optimal arrangement may be adopted according to conditions such as capacity and use. Further, in the embodiment of FIG. 1, each electrode has a planar shape, but is not limited to a planar shape.
【0021】また本発明の荷電粒子ビーム発生装置は、
イオンビームや電子ビーム等の荷電粒子ビ−ムを供給す
ることを最終目標とするものに限るものではなく、中性
粒子ビ−ム発生装置において中性粒子に変換される荷電
粒子の供給源、あるいは荷電粒子蒸着装置のタ−ゲット
に衝突させる荷電粒子の供給源、または荷電粒子ビ−ム
の反力を利用するイオンエンジンに適用されることもあ
る。Further, the charged particle beam generator of the present invention comprises:
The supply of charged particle beams such as an ion beam and an electron beam is not limited to the ultimate target, and a supply source of charged particles converted into neutral particles in a neutral particle beam generator, Alternatively, the present invention may be applied to a supply source of charged particles which collide with a target of a charged particle deposition apparatus, or an ion engine utilizing a reaction force of a charged particle beam.
【0022】[0022]
【実施例】スクリーン電極の電極孔形状を正六角形にし
た場合の効果を確認するために、図5に示す前記荷電粒
子ビーム発生実験装置において、スクリーン電極を図6
に示す正六角形状の電極孔形状を有するものに変えて、
前記第6欄で記載したと同様な条件でイオンビームレッ
トの断面形状を計測した。その結果、図7に示すような
イオン電流密度分布が得られた。EXAMPLE In order to confirm the effect when the shape of the electrode hole of the screen electrode was made regular hexagon, in the charged particle beam generation experiment apparatus shown in FIG.
Instead of having a regular hexagonal electrode hole shape shown in
The sectional shape of the ion beamlet was measured under the same conditions as described in the sixth column. As a result, an ion current density distribution as shown in FIG. 7 was obtained.
【0023】円形電極孔形状の場合(比較例)である図
8と、正六角形電極孔形状の場合(実施例)である図7
とを比較すると、一見して図7に示す実施例の場合は、
比較例における鋭い角部分が丸くなり、円度が増してい
ることが分かる。このことを定量的に示すために、次の
ような「歪み率」及び「発散角」なる測度を導入して表
す。FIG. 8 shows a case of a circular electrode hole shape (comparative example), and FIG. 7 shows a case of a regular hexagonal electrode hole shape (example).
In the case of the embodiment shown in FIG.
It can be seen that the sharp corners in the comparative example are rounded and the circularity is increased. In order to quantitatively show this, the following measures such as “distortion rate” and “divergence angle” are introduced and expressed.
【0024】前記「歪み率」とは、図11(a)に示す
ような等電流密度線で囲まれた図形の面積S0を求め、
面積S0の円を同図(b)に示すように、円の中心が電
流密度のピークに重なるように元の図形に重ね、同図
(c)で斜線で示す円の外側の部分の面積S1を求め
て、両者の比S1/S0を表すものであり、円形に対する
歪みの度合いを表している。従って、完全な円形の場合
は歪み率0であり、非円形となる程歪み率は高くなる。
また、発散角とは、歪み率の減ることの効果として期待
されるものであり、総イオンビームレット電流のうち、
95%を包含する円錐の半頂角のことであり、発散角が
小さいほど円度が高いことを表す。The “distortion rate” is obtained by calculating the area S 0 of a figure surrounded by constant current density lines as shown in FIG.
A circle having an area S 0 is superimposed on the original figure so that the center of the circle overlaps the peak of the current density as shown in FIG. 3B, and the area of a portion outside the circle shown by oblique lines in FIG. S 1 is obtained and represents the ratio S 1 / S 0 between the two, and represents the degree of distortion with respect to a circle. Therefore, the distortion rate is 0 in the case of a perfect circle, and the distortion rate increases as the shape becomes non-circular.
Further, the divergence angle is expected as an effect of reducing the distortion rate, and of the total ion beamlet current,
It is a half vertex angle of a cone containing 95%, and a smaller divergence angle indicates a higher circularity.
【0025】前記実験において、電極孔が六角形の場合
(実施例)と円形の場合(比較例)について、イオンビ
ームレット電流に対する歪み率、及びイオンビームレッ
ト電流に対する発散角をそれぞれ測定した。その結果を
図9及び図10に示す。これらのグラフから、実施例の
場合が比較例の場合より歪み率、発散角とも小さく、明
らかに実施例の場合が円度が高く、収束性が良いことが
分かり、本発明の効果が確認された。In the above experiment, the distortion rate with respect to the ion beamlet current and the divergence angle with respect to the ion beamlet current were measured when the electrode hole was hexagonal (Example) and circular (Comparative Example). The results are shown in FIGS. From these graphs, it can be understood that the distortion rate and the divergence angle of the example are smaller than those of the comparative example, and that the example clearly has higher circularity and better convergence, confirming the effect of the present invention. Was.
【0026】前記図7及び図8は、この実験におけるイ
オンビームレット電流が106μAでの実施例及び比較
例のイオン電流密度線を表し、この場合、歪み率は実施
例が8.75%で比較例10.85%であり、発散角は
実施例が20.2°で比較例は25.0°であり、実施
例の場合が比較例の場合より明らかに歪み率、発散角と
も小さい値となっている。なお、実験結果の歪み率を求
めるのに使用する等電流密度線としては、ピーク電流密
度の2.5%のものを選んだ。FIGS. 7 and 8 show the ion current density lines of the example and the comparative example in which the ion beamlet current was 106 μA in this experiment. In this case, the distortion rate was 8.75% in the example. Example 10.85%, the divergence angle is 20.2 ° in the example and 25.0 ° in the comparative example, and the distortion rate and the divergence angle in the example are clearly smaller than those in the comparative example. Has become. In addition, as the isocurrent density line used for obtaining the distortion rate of the experimental result, a line having a peak current density of 2.5% was selected.
【0027】[0027]
【発明の効果】本発明は、以上の説明から明らかなよう
に、以下に記載されているような効果を奏する。電極孔
を非円形にすることにより、荷電粒子ビ−ムレットの断
面の円度が高まって径を最小とする可能性が高く、荷電
粒子ビ−ムレットの通路となる加速電極や減速電極に荷
電粒子が衝突してこれを損耗させる度合いが減少する。As apparent from the above description, the present invention has the following effects. By making the electrode hole non-circular, the circularity of the cross section of the charged particle beamlet is increased and the diameter is likely to be minimized, and the charged particles are charged to the accelerating electrode and decelerating electrode serving as the path of the charged particle beamlet. Impact and wear is reduced.
【0028】その結果、電極が損耗して発生する電極材
物質の飛散により、周囲が汚染される度合いが減少し、
さらに電極の損耗と汚染の度合いが減少することによ
り、荷電粒子ビ−ム発生装置の寿命や無保守運転期間を
延ばすことができる。As a result, the degree of contamination of the surroundings due to the scattering of the electrode material generated due to wear of the electrodes is reduced,
Furthermore, the life of the charged particle beam generator and the maintenance-free operation period can be extended by reducing the degree of electrode wear and contamination.
【0029】また電極孔の2次元的配置を2種以上組み
合わせることにより、荷電粒子ビ−ムの円度を高めて断
面の径を最小とすることができ、荷電粒子ビ−ムの通路
上に円形のゲ−ト弁等がある場合に荷電粒子が衝突して
これを損耗させる度合いを減少させることができる。Further, by combining two or more kinds of two-dimensional arrangement of the electrode holes, the circularity of the charged particle beam can be increased and the diameter of the cross section can be minimized. In the case where there is a circular gate valve or the like, it is possible to reduce the degree to which charged particles collide and are worn.
【0030】その結果、ゲ−ト弁等が損耗して発生する
物質の飛散により、周囲が汚染される度合いが減少し、
さらに損耗と汚染の度合いが減少することにより、ゲ−
ト弁等の寿命や無保守運転時間を伸ばすことができる。As a result, the degree of contamination of the surroundings due to scattering of substances generated due to wear of the gate valve and the like is reduced,
Further reduction in wear and contamination,
The service life and maintenance-free operation time of the valve can be extended.
【0031】また荷電粒子ビ−ムを最小径の円内に集中
させることができるので、必要量の荷電粒子ビ−ムを得
るための荷電粒子の元となる気体等の量と電力量を低減
させることができる。さらに、荷電粒子ビ−ム装置を作
動させるために必要な、真空排気装置等の必要能力が最
小となり、これを一定とすれば周囲環境の圧力を最小に
することができる。Also, since the charged particle beam can be concentrated within the circle having the minimum diameter, the amount of gas and the like which are the source of the charged particles for obtaining the required amount of charged particle beam and the amount of electric power can be reduced. Can be done. Further, the required capacity of the vacuum exhaust device and the like required to operate the charged particle beam device is minimized, and if this is kept constant, the pressure of the surrounding environment can be minimized.
【0032】また荷電粒子ビ−ムの密度分布が中心から
の距離だけの関数となり、周方向の密度変化を考慮しな
くて済むので、荷電粒子ビ−ムを一定量照射したいとき
等の作業が容易になる。さらに、本発明の装置をイオン
エンジンに用いると、発散角が最小となるので、取り付
けの自由度が増す等の効果を有する。Further, since the density distribution of the charged particle beam is a function only of the distance from the center and it is not necessary to consider the change in the circumferential density, it is possible to irradiate a fixed amount of the charged particle beam. It will be easier. Further, when the apparatus of the present invention is used in an ion engine, the divergence angle is minimized, and thus there is an effect that the degree of freedom in mounting is increased.
【図1】本発明の実施形態に係る荷電粒子ビ−ム発生装
置を一部切欠して示す斜視図である。FIG. 1 is a partially cutaway perspective view showing a charged particle beam generator according to an embodiment of the present invention.
【図2】スクリ−ン電極の電極孔の形状及び配置の実施
形態を示す模式図である。FIG. 2 is a schematic view showing an embodiment of a shape and an arrangement of an electrode hole of a screen electrode.
【図3】加速電極孔の電極孔の形状及び配置の実施形態
を示す模式図である。FIG. 3 is a schematic diagram showing an embodiment of the shape and arrangement of the electrode holes of the acceleration electrode holes.
【図4】スクリ−ン電極の電極孔の配置の実施形態を示
す横断面図である。FIG. 4 is a cross-sectional view showing an embodiment of the arrangement of the electrode holes of the screen electrode.
【図5】荷電粒子ビーム発生実験装置の一部破断斜視図
である。FIG. 5 is a partially cutaway perspective view of the charged particle beam generation experiment apparatus.
【図6】実施例における電極孔形状及び配置を示す模式
図である。FIG. 6 is a schematic diagram showing the shape and arrangement of electrode holes in an example.
【図7】実施例におけるイオン電流密度を表す線図であ
る。FIG. 7 is a diagram illustrating an ion current density in an example.
【図8】比較例におけるイオン電流密度を表す線図であ
る。FIG. 8 is a diagram illustrating an ion current density in a comparative example.
【図9】電極孔形状に対するイオンビームレット電流と
歪み率との関係を表すグラフである。FIG. 9 is a graph showing a relationship between an ion beamlet current and a distortion rate with respect to an electrode hole shape.
【図10】電極孔形状に対するイオンビームレット電流
と発散角との関係を表すグラフである。FIG. 10 is a graph showing a relationship between an ion beamlet current and a divergence angle with respect to an electrode hole shape.
【図11】(a)〜(c)は歪み率の説明図である。FIGS. 11A to 11C are explanatory diagrams of distortion rates.
1 プラズマ生成室 2、9 スクリ−ン電極 3 加速電極 4 減速電極 5 スペ−サ 6〜8、13 電極孔 10 中央部 11 周辺部 20 荷電粒子ビーム発生実験装置 21 放電室 22 スクリーン電極 24 加速電極 23、25 電極孔 26 セパレータ DESCRIPTION OF SYMBOLS 1 Plasma generation chamber 2, 9 Screen electrode 3 Acceleration electrode 4 Deceleration electrode 5 Spacer 6-8, 13 Electrode hole 10 Central part 11 Peripheral part 20 Charged particle beam generation experimental apparatus 21 Discharge chamber 22 Screen electrode 24 Acceleration electrode 23, 25 Electrode hole 26 Separator
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6,DB名) G21K 1/00 - 5/10 H01J 27/00 - 27/26 H01J 37/08 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int. Cl. 6 , DB name) G21K 1/00-5/10 H01J 27/00-27/26 H01J 37/08
Claims (5)
して、荷電粒子ビームレットの断面形状の円度を高めた
ことを特徴とする荷電粒子ビーム発生装置。1. A charged particle beam generator, wherein a shape of an electrode hole of a screen electrode is made non-circular to increase the circularity of a sectional shape of a charged particle beamlet.
極の電極孔形状を非円形にして、荷電粒子ビームレット
の断面形状の円度を高めたことを特徴とする荷電粒子ビ
ーム発生装置。2. A charged particle beam generator, wherein the shape of the electrode hole of the screen electrode and the shape of the electrode hole of the acceleration electrode are made non-circular to increase the circularity of the sectional shape of the charged particle beamlet.
接の電極孔との最接近点で径が最大に、最接近点間の中
点で径が最小になっている請求項1又は2記載の荷電粒
子ビーム発生装置。Electrode hole shape wherein the screen electrode, the diameter closest point of approach between the adjacent electrode holes up, according to claim 1 or 2, wherein the diameter at the midpoint between the points of closest approach is at the minimum Charged particle beam generator.
極孔との最接近点で径が最小に、最接近点間の中点で径
が最大になっている請求項2記載の荷電粒子ビーム発生
装置。Wherein the electrode hole shape of the accelerating electrode, the diameter closest point of approach between the adjacent electrode holes minimum, according to claim 2, wherein the diameter at the midpoint between the points of closest approach is the largest charge Particle beam generator.
の電極孔の2次元的配置を2種以上組み合わせることに
より、荷電粒子ビームの断面形状の円度を高めたことを
特徴とする荷電粒子ビーム発生装置。5. A charged particle beam generation characterized by increasing the circularity of the cross section of a charged particle beam by combining two or more kinds of two-dimensional arrangement of an electrode hole of a screen electrode and an electrode hole of an acceleration electrode. apparatus.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP8178675A JP2879662B2 (en) | 1996-06-20 | 1996-06-20 | Charged particle beam generator |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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JP8178675A JP2879662B2 (en) | 1996-06-20 | 1996-06-20 | Charged particle beam generator |
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JPH1010300A JPH1010300A (en) | 1998-01-16 |
JP2879662B2 true JP2879662B2 (en) | 1999-04-05 |
Family
ID=16052600
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