JP2013235948A - 半導体デバイス - Google Patents
半導体デバイス Download PDFInfo
- Publication number
- JP2013235948A JP2013235948A JP2012107151A JP2012107151A JP2013235948A JP 2013235948 A JP2013235948 A JP 2013235948A JP 2012107151 A JP2012107151 A JP 2012107151A JP 2012107151 A JP2012107151 A JP 2012107151A JP 2013235948 A JP2013235948 A JP 2013235948A
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- Prior art keywords
- conductor
- electrode pad
- convex portion
- semiconductor device
- pad
- Prior art date
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 70
- 239000004020 conductor Substances 0.000 claims abstract description 87
- 230000003746 surface roughness Effects 0.000 claims description 10
- 238000000992 sputter etching Methods 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 description 15
- 229910052751 metal Inorganic materials 0.000 description 13
- 239000002184 metal Substances 0.000 description 13
- 229910000679 solder Inorganic materials 0.000 description 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 12
- 229910052802 copper Inorganic materials 0.000 description 12
- 239000010949 copper Substances 0.000 description 12
- 239000000463 material Substances 0.000 description 11
- 239000000758 substrate Substances 0.000 description 10
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 239000011888 foil Substances 0.000 description 5
- 229910000838 Al alloy Inorganic materials 0.000 description 4
- 229910001182 Mo alloy Inorganic materials 0.000 description 4
- 229910001080 W alloy Inorganic materials 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 238000000605 extraction Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910001316 Ag alloy Inorganic materials 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 206010040844 Skin exfoliation Diseases 0.000 description 1
- 229910020888 Sn-Cu Inorganic materials 0.000 description 1
- 229910019204 Sn—Cu Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/4847—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
- H01L2224/48472—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
- H01L2924/13055—Insulated gate bipolar transistor [IGBT]
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
【解決手段】半導体デバイス1は半導体素子2上の電極パッド3に圧接する当該パッド3よりも硬質の導体4を備える。電極パッド3と接合する導体4の端面には凹凸部5が形成されている。また、凹凸部5における凸部51の縁部には縦断面尖塔状の凸部53が形成されている。凹凸部5を有する導体4の端面は電極パッド3及び導体4よりも軟質で電気抵抗の低い導電性材料によって被覆するとよい。
【選択図】図1
Description
2…半導体素子
3…電極パッド
4…導体
5…凹凸部,51,53…凸部,52…凹部
Claims (5)
- 半導体素子上の電極パッドに圧接する当該パッドよりも硬質の導体を備え、
前記パッドと接合する導体の端面には凹凸部が形成され、この凹凸部における凸部の縁部には縦断面尖塔状の凸部が形成されたこと
を特徴とする半導体デバイス。 - 前記凹凸部を有する導体の端面は前記パッド及び導体よりも軟質で電気抵抗の低い導電性材料によって被覆されたこと
を特徴とする請求項1に記載の半導体デバイス。 - 前記被覆の膜厚が前記端面の表面粗さよりも厚いこと
を特徴とする請求項2に記載の半導体デバイス。 - 前記凸部の下端から前記縦断面尖塔状の凸部の頂点までの距離は前記パッドの厚さ以下であること
を特徴とする請求項1から3のいずれかに記載の半導体デバイス。 - 前記縦断面尖塔状の凸部を有する凹凸部はイオンミリングによって形成されること
を特徴とする請求項1から4のいずれかに記載の半導体デバイス。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012107151A JP5884625B2 (ja) | 2012-05-09 | 2012-05-09 | 半導体デバイス |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012107151A JP5884625B2 (ja) | 2012-05-09 | 2012-05-09 | 半導体デバイス |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013235948A true JP2013235948A (ja) | 2013-11-21 |
JP5884625B2 JP5884625B2 (ja) | 2016-03-15 |
Family
ID=49761828
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012107151A Expired - Fee Related JP5884625B2 (ja) | 2012-05-09 | 2012-05-09 | 半導体デバイス |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5884625B2 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110416187A (zh) * | 2019-06-28 | 2019-11-05 | 西安中车永电电气有限公司 | 一种新型压接式igbt内部封装结构 |
US20220278060A1 (en) * | 2020-12-07 | 2022-09-01 | Infineon Technologies Ag | Molded semiconductor package with high voltage isolation |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61199042U (ja) * | 1985-05-30 | 1986-12-12 | ||
WO1999012197A1 (fr) * | 1997-08-29 | 1999-03-11 | Hitachi, Ltd. | Dispositif a semi-conducteurs colle par compression et convertisseur de courant faisant appel a ce dispositif |
-
2012
- 2012-05-09 JP JP2012107151A patent/JP5884625B2/ja not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61199042U (ja) * | 1985-05-30 | 1986-12-12 | ||
WO1999012197A1 (fr) * | 1997-08-29 | 1999-03-11 | Hitachi, Ltd. | Dispositif a semi-conducteurs colle par compression et convertisseur de courant faisant appel a ce dispositif |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110416187A (zh) * | 2019-06-28 | 2019-11-05 | 西安中车永电电气有限公司 | 一种新型压接式igbt内部封装结构 |
CN110416187B (zh) * | 2019-06-28 | 2021-07-09 | 西安中车永电电气有限公司 | 一种新型压接式igbt内部封装结构 |
US20220278060A1 (en) * | 2020-12-07 | 2022-09-01 | Infineon Technologies Ag | Molded semiconductor package with high voltage isolation |
US11817407B2 (en) * | 2020-12-07 | 2023-11-14 | Infineon Technologies Ag | Molded semiconductor package with high voltage isolation |
Also Published As
Publication number | Publication date |
---|---|
JP5884625B2 (ja) | 2016-03-15 |
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