JP2011501858A - 粒子ビーム輸送装置及び小さなビームスポットサイズを有する粒子ビームの輸送方法 - Google Patents
粒子ビーム輸送装置及び小さなビームスポットサイズを有する粒子ビームの輸送方法 Download PDFInfo
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Abstract
Description
Claims (15)
- ターゲット(3)上で荷電粒子ビームを走査する走査手段(12)と、
前記走査手段の上流に配置された双極磁石(15)と、
前記双極磁石と前記走査手段との間に配置された少なくとも3つの四重極レンズ(17)と、
前記少なくとも3つの四重極レンズ(17)の場の強度を前記荷電粒子ビームの走査角度の関数として調整する調整手段と、
を備える、ターゲット(3)に荷電粒子ビームを輸送する装置(10)。 - 前記場の強度を調整する調整手段が、前記少なくとも3つの四重極レンズの前記場の強度を調整するように構成されている、請求項1に記載の装置。
- 前記場の強度を調整する調整手段が、線上又は面上における複数の既定の位置で前記装置の少なくとも単一の収色性を得るように配置されており、前記線又は前記面が好ましくは前記ターゲット上にある、請求項1又は2に記載の装置。
- 前記場の強度を調整する調整手段が、既定の走査角度に対して前記四重極レンズの前記場の強度と関連付けられた既定の情報を記録するように構成された参照テーブルを備える、請求項1〜3の何れか一項に記載の装置。
- 前記荷電粒子ビームを走査する前記走査手段(12)の下流に配置された追加的な四重極レンズ(13)を備え、
前記追加的な四重極レンズは、前記荷電粒子ビームが前記走査角度と関係なく同じ方向を有するよう前記荷電粒子ビームの方向を調整するように配置されているか、又は前記荷電粒子ビームの方向を他の任意の角度分布に調整するように配置されている、請求項1〜4の何れか一項に記載の装置。 - 前記走査手段(12)及び/又は前記少なくとも3つの四重極レンズ(17)が、磁石を備え、前記磁石が電気的に絶縁性の磁気材料、好ましくはフェライトからなるヨークを含む、請求項1〜5の何れか一項に記載の装置。
- 前記走査手段(12)及び/又は前記少なくとも3つの四重極レンズ(17)が、磁石を備え、前記磁石が薄板状のヨークを含む、請求項1〜5の何れか一項に記載の装置。
- 少なくとも部分的に電気的に絶縁性の材料からなる真空チャンバを備え、前記走査手段(12)及び/又は前記少なくとも3つの四重極レンズ(17)が、前記真空チャンバの外部に設けられている、請求項1〜7の何れか一項に記載の装置。
- 前記走査手段(12)及び/又は前記少なくとも3つの四重極レンズ(17)が、真空チャンバの内部に設けられている、請求項1〜7の何れか一項に記載の装置。
- 前記走査手段(12)が、90°にわたって前記荷電粒子ビームを走査するように配置されている、請求項1〜9の何れか一項に記載の装置。
- ターゲットに荷電粒子ビームを輸送する方法であって、
ビーム生成器(2)から前記荷電粒子ビームを走査する走査手段(12)までに前記荷電粒子ビームを輸送する段階であって、前記走査手段の上流の位置(14)において前記荷電粒子ビームがゼロ度以外の角度で曲がる段階と、
前記上流の位置(14)と前記走査手段との間の3つ又はそれ以上の位置において、前記荷電粒子ビームの前記走査角度の関数で磁場及び/又は電場の強度を調整する段階と、
前記ターゲット(3)上に前記荷電粒子ビームを走査する段階と、
を備える、方法。 - 材料、製品及び/又はデバイスの非侵入式検査のための、請求項1〜10の何れか一項に記載の装置の利用。
- 貨物をスクリーニングするための、請求項12に記載の装置の利用。
- 殺菌のための、請求項1〜10の何れか一項に記載の装置の利用。
- 材料特性の変更のための、請求項1〜10の何れか一項に記載の装置の利用。
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EPPCT/EP2007/060235 | 2007-09-26 | ||
PCT/EP2007/060235 WO2009039884A1 (en) | 2007-09-26 | 2007-09-26 | Particle beam transport apparatus and method of transporting a particle beam with small beam spot size |
PCT/EP2008/062955 WO2009040424A1 (en) | 2007-09-26 | 2008-09-26 | Particle beam transport apparatus and method of transporting a particle beam with small beam spot size |
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JP2011501858A true JP2011501858A (ja) | 2011-01-13 |
JP5336496B2 JP5336496B2 (ja) | 2013-11-06 |
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US (2) | US8946659B2 (ja) |
JP (1) | JP5336496B2 (ja) |
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US9236222B2 (en) | 2014-06-09 | 2016-01-12 | Sumitomo Heavy Industries Ion Technology Co., Ltd. | Ion implantation apparatus and ion implantation method |
JP2019529017A (ja) * | 2016-09-09 | 2019-10-17 | ボード・オブ・リージエンツ,ザ・ユニバーシテイ・オブ・テキサス・システム | 照射電子ビームの磁気制御用の装置および方法 |
JP7271425B2 (ja) | 2016-09-09 | 2023-05-11 | ボード オブ リージェンツ,ザ ユニバーシティ オブ テキサス システム | 照射電子ビームの磁気制御用の装置および方法 |
CN107018619A (zh) * | 2017-05-12 | 2017-08-04 | 合肥中科离子医学技术装备有限公司 | 一种紧凑型质子束流能量和能散度控制结构 |
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US20150123005A1 (en) | 2015-05-07 |
US8946659B2 (en) | 2015-02-03 |
US20110210263A1 (en) | 2011-09-01 |
ATE544160T1 (de) | 2012-02-15 |
WO2009040424A1 (en) | 2009-04-02 |
CN101896980B (zh) | 2014-08-06 |
JP5336496B2 (ja) | 2013-11-06 |
CN101896980A (zh) | 2010-11-24 |
WO2009039884A1 (en) | 2009-04-02 |
US9818573B2 (en) | 2017-11-14 |
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