JP2008026212A - パターン検査装置 - Google Patents
パターン検査装置 Download PDFInfo
- Publication number
- JP2008026212A JP2008026212A JP2006200572A JP2006200572A JP2008026212A JP 2008026212 A JP2008026212 A JP 2008026212A JP 2006200572 A JP2006200572 A JP 2006200572A JP 2006200572 A JP2006200572 A JP 2006200572A JP 2008026212 A JP2008026212 A JP 2008026212A
- Authority
- JP
- Japan
- Prior art keywords
- illumination
- pattern
- inspection
- lens
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95684—Patterns showing highly reflecting parts, e.g. metallic elements
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/70—Determining position or orientation of objects or cameras
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N2021/95638—Inspecting patterns on the surface of objects for PCB's
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30141—Printed circuit board [PCB]
Landscapes
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Pathology (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Theoretical Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006200572A JP2008026212A (ja) | 2006-07-24 | 2006-07-24 | パターン検査装置 |
TW096116158A TW200806978A (en) | 2006-07-24 | 2007-05-07 | Pattern inspection device |
KR1020070050951A KR20080009628A (ko) | 2006-07-24 | 2007-05-25 | 패턴 검사 장치 |
CNA2007101386269A CN101113958A (zh) | 2006-07-24 | 2007-07-24 | 图形检查装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006200572A JP2008026212A (ja) | 2006-07-24 | 2006-07-24 | パターン検査装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2008026212A true JP2008026212A (ja) | 2008-02-07 |
Family
ID=39022411
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006200572A Pending JP2008026212A (ja) | 2006-07-24 | 2006-07-24 | パターン検査装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2008026212A (ko) |
KR (1) | KR20080009628A (ko) |
CN (1) | CN101113958A (ko) |
TW (1) | TW200806978A (ko) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101198406B1 (ko) | 2010-04-21 | 2012-11-07 | (주)에이앤아이 | 패턴 검사 장치 |
JP2013113750A (ja) * | 2011-11-30 | 2013-06-10 | Hitachi Zosen Corp | 積層基板の検査装置および検査方法 |
CN103364412A (zh) * | 2012-04-10 | 2013-10-23 | 北京兆维电子(集团)有限责任公司 | 胶印版材在线检测与分垛*** |
JP2016006422A (ja) * | 2009-03-24 | 2016-01-14 | オルボテック・リミテッド | マルチモード・イメージング |
JP2018009800A (ja) * | 2016-07-11 | 2018-01-18 | 住友化学株式会社 | 欠陥検査用撮像装置、欠陥検査システム、フィルム製造装置、欠陥検査用撮像方法、欠陥検査方法、及び、フィルム製造方法 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5480149B2 (ja) | 2008-09-18 | 2014-04-23 | インターナショナル・ビジネス・マシーンズ・コーポレーション | 検査対象物の欠陥の発見を支援するシステム及び方法 |
KR101115010B1 (ko) * | 2010-07-13 | 2012-03-06 | 한미반도체 주식회사 | 웨이퍼 검사 장치 |
JP5559644B2 (ja) * | 2010-09-03 | 2014-07-23 | 株式会社トプコン | 検査装置 |
KR102023581B1 (ko) * | 2012-11-23 | 2019-09-24 | 해성디에스 주식회사 | 릴-투-릴 검사장치 및 릴-투-릴 검사방법 |
JP6085188B2 (ja) * | 2013-02-15 | 2017-02-22 | 株式会社Screenホールディングス | パターン検査装置 |
KR101464251B1 (ko) * | 2014-05-20 | 2014-11-25 | 테크밸리 주식회사 | 반도체 테이프릴의 등록방법 및 그 디스플레이시스템 |
CN104330419A (zh) * | 2014-11-20 | 2015-02-04 | 北京凌云光技术有限责任公司 | 菲林检测方法及装置 |
CN106249517B (zh) * | 2016-09-29 | 2019-04-19 | 长春理工大学 | 单相机全视角线号识别装置 |
KR102611983B1 (ko) * | 2018-10-29 | 2023-12-08 | 삼성전자주식회사 | 배선 회로 테스트 장치 및 방법 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003057192A (ja) * | 2001-08-10 | 2003-02-26 | Dainippon Screen Mfg Co Ltd | 画像取得装置 |
JP2005024386A (ja) * | 2003-07-02 | 2005-01-27 | Ushio Inc | 配線パターン検査装置 |
JP2006072147A (ja) * | 2004-09-03 | 2006-03-16 | Lasertec Corp | 検査装置及び検査方法並びにパターン基板の製造方法 |
JP2009523228A (ja) * | 2005-12-27 | 2009-06-18 | ケーエルエー−テンカー テクノロジィース コーポレイション | 複数画像の同時高速取得を行う方法および装置 |
-
2006
- 2006-07-24 JP JP2006200572A patent/JP2008026212A/ja active Pending
-
2007
- 2007-05-07 TW TW096116158A patent/TW200806978A/zh unknown
- 2007-05-25 KR KR1020070050951A patent/KR20080009628A/ko not_active Application Discontinuation
- 2007-07-24 CN CNA2007101386269A patent/CN101113958A/zh active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003057192A (ja) * | 2001-08-10 | 2003-02-26 | Dainippon Screen Mfg Co Ltd | 画像取得装置 |
JP2005024386A (ja) * | 2003-07-02 | 2005-01-27 | Ushio Inc | 配線パターン検査装置 |
JP2006072147A (ja) * | 2004-09-03 | 2006-03-16 | Lasertec Corp | 検査装置及び検査方法並びにパターン基板の製造方法 |
JP2009523228A (ja) * | 2005-12-27 | 2009-06-18 | ケーエルエー−テンカー テクノロジィース コーポレイション | 複数画像の同時高速取得を行う方法および装置 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016006422A (ja) * | 2009-03-24 | 2016-01-14 | オルボテック・リミテッド | マルチモード・イメージング |
KR101198406B1 (ko) | 2010-04-21 | 2012-11-07 | (주)에이앤아이 | 패턴 검사 장치 |
JP2013113750A (ja) * | 2011-11-30 | 2013-06-10 | Hitachi Zosen Corp | 積層基板の検査装置および検査方法 |
CN103364412A (zh) * | 2012-04-10 | 2013-10-23 | 北京兆维电子(集团)有限责任公司 | 胶印版材在线检测与分垛*** |
JP2018009800A (ja) * | 2016-07-11 | 2018-01-18 | 住友化学株式会社 | 欠陥検査用撮像装置、欠陥検査システム、フィルム製造装置、欠陥検査用撮像方法、欠陥検査方法、及び、フィルム製造方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20080009628A (ko) | 2008-01-29 |
CN101113958A (zh) | 2008-01-30 |
TW200806978A (en) | 2008-02-01 |
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Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20090318 |
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