JP2005032838A5 - - Google Patents
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- Publication number
- JP2005032838A5 JP2005032838A5 JP2003193836A JP2003193836A JP2005032838A5 JP 2005032838 A5 JP2005032838 A5 JP 2005032838A5 JP 2003193836 A JP2003193836 A JP 2003193836A JP 2003193836 A JP2003193836 A JP 2003193836A JP 2005032838 A5 JP2005032838 A5 JP 2005032838A5
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003193836A JP4494734B2 (en) | 2003-07-08 | 2003-07-08 | Charged particle beam drawing method, charged particle beam exposure apparatus, and device manufacturing method |
| US10/885,666 US7005659B2 (en) | 2003-07-08 | 2004-07-08 | Charged particle beam exposure apparatus, charged particle beam exposure method, and device manufacturing method using the same apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003193836A JP4494734B2 (en) | 2003-07-08 | 2003-07-08 | Charged particle beam drawing method, charged particle beam exposure apparatus, and device manufacturing method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005032838A JP2005032838A (en) | 2005-02-03 |
| JP2005032838A5 true JP2005032838A5 (en) | 2006-08-24 |
| JP4494734B2 JP4494734B2 (en) | 2010-06-30 |
Family
ID=34205196
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003193836A Expired - Fee Related JP4494734B2 (en) | 2003-07-08 | 2003-07-08 | Charged particle beam drawing method, charged particle beam exposure apparatus, and device manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4494734B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008004596A (en) * | 2006-06-20 | 2008-01-10 | Canon Inc | Charged particle beam drawing method, aligner, and process for fabricating device |
| JP5116996B2 (en) * | 2006-06-20 | 2013-01-09 | キヤノン株式会社 | Charged particle beam drawing method, exposure apparatus, and device manufacturing method |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54150082A (en) * | 1978-05-18 | 1979-11-24 | Cho Lsi Gijutsu Kenkyu Kumiai | Method of drawing pattern with electron beam |
| JPS5548929A (en) * | 1978-09-30 | 1980-04-08 | Toshiba Corp | Method of drawing by electron beam |
| JPS5645027A (en) * | 1979-09-20 | 1981-04-24 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Electron beam lithography |
| JPS6489433A (en) * | 1987-09-30 | 1989-04-03 | Toshiba Corp | Resist-pattern forming method |
| JPH07307136A (en) * | 1994-05-12 | 1995-11-21 | Nikon Corp | Irradiator for charged particle beam |
| JP3647128B2 (en) * | 1996-03-04 | 2005-05-11 | キヤノン株式会社 | Electron beam exposure apparatus and exposure method thereof |
| JP2001168016A (en) * | 1999-12-13 | 2001-06-22 | Canon Inc | Device and system for exposing charged corpuscular beam, control method therefor and device producing method |
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2003
- 2003-07-08 JP JP2003193836A patent/JP4494734B2/en not_active Expired - Fee Related