JP2004140066A - Chemical supply apparatus - Google Patents
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- JP2004140066A JP2004140066A JP2002301537A JP2002301537A JP2004140066A JP 2004140066 A JP2004140066 A JP 2004140066A JP 2002301537 A JP2002301537 A JP 2002301537A JP 2002301537 A JP2002301537 A JP 2002301537A JP 2004140066 A JP2004140066 A JP 2004140066A
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- 239000000126 substance Substances 0.000 title claims abstract description 109
- 239000007788 liquid Substances 0.000 claims description 35
- 238000001514 detection method Methods 0.000 claims description 17
- 238000005086 pumping Methods 0.000 claims description 14
- 238000000746 purification Methods 0.000 claims description 7
- 238000012423 maintenance Methods 0.000 abstract description 5
- 238000000034 method Methods 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 97
- 239000000243 solution Substances 0.000 description 39
- 238000004140 cleaning Methods 0.000 description 20
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J4/00—Feed or outlet devices; Feed or outlet control devices
- B01J4/008—Feed or outlet control devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J4/00—Feed or outlet devices; Feed or outlet control devices
- B01J4/02—Feed or outlet devices; Feed or outlet control devices for feeding measured, i.e. prescribed quantities of reagents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
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- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
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- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Liquid Crystal (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
Description
【0001】
【発明の属する技術分野】
この発明は、半導体装置あるいは液晶表示装置の製造工程で使用する薬液供給装置に関するものである。
【0002】
ウェハや液晶基板の洗浄工程では、高純度薬液を収容した加圧容器に高純度窒素ガスを加圧流入させることにより、高純度薬液をウェハや液晶基板の洗浄装置に圧送している。このような薬液供給装置では、薬液を洗浄装置に安定して移送することが必要となっている。
【0003】
【従来の技術】
従来、洗浄装置に薬液を移送する薬液供給装置では、洗浄装置への薬液移送配管及び薬液圧送用ガス配管が接続された容器内に薬液が収容される。薬液移送配管は、容器内において薬液の液面より下方まで挿入され、圧送用ガス配管は容器内の上部にガスが噴出するように接続されている。
【0004】
そして、容器内に圧送用ガスを供給することにより、薬液が容器内から薬液移送配管に押し出され、洗浄装置へ移送される。圧送用ガスは、高純度窒素が用いられる。
【0005】
一般的な薬液供給装置では、薬液を収容する容器は複数設けられ、薬液移送配管は各容器に対し自動開閉弁を介して分岐接続されている。また、圧送用ガス配管はガス供給元と各容器との間で分岐され、各容器に自動開閉弁を介してそれぞれ供給される。
【0006】
そして、まず一方の容器へ繋がる圧送用ガス配管の自動開閉弁が開かれ、かつその容器に繋がる薬液移送配管の自動開閉弁が開かれる。すると、一方の容器から薬液が洗浄装置に移送される。
【0007】
このとき、他方の容器に繋がる圧送用ガス配管及び薬液移送配管の自動開閉弁は閉じられている。
一方の容器内の薬液がなくなると、その容器に繋がる圧送用ガス配管及び薬液移送配管の自動開閉弁は閉じられるとともに、他方の容器に繋がる圧送用ガス配管及び薬液移送配管の自動開閉弁が開かれる。この結果、容器が切り替えられて、洗浄装置への薬液の供給が継続される。
【0008】
上記のような容器の切替え動作において、容器内の薬液がなくなったことを検知するために、薬液移送配管の一部が透明あるいは半透明のフッ素樹脂で形成され、その配管内を薬液が流れているか否かを光学式の薬液検知センサーで検出している。
【0009】
そして、薬液検知センサーの出力信号に基づいて、制御装置により自動開閉弁の動作が制御される。
このように、光学式の薬液検出センサーにより容器内の薬液の有無を検出する構成は、例えば特許文献1に開示されている。
【0010】
また、特許文献2では、薬液の供給開始時に、容器内の気圧が大気圧から所定の薬液移送気圧に至るまでのガス流量を積分して、容器内の初期空間容積を算出して容器内の薬液量を算出する。次いで、薬液の供給時には、圧送用ガスの圧力と流量を積算して薬液の移送量を算出し、容器が空になる前に容器を切り替える構成が開示されている。
【0011】
【特許文献1】
特開昭62−237324
【特許文献2】
特開2000−15082
【0012】
【発明が解決しようとする課題】
光学式の薬液検出センサーで薬液移送配管内に薬液がなくなったことを検出してから容器を切り替える構成では、薬液移送配管内に圧送用ガスが混入するため、薬液の移送圧力が変動し、洗浄ムラが発生し易い。
【0013】
また、圧送用ガスの混入により洗浄装置の薬液供給口において薬液が飛散する。このため、強酸あるいは強アルカリ溶液である薬液の飛散液滴による被害を蒙るおそれがあり、その被害を防止するために、飛散防止用のカバーを備える必要があった。
【0014】
また、薬液を光学的に検出するセンサーを使用していることから、移送する薬液の物性や特性に合わせて制御装置での検出レベルのしきい値を調整する必要がある。さらに、センサー設置位置のフッ素樹脂の配管に薬液により経年劣化して透明度が低下するため、安定した薬液検知を行うことができない。
【0015】
このようなことから、薬液検出センサーの検出信号に基づいて容器を切り替える構成では、薬液の安定した供給を期待することができず、この結果洗浄装置において安定した洗浄性能を得ることができないという問題点がある。
【0016】
特許文献2に開示された構成では、薬液移送配管内に圧送用ガスが混入することはないので、上記のような不具合は発生しない。
ところが、容器毎にガス流量検出手段及びガス圧力検出手段が必要となるとともに、各検出手段から出力される検出信号に基づいて移送薬液量の算出を行う必要があるため、制御装置での演算プログラムが煩雑となる。
【0017】
また、ガス流量検出手段及びガス圧力検出手段にはそれぞれ個体差が存在するため、それらを補正する作業も必要となり、その補正作業が煩雑である。
また、薬液の供給を停止した容器内のガス圧を大気圧に戻す際に、容器内に残存する気化した薬液が圧送用ガス配管に逆流して、ガス流量検出手段及びガス圧力検出手段まで到達し、これらを腐食させて破損に至らしめることがある。
【0018】
このようなことから、特許文献2に記載された構成では、ガス流量検出手段及びガス圧力検出手段をそれぞれ設けることによるコストの上昇と、その調整及び維持管理コストが上昇する。従って、このような薬液供給装置で製造される半導体装置あるいは液晶表示装置のコストを上昇させるという問題点がある。
【0019】
この発明の目的は、薬液の安定供給を可能としながら、その初期コスト及び維持管理コストを低減し得る薬液供給装置を提供することにある。
【0020】
【課題を解決するための手段】
圧送用ガス配管から加圧容器への圧送用ガスの供給に先立って、予備加圧用ガス配管から圧送用ガスを前記加圧容器に供給し、予備加圧後に前記圧送用ガス配管から圧送用ガスを加圧容器に供給し、前記ガス流量計の検出値に基づいて前記圧送用ガスを供給する加圧容器を切り替える。
【0021】
【発明の実施の形態】
以下、この発明を具体化した薬液供給装置の一実施の形態を図1に従って説明する。
【0022】
ガス供給元1から二つの加圧容器2a,2bに薬液圧送用ガスを供給する圧送用ガス配管は、ガス流量計3と、ガス精製フィルタ4aと、逆止弁5aが介在される第一の圧送用ガス配管6aと、第一の圧送用ガス配管6aから分岐する第二及び第三の圧送用ガス配管6b,6cとから構成される。
【0023】
そして、加圧容器2aには第一の圧送用ガス配管6a及び第二の圧送用ガス配管6bを介して圧送用ガスが供給され、加圧容器2bには第一の圧送用ガス配管6a及び第三の圧送用ガス配管6cを介して圧送用ガスが供給される。
【0024】
前記第二及び第三の圧送用ガス配管6b,6cにはそれぞれ自動開閉弁7a,7bが介在される。
前記ガス供給元1と加圧容器2a,2bとの間には、前記第一及び第二の圧送用ガス配管6a,6bと、第一及び第三の圧送用ガス配管6a,6cに対しそれぞれ並列に予備加圧用ガス配管が配設される。
【0025】
その予備加圧用ガス配管は、ガス精製フィルタ4bと、逆止弁5bが介在される第一の予備加圧用ガス配管8aと、第一の予備加圧用ガス配管8aから分岐する第二及び第三の予備加圧用ガス配管8b,8cとから構成される。
【0026】
そして、第一及び第二の予備加圧用ガス配管8a,8bが前記第一及び第二の圧送用ガス配管6a,6bに並列に接続され、第一及び第三の予備加圧用ガス配管8a,8cが前記第一及び第三の圧送用ガス配管6a,6cに並列に接続される。
【0027】
前記第二及び第三の予備加圧用ガス配管8b,8cにはそれぞれ自動開閉弁9a,9bが介在される。
前記加圧容器2aは、前記第二の圧送用ガス配管6bから分岐する大気開放用配管10aを介して大気圧に開放され、前記加圧容器2bは、前記第三の圧送用ガス配管6cから分岐する大気開放用配管10bを介して大気圧に開放される。
【0028】
また、前記大気開放用配管10a,10bには自動開閉弁11a,11bがそれぞれ介在されている。
前記加圧容器2a,2bには、薬液移送配管12a,12bの一端部が同容器2a,2bの底部近傍まで挿通されている。前記薬液移送配管12a,12bの他端部は、自動開閉弁13a,13bを介して共通の薬液供給配管14に接続され、その薬液供給配管14から薬液供給先である洗浄装置に薬液が供給される。
【0029】
前記自動開閉弁7a,7b,9a,9b,11a,11b,13a,13bの動作は、制御部15により制御され、前記ガス流量計3の検出値は制御部15に出力される。
【0030】
次に、上記のように構成された薬液供給装置の動作を説明する。加圧容器2a,2bに薬液を満たした状態で、まず自動開閉弁9aを開き、予備加圧用ガス配管8a,8bを介して加圧容器2aに加圧ガスを供給し、加圧容器2aに対し予備加圧を行う。このとき、その他の自動開閉弁はすべて閉じる。
【0031】
自動開閉弁9aを所定時間開いて加圧容器2aに予備加圧を行った後、自動開閉弁9aを閉じ、第二の圧送用ガス配管6bの自動開閉弁7aを開き、さらに薬液移送配管12aの自動開閉弁13aを開く。
【0032】
すると、加圧容器2a内の薬液が薬液移送配管12aを経て、洗浄装置に移送される。
このとき、ガス流量計3で加圧容器2aに供給される圧送用ガスの流量がガス流量計3で検出され、その検出値が制御部15に出力される。制御部15では、ガス流量計3の検出値を積算することにより、加圧容器2a内に圧送したガスの体積値を算出する。この体積値は、加圧容器2aから洗浄装置に圧送される薬液の量とほぼ一致する。
【0033】
また、上記動作と並行して、第三の予備加圧用ガス配管8cの自動開閉弁9bが開かれ、加圧容器2bが予備加圧される。
加圧容器2a内に圧送したガスの体積値があらかじめ設定されている設定値を超えたとき、すなわち加圧容器2a内の薬液が一定量以下となったとき、薬液移送配管12aの自動開閉弁13a及び第二の圧送用ガス配管6bの自動開閉弁7aが閉じられる。
【0034】
また、第三の圧送用ガス配管6cの自動開閉弁7bが開かれ、薬液移送配管12bの自動開閉弁13bが開かれる。
すると、加圧容器2aからの薬液の移送が停止され、引き続いて加圧容器2bから洗浄装置への薬液の移送が開始される。
【0035】
このとき、大気開放用配管10aの自動開閉弁11aが開かれ、加圧容器2a内の圧力は大気圧まで減圧される。
そして、ガス流量計3の検出値の積算値が一定値を超えると、第三の圧送用ガス配管6cの自動開閉弁7bが閉じられ、薬液移送配管12bの自動開閉弁13bが閉じられて、加圧容器2bから洗浄装置への薬液の移送が停止される。
【0036】
このとき、大気開放用配管10bの自動開閉弁11bが開かれ、加圧容器2b内の圧力は大気圧まで減圧される。
また、逆止弁5aにより気化薬液がガス精製フィルタ4a,4b及びガス流量計3に逆流することはない。
【0037】
上記のように構成されたでは、次に示す作用効果を得ることができる。
(1)加圧容器2a,2bを切り替えるとき、薬液移送配管12aに加圧ガスが混入する前に、加圧容器2aから同2bに切り替える。従って、薬液供給配管14内に加圧ガスの混入を防止することができるので、洗浄装置での薬液の飛散及び洗浄ムラの発生を防止することができる。
(2)薬液を光学的に検出するセンサーを使用していないので、移送する薬液の物性や特性に合わせて制御部15での検出レベルのしきい値を調整する必要がない。
(3)洗浄装置への薬液の供給量は、加圧容器2a,2bに予備加圧を行うことにより、ガス流量計3のみで検出可能である。従って、制御部15で移送薬液量を算出するためのプログラムを簡略化することができる。
(4)1個のガス流量計3を使用するのみであるので、そのガス流量計3の検出値の補正作業はほとんど必要ない。
(5)逆止弁5a,5bにより加圧容器2a,2b内の気化薬液のガス精製フィルタ4a,4bあるいはガス流量計3への逆流を防止することができる。従って、ガス精製フィルタ4a,4bあるいはガス流量計3の腐食を未然に防止することができる。
(6)上記(3)(4)(5)の作用効果により、薬液供給装置の初期コスト及びメンテナンスコストを低減することができる。
【0038】
上記実施の形態は、次に示すように変更することもできる。
・加圧容器は3つ以上でも同様に実施することができる。
【0039】
【発明の効果】
以上詳述したように、この発明は薬液の安定供給を可能としながら、その初期コスト及び維持管理コストを低減し得る薬液供給装置を提供することができる。
【図面の簡単な説明】
【図1】薬液供給装置を示す構成図である。
【符号の説明】
2a,2b 加圧容器
3 ガス流量計
6a〜6c 圧送用ガス配管
7a,7b 自動開閉弁
8a〜8c 予備加圧用ガス配管
13a,13b 自動開閉弁
12a,12b 薬液移送配管
15 制御部[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a chemical liquid supply device used in a manufacturing process of a semiconductor device or a liquid crystal display device.
[0002]
In a wafer or liquid crystal substrate cleaning process, a high-purity chemical is pumped into a pressurized container containing a high-purity chemical to pump the high-purity chemical to a wafer or liquid crystal substrate cleaning apparatus. In such a chemical solution supply device, it is necessary to stably transfer the chemical solution to the cleaning device.
[0003]
[Prior art]
2. Description of the Related Art Conventionally, in a chemical solution supply device for transferring a chemical solution to a cleaning device, a chemical solution is stored in a container to which a chemical solution transfer pipe to the cleaning device and a gas pipe for chemical solution pressure feed are connected. The chemical liquid transfer pipe is inserted below the liquid level of the chemical liquid in the container, and the gas pipe for pressure feeding is connected so that gas is ejected to the upper part in the container.
[0004]
Then, by supplying the gas for pressure feeding into the container, the chemical solution is pushed out of the container to the chemical solution transfer pipe and transferred to the cleaning device. High-purity nitrogen is used as the gas for pumping.
[0005]
In a general chemical solution supply device, a plurality of containers for storing a chemical solution are provided, and a chemical solution transfer pipe is branched and connected to each container via an automatic opening / closing valve. Further, the gas pipe for pressure feed is branched between a gas supply source and each container, and is supplied to each container via an automatic opening / closing valve.
[0006]
Then, first, the automatic open / close valve of the gas pipe for pressure feeding connected to one container is opened, and the automatic open / close valve of the chemical liquid transfer pipe connected to the container is opened. Then, the chemical solution is transferred from one container to the cleaning device.
[0007]
At this time, the automatic on-off valves of the gas pipe for pressure feed and the chemical liquid transfer pipe connected to the other container are closed.
When the chemical liquid in one container is exhausted, the automatic opening / closing valve of the pressure gas pipe and the chemical liquid transfer pipe connected to that container is closed, and the automatic gas valve of the pressure gas gas pipe and the chemical liquid transfer pipe connected to the other container are opened. It is. As a result, the container is switched, and the supply of the chemical solution to the cleaning device is continued.
[0008]
In the above-described container switching operation, a part of the chemical liquid transfer pipe is formed of a transparent or translucent fluororesin to detect that the chemical liquid in the container has run out, and the chemical liquid flows through the pipe. The presence or absence is detected by an optical chemical detection sensor.
[0009]
Then, the operation of the automatic on-off valve is controlled by the control device based on the output signal of the chemical liquid detection sensor.
A configuration for detecting the presence or absence of a chemical solution in a container by an optical chemical solution detection sensor is disclosed in, for example,
[0010]
Further, in Patent Document 2, at the start of the supply of the chemical, the gas flow rate from the atmospheric pressure in the container to the predetermined chemical liquid transfer pressure is integrated, the initial space volume in the container is calculated, and the internal space in the container is calculated. Calculate the chemical volume. Then, at the time of supplying the chemical solution, a configuration is disclosed in which the transfer amount of the chemical solution is calculated by integrating the pressure and the flow rate of the pressure-feeding gas, and the container is switched before the container becomes empty.
[0011]
[Patent Document 1]
JP-A-62-237324
[Patent Document 2]
JP 2000-15082A
[0012]
[Problems to be solved by the invention]
In the configuration in which the container is switched after detecting that the chemical liquid has run out in the chemical liquid transfer pipe with the optical chemical liquid detection sensor, the gas transfer pressure is mixed into the chemical liquid transfer pipe, so the transfer pressure of the chemical liquid fluctuates and cleaning is performed. Unevenness is likely to occur.
[0013]
Further, the chemical solution is scattered at the chemical solution supply port of the cleaning device due to the mixing of the gas for pressure feeding. For this reason, there is a possibility that the chemical liquid, which is a strong acid or strong alkaline solution, may be damaged by scattered droplets, and in order to prevent the damage, it is necessary to provide a cover for preventing scattering.
[0014]
Further, since a sensor for optically detecting a chemical solution is used, it is necessary to adjust the threshold value of the detection level in the control device according to the physical properties and characteristics of the chemical solution to be transferred. Further, the fluororesin piping at the sensor installation position is deteriorated with the aging due to the chemical solution and the transparency is reduced, so that stable detection of the chemical solution cannot be performed.
[0015]
For this reason, in the configuration in which the containers are switched based on the detection signal of the chemical liquid detection sensor, stable supply of the chemical liquid cannot be expected, and as a result, stable cleaning performance cannot be obtained in the cleaning device. There are points.
[0016]
In the configuration disclosed in Patent Literature 2, since the gas for pressure feeding does not mix into the chemical liquid transfer pipe, the above-described problem does not occur.
However, a gas flow rate detecting means and a gas pressure detecting means are required for each container, and it is necessary to calculate the amount of the transferred chemical solution based on the detection signal output from each detecting means. Is complicated.
[0017]
In addition, since there are individual differences in the gas flow rate detecting means and the gas pressure detecting means, it is necessary to perform a work of correcting them, and the work of correcting them is complicated.
Also, when returning the gas pressure in the container in which the supply of the chemical solution is stopped to the atmospheric pressure, the vaporized chemical solution remaining in the container flows back to the gas pipe for pressure feed and reaches the gas flow rate detecting means and the gas pressure detecting means. However, they may corrode and cause damage.
[0018]
For this reason, in the configuration described in Patent Literature 2, the cost is increased due to the provision of the gas flow rate detecting means and the gas pressure detecting means, and the adjustment and maintenance costs are increased. Therefore, there is a problem that the cost of the semiconductor device or the liquid crystal display device manufactured by such a chemical liquid supply device is increased.
[0019]
An object of the present invention is to provide a chemical solution supply device capable of reducing the initial cost and the maintenance and management cost while enabling stable supply of the chemical solution.
[0020]
[Means for Solving the Problems]
Prior to the supply of the gas for pressure feed from the gas pipe for pressure feed to the pressurized container, the gas for pressure feed is supplied from the gas pipe for preliminary pressurization to the pressurized container, and the gas for pressure transfer from the gas pipe for pressure feed after the pre-pressurization. Is supplied to the pressurized container, and the pressurized container for supplying the pressure-feeding gas is switched based on the detection value of the gas flow meter.
[0021]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, an embodiment of a chemical liquid supply device embodying the present invention will be described with reference to FIG.
[0022]
A gas supply gas pipe for supplying a chemical liquid pressure supply gas from the
[0023]
Then, the
[0024]
Automatic opening /
Between the
[0025]
The pre-pressurizing gas pipe includes a
[0026]
Then, the first and second
[0027]
Automatic opening / closing valves 9a and 9b are interposed in the second and third
The
[0028]
Automatic opening /
One ends of chemical
[0029]
The operation of the automatic on-off
[0030]
Next, the operation of the chemical liquid supply device configured as described above will be described. When the
[0031]
After the automatic opening / closing valve 9a is opened for a predetermined time to pre-pressurize the
[0032]
Then, the chemical in the
At this time, the gas flow meter 3 detects the flow rate of the pressure-feeding gas supplied to the
[0033]
In parallel with the above operation, the automatic opening / closing valve 9b of the third
When the volume value of the gas pumped into the
[0034]
In addition, the automatic opening / closing valve 7b of the third pressure-feeding
Then, the transfer of the chemical from the
[0035]
At this time, the automatic opening /
Then, when the integrated value of the detection value of the gas flow meter 3 exceeds a certain value, the automatic opening / closing valve 7b of the third gas feed piping 6c is closed, and the automatic opening /
[0036]
At this time, the automatic opening /
In addition, the vaporized chemical liquid does not flow back to the
[0037]
With the above configuration, the following operation and effect can be obtained.
(1) When switching between the
(2) Since no sensor for optically detecting the chemical is used, there is no need to adjust the threshold of the detection level in the
(3) The supply amount of the chemical solution to the cleaning device can be detected only by the gas flow meter 3 by pre-pressurizing the
(4) Since only one gas flow meter 3 is used, there is almost no need to correct the detection value of the gas flow meter 3.
(5) The
(6) The initial cost and maintenance cost of the chemical liquid supply device can be reduced by the effects of (3), (4), and (5).
[0038]
The above embodiment can be modified as follows.
-The same can be performed with three or more pressurized containers.
[0039]
【The invention's effect】
As described above in detail, the present invention can provide a chemical solution supply device capable of stably supplying a chemical solution and reducing the initial cost and the maintenance and management cost.
[Brief description of the drawings]
FIG. 1 is a configuration diagram showing a chemical solution supply device.
[Explanation of symbols]
2a, 2b Pressurized container 3
Claims (6)
前記各加圧容器に圧送用ガスをそれぞれ供給する圧送用ガス配管と、
前記加圧容器から前記圧送用ガスに基づいて押し出される薬液を供給先に移送する薬液移送配管と、
前記圧送用ガス配管に介在される自動開閉弁と、
前記薬液移送配管に介在される自動開閉弁と、
前記加圧容器を予備加圧するための圧送用ガスを該加圧容器に供給する予備加圧用ガス配管と、
前記圧送用ガス配管に流れる圧送用ガスの流量を計測するガス流量計と、
前記自動開閉弁の動作を制御して、前記供給先に薬液を供給する加圧容器を切り替える制御部とを有し、
前記制御部は、前記圧送用ガス配管から加圧容器への圧送用ガスの供給に先立って、前記予備加圧用ガス配管から圧送用ガスを前記加圧容器に供給し、予備加圧後に前記圧送用ガス配管から圧送用ガスを加圧容器に供給し、前記ガス流量計の検出値に基づいて前記圧送用ガスを供給する加圧容器を切り替えることを特徴とする薬液供給装置。A plurality of pressurized containers capable of storing a chemical solution,
A pressure-feed gas pipe for supplying a pressure-feed gas to each of the pressurized containers,
A chemical transfer pipe that transfers a chemical extruded from the pressurized container based on the gas for pressure transfer to a supply destination,
An automatic on-off valve interposed in the gas pipe for pressure feeding,
An automatic on-off valve interposed in the chemical transfer pipe,
A pre-pressurizing gas pipe for supplying a pressurized gas for pre-pressurizing the pressurized container to the pressurized container,
A gas flow meter that measures the flow rate of the gas for pumping flowing through the gas pipe for pumping,
A control unit that controls the operation of the automatic opening and closing valve and switches a pressurized container that supplies a chemical solution to the supply destination,
The control unit supplies a gas for pumping from the gas pipe for preliminary pressurization to the pressurized container prior to the supply of the gas for pumping from the gas pipe for pressurizing to the pressurized container, and performs the pumping after the prepressurization. A chemical solution supply device for supplying a gas for pressurization from a gas pipe to a pressurized container and switching the pressurized container for supplying the gas for pressurization based on a detection value of the gas flow meter.
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JP2002301537A JP4138440B2 (en) | 2002-10-16 | 2002-10-16 | Chemical supply device |
TW092127815A TWI228434B (en) | 2002-10-16 | 2003-10-07 | Chemical liquid feeding apparatus |
KR1020030071309A KR100904052B1 (en) | 2002-10-16 | 2003-10-14 | Chemical liquid feeding apparatus |
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JP2002301537A JP4138440B2 (en) | 2002-10-16 | 2002-10-16 | Chemical supply device |
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Cited By (3)
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JP2007273568A (en) * | 2006-03-30 | 2007-10-18 | Hitachi High-Technologies Corp | Substrate-treating device, substrate treatment method, and manufacturing method of the substrate |
JP2008539078A (en) * | 2005-04-25 | 2008-11-13 | アドバンスド テクノロジー マテリアルズ,インコーポレイテッド | Liner type liquid storage and distribution system with empty detection function |
US9079758B2 (en) | 2005-06-06 | 2015-07-14 | Advanced Technology Materials, Inc. | Fluid storage and dispensing systems and processes |
Families Citing this family (1)
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JP4113546B2 (en) | 2005-12-12 | 2008-07-09 | 鶴見曹達株式会社 | How to clean container valves |
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JPH0781900B2 (en) | 1986-04-08 | 1995-09-06 | 九州日本電気株式会社 | Chemical supply device |
JP4314537B2 (en) | 1998-07-03 | 2009-08-19 | 関東化学株式会社 | Safety detection type chemical supply device |
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2002
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Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2008539078A (en) * | 2005-04-25 | 2008-11-13 | アドバンスド テクノロジー マテリアルズ,インコーポレイテッド | Liner type liquid storage and distribution system with empty detection function |
JP2012143756A (en) * | 2005-04-25 | 2012-08-02 | Advanced Technology Materials Inc | Liner-based liquid storage and dispensing systems with empty detection capability |
US8322571B2 (en) | 2005-04-25 | 2012-12-04 | Advanced Technology Materials, Inc. | Liner-based liquid storage and dispensing systems with empty detection capability |
TWI409213B (en) * | 2005-04-25 | 2013-09-21 | Advanced Tech Materials | Liner-based liquid storage and dispensing systems with empty detection capability |
US9073028B2 (en) | 2005-04-25 | 2015-07-07 | Advanced Technology Materials, Inc. | Liner-based liquid storage and dispensing systems with empty detection capability |
JP2015157286A (en) * | 2005-04-25 | 2015-09-03 | アドバンスド テクノロジー マテリアルズ,インコーポレイテッド | Liner-based liquid storage and dispensing systems with empty detection capability |
JP2015163401A (en) * | 2005-04-25 | 2015-09-10 | アドバンスド テクノロジー マテリアルズ,インコーポレイテッド | Liner type liquid storage/distribution system with emptiness detection function |
US9802749B2 (en) | 2005-04-25 | 2017-10-31 | Entegris, Inc. | Liner-based liquid storage and dispensing systems with empty detection capability |
US9079758B2 (en) | 2005-06-06 | 2015-07-14 | Advanced Technology Materials, Inc. | Fluid storage and dispensing systems and processes |
US9802808B2 (en) | 2005-06-06 | 2017-10-31 | Entegris, Inc. | Fluid storage and dispensing systems and processes |
JP2007273568A (en) * | 2006-03-30 | 2007-10-18 | Hitachi High-Technologies Corp | Substrate-treating device, substrate treatment method, and manufacturing method of the substrate |
Also Published As
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JP4138440B2 (en) | 2008-08-27 |
KR100904052B1 (en) | 2009-06-23 |
KR20040034436A (en) | 2004-04-28 |
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TW200410757A (en) | 2004-07-01 |
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