JP1546801S - - Google Patents
Info
- Publication number
- JP1546801S JP1546801S JPD2015-13038F JP2015013038F JP1546801S JP 1546801 S JP1546801 S JP 1546801S JP 2015013038 F JP2015013038 F JP 2015013038F JP 1546801 S JP1546801 S JP 1546801S
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2015-13038F JP1546801S (ja) | 2015-06-12 | 2015-06-12 | |
| TW104305551F TWD175855S (zh) | 2015-06-12 | 2015-10-06 | 電漿處理裝置用下腔室 |
| US29/544,071 USD802545S1 (en) | 2015-06-12 | 2015-10-30 | Lower chamber for a plasma processing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2015-13038F JP1546801S (ja) | 2015-06-12 | 2015-06-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP1546801S true JP1546801S (ja) | 2016-03-28 |
Family
ID=55539625
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JPD2015-13038F Active JP1546801S (ja) | 2015-06-12 | 2015-06-12 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD802545S1 (ja) |
| JP (1) | JP1546801S (ja) |
| TW (1) | TWD175855S (ja) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP1611626S (ja) * | 2017-01-20 | 2018-08-20 | ||
| JP1584146S (ja) * | 2017-01-31 | 2017-08-21 | ||
| USD837754S1 (en) * | 2017-04-28 | 2019-01-08 | Applied Materials, Inc. | Plasma chamber liner |
| USD838681S1 (en) * | 2017-04-28 | 2019-01-22 | Applied Materials, Inc. | Plasma chamber liner |
| USD842259S1 (en) * | 2017-04-28 | 2019-03-05 | Applied Materials, Inc. | Plasma chamber liner |
| USD859333S1 (en) | 2018-03-16 | 2019-09-10 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| USD858468S1 (en) | 2018-03-16 | 2019-09-03 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| JP1638504S (ja) * | 2018-12-06 | 2019-08-05 | ||
| USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
| USD998575S1 (en) | 2020-04-07 | 2023-09-12 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
| USD947914S1 (en) | 2020-11-23 | 2022-04-05 | Applied Materials, Inc. | Base plate for a processing chamber substrate support |
| JP1704964S (ja) * | 2021-04-19 | 2022-01-14 | プラズマ処理装置用サセプタリング | |
| JP1700629S (ja) * | 2021-04-26 | 2021-11-29 | ||
| USD1009816S1 (en) | 2021-08-29 | 2024-01-02 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| USD997111S1 (en) | 2021-12-15 | 2023-08-29 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
| USD1034493S1 (en) * | 2022-11-25 | 2024-07-09 | Ap Systems Inc. | Chamber wall liner for a semiconductor manufacturing apparatus |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4319432A (en) * | 1980-05-13 | 1982-03-16 | Spitfire Tool And Machine Co. | Polishing fixture |
| USD404369S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Manifold cover for use in a semiconductor wafer heat processing apparatus |
| US6068548A (en) * | 1997-12-17 | 2000-05-30 | Intel Corporation | Mechanically stabilized retaining ring for chemical mechanical polishing |
| US6264540B1 (en) * | 2000-03-30 | 2001-07-24 | Speedfam-Ipec Corporation | Method and apparatus for disposable bladder carrier assembly |
| AU2003300375A1 (en) * | 2002-10-11 | 2004-05-04 | Semplastics, L.L.C. | Retaining ring for use on a carrier of a polishing apparatus |
| CN1910012B (zh) * | 2003-11-13 | 2012-03-21 | 应用材料公司 | 具有成型表面的固定环 |
| WO2006127780A2 (en) * | 2005-05-24 | 2006-11-30 | Entegris, Inc. | Cmp retaining ring |
| USD703160S1 (en) * | 2011-01-27 | 2014-04-22 | Hitachi High-Technologies Corporation | Grounded electrode for a plasma processing apparatus |
| USD658691S1 (en) * | 2011-03-30 | 2012-05-01 | Tokyo Electron Limited | Liner for plasma processing apparatus |
| US20120263569A1 (en) * | 2011-04-14 | 2012-10-18 | Scott Wayne Priddy | Substrate holders and methods of substrate mounting |
| USD693782S1 (en) * | 2012-11-19 | 2013-11-19 | Epicrew Corporation | Lid for epitaxial growing device |
| USD734377S1 (en) * | 2013-03-28 | 2015-07-14 | Hirata Corporation | Top cover of a load lock chamber |
| TWD169790S (zh) * | 2013-07-10 | 2015-08-11 | 日立國際電氣股份有限公司 | 基板處理裝置用氣化器之部分 |
| USD722966S1 (en) * | 2013-08-23 | 2015-02-24 | Bridgeport Fittings, Inc. | Split, non-metallic electrical insulating bushing |
| USD716240S1 (en) * | 2013-11-07 | 2014-10-28 | Applied Materials, Inc. | Lower chamber liner |
| USD775710S1 (en) * | 2015-05-19 | 2017-01-03 | Il Han Kim | End bushing for fishing reel spool |
| JP1546800S (ja) * | 2015-06-12 | 2016-03-28 |
-
2015
- 2015-06-12 JP JPD2015-13038F patent/JP1546801S/ja active Active
- 2015-10-06 TW TW104305551F patent/TWD175855S/zh unknown
- 2015-10-30 US US29/544,071 patent/USD802545S1/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| TWD175855S (zh) | 2016-05-21 |
| USD802545S1 (en) | 2017-11-14 |