IL273309A - Charged particle beam apparatus, and systems and methods for operating the apparatus - Google Patents

Charged particle beam apparatus, and systems and methods for operating the apparatus

Info

Publication number
IL273309A
IL273309A IL273309A IL27330920A IL273309A IL 273309 A IL273309 A IL 273309A IL 273309 A IL273309 A IL 273309A IL 27330920 A IL27330920 A IL 27330920A IL 273309 A IL273309 A IL 273309A
Authority
IL
Israel
Prior art keywords
systems
operating
methods
charged particle
particle beam
Prior art date
Application number
IL273309A
Other languages
Hebrew (he)
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of IL273309A publication Critical patent/IL273309A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H01J2237/0451—Diaphragms with fixed aperture
    • H01J2237/0453—Diaphragms with fixed aperture multiple apertures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2817—Pattern inspection

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Electron Beam Exposure (AREA)
IL273309A 2017-09-19 2020-03-15 Charged particle beam apparatus, and systems and methods for operating the apparatus IL273309A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201762560622P 2017-09-19 2017-09-19
PCT/EP2018/074985 WO2019057644A1 (en) 2017-09-19 2018-09-14 Charged particle beam apparatus, and systems and methods for operating the apparatus

Publications (1)

Publication Number Publication Date
IL273309A true IL273309A (en) 2020-04-30

Family

ID=63586751

Family Applications (1)

Application Number Title Priority Date Filing Date
IL273309A IL273309A (en) 2017-09-19 2020-03-15 Charged particle beam apparatus, and systems and methods for operating the apparatus

Country Status (8)

Country Link
US (1) US11798777B2 (en)
EP (1) EP3685421A1 (en)
JP (2) JP6972312B2 (en)
KR (1) KR102378925B1 (en)
CN (1) CN111213219B (en)
IL (1) IL273309A (en)
TW (3) TWI747213B (en)
WO (1) WO2019057644A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3408829B1 (en) * 2016-01-27 2023-10-25 ASML Netherlands B.V. Apparatus of plural charged-particle beams
SG11202112463SA (en) * 2019-05-31 2021-12-30 Asml Netherlands Bv Multiple charged-particle beam apparatus and methods of operating the same
US10928336B1 (en) * 2019-07-29 2021-02-23 Applied Materials Israel Ltd. X-ray based evaluation of a status of a structure of a substrate
DE102019005362A1 (en) * 2019-07-31 2021-02-04 Carl Zeiss Multisem Gmbh Method for operating a multitude particle beam system with changing the numerical aperture, associated computer program product and multitude particle beam system
TWI834015B (en) * 2019-12-19 2024-03-01 荷蘭商Ａｓｍｌ荷蘭公司 Charged particle multi-beam system and related non-transitory computer readable medium
US11562879B2 (en) * 2020-09-15 2023-01-24 Nuflare Technology, Inc. Low-blur electrostatic transfer lens for multi-beam electron gun
DE102021200799B3 (en) * 2021-01-29 2022-03-31 Carl Zeiss Multisem Gmbh Method with improved focus adjustment considering an image plane tilt in a multiple particle beam microscope
EP4113570A1 (en) * 2021-06-29 2023-01-04 ASML Netherlands B.V. Charged particle assessment system and method of aligning a sample in a charged particle assessment system
KR20240034830A (en) * 2021-07-22 2024-03-14 에이에스엠엘 네델란즈 비.브이. Systems and devices for stabilizing electron sources in charged particle systems
US20230245291A1 (en) * 2022-01-28 2023-08-03 Fei Company Automatic particle beam focusing
WO2024008493A1 (en) * 2022-07-05 2024-01-11 Asml Netherlands B.V. Assessment apparatus and methods
EP4303908A1 (en) * 2022-07-05 2024-01-10 ASML Netherlands B.V. Assessment apparatus using a plurality of charged particle beams

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3994691B2 (en) * 2001-07-04 2007-10-24 株式会社日立製作所 Charged particle beam apparatus and automatic astigmatism adjustment method
JP3684943B2 (en) 1999-10-19 2005-08-17 株式会社日立製作所 Beam scanning inspection system
JP2007087639A (en) * 2005-09-20 2007-04-05 Ebara Corp Electron beam device and pattern evaluation method
WO2007067296A2 (en) * 2005-12-02 2007-06-14 Alis Corporation Ion sources, systems and methods
JP4995542B2 (en) * 2006-11-06 2012-08-08 株式会社トプコン Autofocus method of charged particle beam apparatus, computer program, and recording medium
JP4857101B2 (en) 2006-12-21 2012-01-18 株式会社日立ハイテクノロジーズ Probe evaluation method
JP2010244740A (en) * 2009-04-02 2010-10-28 Hitachi High-Technologies Corp Review device and review method
EP2676285B1 (en) * 2011-02-18 2015-05-20 Applied Materials Israel Ltd. Focusing a charged particle imaging system
JP5890652B2 (en) 2011-10-28 2016-03-22 株式会社荏原製作所 Sample observation apparatus and sample observation method
US10325753B2 (en) * 2015-09-23 2019-06-18 Kla Tencor Corporation Method and system for focus adjustment of a multi-beam scanning electron microscopy system
TWI701459B (en) * 2015-09-23 2020-08-11 美商克萊譚克公司 Method and system for focus adjustment of a multi-beam scanning electron microscopy system
DE102015013698B9 (en) * 2015-10-22 2017-12-21 Carl Zeiss Microscopy Gmbh Method for operating a multi-beam particle microscope
US11302511B2 (en) * 2016-02-04 2022-04-12 Kla Corporation Field curvature correction for multi-beam inspection systems
DE102016203094B4 (en) * 2016-02-26 2022-02-10 Carl Zeiss Smt Gmbh Method and apparatus for permanently repairing missing material defects of a photolithographic mask

Also Published As

Publication number Publication date
US20200286707A1 (en) 2020-09-10
EP3685421A1 (en) 2020-07-29
TWI691804B (en) 2020-04-21
JP2022023964A (en) 2022-02-08
TW201921155A (en) 2019-06-01
US11798777B2 (en) 2023-10-24
JP7244606B2 (en) 2023-03-22
CN111213219B (en) 2023-03-10
TW202230428A (en) 2022-08-01
TW202046018A (en) 2020-12-16
WO2019057644A1 (en) 2019-03-28
JP6972312B2 (en) 2021-11-24
KR20200040290A (en) 2020-04-17
CN111213219A (en) 2020-05-29
JP2020534638A (en) 2020-11-26
TWI747213B (en) 2021-11-21
KR102378925B1 (en) 2022-03-25

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