GB0001330D0 - Method of,and apparatus for,depositing materials - Google Patents

Method of,and apparatus for,depositing materials

Info

Publication number
GB0001330D0
GB0001330D0 GB0001330A GB0001330A GB0001330D0 GB 0001330 D0 GB0001330 D0 GB 0001330D0 GB 0001330 A GB0001330 A GB 0001330A GB 0001330 A GB0001330 A GB 0001330A GB 0001330 D0 GB0001330 D0 GB 0001330D0
Authority
GB
United Kingdom
Prior art keywords
depositing materials
depositing
materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB0001330A
Other versions
GB2345919A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Marconi Caswell Ltd
Original Assignee
Marconi Caswell Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Marconi Caswell Ltd filed Critical Marconi Caswell Ltd
Publication of GB0001330D0 publication Critical patent/GB0001330D0/en
Publication of GB2345919A publication Critical patent/GB2345919A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02Pretreatment of the material to be coated
    • C23C16/0272Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C23C16/029Graded interfaces
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/027Graded interfaces
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/46Sputtering by ion beam produced by an external ion source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
GB0001330A 1999-01-20 2000-01-20 Depositing material Withdrawn GB2345919A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB9901093.6A GB9901093D0 (en) 1999-01-20 1999-01-20 Method of making coatings

Publications (2)

Publication Number Publication Date
GB0001330D0 true GB0001330D0 (en) 2000-03-08
GB2345919A GB2345919A (en) 2000-07-26

Family

ID=10846095

Family Applications (2)

Application Number Title Priority Date Filing Date
GBGB9901093.6A Ceased GB9901093D0 (en) 1999-01-20 1999-01-20 Method of making coatings
GB0001330A Withdrawn GB2345919A (en) 1999-01-20 2000-01-20 Depositing material

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GBGB9901093.6A Ceased GB9901093D0 (en) 1999-01-20 1999-01-20 Method of making coatings

Country Status (2)

Country Link
GB (2) GB9901093D0 (en)
WO (1) WO2000043564A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006024068A1 (en) * 2006-05-23 2007-11-29 Oerlikon Leybold Vacuum Gmbh coating plant

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1051393A (en) * 1964-08-28 1900-01-01
US3607697A (en) * 1968-04-18 1971-09-21 Sprague Electric Co Sputtering process for making a film of silica and silicon nitride
FR1594668A (en) * 1968-10-15 1970-06-08
CA1014889A (en) * 1974-12-06 1977-08-02 Bell-Northern Research Ltd. Sputtered dielectric thin films
US4142958A (en) * 1978-04-13 1979-03-06 Litton Systems, Inc. Method for fabricating multi-layer optical films
JPS57145982A (en) * 1981-03-03 1982-09-09 Toshiba Corp Target for sputtering device
GB2165266B (en) * 1982-10-12 1987-09-23 Nat Res Dev Infra red transparent optical components
CA1193227A (en) * 1982-11-18 1985-09-10 Kovilvila Ramachandran Magnetron sputtering apparatus
US4870322A (en) * 1986-04-15 1989-09-26 Hoya Corporation Electroluminescent panel having a layer of germanium nitride between an electroluminescent layer and a back electrode
US4793908A (en) * 1986-12-29 1988-12-27 Rockwell International Corporation Multiple ion source method and apparatus for fabricating multilayer optical films
GB2228948A (en) * 1989-02-28 1990-09-12 British Aerospace Fabrication of thin films from a composite target
US5330853A (en) * 1991-03-16 1994-07-19 Leybold Ag Multilayer Ti-Al-N coating for tools
JPH0565637A (en) * 1991-09-05 1993-03-19 Ricoh Co Ltd Ion beam sputtering device
GB9225270D0 (en) * 1992-12-03 1993-01-27 Gec Ferranti Defence Syst Depositing different materials on a substrate
CA2122932C (en) * 1993-05-06 1998-01-06 Thomas D. Rahmlow Jr. Rugate filter having suppressed harmonics
EP0623833B1 (en) * 1993-05-06 1997-08-13 Hughes Aircraft Company Broadband rugate filter
GB2310218B (en) * 1996-02-13 1999-12-22 Marconi Gec Ltd Coatings
EP0837491A3 (en) * 1996-10-21 2000-11-15 Nihon Shinku Gijutsu Kabushiki Kaisha Composite sputtering cathode assembly and sputtering apparatus with such composite sputtering cathode assembly
GB2321063A (en) * 1997-01-08 1998-07-15 Oxford Plasma Technology Ltd Reactive particle beam sputtering

Also Published As

Publication number Publication date
GB9901093D0 (en) 1999-03-10
GB2345919A (en) 2000-07-26
WO2000043564A1 (en) 2000-07-27

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)