GB0001330D0 - Method of,and apparatus for,depositing materials - Google Patents
Method of,and apparatus for,depositing materialsInfo
- Publication number
- GB0001330D0 GB0001330D0 GB0001330A GB0001330A GB0001330D0 GB 0001330 D0 GB0001330 D0 GB 0001330D0 GB 0001330 A GB0001330 A GB 0001330A GB 0001330 A GB0001330 A GB 0001330A GB 0001330 D0 GB0001330 D0 GB 0001330D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- depositing materials
- depositing
- materials
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
- C23C16/029—Graded interfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/027—Graded interfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB9901093.6A GB9901093D0 (en) | 1999-01-20 | 1999-01-20 | Method of making coatings |
Publications (2)
Publication Number | Publication Date |
---|---|
GB0001330D0 true GB0001330D0 (en) | 2000-03-08 |
GB2345919A GB2345919A (en) | 2000-07-26 |
Family
ID=10846095
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GBGB9901093.6A Ceased GB9901093D0 (en) | 1999-01-20 | 1999-01-20 | Method of making coatings |
GB0001330A Withdrawn GB2345919A (en) | 1999-01-20 | 2000-01-20 | Depositing material |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GBGB9901093.6A Ceased GB9901093D0 (en) | 1999-01-20 | 1999-01-20 | Method of making coatings |
Country Status (2)
Country | Link |
---|---|
GB (2) | GB9901093D0 (en) |
WO (1) | WO2000043564A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102006024068A1 (en) * | 2006-05-23 | 2007-11-29 | Oerlikon Leybold Vacuum Gmbh | coating plant |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1051393A (en) * | 1964-08-28 | 1900-01-01 | ||
US3607697A (en) * | 1968-04-18 | 1971-09-21 | Sprague Electric Co | Sputtering process for making a film of silica and silicon nitride |
FR1594668A (en) * | 1968-10-15 | 1970-06-08 | ||
CA1014889A (en) * | 1974-12-06 | 1977-08-02 | Bell-Northern Research Ltd. | Sputtered dielectric thin films |
US4142958A (en) * | 1978-04-13 | 1979-03-06 | Litton Systems, Inc. | Method for fabricating multi-layer optical films |
JPS57145982A (en) * | 1981-03-03 | 1982-09-09 | Toshiba Corp | Target for sputtering device |
GB2165266B (en) * | 1982-10-12 | 1987-09-23 | Nat Res Dev | Infra red transparent optical components |
CA1193227A (en) * | 1982-11-18 | 1985-09-10 | Kovilvila Ramachandran | Magnetron sputtering apparatus |
US4870322A (en) * | 1986-04-15 | 1989-09-26 | Hoya Corporation | Electroluminescent panel having a layer of germanium nitride between an electroluminescent layer and a back electrode |
US4793908A (en) * | 1986-12-29 | 1988-12-27 | Rockwell International Corporation | Multiple ion source method and apparatus for fabricating multilayer optical films |
GB2228948A (en) * | 1989-02-28 | 1990-09-12 | British Aerospace | Fabrication of thin films from a composite target |
US5330853A (en) * | 1991-03-16 | 1994-07-19 | Leybold Ag | Multilayer Ti-Al-N coating for tools |
JPH0565637A (en) * | 1991-09-05 | 1993-03-19 | Ricoh Co Ltd | Ion beam sputtering device |
GB9225270D0 (en) * | 1992-12-03 | 1993-01-27 | Gec Ferranti Defence Syst | Depositing different materials on a substrate |
CA2122932C (en) * | 1993-05-06 | 1998-01-06 | Thomas D. Rahmlow Jr. | Rugate filter having suppressed harmonics |
EP0623833B1 (en) * | 1993-05-06 | 1997-08-13 | Hughes Aircraft Company | Broadband rugate filter |
GB2310218B (en) * | 1996-02-13 | 1999-12-22 | Marconi Gec Ltd | Coatings |
EP0837491A3 (en) * | 1996-10-21 | 2000-11-15 | Nihon Shinku Gijutsu Kabushiki Kaisha | Composite sputtering cathode assembly and sputtering apparatus with such composite sputtering cathode assembly |
GB2321063A (en) * | 1997-01-08 | 1998-07-15 | Oxford Plasma Technology Ltd | Reactive particle beam sputtering |
-
1999
- 1999-01-20 GB GBGB9901093.6A patent/GB9901093D0/en not_active Ceased
-
2000
- 2000-01-20 GB GB0001330A patent/GB2345919A/en not_active Withdrawn
- 2000-01-20 WO PCT/GB2000/000147 patent/WO2000043564A1/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
GB9901093D0 (en) | 1999-03-10 |
GB2345919A (en) | 2000-07-26 |
WO2000043564A1 (en) | 2000-07-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |