FR2513273B1 - Procede et appareil d'electro-deposition d'un metal sur une piece par utilisation d'un faisceau laser ou un faisceau lumineux thermique analogue - Google Patents

Procede et appareil d'electro-deposition d'un metal sur une piece par utilisation d'un faisceau laser ou un faisceau lumineux thermique analogue

Info

Publication number
FR2513273B1
FR2513273B1 FR828212947A FR8212947A FR2513273B1 FR 2513273 B1 FR2513273 B1 FR 2513273B1 FR 828212947 A FR828212947 A FR 828212947A FR 8212947 A FR8212947 A FR 8212947A FR 2513273 B1 FR2513273 B1 FR 2513273B1
Authority
FR
France
Prior art keywords
electro
workpiece
deposition
metal
laser beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR828212947A
Other languages
English (en)
Other versions
FR2513273A1 (fr
Inventor
Kiyoshi Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Inoue Japax Research Inc
Original Assignee
Inoue Japax Research Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP11536981A external-priority patent/JPS5819488A/ja
Priority claimed from JP12774281A external-priority patent/JPS5831092A/ja
Priority claimed from JP5649482A external-priority patent/JPS58174598A/ja
Application filed by Inoue Japax Research Inc filed Critical Inoue Japax Research Inc
Publication of FR2513273A1 publication Critical patent/FR2513273A1/fr
Application granted granted Critical
Publication of FR2513273B1 publication Critical patent/FR2513273B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C25D5/024—Electroplating of selected surface areas using locally applied electromagnetic radiation, e.g. lasers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern
    • H05K3/241—Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern
    • H05K3/243—Reinforcing the conductive pattern characterised by selective plating, e.g. for finish plating of pads

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Laser Beam Processing (AREA)
FR828212947A 1981-07-24 1982-07-23 Procede et appareil d'electro-deposition d'un metal sur une piece par utilisation d'un faisceau laser ou un faisceau lumineux thermique analogue Expired - Fee Related FR2513273B1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP11536981A JPS5819488A (ja) 1981-07-24 1981-07-24 メツキ装置
JP12774281A JPS5831092A (ja) 1981-08-17 1981-08-17 電鋳装置
JP5649482A JPS58174598A (ja) 1982-04-07 1982-04-07 複合メツキ装置

Publications (2)

Publication Number Publication Date
FR2513273A1 FR2513273A1 (fr) 1983-03-25
FR2513273B1 true FR2513273B1 (fr) 1990-02-09

Family

ID=27295938

Family Applications (1)

Application Number Title Priority Date Filing Date
FR828212947A Expired - Fee Related FR2513273B1 (fr) 1981-07-24 1982-07-23 Procede et appareil d'electro-deposition d'un metal sur une piece par utilisation d'un faisceau laser ou un faisceau lumineux thermique analogue

Country Status (5)

Country Link
US (1) US4430165A (fr)
DE (1) DE3227878A1 (fr)
FR (1) FR2513273B1 (fr)
GB (1) GB2106542B (fr)
IT (1) IT1148391B (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4519876A (en) * 1984-06-28 1985-05-28 Thermo Electron Corporation Electrolytic deposition of metals on laser-conditioned surfaces
GB2188774B (en) * 1986-04-02 1990-10-31 Westinghouse Electric Corp Method of forming a conductive pattern on a semiconductor surface
JP2896726B2 (ja) * 1992-03-30 1999-05-31 セイコーインスツルメンツ株式会社 微細加工装置
US5595637A (en) * 1995-11-17 1997-01-21 Rockwell International Corporation Photoelectrochemical fabrication of electronic circuits
US8246808B2 (en) * 2008-08-08 2012-08-21 GM Global Technology Operations LLC Selective electrochemical deposition of conductive coatings on fuel cell bipolar plates
CN101864587B (zh) * 2009-04-20 2013-08-21 鸿富锦精密工业（深圳）有限公司 纳米级金属粒子/金属复合镀层的形成装置及形成方法
US8764515B2 (en) * 2012-05-14 2014-07-01 United Technologies Corporation Component machining method and assembly
US10242789B2 (en) * 2015-06-16 2019-03-26 Murata Manufacturing Co., Ltd. Method for manufacturing ceramic electronic component, and ceramic electronic component
CN109735883B (zh) * 2019-02-20 2021-02-12 江苏大学 一种激光辅助柔性随动式工具电极微细电沉积的装置及方法
CN112899740B (zh) * 2019-11-15 2022-04-19 源秩科技（上海）有限公司 基于电化学的加工装置和方法
CN112126955B (zh) * 2020-08-18 2021-08-03 江苏大学 一种膛线式空心旋转电极的激光电化学复合沉积的方法及装置
CN112176383B (zh) * 2020-08-18 2022-01-11 江苏大学 一种利用激光电沉积复合加工的装置及方法
CN113897654B (zh) * 2021-11-11 2023-03-28 浙江工业大学 一种同轴式激光辅助微弧氧化装置及方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB847927A (en) * 1955-10-11 1960-09-14 Philco Corp A method and apparatus for the electrolytic treatment of semiconductive bodies
US4217183A (en) * 1979-05-08 1980-08-12 International Business Machines Corporation Method for locally enhancing electroplating rates

Also Published As

Publication number Publication date
FR2513273A1 (fr) 1983-03-25
DE3227878A1 (de) 1983-02-10
DE3227878C2 (fr) 1990-03-01
IT1148391B (it) 1986-12-03
GB2106542A (en) 1983-04-13
GB2106542B (en) 1985-10-09
IT8248887A0 (it) 1982-07-26
US4430165A (en) 1984-02-07

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Legal Events

Date Code Title Description
ST Notification of lapse