DE60036851D1 - Entsprechende verfahren und vorrichtungen zum schleifen und läppen gleichzeitig von doppelseitigen oberflächen - Google Patents
Entsprechende verfahren und vorrichtungen zum schleifen und läppen gleichzeitig von doppelseitigen oberflächenInfo
- Publication number
- DE60036851D1 DE60036851D1 DE60036851T DE60036851T DE60036851D1 DE 60036851 D1 DE60036851 D1 DE 60036851D1 DE 60036851 T DE60036851 T DE 60036851T DE 60036851 T DE60036851 T DE 60036851T DE 60036851 D1 DE60036851 D1 DE 60036851D1
- Authority
- DE
- Germany
- Prior art keywords
- lapping
- grinding
- double
- same time
- corresponding methods
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/08—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0076—Other grinding machines or devices grinding machines comprising two or more grinding tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
- B24B41/061—Work supports, e.g. adjustable steadies axially supporting turning workpieces, e.g. magnetically, pneumatically
- B24B41/062—Work supports, e.g. adjustable steadies axially supporting turning workpieces, e.g. magnetically, pneumatically between centres; Dogs
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
- B24B49/04—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent involving measurement of the workpiece at the place of grinding during grinding operation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/10—Single-purpose machines or devices
- B24B7/16—Single-purpose machines or devices for grinding end-faces, e.g. of gauges, rollers, nuts, piston rings
- B24B7/17—Single-purpose machines or devices for grinding end-faces, e.g. of gauges, rollers, nuts, piston rings for simultaneously grinding opposite and parallel end faces, e.g. double disc grinders
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12660399 | 1999-05-07 | ||
JP12660399 | 1999-05-07 | ||
JP35299199 | 1999-12-13 | ||
JP35299199 | 1999-12-13 | ||
PCT/JP2000/002788 WO2000067950A1 (fr) | 1999-05-07 | 2000-04-27 | Procedes et dispositifs correspondants permettant de meuler et de roder des surfaces doubles simultanement |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60036851D1 true DE60036851D1 (de) | 2007-12-06 |
DE60036851T2 DE60036851T2 (de) | 2008-08-07 |
Family
ID=26462773
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60036851T Expired - Lifetime DE60036851T2 (de) | 1999-05-07 | 2000-04-27 | Entsprechende verfahren und vorrichtungen zum schleifen und läppen gleichzeitig von doppelseitigen oberflächen |
Country Status (6)
Country | Link |
---|---|
US (1) | US6652358B1 (de) |
EP (1) | EP1118429B1 (de) |
JP (1) | JP3969956B2 (de) |
KR (1) | KR100642879B1 (de) |
DE (1) | DE60036851T2 (de) |
WO (1) | WO2000067950A1 (de) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4795529B2 (ja) * | 2000-12-07 | 2011-10-19 | 株式会社東芝 | セラミック基板、薄膜回路基板およびセラミック基板の製造方法 |
DE60231566D1 (de) * | 2002-10-09 | 2009-04-23 | Koyo Machine Ind Co Ltd | Beidseitiges schleifverfahren und beidseitige schleifmaschine für ein dünnes plattenähnliches arbeitsstück |
JP3993856B2 (ja) * | 2004-01-22 | 2007-10-17 | 光洋機械工業株式会社 | 両頭平面研削装置 |
WO2005095054A1 (en) * | 2004-03-19 | 2005-10-13 | Memc Electronic Materials, Inc. | Wafer clamping device for a double side grinder |
JP4764693B2 (ja) * | 2005-09-29 | 2011-09-07 | 信越半導体株式会社 | 半導体ウェーハの製造方法及び両頭研削装置 |
JP4670566B2 (ja) * | 2005-09-29 | 2011-04-13 | 信越半導体株式会社 | 半導体ウェーハの両頭研削装置、静圧パッドおよびこれを用いた両頭研削方法 |
JP4752475B2 (ja) | 2005-12-08 | 2011-08-17 | 信越半導体株式会社 | 半導体ウェーハの両頭研削装置、静圧パッドおよびこれを用いた両頭研削方法 |
US7662023B2 (en) * | 2006-01-30 | 2010-02-16 | Memc Electronic Materials, Inc. | Double side wafer grinder and methods for assessing workpiece nanotopology |
US7930058B2 (en) | 2006-01-30 | 2011-04-19 | Memc Electronic Materials, Inc. | Nanotopography control and optimization using feedback from warp data |
US7601049B2 (en) | 2006-01-30 | 2009-10-13 | Memc Electronic Materials, Inc. | Double side wafer grinder and methods for assessing workpiece nanotopology |
DE102006037490B4 (de) * | 2006-08-10 | 2011-04-07 | Peter Wolters Gmbh | Doppelseiten-Bearbeitungsmaschine |
WO2008102938A1 (en) * | 2007-02-22 | 2008-08-28 | Hana Silicon, Inc. | Method for manufacturing silicon matter for plasma processing apparatus |
JP4414449B2 (ja) * | 2007-06-11 | 2010-02-10 | 光洋機械工業株式会社 | 平面研削盤、スピンドル装置及び平面研削方法 |
DE102007049810B4 (de) | 2007-10-17 | 2012-03-22 | Siltronic Ag | Simultanes Doppelseitenschleifen von Halbleiterscheiben |
JP4985451B2 (ja) | 2008-02-14 | 2012-07-25 | 信越半導体株式会社 | ワークの両頭研削装置およびワークの両頭研削方法 |
JP5463570B2 (ja) | 2008-10-31 | 2014-04-09 | Sumco Techxiv株式会社 | ウェハ用両頭研削装置および両頭研削方法 |
DE102009024125B4 (de) * | 2009-06-06 | 2023-07-27 | Lapmaster Wolters Gmbh | Verfahren zum Bearbeiten von flachen Werkstücken |
DE102010005032B4 (de) * | 2010-01-15 | 2012-03-29 | Peter Wolters Gmbh | Vorrichtung und Verfahren zur Bestimmung der Position einer Arbeitsfläche einer Arbeitsscheibe |
US8712575B2 (en) * | 2010-03-26 | 2014-04-29 | Memc Electronic Materials, Inc. | Hydrostatic pad pressure modulation in a simultaneous double side wafer grinder |
US20130144421A1 (en) * | 2011-12-01 | 2013-06-06 | Memc Electronic Materials, Spa | Systems For Controlling Temperature Of Bearings In A Wire Saw |
CN102513894A (zh) * | 2011-12-06 | 2012-06-27 | 瓦房店冶矿轴承制造有限公司 | 一种调心滚子双端面磨削方法 |
KR101597209B1 (ko) * | 2014-07-30 | 2016-02-24 | 주식회사 엘지실트론 | 웨이퍼 연마 장치 |
DE102018202059A1 (de) * | 2018-02-09 | 2019-08-14 | Siltronic Ag | Verfahren zum Polieren einer Halbleiterscheibe |
JP7120958B2 (ja) * | 2019-04-19 | 2022-08-17 | ファナック株式会社 | ドレッシング推定装置、及び制御装置 |
CN110509134B (zh) * | 2019-09-12 | 2021-04-09 | 西安奕斯伟硅片技术有限公司 | 一种晶圆研磨装置 |
KR102565604B1 (ko) | 2021-07-06 | 2023-08-09 | 서철 | 리니어 블록 연삭 방법 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5878236A (ja) | 1981-11-04 | 1983-05-11 | Mitsubishi Electric Corp | マイクロコンピユ−タの制御装置 |
JPS6078236U (ja) * | 1983-10-31 | 1985-05-31 | 日立造船株式会社 | 円盤状工作物の回転用保持装置 |
JP3138205B2 (ja) | 1996-03-27 | 2001-02-26 | 株式会社不二越 | 高脆性材の両面研削装置 |
JPH09272049A (ja) * | 1996-04-05 | 1997-10-21 | Kobe Steel Ltd | 工作物の両頭平面研削方法およびその両頭平面研削盤 |
JPH10543A (ja) | 1996-06-12 | 1998-01-06 | Daikin Ind Ltd | 両頭平面研削装置 |
US5989108A (en) | 1996-09-09 | 1999-11-23 | Koyo Machine Industries Co., Ltd. | Double side grinding apparatus for flat disklike work |
JP3230149B2 (ja) * | 1997-02-07 | 2001-11-19 | 光洋機械工業株式会社 | 薄板円板状ワークの両面研削装置 |
JPH10217074A (ja) * | 1997-02-06 | 1998-08-18 | Toyo A Tec Kk | 平面研削方法及び装置 |
JPH1177497A (ja) * | 1997-09-01 | 1999-03-23 | Waida Seisakusho:Kk | 半導体ウエハの両面研削方法及び両面研削装置 |
JPH1190801A (ja) | 1997-09-19 | 1999-04-06 | Toyo Advanced Technologies Co Ltd | ウェハの両面加工方法及び装置 |
-
2000
- 2000-04-27 KR KR1020017000290A patent/KR100642879B1/ko active IP Right Grant
- 2000-04-27 DE DE60036851T patent/DE60036851T2/de not_active Expired - Lifetime
- 2000-04-27 JP JP2000616963A patent/JP3969956B2/ja not_active Expired - Lifetime
- 2000-04-27 US US09/720,688 patent/US6652358B1/en not_active Expired - Lifetime
- 2000-04-27 WO PCT/JP2000/002788 patent/WO2000067950A1/ja active IP Right Grant
- 2000-04-27 EP EP00921070A patent/EP1118429B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE60036851T2 (de) | 2008-08-07 |
JP3969956B2 (ja) | 2007-09-05 |
EP1118429A4 (de) | 2002-07-31 |
EP1118429A1 (de) | 2001-07-25 |
EP1118429B1 (de) | 2007-10-24 |
US6652358B1 (en) | 2003-11-25 |
WO2000067950A1 (fr) | 2000-11-16 |
KR20010053432A (ko) | 2001-06-25 |
KR100642879B1 (ko) | 2006-11-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8381 | Inventor (new situation) |
Inventor name: IKEDA, SHUNICHI, NISHISHIRAKAWA-GUN FUKUSHIMA , JP Inventor name: OKUNI, SADAYUKI, NISHISHIRAKAWA-GUN FUKUSHIMA , JP Inventor name: KATO, TADAHIRO, NISHISHIRAKAWA-GUN FUKUSHIMA 9, JP |
|
8364 | No opposition during term of opposition |