DE59700621D1 - Process for material-removing processing of the edge of a semiconductor wafer - Google Patents

Process for material-removing processing of the edge of a semiconductor wafer

Info

Publication number
DE59700621D1
DE59700621D1 DE59700621T DE59700621T DE59700621D1 DE 59700621 D1 DE59700621 D1 DE 59700621D1 DE 59700621 T DE59700621 T DE 59700621T DE 59700621 T DE59700621 T DE 59700621T DE 59700621 D1 DE59700621 D1 DE 59700621D1
Authority
DE
Germany
Prior art keywords
edge
semiconductor wafer
removing processing
processing
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE59700621T
Other languages
German (de)
Inventor
Alexander Rieger
Simon Ehrenschwendtner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siltronic AG
Original Assignee
Wacker Siltronic AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wacker Siltronic AG filed Critical Wacker Siltronic AG
Application granted granted Critical
Publication of DE59700621D1 publication Critical patent/DE59700621D1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321After treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/0076Other grinding machines or devices grinding machines comprising two or more grinding tools
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B24B1/04Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes subjecting the grinding or polishing tools, the abrading or polishing medium or work to vibration, e.g. grinding with ultrasonic frequency
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/02Lapping machines or devices; Accessories designed for working surfaces of revolution
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/065Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of thin, brittle parts, e.g. semiconductors, wafers

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
DE59700621T 1996-09-05 1997-09-04 Process for material-removing processing of the edge of a semiconductor wafer Expired - Lifetime DE59700621D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19636055A DE19636055A1 (en) 1996-09-05 1996-09-05 Edge material removing machining method for semiconductor wafer

Publications (1)

Publication Number Publication Date
DE59700621D1 true DE59700621D1 (en) 1999-12-02

Family

ID=7804717

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19636055A Withdrawn DE19636055A1 (en) 1996-09-05 1996-09-05 Edge material removing machining method for semiconductor wafer
DE59700621T Expired - Lifetime DE59700621D1 (en) 1996-09-05 1997-09-04 Process for material-removing processing of the edge of a semiconductor wafer

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE19636055A Withdrawn DE19636055A1 (en) 1996-09-05 1996-09-05 Edge material removing machining method for semiconductor wafer

Country Status (6)

Country Link
US (1) US6045436A (en)
EP (1) EP0881035B1 (en)
JP (1) JP2900253B2 (en)
KR (1) KR100273960B1 (en)
DE (2) DE19636055A1 (en)
TW (1) TW352354B (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11320363A (en) * 1998-05-18 1999-11-24 Tokyo Seimitsu Co Ltd Wafer chamferring device
DE19841492A1 (en) * 1998-09-10 2000-03-23 Wacker Siltronic Halbleitermat Method and device for separating a large number of disks from a brittle hard workpiece
DE19928949A1 (en) * 1999-06-24 2001-01-04 Wacker Siltronic Halbleitermat Production of a semiconductor wafer used as the base material for a semiconductor component comprises removing the semiconductor from a single crystal, processing by ductile chip removal, and polishing and cleaning the surface
JP3510584B2 (en) * 2000-11-07 2004-03-29 スピードファム株式会社 Peripheral polishing device for disk-shaped workpiece
US20020058466A1 (en) * 2000-11-13 2002-05-16 Curran David M. Method and system for reducing thickness of spin-on glass on semiconductor wafers
US6860795B2 (en) * 2001-09-17 2005-03-01 Hitachi Global Storage Technologies Netherlands B.V. Edge finishing process for glass or ceramic disks used in disk drive data storage devices
DE10147646C1 (en) * 2001-09-27 2002-12-19 Wacker Siltronic Halbleitermat Machining method for semiconductor disc edge calculates displacement rate for semiconductor disc by comparing overall material volume to be removed with volume removed per unit of time
US20070298240A1 (en) * 2006-06-22 2007-12-27 Gobena Feben T Compressible abrasive article
US9676114B2 (en) * 2012-02-29 2017-06-13 Taiwan Semiconductor Manufacturing Company, Ltd. Wafer edge trim blade with slots
KR101414204B1 (en) * 2013-01-30 2014-07-01 주식회사 엘지실트론 Apparatus and method for grinding wafer edge
JP2014226767A (en) * 2013-05-27 2014-12-08 株式会社東京精密 Wafer chamfer device and wafer chamfer method
JP7222636B2 (en) * 2018-09-12 2023-02-15 株式会社ディスコ Edge trimming device
CN110605629B (en) * 2019-09-19 2022-11-18 西安奕斯伟材料科技有限公司 Grinding device
CN114643519B (en) * 2022-03-26 2022-12-09 浙江金连接科技股份有限公司 Palladium alloy sleeve barrel for semiconductor chip test probe and processing equipment thereof

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60104644A (en) * 1983-11-08 1985-06-10 Mitsubishi Metal Corp Device for grinding and chamfering outer periphery of wafer
JPH0637025B2 (en) * 1987-09-14 1994-05-18 スピードファム株式会社 Wafer mirror surface processing equipment
KR0185234B1 (en) * 1991-11-28 1999-04-15 가부시키 가이샤 토쿄 세이미쯔 Method of chamfering semiconductor wafer
JP2628424B2 (en) * 1992-01-24 1997-07-09 信越半導体株式会社 Polishing method and apparatus for wafer chamfer
JPH07205001A (en) * 1993-11-16 1995-08-08 Tokyo Seimitsu Co Ltd Wafer chamfering machine
US5595522A (en) * 1994-01-04 1997-01-21 Texas Instruments Incorporated Semiconductor wafer edge polishing system and method
JP3010572B2 (en) * 1994-09-29 2000-02-21 株式会社東京精密 Wafer edge processing equipment
US5816897A (en) * 1996-09-16 1998-10-06 Corning Incorporated Method and apparatus for edge finishing glass
US5725414A (en) * 1996-12-30 1998-03-10 Intel Corporation Apparatus for cleaning the side-edge and top-edge of a semiconductor wafer

Also Published As

Publication number Publication date
EP0881035B1 (en) 1999-10-27
JP2900253B2 (en) 1999-06-02
KR100273960B1 (en) 2001-01-15
US6045436A (en) 2000-04-04
DE19636055A1 (en) 1998-03-12
JPH1080849A (en) 1998-03-31
EP0881035A1 (en) 1998-12-02
KR19980024185A (en) 1998-07-06
TW352354B (en) 1999-02-11

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: WACKER SILTRONIC AG, 84489 BURGHAUSEN, DE

8327 Change in the person/name/address of the patent owner

Owner name: SILTRONIC AG, 81737 MUENCHEN, DE