CN209746352U - Baffle mechanism for photoetching chip carrier tape - Google Patents
Baffle mechanism for photoetching chip carrier tape Download PDFInfo
- Publication number
- CN209746352U CN209746352U CN201920854910.4U CN201920854910U CN209746352U CN 209746352 U CN209746352 U CN 209746352U CN 201920854910 U CN201920854910 U CN 201920854910U CN 209746352 U CN209746352 U CN 209746352U
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- baffle
- baffle mechanism
- chip carrier
- compression roller
- photoetching
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Abstract
The utility model provides a chip carrier band is baffle mechanism for photoetching, include blowing frame, baffle mechanism, receive work or material rest and compression roller, blowing frame, baffle mechanism, receive work or material rest and compression roller setting at the photoetching under-deck, the compression roller both ends are rotated with photoetching under-deck inner wall and are connected, baffle mechanism is located blowing frame and is received between the work or material rest, baffle mechanism respectively has a compression roller, two at both ends about, carrier band between the compression roller is pasted on baffle mechanism and is rotated along with baffle mechanism. The utility model discloses simple structure through the blowing frame blowing, carries out the photoetching by baffle mechanism and compression roller again, receives the material by receiving the work or material rest at last, has accomplished the photoetching process of carrier band, easily realizes that machining efficiency is high, can realize continuous production.
Description
Technical Field
The utility model relates to a baffle technical field especially relates to chip carrier band is baffle technical field for photoetching.
Background
The chip carrier tape is usually required to be subjected to photoetching treatment during processing of the product, the raw material is generally a tape material, and a baffle mechanism is required to be provided for blocking a light source groove in order to improve the photoetching efficiency and the photoetching effect.
For example, chinese patent "CN 205450560U" discloses a sub-area exposure apparatus suitable for a contact lithography machine, which is characterized in that the sub-area exposure apparatus suitable for the contact lithography machine comprises: the first sliding chute guide rail group, the second sliding chute guide rail group, the first baffle and the second baffle; the first sliding chute guide rail group comprises a pair of first sliding chute guide rails which are distributed in parallel at intervals; the first sliding chute guide rail comprises a first guide rail body and a first sliding chute arranged on the first guide rail body; the first chute is positioned at the inner side of the first chute guide rail; the first baffle is positioned between the first chute guide rails, and two ends of the first baffle are respectively positioned in the first chutes on the two first chute guide rails and can slide along the length direction of the first chutes; the second chute guide rail group comprises a pair of second chute guide rails which are arranged in parallel at intervals; the second chute guide rail crosses the first chute guide rail group and is fixed on the surface of the first chute guide rail, and the second chute guide rail is vertical to the first chute guide rail; the second sliding chute guide rail comprises a second guide rail body and a second sliding chute arranged on the second guide rail body; the second chute is positioned at the inner side of the second chute guide rail; the second baffle is located between the second chute guide rails, and two ends of the second baffle are respectively located in the second chutes on the two second chute guide rails and can slide along the length direction of the second slide way. According to the technical scheme, the flat-plate-shaped baffle is adopted for photoetching blocking, the strip needs to be blocked by the baffle moving back and forth on the chute guide rail, the strip is easy to be etched or etched repeatedly, the processing efficiency is low, and continuous production cannot be realized.
Disclosure of Invention
for the easy hourglass that exists among the overcome prior art is carved or is carved repeatedly, and machining efficiency is lower, problem that can not continuous production, the utility model provides a chip carrier band is baffle mechanism for photoetching.
The utility model discloses a following technical scheme realizes above-mentioned purpose: the utility model provides a chip carrier band is baffle mechanism for photoetching, includes blowing frame, baffle mechanism, receives work or material rest and compression roller, blowing frame, baffle mechanism, receive work or material rest and compression roller setting are in the photoetching cabin, the compression roller both ends are rotated with photoetching cabin inner wall and are connected, baffle mechanism is located between blowing frame and the material rest, the left and right sides both ends of baffle mechanism respectively have a compression roller, two carrier band between the compression roller pastes on baffle mechanism and rotates along with baffle mechanism.
On this basis, baffle mechanism includes humanoid support, bracing piece, cylindric baffle and bearing, humanoid support quantity is 2, respectively in the both ends fixed connection of bracing piece, the cylindric baffle cover is established in the bracing piece outside, the cylindric baffle is coaxial arrangement with the bracing piece, the bottom surface and the bracing piece of cylindric baffle pass through the bearing and rotate and be connected.
On the basis, the outer diameter of the cylindrical baffle is provided with a special-shaped light hole.
on the basis, the baffle mechanism further comprises a motor and a driving ring, the driving ring and the cylindrical baffle are coaxially arranged, one end face of the driving ring is fixedly connected with one bottom face of the cylindrical baffle, inner teeth are arranged on the inner wall of the driving ring, the motor body is fixed on the humanoid support, outer teeth are arranged on the output end of the motor, and the outer teeth are meshed with the inner teeth on the inner wall of the driving ring.
On the basis, the baffle mechanism is further provided with a light source groove, the light source groove is formed in the lower portion of the supporting rod, and the length of the light source groove in the axial direction of the supporting rod is larger than or equal to the width of the carrier tape.
On the basis, an ultraviolet light source is arranged in the light source groove.
On this basis, baffle mechanism still includes the housing, the housing setting is in cylindric baffle top to with humanoid support fixed connection.
On the basis, the housing is of a cylindrical structure with the bottom surface radius included angle of 60-90 degrees.
On this basis, baffle mechanism still includes elevating gear, elevating gear quantity is 2, elevating gear is located humanoid support below.
On this basis, the lifting device is a hydraulic lifting device.
Compared with the prior art, the beneficial effects of the utility model are that:
The utility model has simple structure, discharges materials through the discharging frame, carries out photoetching through the baffle mechanism and the compression roller, receives materials through the receiving frame, completes the photoetching process of the carrier band, is easy to realize, has high processing efficiency and can realize continuous production;
The utility model sets the baffle in the baffle mechanism as the cylindrical baffle, the carrier band moves along the outer surface of the cylindrical baffle under the action of the compression roller, the cylindrical baffle rotates circularly to complete the blocking function, and the influence of position deviation caused by the movement of the baffle on the photoetching effect is avoided;
The utility model sets the supporting rod and the cylindrical baffle plate as the same axis, and sets the light source groove at the lower part of the supporting rod, so that the distance from the light to the carrier band is equal, and the light is all vertical to the carrier band, thereby improving the photoetching effect;
The utility model discloses a set up elevating gear at humanoid support lower surface, be convenient for debug the distance between compression roller and the cylindric baffle, make things convenient for personnel to operate, improve and use the convenience;
The utility model drives the cylindrical baffle to rotate by matching the motor and the driving ring, reduces friction through the bearing, and has simple structure and easy maintenance;
The utility model discloses a set up the housing above the cylindric baffle, avoided light to spill over on the one hand, on the other hand has avoided having the dust to fall down and has influenced the photoetching quality.
Drawings
Fig. 1 is a schematic structural diagram of the present invention;
FIG. 2 is a cross-sectional view of the baffle mechanism of the present invention;
In the figure: 1. the device comprises a material placing frame 2, a baffle mechanism 3, a material collecting frame 4, a press roller 21, a human-shaped support frame 22, a support rod 23, a motor 24, a drive ring 25, a cylindrical baffle 26, a housing 27, a bearing 28, a light source groove 29 and a lifting device.
Detailed Description
the present invention will be described in further detail with reference to the accompanying drawings and examples. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the invention.
As shown in fig. 1-2, the utility model discloses the schematic shows a chip carrier band is baffle mechanism for photoetching, including blowing frame 1, baffle mechanism 2, receive material frame 3 and compression roller 4, blowing frame 1, baffle mechanism 2, receive material frame 3 and compression roller 4 setting at the photoetching under-deck, 4 both ends of compression roller are rotated with the photoetching under-deck inner wall and are connected, baffle mechanism 2 is located blowing frame 1 and receives between the material frame 3, baffle mechanism 2 respectively has a compression roller 4, two in both ends about respectively there is a compression roller 4 the carrier band between the compression roller 4 pastes on baffle mechanism 2 and along with baffle mechanism 2 rotates. The carrier band twines on blowing frame 1, by blowing frame 1 blowing, carries out the photoetching through baffle mechanism 2 and compression roller 4, receives the material by receiving material frame 3 at last, accomplishes the photoetching process of carrier band, simple structure easily realizes.
as shown in fig. 2, as the preferred embodiment of the present invention, baffle mechanism 2 includes humanoid support 21, bracing piece 22, cylindric baffle 25 and bearing 27, humanoid support 21 quantity is 2, respectively in the both ends fixed connection of bracing piece 22, cylindric baffle 25 cover is established in the bracing piece 22 outside, cylindric baffle 25 is coaxial arrangement with bracing piece 22, cylindric baffle 25's bottom surface and bracing piece 22 pass through bearing 27 and rotate and be connected. The support rod 22 is rotatably connected with the cylindrical baffle 25 through a bearing 27, so that friction is small, rotation is more convenient, and furthermore, the outer diameter of the cylindrical baffle 25 is provided with a special-shaped light hole. Different patterns can be photoetched according to different arrangement of the special-shaped light holes.
As a preferred embodiment of the present invention, the baffle mechanism 2 further includes a motor 23 and a driving ring 24, the driving ring 24 and the cylindrical baffle 25 are coaxially arranged, a bottom surface fixed connection of a terminal surface of the driving ring 24 and the cylindrical baffle 25, inner teeth are provided on an inner wall of the driving ring 24, a main body of the motor 23 is fixed on the humanoid support 21, outer teeth are provided on an output end of the motor 23, and the outer teeth are engaged with the inner teeth on the inner wall of the driving ring 24. The supporting rod 22, the cylindrical baffle 25 and the driving ring 24 are all arranged on the same axis, so that the transmission is more stable, and the rotational deviation of the cylindrical baffle 25 is avoided. The surface linear velocity of the compression roller 4 is the same as that of the cylindrical baffle 25, so that the carrier tape can not move relatively on the cylindrical baffle 25, and further missing carving or repeated carving can be avoided.
As a preferred embodiment of the present invention, the baffle mechanism 2 is further provided with a light source groove 28, the light source groove 28 is provided at the lower portion of the support rod 22, and the length of the light source groove 28 along the axial direction of the support rod 22 is greater than or equal to the width of the carrier tape. Further, an ultraviolet light source is installed in the light source groove 28. The light source shines from baffle mechanism 2 inside, and the distance that light reaches the carrier band equals, and light all is perpendicular to carrier band, and then has improved the photoetching effect.
as a preferred embodiment of the present invention, the baffle mechanism 2 further comprises a housing 26, wherein the housing 26 is disposed above the cylindrical baffle 25 and is fixedly connected to the human-shaped support 21. Further, the housing 26 is a cylindrical structure with a bottom radius included angle of 60 ° to 90 °. The housing 26 is arranged above the cylindrical baffle 25, so that on one hand, light inside the cylindrical baffle 25 is prevented from overflowing, and on the other hand, dust is prevented from falling to influence the photoetching quality.
As a preferred embodiment of the present invention, the baffle mechanism 2 further comprises a lifting device 29, the number of the lifting devices 29 is 2, and the lifting device 29 is located below the human-shaped support 21. Further, the lifting device 29 is a hydraulic lifting device. Elevating gear 29 can debug the distance between compression roller 4 and cylindric baffle 25, makes things convenient for personnel to operate, improves the convenience of use.
The utility model discloses a theory of operation is:
The carrier band is placed on blowing frame 1, and blowing frame 1 rotates the blowing, and the carrier band passes between compression roller 4 and cylindric baffle 25, pastes at cylindric baffle 25 lower surface, and motor 23 passes through drive ring 24 and rotates in dong cylindric baffle 25, then passes between another compression roller 4 and cylindric baffle 25, and the light source is opened simultaneously, and the light source carries out the photoetching to the carrier band of pasting at cylindric baffle 25 lower surface, and the carrier band is connected and is received material on receiving frame 2 at last.
The utility model has simple structure, discharges materials through the material discharge frame 1, carries out photoetching through the baffle mechanism 2 and the compression roller 4, and finally receives materials through the material receiving frame 3, thereby completing the photoetching process of the carrier band, being easy to realize, having high processing efficiency and realizing continuous production;
the utility model sets the baffle in the baffle mechanism 2 as the cylindrical baffle 25, the carrier tape moves along the outer surface of the cylindrical baffle 25 under the action of the compression roller 4, the cylindrical baffle 25 rotates circularly to complete the blocking function, and the influence of position deviation caused by the movement of the baffle on the photoetching effect is avoided;
The utility model sets the supporting rod 22 and the cylindrical baffle 25 as the same axis, and sets the light source groove 28 at the lower part of the supporting rod 22, so that the distance from the light to the carrier band is equal, and the light is vertical to the carrier band, thereby improving the photoetching effect;
the lifting device 29 is arranged on the lower surface of the humanoid support 21, so that the distance between the compression roller 4 and the cylindrical baffle 25 can be conveniently adjusted, the operation of personnel is facilitated, and the use convenience is improved;
The utility model drives the cylindrical baffle 25 to rotate by using the matching of the motor 23 and the driving ring 24, reduces friction through the bearing 27, and has simple structure and easy maintenance;
The utility model discloses a set up housing 26 above cylindric baffle 25, avoided light to spill over on the one hand, on the other hand has avoided having the dust to fall down and has influenced the photoetching quality.
While the foregoing description shows and describes the preferred embodiments of the present invention, it is to be understood that the invention is not limited to the forms disclosed herein, but is not intended to be exhaustive or to exclude other embodiments and may be used in various other combinations, modifications, and environments and is capable of changes within the scope of the inventive concept as expressed herein, commensurate with the above teachings, or the skill or knowledge of the relevant art. But that modifications and variations may be effected by those skilled in the art without departing from the spirit and scope of the invention, which is to be limited only by the claims appended hereto.
Claims (10)
1. The utility model provides a chip carrier band is baffle mechanism for photoetching which characterized in that: including blowing frame (1), baffle mechanism (2), receipts work or material rest (3) and compression roller (4), blowing frame (1), baffle mechanism (2), receipts work or material rest (3) and compression roller (4) set up in the photoetching cabin, compression roller (4) both ends are rotated with photoetching cabin inner wall and are connected, baffle mechanism (2) are located blowing frame (1) and receive between work or material rest (3), each has one compression roller (4), two in both ends about baffle mechanism (2) the carrier band between compression roller (4) is pasted on baffle mechanism (2) and is rotated along with baffle mechanism (2).
2. the shutter mechanism for lithography of chip carrier tapes according to claim 1, wherein: baffle mechanism (2) are including humanoid support (21), bracing piece (22), cylindric baffle (25) and bearing (27), humanoid support (21) quantity is 2, respectively in the both ends fixed connection of bracing piece (22), cylindric baffle (25) cover is established in the bracing piece (22) outside, cylindric baffle (25) are coaxial with bracing piece (22) and arrange, the bottom surface and the bracing piece (22) of cylindric baffle (25) rotate through bearing (27) and are connected.
3. the shutter mechanism for lithography of chip carrier tapes according to claim 2, wherein: the outer diameter of the cylindrical baffle (25) is provided with a special-shaped light hole.
4. the shutter mechanism for lithography of chip carrier tapes according to claim 2, wherein: the baffle mechanism (2) further comprises a motor (23) and a driving ring (24), the driving ring (24) and the cylindrical baffle (25) are coaxially arranged, one end face of the driving ring (24) is fixedly connected with one bottom face of the cylindrical baffle (25), inner teeth are arranged on the inner wall of the driving ring (24), a main body of the motor (23) is fixed on the man-shaped support (21), outer teeth are arranged at the output end of the motor (23), and the outer teeth are meshed with the inner teeth on the inner wall of the driving ring (24).
5. The shutter mechanism for lithography of chip carrier tapes according to claim 2, wherein: the baffle mechanism (2) is further provided with a light source groove (28), the light source groove (28) is formed in the lower portion of the supporting rod (22), and the length of the light source groove (28) in the axial direction of the supporting rod (22) is larger than or equal to the width of the carrier tape.
6. the shutter mechanism for lithography of chip carrier tapes according to claim 5, wherein: an ultraviolet light source is arranged in the light source groove (28).
7. The shutter mechanism for lithography of chip carrier tapes according to claim 2, wherein: the baffle mechanism (2) further comprises a cover shell (26), and the cover shell (26) is arranged above the cylindrical baffle (25) and is fixedly connected with the humanoid support (21).
8. The shutter mechanism for lithography of chip carrier tapes according to claim 7, wherein: the housing (26) is of a cylindrical structure with the bottom surface radius included angle of 60-90 degrees.
9. the shutter mechanism for lithography of chip carrier tapes according to claim 2, wherein: the baffle mechanism (2) further comprises lifting devices (29), the number of the lifting devices (29) is 2, and the lifting devices (29) are located below the human-shaped support (21).
10. the shutter mechanism for lithography of chip carrier tape according to claim 9, wherein: the lifting device (29) is a hydraulic lifting device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920854910.4U CN209746352U (en) | 2019-06-06 | 2019-06-06 | Baffle mechanism for photoetching chip carrier tape |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920854910.4U CN209746352U (en) | 2019-06-06 | 2019-06-06 | Baffle mechanism for photoetching chip carrier tape |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209746352U true CN209746352U (en) | 2019-12-06 |
Family
ID=68723525
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920854910.4U Active CN209746352U (en) | 2019-06-06 | 2019-06-06 | Baffle mechanism for photoetching chip carrier tape |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN209746352U (en) |
-
2019
- 2019-06-06 CN CN201920854910.4U patent/CN209746352U/en active Active
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of utility model: A baffle mechanism for chip tape lithography Effective date of registration: 20220121 Granted publication date: 20191206 Pledgee: China Construction Bank Corporation Changzhou Economic Development Zone sub branch Pledgor: Changzhou Xinsheng Semiconductor Technology Co.,Ltd. Registration number: Y2022320000027 |
|
| PE01 | Entry into force of the registration of the contract for pledge of patent right |