CN203495741U - Polishing head for chemical-mechanical polishing - Google Patents
Polishing head for chemical-mechanical polishing Download PDFInfo
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- CN203495741U CN203495741U CN201320581451.XU CN201320581451U CN203495741U CN 203495741 U CN203495741 U CN 203495741U CN 201320581451 U CN201320581451 U CN 201320581451U CN 203495741 U CN203495741 U CN 203495741U
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- head
- pitch
- polishing
- rubbing head
- asphalt
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Abstract
The utility model discloses a polishing head for the chemical-mechanical polishing, and the polishing head comprises a gasbag head, an asphalt-adhesion copper disc, and an asphalt polishing head. The asphalt-adhesion copper disc is fixed at the top of the gasbag head. The asphalt polishing head is fixed on the asphalt-adhesion copper disc. The facial form of the asphalt-adhesion copper disc is matched with the facial form of the gasbag head. The facial form of the asphalt polishing head is matched with the facial form of a to-be-polished element. According to the utility model, the facial form of the asphalt-adhesion copper disc is matched with the facial form of the gasbag head, thereby improving the stability of the polishing head, avoiding a situation that the asphalt-adhesion copper disc is departed from the gasbag head during polishing. Meanwhile, a groove of the asphalt polishing head also gathers a certain amount of polishing liquid, thereby guaranteeing the efficiency and quality of polishing, and increasing the effects of polishing and removal.
Description
Technical field
The utility model relates to ultraprecise optical processing technology field, particularly a kind of rubbing head for chemically mechanical polishing.
Background technology
In ultraprecise optics processing process, chemically mechanical polishing (Chemical Mechanical Polishing, CMP) is a very important procedure.So-called chemically mechanical polishing, adopts exactly chemistry and mechanical integrated effect to remove excess stock from optical element, and obtains the technical process of flat surface.Specifically, this finishing method is normally pushed down polished element with rubbing head, and imposed certain pressure, then rubbing head rotates with certain speed, and under the effect of polishing fluid that includes chemically mechanical polishing particle, by rubbing head and the phase mutual friction of element, reaches the object of leveling.In view of this, in polishing process, rubbing head plays a part element to exert pressure, and is the critical component of realizing element leveling.
The existing rubbing head for chemically mechanical polishing, as shown in Figure 1, it at least comprises an air bag head 1(Bonnet), a pitch adheres to copper dish 2(Copper set) and pitch rubbing head 3(Pitch head), pitch adheres to the top that copper dish 2 is bonded in air bag head 1, pitch rubbing head 3 is cast in pitch and adheres on copper dish 2, it is plane that pitch adheres to 2 types of copper dish, and the face type of air bag head 1 is sphere, this polishing head structure, there will be bonding not firm situation, when polishing, there will be pitch to adhere to the situation that copper dish 2 departs from air bag head 1; Meanwhile, pitch rubbing head 3 is generally plane, and when polishing concave surface or convex surface, plane pitch rubbing head 3 does not mate with burnishing surface type, affects efficiency and the quality of polishing.
Utility model content
The shortcoming of prior art in view of the above, the purpose of this utility model is to provide a kind of rubbing head for chemically mechanical polishing, for solving that prior art air bag and pitch adhere to that the bonding not firm and plane pitch rubbing head of copper dish does not mate with polished component side type and the quality of finish problem that produces.
Technical solution of the present utility model is as follows:
A rubbing head for chemically mechanical polishing, comprising: air bag head, pitch adhere to copper dish and pitch rubbing head; This pitch adheres to the top center position that copper dish is fixed on described air bag head, described pitch rubbing head is fixed on this pitch and adheres on copper dish, it is characterized in that, described pitch adheres to the face type of copper dish and the face type of air bag head is suitable, and described the face type of pitch rubbing head and the face type of polished element are suitable.
On described pitch rubbing head, be also provided with cross recess.
The degree of depth of described cross recess is 500～1000 μ m.
Described air bag head, pitch adheres to copper dish and the link of pitch rubbing head is integrated.
Pitch on described pitch rubbing head, when the plastic form of heat, is contained upper polishing fluid by polished element, and pitch rubbing head is rubbed by being pressed in polished element surface, and the face type of pitch rubbing head and the face type of polished element are mated.
Compared with prior art, the beneficial effects of the utility model are:
(1) by pitch, adhere to mating of copper card type and air bag women's head-ornaments type, strengthened the stability of rubbing head, while having avoided polishing, there will be pitch to adhere to the situation of copper disk detachment air bag head.
(2) mating of the face type of pitch rubbing head and the face type of polished element, guaranteed efficiency and the quality of polishing.
(3) cross recess arranging on pitch rubbing head is ejected into polishing fluid on rubbing head and has part and stay in cross recess when polishing, increases polishing removal effect.
Accompanying drawing explanation
Fig. 1 is the rubbing head generalized section for chemically mechanical polishing of the prior art.
Fig. 2 is the rubbing head generalized section for chemically mechanical polishing of the present utility model.
Fig. 3 is the structural representation that adheres to copper dish and pitch rubbing head for the rubbing head medium pitch of chemically mechanical polishing of the present utility model.
In figure, 1 is air bag head, and 2 for pitch adheres to copper dish, and 3 is pitch rubbing head.
The specific embodiment
Below in conjunction with embodiment and accompanying drawing, the utility model is described in detail; the present embodiment is implemented take technical solutions of the utility model under prerequisite; provided detailed embodiment and concrete operating process, but protection domain of the present utility model is not limited to following embodiment.
Please first consult Fig. 2, Fig. 2 is the rubbing head generalized section for chemically mechanical polishing of the present utility model, and as shown in the figure, a kind of rubbing head for chemically mechanical polishing, comprising: air bag head 1, pitch adhere to copper dish 2 and pitch rubbing head 3; This pitch adheres to the center position that copper dish 2 is fixed on the top of described air bag head 1, and described pitch rubbing head 3 is fixed on this pitch and adheres on copper dish 2.Air bag head, pitch adhere to copper dish and the link of pitch rubbing head is integrated.
Fig. 3 is the structural representation that adheres to copper dish and pitch rubbing head for the rubbing head medium pitch of chemically mechanical polishing of the present utility model, as shown in the figure, described pitch adheres to the face type of copper dish 2 and the face type of air bag head 1 is suitable, and described the face type of pitch rubbing head and the face type of polished element are suitable.Pitch on described pitch rubbing head, when the plastic form of heat, is contained upper polishing fluid by polished element, and pitch rubbing head is rubbed by being pressed in polished element surface, and the face type of pitch rubbing head and the face type of polished element are mated.On described pitch rubbing head, be also provided with cross recess.The degree of depth of cross recess is 500～1000 μ m.
Appended graphic the illustrated structure of this description, ratio, size etc., equal contents in order to coordinate description to disclose only, for person skilled in the art scholar, understand and read, not in order to limit the enforceable qualifications of the utility model, therefore the technical essential meaning of tool not, the adjustment of the modification of any structure, the change of proportionate relationship or size, do not affecting under the effect that the utility model can produce and the object that can reach, all should still drop on the technology contents that the utility model discloses and obtain in the scope that can contain.Meanwhile, in this description, quote as " on ", the term of D score, " left side ", " right side ", " centre " and " " etc., also only for ease of the understanding of narration, but not in order to limit enforceable scope of the present utility model.
Claims (4)
1. for a rubbing head for chemically mechanical polishing, comprising: air bag head (1), pitch adhere to copper dish (2) and pitch rubbing head (3); This pitch adheres to the top center position that copper dish (2) is fixed on described air bag head (1), described pitch rubbing head (3) is fixed on this pitch and adheres on copper dish (2), it is characterized in that, described pitch adheres to the face type of copper dish (2) and the face type of air bag head (1) is suitable, and the face type of described pitch rubbing head and the face type of polished element are suitable.
2. the rubbing head for chemically mechanical polishing according to claim 1, is characterized in that, on described pitch rubbing head, is also provided with cross recess.
3. the rubbing head for chemically mechanical polishing according to claim 2, is characterized in that, the degree of depth of described cross recess is 500～1000 μ m.
4. the rubbing head for chemically mechanical polishing according to claim 1, is characterized in that, described air bag head, pitch adheres to copper dish and the link of pitch rubbing head is integrated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320581451.XU CN203495741U (en) | 2013-09-18 | 2013-09-18 | Polishing head for chemical-mechanical polishing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320581451.XU CN203495741U (en) | 2013-09-18 | 2013-09-18 | Polishing head for chemical-mechanical polishing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203495741U true CN203495741U (en) | 2014-03-26 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320581451.XU Expired - Lifetime CN203495741U (en) | 2013-09-18 | 2013-09-18 | Polishing head for chemical-mechanical polishing |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203495741U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104308705A (en) * | 2014-10-20 | 2015-01-28 | 芜湖市泰能电热器具有限公司 | Aluminum alloy section polishing die |
| CN107052948A (en) * | 2017-04-24 | 2017-08-18 | 上海现代先进超精密制造中心有限公司 | A kind of Cassegrain's primary mirror precision processing method and its matched clamp |
-
2013
- 2013-09-18 CN CN201320581451.XU patent/CN203495741U/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104308705A (en) * | 2014-10-20 | 2015-01-28 | 芜湖市泰能电热器具有限公司 | Aluminum alloy section polishing die |
| CN107052948A (en) * | 2017-04-24 | 2017-08-18 | 上海现代先进超精密制造中心有限公司 | A kind of Cassegrain's primary mirror precision processing method and its matched clamp |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term |
Granted publication date: 20140326 |
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| CX01 | Expiry of patent term |