CN1937197A - 一种真空锁过渡腔室 - Google Patents
一种真空锁过渡腔室 Download PDFInfo
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- CN1937197A CN1937197A CN 200510126399 CN200510126399A CN1937197A CN 1937197 A CN1937197 A CN 1937197A CN 200510126399 CN200510126399 CN 200510126399 CN 200510126399 A CN200510126399 A CN 200510126399A CN 1937197 A CN1937197 A CN 1937197A
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- chamber
- vacuum lock
- wafer
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CNB2005101263999A CN100388456C (zh) | 2005-12-08 | 2005-12-08 | 一种真空锁过渡腔室 |
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CNB2005101263999A CN100388456C (zh) | 2005-12-08 | 2005-12-08 | 一种真空锁过渡腔室 |
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CN1937197A true CN1937197A (zh) | 2007-03-28 |
CN100388456C CN100388456C (zh) | 2008-05-14 |
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CNB2005101263999A Active CN100388456C (zh) | 2005-12-08 | 2005-12-08 | 一种真空锁过渡腔室 |
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101677076B (zh) * | 2008-09-16 | 2011-04-06 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种半导体传输***中的真空锁 |
WO2011137692A1 (zh) * | 2010-05-06 | 2011-11-10 | 东莞宏威数码机械有限公司 | 气体环境缓冲装置 |
CN105977123A (zh) * | 2016-06-29 | 2016-09-28 | 中国电子科技集团公司第四十八研究所 | 一种SiC注入机传片***及其传片方法 |
CN107275249A (zh) * | 2016-04-08 | 2017-10-20 | 东方晶源微电子科技(北京)有限公司 | 真空腔体装置和处理硅片的方法 |
CN112151431A (zh) * | 2020-09-25 | 2020-12-29 | 北京北方华创微电子装备有限公司 | 预装载腔室及半导体工艺平台 |
CN112768381A (zh) * | 2021-01-19 | 2021-05-07 | 上海广川科技有限公司 | 半导体真空设备 |
CN117457559A (zh) * | 2023-12-22 | 2024-01-26 | 上海谙邦半导体设备有限公司 | 一种晶圆搬运方法、装置、真空反应腔及工艺腔室 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4727993A (en) * | 1984-03-09 | 1988-03-01 | Tegal Corporation | Wafer cassette having multi-directional access |
US5909994A (en) * | 1996-11-18 | 1999-06-08 | Applied Materials, Inc. | Vertical dual loadlock chamber |
TW543080B (en) * | 1999-10-26 | 2003-07-21 | Fab Solutions Inc | Semiconductor device |
US6558509B2 (en) * | 1999-11-30 | 2003-05-06 | Applied Materials, Inc. | Dual wafer load lock |
-
2005
- 2005-12-08 CN CNB2005101263999A patent/CN100388456C/zh active Active
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101677076B (zh) * | 2008-09-16 | 2011-04-06 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种半导体传输***中的真空锁 |
WO2011137692A1 (zh) * | 2010-05-06 | 2011-11-10 | 东莞宏威数码机械有限公司 | 气体环境缓冲装置 |
CN107275249A (zh) * | 2016-04-08 | 2017-10-20 | 东方晶源微电子科技(北京)有限公司 | 真空腔体装置和处理硅片的方法 |
CN107275249B (zh) * | 2016-04-08 | 2020-05-05 | 东方晶源微电子科技(北京)有限公司 | 真空腔体装置和处理硅片的方法 |
CN105977123A (zh) * | 2016-06-29 | 2016-09-28 | 中国电子科技集团公司第四十八研究所 | 一种SiC注入机传片***及其传片方法 |
CN105977123B (zh) * | 2016-06-29 | 2018-07-24 | 中国电子科技集团公司第四十八研究所 | 一种SiC注入机传片***及其传片方法 |
CN112151431A (zh) * | 2020-09-25 | 2020-12-29 | 北京北方华创微电子装备有限公司 | 预装载腔室及半导体工艺平台 |
WO2022063052A1 (zh) * | 2020-09-25 | 2022-03-31 | 北京北方华创微电子装备有限公司 | 预装载腔室及半导体工艺平台 |
TWI798838B (zh) * | 2020-09-25 | 2023-04-11 | 大陸商北京北方華創微電子裝備有限公司 | 預裝載腔室及半導體製程平臺 |
CN112151431B (zh) * | 2020-09-25 | 2023-07-11 | 北京北方华创微电子装备有限公司 | 预装载腔室及半导体工艺平台 |
CN112768381A (zh) * | 2021-01-19 | 2021-05-07 | 上海广川科技有限公司 | 半导体真空设备 |
CN117457559A (zh) * | 2023-12-22 | 2024-01-26 | 上海谙邦半导体设备有限公司 | 一种晶圆搬运方法、装置、真空反应腔及工艺腔室 |
CN117457559B (zh) * | 2023-12-22 | 2024-03-15 | 上海谙邦半导体设备有限公司 | 一种晶圆搬运方法、装置、真空反应腔及工艺腔室 |
Also Published As
Publication number | Publication date |
---|---|
CN100388456C (zh) | 2008-05-14 |
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Owner name: BEIFANG MICROELECTRONIC BASE EQUIPMENT PROCES RESE Free format text: FORMER OWNER: BEIJING YUANHE ELECTRONIC TECHNOLOGY CO., LTD. Effective date: 20110311 |
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Free format text: CORRECT: ADDRESS; FROM: 100016 NO. 1, JIUXIANQIAO EAST ROAD, CHAOYANG DISTRICT, BEIJING TO: 100015 NO. 1, JIUXIANQIAO EAST ROAD, CHAOYANG DISTRICT, BEIJING |
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Effective date of registration: 20110311 Address after: 100015 No. 1 East Jiuxianqiao Road, Beijing, Chaoyang District Patentee after: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing Address before: 100016 Jiuxianqiao East Road, Beijing, No. 1, No. Patentee before: Beijing Yuanhe Electronic Technology Co., Ltd. |
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Address after: 100176 8 Wenchang Avenue, Beijing economic and Technological Development Zone, Beijing Patentee after: Beijing North China microelectronics equipment Co Ltd Address before: 100015 Jiuxianqiao East Road, Chaoyang District, Chaoyang District, Beijing Patentee before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing |
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